• Title/Summary/Keyword: X-ray Structure

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X-ray grayscale lithography for sub-micron lines with cross sectional hemisphere for Bio-MEMS application (엑스선 그레이 스케일 리소그래피를 활용한 반원형 단면의 서브 마이크로 선 패턴의 바이오멤스 플랫폼 응용)

  • Kim, Kanghyun;Kim, Jong Hyun;Nam, Hyoryung;Kim, Suhyeon;Lim, Geunbae
    • Journal of Sensor Science and Technology
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    • v.30 no.3
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    • pp.170-174
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    • 2021
  • As the rising attention to the medical and healthcare issue, Bio-MEMS (Micro electro mechanical systems) platform such as bio sensor, cell culture system, and microfluidics device has been studied extensively. Bio-MEMS platform mostly has high resolution structure made by biocompatible material such as polydimethylsiloxane (PDMS). In addition, three dimension structure has been applied to the bio-MEMS. Lithography can be used to fabricate complex structure by multiple process, however, non-rectangular cross section can be implemented by introducing optical apparatus to lithography technic. X-ray lithography can be used even for sub-micron scale. Here in, we demonstrated lines with round shape cross section using the tilted gold absorber which was deposited on the oblique structure as the X-ray mask. This structure was used as a mold for PDMS. Molded PDMS was applied to the cell culture platform. Moreover, molded PDMS was bonded to flat PDMS to utilize to the sub-micro channel. This work has potential to the large area bio-MEMS.

Electronic structure studies of Co-substituted FINEMET alloys by x-ray absorption spectroscopy

  • Chae, K.H.;Gautam, S.;Song, J.H.;Kane, S.N.;Varga, L.K.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.377-377
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    • 2010
  • FINEMET type nanocrystalline materials synthesized by controlled crystallization of amorphous ribbons[1] exhibit excellent soft magnetic properties making them attractive for technological applications. Present work reports the electronic structure studies of Co-substituted FINEMET to get information on the effect of successive Co substitution on local environment around Fe and Co atom by using near edge x-ray absorption fine structure (NEXAFS) and x-ray magnetic circular dichroism (XMCD) measurements. NEXAFS spectroscopy and XMCD measurements have been carried out at Fe $L_{3,2}$ and Co $L_{3,2}$-edges to investigate the chemical states and electronic structure of FINEMET [$(Fe_{100-x}Co_x)_{78}Si_9Nb_3Cu_1Ba$](0$L_{3,2}$-edge reveal that Fe is in 2+ state and in tetrahedral symmetry with other elements. The magnetic properties exhibiting soft magnetic behavior[2] are discussed on the basis of the electronic structure studied through XMCD.

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A Study on How Understanding of Explosive Structure Impacts on X-ray Reading Ability (폭발물의 구조이해가 X-ray 판독능력에 미치는 영향 연구)

  • Jeong, Jin-Man;Jeong, Yeon-Wan;Cho, Yong-Hoon;Oh, Se-Jin
    • Proceedings of the Korean Society of Disaster Information Conference
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    • 2017.11a
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    • pp.301-302
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    • 2017
  • 본 연구는 중요시설 보안검색에서 기초가 되는 X-ray검색에서 판독요원들의 판독능력 향상 방법에 대한 연구를 목적으로 한다. 특히 색상과 구조로 판독하는 지금의 방법에서 대부분 폭발물에 대한 기초지식만으로 판독이 진행되고 있어 폭발물의 구조이해의 필요성을 강조하고 폭발물의 구조이해가 X-ray 판독능력 향상에 도움이 될 것이라는 가설을 설정하여 연구 과제를 도출하고 있다.

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Comparison of the Solution Structure of Vancomycin with Its X-ray Crystallographic Structure

  • Lee, Chul-Hoon;Kyung, Han-Soo;Lim, Yoong-Ho
    • Journal of Microbiology and Biotechnology
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    • v.10 no.5
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    • pp.733-736
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    • 2000
  • Since pathogens resistant against vancomycin occur rapidly, the development of a new drug is needed. To make a new drug based on a rational drug design, the structural study of vancomycin is necessary. Accordingly, this study reports on a comparison of the solution structure of vancomycin determined by NMR spectroscopy, which was performed in the present work, with the X-ray crystallographic structure previously deposited in the Protein Data Bank (PDB).

