• Title/Summary/Keyword: X-Ray Photoelectron Spectroscopy

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CD34 Monoclonal Antibody-Immobilization on Polyurethane Surface by Poly(PEGA-co-BMA) Coating (PEGA/BMA 공중합체의 코팅을 통해 CD34 단일클론항체가 고정화된 폴리우레탄 표면)

  • Joung, Yoon-Ki;Hwang, In-Kyu;Park, Ki-Dong
    • Polymer(Korea)
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    • v.33 no.6
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    • pp.602-607
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    • 2009
  • A polyurethane (PU) surface enabling in vivo endothelialization via endothelial progenitor cell (EPC) capture was prepared for cardiovascular applications. To introduce CD34 monoclonal antibody (mAb) inducing EPC adhesion onto a surface, poly (poly (ethylene glycol) acrylate-co-butyl methacrylate) and poly (PEGA-co-BMA) were synthesized and then coated on a surface of PU, followed by immobilizing CD34 mAb. $^1H$-NMR analysis demonstrated that poly(PEGA-co-BMA) copolymers with a desired composition were synthesized. Poly(PEGA-co-BMA)-coated PU was much more effective for the immobilization of CD34 mAb, comparing with PEG-grafted PU prepared in our previous study, as demonstrated by that surface density and activity of CD34 mAb increased over 32 times. Physico-chemical properties of modified PU surfaces were characterized by X-ray photoelectron spectroscopy (XPS), water contact angle, and atomic force microscopy (AFM). The results demonstrated that the poly(PEGA-co-BMA) coating was effective for CD34 mAb immobilization and feasible for applying to cardiovascular biomaterials.

Effect of Anodic Oxidation of H2SO4/HNO3 Ratio for Improving Interfacial Adhesion between Carbon Fibers and Epoxy Matrix Resins (탄소섬유와 에폭시 기지의 계면강도 증가를 위한 황산/질산 양극산화에 관한 영향)

  • Moon, Cheol-Whan;Jung, Gun;Im, Seung-Soon;Nah, Changwoon;Park, Soo-Jin
    • Polymer(Korea)
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    • v.37 no.1
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    • pp.61-65
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    • 2013
  • In this work, the anodic oxidation of carbon fibers was carried out to enhance the mechanical interfacial properties of carbon fibers-reinforced epoxy matrix composites. The surface characteristics of the carbon fibers were studied by FTIR, X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy (SEM). Also, the mechanical interfacial properties of the composites were studied with interlaminar shear strength (ILSS), critical stress intensity factor ($K_{IC}$), and critical strain energy release rate ($G_{IC}$). The anodic oxidation led to a significant change in the surface characteristics of the carbon fibers. The anodic oxidation of carbon fiber improved the mechanical interfacial properties, such as ILSS, $K_{IC}$, and $G_{IC}$ of the composites. The mechanical interfacial properties of the composites anodized at 20% sulfuric/nitric (3/1) were the highest values among the anodized carbon fibers. These results were attributed to the increase of the degree of adhesion at interfaces between the carbon fibers and the matrix resins in the composite systems.

Surface Modification of Polystyrene (PS) by Atmospheric Pressure Plasma (상압 플라즈마를 이용한 Polystyrene (PS)의 표면개절)

  • Lee, Jong-Su;Shin, Hyun-Seok;Seok, Jin-Woo;Jang, Gyu-Wan;Beag, Yeong-Hwan
    • Journal of the Korean Vacuum Society
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    • v.18 no.1
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    • pp.1-8
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    • 2009
  • Hydrophilic Surface modification of Polysarene (PS) was performed by Atmospheric Pressure Plasma (APP). Air or 0, gases were used for carrier gases and RF power was changed from 150 to 350 W. We controlled the treatment time as 1 time to 4 time passing through the plasma region. when the carrier gas was air, the water contact angle on the PS surface was decreased from $91^{\circ}$ to $20^{\circ}$. And the surface energy increased from 45.74 dyne/cm to 68.48 dyne/cm. In case of the $O_2$ plasma treatment, at 300 W of RF power and 4 times treatment, the water contact angle on the PS. Surface was decreased from $91^{\circ}$ to $17^{\circ}$ and the surface energy was increased from 45.74 dyne/cm to 69.73 dyne/cm. The surface energy was increased by polar force not by dispersion force. Improvement of surface properties can be explained by the formation of new hydrophilic groups which is identified as C-O, C=O by XPS analysis. The contact angle of APP treated PS surface kept in air was increased with time elapse, but maintained same value when it was kept in water. We treated the PS surface by APP and deposited Cu as $4,000\;{\AA}$ and $8,000\;{\AA}$ by thermal evaporation. The adhesion between sample and Cu thin film improvement of treated PS surface against untreated sample. could be verifiable by Tape test (ASTM D3359)

