• Applied Microscopy
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• v.45 no.3
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• pp.131-134
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• 2015

Here we show how by processing energy dispersive X-ray spectrometry (EDS) data obtained using highly sensitive, new generation EDS detectors in the AZtec LayerProbe software we can obtain data of sufficiently high quality to non-destructively measure the number of layers in two-dimensional (2D) $MoS_2$ and $MoS_2/WSe_2$ and thereby enable the characterization of working devices based on 2D materials. We compare the thickness measurements with EDS to results from atomic force microscopy measurements. We also show how we can use electron backscatter diffraction (EBSD) to address fabrication challenges of 2D materials. Results from EBSD analysis of individual flakes of exfoliated $MoS_2$ obtained using the Nordlys Nano detector are shown to aid a better understanding of the exfoliation process which is still widely used to produce 2D materials for research purposes.

• The Bulletin of The Korean Astronomical Society
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• v.42 no.2
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• pp.73.4-74
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• 2017

We report preliminary results from our radio study of X-ray selected complete AGN sample in the Local Universe (z < 0.05), using the KVN/KaVA. The main goal is to probe the parsec-scale radio properties of the X-ray selected AGNs, which has not been done systematically before. The BASS (Burst Alert Telescope AGN spectroscopic survey) sample from the Swift-BAT hard X-ray all-sky survey is the least biased AGN sample against dense gas/torus obscurations compared to optically selected AGNs, providing ideal targets to study the general properties of local AGNs in radio wavelengths. Combining our radio data with BASS X-ray/optical measurements, we will probe the relations of radio powers with the fundamental quantities of black holes such as bolometric luminosity, black hole mass, and Eddington ratio. Using these relations, we will discuss our current understandings of how accretions and jets of local AGNs are linked together, and what they imply for the nature of our AGN sample.

• International Journal of Precision Engineering and Manufacturing
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• v.2 no.2
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• pp.73-80
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• 2001

The objective of this research is to develop a measurement error model for sculptured surface in On-Machine Measurement(OMM) process based on a closed-loop configuration. The geometric error model of each axis of a vertical CNC machining center is derived using a 4$\times$4 homogeneous transformation matrix. The ideal locations of a touch-type probe for the sculptured surface measurement are calculated from the parametric surface representation and X-, Y- directional geometric errors of the machine. Also the actual coordinates of the probe are calculated by considering the pre-travel variation of a probe and Z-directional geometric errors. Then, the step-by-sep measurement error analysis method is suggested based on a closed-loop configuration of the machining center including workpiece and probe errors. The simulation study shows the simplicity and effectiveness of the proposed error modeling strategy.

• Journal of Power System Engineering
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• v.19 no.1
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• pp.19-23
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• 2015

The swirling flow fields of a gun-type gas burner(GTGB) without a combustion chamber were measured by a straight-type five-hole pressure probe(FHPP) under the cold flow condition. The three kinds of velocity components and the static pressure were calculated by using a non-nulling calibration method covering the velocity reduction performance of the effective flow attack angle of ${\pm}80^{\circ}$. As a result, the velocity and static pressure measured by a FHPP comparatively shows the better performance on the swirling flow of a GTGB than those measured by X-probe.

• Journal of the Korean Society of Manufacturing Process Engineers
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• v.2 no.3
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• pp.56-61
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• 2003

This paper described about on-machine profile measurement of aspheric surfaces using contact probing technique in ultra precision machine. A contact probe has been designed as a sensing device to obtain measuring resolutions in nanometer regime using a circle leaf spring mechanism and a capacitive-type sensor. The contact probe which is installed on the z-axis is In touch with the aspheric objects which is fixed on the spindle of the diamond turning machine(DTM) during the measuring procedure. The x, z-axis motions of the machine are monitored by a set of two orthogonal plane mirror type laser interferometers. As a results, the developed contact probe on-machine measurement system showed 10 nanometers repeatability with a ${\pm}2{\sigma}$ and uncertainty of 200 nmPv.

• Journal of the Korean Society for Precision Engineering
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• v.16 no.10
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• pp.172-181
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• 1999

The objective of this research is to develop a measurement error model for sculptured surfaces in On-Machine Measurement (OMM) process based on a closed-loop configuration. The geometric error model of each axis of a vertical CNC Machining center is derived using a 4${\times}$4 homogeneous transformation matrix. The ideal locations of a touch-type probe for the scupltured surface measurement are calculated from the parametric surface representation and X-, Y- directional geometric errors of the machine. Also, the actual coordinates of the probe are calculated by considering the pre-travel variation of a probe and Z-directional geometric errors. Then, the step-by-step measurement error analysis method is suggested based on a closed-loop configuration of the machining center including workpiece and probe errors. The simulation study shows the simplicity and effectiveness of the proposed error modeling strategy.