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X-Ray Reflectivity Analysis Incorporated with Genetic Algorithm to Analyze the Y- to X Type Transition in CdA LB Film

  • 최정우;조경상;이희우;이원홍;이한섭
    • Bulletin of the Korean Chemical Society
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    • v.19 no.5
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    • pp.549-553
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    • 1998
  • The structure and layer distribution of cadmium arachidate Langmuir-Blodgett film were analyzed by the small angle X-ray reflectivity measurements using synchrotron radiation. Y-to X type transition was ocurred during the 39th passage of deposition of cadmium arachidate. Based on the measurement of the consumed area of the monolayer, it was determined that about 27.5 layer was deposited. Using the synchrotron X-ray, the reflectivity profile of cadmium arachidate LB film over the wide range of grazing angle was obtained. The X-ray reflectivity profile was analyzed using the recursion formula. By fitting the location and dispersion of the subsidiary maxima between the Bragg peaks of the measured reflectivity profile with that of the calculated reflectivity profile, the average thickness and the distribution of layer thickness were evaluated. The genetic algorithm was adopted to the fitting of reflectivity profile to evaluate the optimum value of the number distribution of layer. Based on the morphology measurement with an atomic force microscopy (AFM), the domain structure and mean roughness of LB films were obtained. The mean roughness value calculated based on the number of layer distribution obtained from the measurement by AFM is consistent with that obtained from X-ray reflectivity analysis.

THREE DIMENSIONAL RECONSTRUCTION OF TEETH USING X-RAY MICROTOMOGRAPHY (X-ray microtomography를 이용한 치아의 3차원 재구성)

  • Shin, Dong-Hoon
    • Restorative Dentistry and Endodontics
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    • v.28 no.6
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    • pp.485-490
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    • 2003
  • Complete understanding of the exterior and interior structure of the tooth would be prerequisite to the successful clinical results, especially in the restorative and endodontic treatment. Although three-dimensional reconstruction method using x-ray microtomography could not be used in clinical cases, it may be the best way to reconstruct the morphologic characteristics of the tooth structure in detail without destructing the tooth itself. This study was done to three dimensionally reconstruct every teeth in the arch in order to increase the understanding about the endodontic treatment and to promote the effective restorative treatment by upgrading the knowledge of the tooth morphology. After placing tooth between the microfocus x-ray tube and the image intensifier to obtain two-dimensional images of each level. scanning was done under the condition of 80 keV, $100{\;}\mu\textrm{m}$, 16.8 magnification with the spot size of $8{\;}\mu\textrm{m}$. Cross-section pixel size of $16.28{\;}\mu\textrm{m}$ and 48.83 cross-section to cross-section distance were also used. From the results of this study, precise three dimensional reconstructed images of every teeth could be obtained. Furthermore, it was possible to see image that showed interested area only, for example. enamel portion only, pulp and dentin area without enamel structure, pulp only, combination image of enamel and pulp, etc. It was also possible to see transparent image without some part of tooth structure. This image might be used as a guide when restoring and preparing the full and partial crown by showing the positional and morphological relationship between the pulp and the outer tooth structure. Another profit may be related with the fact that it would promote the understanding of the interior structure by making observation of the auto-rotating image of AVI file from the various direction possible.

Review on Laser-Plasma X-Ray Lithography at RAL in UK (영국 RAL 연구소에서의 레이저플라즈마 X-선 리소그라피 연구)

  • 김남성
    • Proceedings of the Optical Society of Korea Conference
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    • 1998.08a
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    • pp.192-193
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    • 1998
  • At Rutherford Appleton Laboratory(RAL), a high-repetition rate ps exicmer laser-plasma x-ray source has been developed for x-ray lithography with a calibrated output of up to 1 watt X-ray average power at 1nm wavelength. In a previous reports this compact x-ray source was used to print 0.18$\mu$m lines for a gate on Si-FET devices and deep three-dimensional structure with 100$\mu$m length, 25$\mu$m width, and 48 $\mu$m depth for a nanotechnology. The deep X-ray lithography is called as LIGA thchnology and getting a wide interest as a new technology for a nano-device. In this report all this works are summarized.

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