The Effect of Pd Coating on Electron Emission from Silicon Field Emitter Arrays (Pd 코팅이 실리콘 전계 방출 어레이의 전자 방출에 미치는 영향)

  • Lee, Jong-Ram;O, Sang-Pyo;Han, Sang-Yun;Gang, Seung-Ryeol;Lee, Jin-Ho;Jo, Gyeong-Ik
    • Korean Journal of Materials Research
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    • v.10 no.4
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    • pp.295-300
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    • 2000
  • Uniform silicon tip arrays were fabricated using the reactive ion etching followed by the reoxidation sharpening, and the effect of Pd-coated layer on electron emission characteristics was studied. The electron emission from Si field emitter arrays(FEAs) was a little, but improved by removing surface oxide on the FEA, but pronounced drastically by coating a $100-{\AA}-thick$ Pd metal layer. The turn-on voltage in the Pd-coated Si FEAs was reduced by 30 V in comparison with that in uncoated ones. This results from the increase of surface roughness at the tip apex by the Pd coating on Si FEA, via the decrease of the apex radius at which electrons are emitting. The Pd-coated emitters showed superior operating stability over a wide current range to that of the uncoated ones. This suggests that Pd coating enhances the high temperature stability and the surface inertness Si FEA.

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Characteristics of Silicon Oxide Thin Films Prepared by Atomic Layer Deposition Using Alternating Exposures of SiH2Cl2 and O3 (SiH2Cl2 와 O3을 이용한 원자층 증착법에 의해 제조된 실리콘 산화막의 특성)

  • Lee Won-Jun;Lee Joo-Hyeon;Han Chang-Hee;Kim Un-Jung;Lee Youn-Seung;Rha Sa-Kyun
    • Korean Journal of Materials Research
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    • v.14 no.2
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    • pp.90-93
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    • 2004
  • Silicon dioxide thin films were deposited on p-type Si (100) substrates by atomic layer deposition (ALD) method using alternating exposures of $SiH_2$$Cl_2$ and $O_3$ at $300^{\circ}C$. $O_3$ was generated by corona discharge inside the delivery line of $O_2$. The oxide film was deposited mainly from $O_3$ not from $O_2$, because the deposited film was not observed without corona discharge under the same process conditions. The growth rate of the deposited films increased linearly with increasing the exposures of $SiH_2$$Cl_2$ and $O_3$ simultaneously, and was saturated at approximately 0.35 nm/cycle with the reactant exposures over $3.6 ${\times}$ 10^{9}$ /L. At a fixed $SiH_2$$Cl_2$ exposure of $1.2 ${\times}$ 10^{9}$L, growth rate increased with $O_3$ exposure and was saturated at approximately 0.28 nm/cycle with $O_3$ exposures over$ 2.4 ${\times}$ 10^{9}$ L. The composition of the deposited film also varied with the exposure of $O_3$. The [O]/[Si] ratio gradually increased up to 2 with increasing the exposure of $O_3$. Finally, the characteristics of ALD films were compared with those of the silicon oxide films deposited by conventional chemical vapor deposition (CVD) methods. The silicon oxide film prepared by ALD at $300^{\circ}C$ showed better stoichiometry and wet etch rate than those of the silicon oxide films deposited by low-pressure CVD (LPCVD) and atmospheric-pressure CVD (APCVD) at the deposition temperatures ranging from 400 to $800^{\circ}C$.

Physical and Electrical Characteristics of SrBi$_2$Ta$_2$O$_9$ thin Films Etched with Inductively Coupled Plasma Reactive Ion Etching System (유도결합형 플라즈마 반응성 이온식각 장치를 이용한 SrBi$_2$Ta$_2$O$_9$ 박막의 물리적, 전기적 특성)

  • 권영석;심선일;김익수;김성일;김용태;김병호;최인훈
    • Journal of the Microelectronics and Packaging Society
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    • v.9 no.4
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    • pp.11-16
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    • 2002
  • In this study, the dry etching characteristics of $SrBi_2Ta_2O_9$ (SBT) thin films were investigated by using ICP-RIE (inductively coupled plasma-reactive ion etching). The etching damage and degradation were analyzed with XPS (X-ray photoelectron spectroscopy) and C-V (Capacitance-Voltage) measurement. The etching rate increased with increasing the ICP power and the capacitively coupled plasma (CCP) power. The etch rate of 900$\AA$/min was obtained with 700 W of ICP power and 200 W of CCP power. The main problem of dry etching is the degradation of the ferroelectric material. The damage-free etching characteristics were obtained with the $Ar/C1_2/CHF_3$ gas mixture of 20/14/2 when the ICP power and CCP power were biased at 700 W and 200 W, respectively. The experimental results show that the dry etching process with ICP-RIE is applicable to the fabrication of the single transistor type ferroelectric memory device.