• Transactions of the Society of Information Storage Systems
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• v.3 no.2
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• pp.73-80
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• 2007

Atomic Force Microscopy (AFM)방식을 이용한 Scanning probe Data Storage (SDS) 시스템은 array cantilever 를 이용하여 나노 단위로 데이터 읽기, 쓰기를 하는 시스템이다. 따라서 미디어가 있는 stage 의 x 축과 y 축 및 두 축간 coupling 을 고려한 제어기 설계가 요구된다. 본 논문은 SDS 시스템의 축간 coupling 을 고려하지 않은 기존의 제안된 LQG 에 PI 를 추가한 제어기 구조를 사용한다. 두 축간 coupling 공진의 영향을 최소화 하기 위해 convex optimization 으로 설계된 최적의 position profile를 기준 입력신호로 사용한다. 제안된 제어기를 SDS 시스템에 적용하여 모의실험을 하고 그 결과 position profile 로 인해 각 축간 coupling 공진 영향이 감소하여 tracking performance 가 기존의 LQG 제어기 보다 향상된 것을 확인한다.

• Journal of Korean Society of Occupational and Environmental Hygiene
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• v.33 no.4
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• pp.439-446
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• 2023

Objectives: The aims of this study are to investigate how X-rays are emitted to surrounding parts during the ion implantation process, to analyze these emissions in relation to the properties of the ion implanter equipment, and to estimate the resulting exposure dose. Eight ion implanters equipped with high-voltage electrical systems were selected for this study. Methods: We monitored X-ray emissions at three locations outside of the ion implanters: the accelerator equipped with a high-voltage energy generator, the impurity ion source, and the beam line. We used a Personal Portable Dose Rate and Survey Meter to monitor real-time X-ray levels. The SX-2R probe, an X-ray Features probe designed for use with the Radiagem^TM meter, was also utilized to monitor lower ranges of X-ray emissions. The counts per second (CPS) measured by the meter were estimated and then converted to a radiation dose (𝜇Sv/hr) based on a validated calibration graph between CPS and μGy/hr. Results: X-rays from seven ion implanters were consistently detected in high-voltage accelerator gaps, regardless of their proximity. X-rays specifically emanated from three ion implanters situated in the ion box gap and were also found in the beam lines of two ion implanters. The intensity of these X-rays did not show a clear pattern relative to the devices' age and electric properties, and notably, it decreased as the distance from the device increased. Conclusions: In conclusion, every gap, in which three components of the ion implanter devices were divided, was found to be insufficiently shielded against X-ray emissions, even though the exposure levels were not estimated to be higher than the threshold.

• Progress in Superconductivity
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• v.14 no.1
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• pp.1-10
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• 2012

We fabricated a closed coils by using resistive-joint method and the joint resistance of the coils were estimated by field decay technique in liquid nitrogen. We used the Runge-kutta method for the numerical analysis to calculate the decay properties. The closed coil was wound by $(Bi,Pb)_2Sr_2Ca_2Cu_3O_x$/Ag tape. Both ends the tape were overlapped and soldered to each other. The current was induced in a closed coils by external magnetic flux density. Its decay characteristic was observed by means of measuring the magnetic flux density generated by induced current at the center of the closed coil with hall sensor. The joint resistance was calculated as the ratio of the inductance of the loop to the time constants. The joint resistances were evaluated as a function of critical current of loop, contact length, sweep time, and external magnetic flux density in a contact length of 7 cm. It was observed that joint resistance was dependent on contact length of a closed coil, but independent of critical current, sweep time, and external magnetic flux density. The joint resistance was measured to be higher for a standard four-probe method, compared with that for the field decay technique. This implies that noise of measurement in a standard four-probe method is larger than that of field decay technique. It was estimated that joint resistance was $8.0{\times}10^{-9}{\Omega}$ to $11.4{\times}10^{-9}{\Omega}$ for coils of contact length for 7 cm. It was found that 40Pb/60Sn solder are unsuitable for persistent mode.

• Analytical Science and Technology
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• v.14 no.3
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• pp.203-211
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• 2001

In this paper it was described on the intereference effect of uranium to analyze Cs in $UO_2$ by Electron Probe Micro Analysis(EPMA) and the beam stability of Cs $L_{\alpha}$ X-ray intensity for some Cs compounds. According to the experimental results, the CsI showed the highest $L_{\alpha}$ X-ray intensity among the tested Cs compounds at the experimental condition; 15~30 kV of accelerating voltage and PET, LiF crystal. When 100 nA of beam current was applied to Cs compounds, Cs $L_{\alpha}$ X-ray intensity was continuously decreased with increasing time. The decreasing rate of Cs $L_{\alpha}$ X-ray intensity was directly proportional to the applied beam current and accelerating voltage but inversely proportional to the applied beam size. It was found that uranium interference can be prevented by using Cs $L_{\alpha}$ X-ray wavelength of Lif crytal for Cs analysis in $UO_2$ by EPMA.