Abstract
In this paper it was described on the intereference effect of uranium to analyze Cs in $UO_2$ by Electron Probe Micro Analysis(EPMA) and the beam stability of Cs $L_{\alpha}$ X-ray intensity for some Cs compounds. According to the experimental results, the CsI showed the highest $L_{\alpha}$ X-ray intensity among the tested Cs compounds at the experimental condition; 15~30 kV of accelerating voltage and PET, LiF crystal. When 100 nA of beam current was applied to Cs compounds, Cs $L_{\alpha}$ X-ray intensity was continuously decreased with increasing time. The decreasing rate of Cs $L_{\alpha}$ X-ray intensity was directly proportional to the applied beam current and accelerating voltage but inversely proportional to the applied beam size. It was found that uranium interference can be prevented by using Cs $L_{\alpha}$ X-ray wavelength of Lif crytal for Cs analysis in $UO_2$ by EPMA.
우라늄산화물중 Cs의 전자탐침 미세분석시 우라늄에 의한 방해와 몇 가지 Cs 화합물의 Cs $L_{\alpha}$ X-선 세기 안정도를 측정하였다. Cs 화합물 중 CsI의 Cs $L_{\alpha}$ X-선 세기가 가속전압과 결정의 종류에 관계없이 가장 높았다. 빔전류량 100 nA 사용시 Cs $L_{\alpha}$ X-선 세기는 측정시간이 경과함에 따라 감소하였으며, X-선 세기의 감소율은 가속전압과 빔전류량에 비례하였으나 빔직경에 반비례하였다. $UO_2$ 시편에 함유된 Cs의 전자탐침미세분석시 LiF결정의 Cs $L_{\alpha}$ X-선 파장을 사용하면 우라늄에 의한 방해를 제거 할 수 있었다.