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Etching properties of $Na_{0.5}K_{0.5}NbO_2$ thin film using inductively coupled plasma (유도결합 플라즈마를 이용한 $Na_{0.5}K_{0.5}NbO_2$ 박막의 식각 특성)

  • Kim, Gwan-Ha;Kim, Kyoung-Tae;Kim, Jong-Gyu;Woo, Jong-Chang;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.116-116
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    • 2007
  • 21 세기에 접어들면서 인터넷을 통한 정보 통신의 발달과 개인 휴대용 이동 통신기기의 활발한 보급에 따라 휴대형 전자기기들의 소형화와 고성능화로 나아가고 있다. 이러한 전자기기에 사용될 IC의 내장 메모리 또한 집적화 및 고속화, 저 전력화가 이루어져야 한다. 이러한 전자기기들에 필수적인 압전 세라믹스 부품 중 압전 부저 및 기타 음향 부품등을 각종 전자기기와 무선 전화기에 채택함으로써 압전 부품에 대한 수요와 생산이 계속 증가할 것으로 전망된다. 이처럼 압전 세라믹스를 이용한 그 응용 범위는 대단히 방대하며, 현재 모든 압전 부품들은 PZT 계열 재료로 만들어지고 있고, 차후 모두 비납계열 재료로 대체될 것이 확실시된다. Pb의 환경오염은 이미 오래전부터 큰 문제점으로 인식되고 있었으며 그 일례로 미국의 캘리포니아 주에서는 1986년부터 약 800종의 유해물질, 그 중에서도 Pb 사용을 300ppm 이하로 규제하는 Proposition 65를 제정하여 실행하고 있다. 그리고 2003년 2월에 EU (European Union) 에서 발표한 전자산업에 관한 규제 사항중 하나인 위험물질 사용에 관한 지칭 (Restriction of Hazardous Substance, RoHS) 에 의하면, 2006 년 7월부터 전기 전자 제품에 있어서 위험 물질인 Pb을 포함한 중금속 물질(카드늄, 수은, 6가 크롬, 브롬계 난연재)의 사용을 금지한다고 발표하였다. 비록 전자세라믹 부품에 함유된 Pb는 예외 사항으로 두었지만 대체 가능한 물질이 개발되면 전자세라믹 부품에서도 Pb의 사용을 금지한다고 규정하였다. 더욱이 일본은 2005 년부터 Pb 사용을 금지시켰다. 이와 같이 Pb가 환경에 미치는 영향 때문에 비납계 강유전 물질 및 압전 세라믹스 재료에 대한 연구가 전 세계적으로 활발히 진행되고 있다. 본 연구에서는 비납계 강유전체의 patterning을 위해서, NKN 박막을 고밀도 플라즈마원인 ICP를 이용하여 식각 mechanism을 연구하고, 식각변수에 따른 식각 공정을 최적화에 대하여 연구하였다. 가스 혼합비에 따라 식각 할때 700 W의 RF 전력과 - 150 V의 직류 바이어스 전압을 인가하였고, 공정 압력은 2 Pa, 기판 온도는 $23^{\circ}C$로 고정하였다. 식각 속도는 Tencor사의 Alpha-step 500을 이용하여 측정되었으며 식각 시 NKN 박막 표면과 라디칼과의 화학적인 반응을 분석하고 식각 메커니즘을 규명하기 위하여 XPS(x-ray photoelectron spectroscopy)를 사용하였다.

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Effects of Thermal and Electrical Conductivity of Al(OH)3 Functionalized Graphene/Epoxy Composites by Simple Sol-Gel Method (졸-젤 법을 이용한 Al(OH)3 처리된 그래핀/에폭시 복합체의 열 및 전기전도 특성 분석)

  • Kim, Ji-Won;Im, Hyun-Gu;Han, Jung-Geun;Kim, Joo-Heon
    • Polymer(Korea)
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    • v.36 no.1
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    • pp.22-28
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    • 2012
  • Functionalized graphene/epoxy composites were prepared to miprove thermal conductivities of epoxy composites and to maintain electrical insulating property. Graphene oxide (GO) was prepared using Hummers method, and then GO was reacted with aluminum isopropoxide to functionalize $Al(OH)_3$ layer onto GO surface by a simple sol-gel method (Al-GO). GO and Al-GO were characterized by X-ray photoelectron spectroscopy, field emission scanning electron microscopy and transmission electron microscopy. The analyses confirm that GO was coated with a large and dense coverage of $Al(OH)_3$. GO and Al-GO (1 and 3 wt%) were embedded in bisphenol A (DGEBA) to investigate the effects of electrical insulating property. Electrical resistivity showed that Al-GO had better insulating property than GO. Further, the thermal conductivity of GO and Al-GO/epoxy composites was higher than that of neat epoxy resins. In particular, the thermal conductivity of Al-GO/bisphenol F (DGEBF) improved by 23.3% and Al-GO/DGEBA enhanced by 21.8% compared with pure epoxy resins.

Effect of Eu in Partial Oxidation of Methane to Hydrogen over Ln(1)-Ni(5)/SBA-15 (Ln = Dy, Eu, Pr, and Tb) Catalysts (Ln(1)-Ni(5)/SBA-15 (Ln = Dy, Eu, Pr, Tb) 촉매상에서 수소제조를 위한 메탄의 부분 산화 반응에서 Eu의 효과)

  • Seo, Ho Joon
    • Applied Chemistry for Engineering
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    • v.32 no.4
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    • pp.478-482
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    • 2021
  • The catalytic yields of partial oxidation of methane (POM) to hydrogen over Ln(1)-Ni(5)/SBA-15 (Ln = Dy, Eu, Pr, and Tb) were investigated in a fixed bed flow reactor under atmosphere. As 1 wt% of Eu was added to Ni(5)/SBA-15 catalyst, the O1s and Si2p core electron levels of Eu(1)-Ni(5)/SBA-15 showed the chemical shift by XPS. XPS analysis also demonstrated that the atomic ratio of O1s, Ni2p3/2, and Si2p increased to 1.284, 1.298, and 1.058, respectively, and exhibited O-, and O2- oxygen and metal ions such as Eu3+, Ni0, Ni2+, and Si4+ on the catalyst surface. The yield of hydrogen on the Eu(1)-Ni(5)/SBA-15 was 57.2%, which was better than that of Ln(1)-Ni(5)/SBA-15 (Ln = Dy, Pr, and Tb), the catalytic activity was kept steady even 25 h. As 1 wt% of Eu was added to Ni(5)/SBA-15, the oxygen vacancies caused by strong metal-support interaction (SMSI) effect due to the strong interaction between metals and carrier are made. They are resulted in increasing the dispersion of Ni0, and Ni2+ nano particles on the surface of catalyst, and are kept catalytic activity.

Acetic Acid Gas Adsorption Characteristics of Activated Carbon Fiber by Plasma and Direct Gas Fluorination (플라즈마 및 직접 기상 불소화에 따른 활성탄소섬유의 초산가스 흡착 특성)

  • Lee, Raneun;Lim, Chaehun;Kim, Min-Ji;Lee, Young-Seak
    • Applied Chemistry for Engineering
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    • v.32 no.1
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    • pp.55-60
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    • 2021
  • Fluorination was carried out to improve the adsorption performance of pitch-based activated carbon fibers (ACFs) onto acetic acid. Both plasma and direct gas fluorination were used for fluorination, and the acetic acid gas adsorption performance of fluorinated ACFs was investigated. X-ray photoelectron spectroscopy (XPS) is analyzed to determine the surface characteristics of ACFs, and the pore characteristics were analyzed by 77 K nitrogen adsorption. An adsorption performance was measured through gas chromatography, and it was confirmed that the breakthrough time of plasma fluorinated sample was 790 min and that the breakthrough time was delayed compared to that of using untreated one of 650 min. However, the breakthrough time of direct gas fluorinated sample was 390 min, indicating that the adsorption performance was inhibited. The plasma fluorinated ACFs showed an increase in the adsorption performance due to an electrostatic attraction between the acetic acid gas (CH3COOH) with the fluorine group introduced to the surface without changing its specific surface area. On the other hand, the specific surface area of the direct gas fluorinated ACFs decreased significantly up to 55%, and the physical adsorption effect on the acetic acid gas also reduced.