• Title/Summary/Keyword: Wet annealing

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AC & DC Electrical Characterization of PTC $BaTiO_3$ and Electrodes (PTC $BaTiO_3$ 및 전극의 직류 및 교류 특성)

  • 전표용;최경만
    • Journal of the Korean Ceramic Society
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    • v.28 no.2
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    • pp.101-108
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    • 1991
  • 0.2 mo1% La doped BaTiO3 samples were prepared by a wet chemical process (Pechini process) and electrical conductivity were measured from annealing temperatures(800-110$0^{\circ}C$) to room temperature continuously. 2 probe I-V characteristics showed that Pt electrodes were non-ohmic below about 80$0^{\circ}C$ for Ladoped sample. I-V curves showed varistor behavior and breakdown voltages showed PTC-like behavior. AC complex impedance of 0.2 La and 0.05 Mn mo1% doped BaTiO3 samples with three different electrodes (electroless Ni, Pt, Ag electrodes) were measured with temperature variation. Complex impedance plots showed that the samples with electroless Ni electrodes have negligible electrode resistance. Samples with Ag or Pt paste electrodes showed large electrode resistance. PTC effect, which is defined as the ratio of maximum resistance to minimum resistance, was found to be less than 10 for 0.2 mo1% La doped dense sample however greater than 105 with codoping of 0.05 mo1% Mn and 0.2 mol% La.

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Trap characteristics of charge trap type NVSM with reoxidized nitrided oxide gate dielectrics (재산화 질화산화 게이트 유전막을 갖는 전하트랩형 비휘발성 기억소자의 트랩특성)

  • 홍순혁;서광열
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.12 no.6
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    • pp.304-310
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    • 2002
  • Novel charge trap type memory devices with reoxidized oxynitride gate dielectrics made by NO annealing and reoxidation process of initial oxide on substrate have been fabricated using 0.35 $\mu \textrm{m}$ retrograde twin well CMOS process. The feasibility for application as NVSM memory device and characteristics of traps have been investigated. For the fabrication of gate dielectric, initial oxide layer was grown by wet oxidation at $800^{\circ}C$ and it was reoxidized by wet oxidation at $800^{\circ}C$ after NO annealing to form the nitride layer for charge trap region for 30 minutes at $850^{\circ}C$. The programming conditions are possible in 11 V, 500 $\mu \textrm{s}$ for program and -13 V, 1ms for erase operation. The maximum memory window is 2.28 V. The retention is over 20 years in program state and about 28 hours in erase state, and the endurance is over $3 \times 10^3$P/E cycles. The lateral distributions of interface trap density and memory trap density have been determined by the single junction charge pumping technique. The maximum interface trap density and memory trap density are $4.5 \times 10^{10} \textrm{cm}^2$ and $3.7\times 10^{18}/\textrm{cm}^3$ respectively. After $10^3$ P/E cycles, interlace trap density increases to $2.3\times 10^{12} \textrm{cm}^2$ but memory charges decreases.

Synthesis of the Nano-sized SrAl2O4 Phosphors by Wet Processing and its Photoluminescence Properties (SrAl2O4계 축광재료의 습식공정에 의한 나노분말 합성 및 발광특성)

  • Kim, Jung-Sik
    • Journal of the Korean Ceramic Society
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    • v.45 no.8
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    • pp.477-481
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    • 2008
  • $Eu^{2+}$ and $Dy^{3+}$ co-doped strontium aluminate, $SrAl_2O_4$ long phosphorescent phoshor was fabricated and its photoluminescence was characterized. The phosphor, $SrAl_2O_4:Eu^{2+},Dy^{3+}$ was synthesized by a coprecipitation in which metal salts of $Sr(NO_3)_2$, $Al(NO_3)_3{\cdot}9H_2O$, were dissolved in $(NH_4)_2CO_3$ solution with adding $Eu(NO_3)_3{\cdot}5H_2O$ and $Dy(NO_3)_3{\cdot}5H_2O$ as a activator and co-activator, respectively. The coprecipitated products were separated from solution, washed, and dried in a vacuum dry oven. The dried powders were then mixed with 3 wt% $B_2O_3$ as a flux and heated at $800{\sim}1400^{\circ}C$ for 3 h under the reducing ambient atmosphere of 95%Ar+$5%H_2$ gases. For the synthesized $SrAl_2O_4:Eu^{2+},Dy^{3+}$, properties of photoluminescence such as emission, excitation and decay time were examined. The emission intensity increased as the annealing temperature increased and showed a maximum peak intensity at 510 nm with a broad band from $400{\sim}650\;nm$. Monitored at 520 nm, the excitation spectrum showed a maximum peak intensity at $315{\sim}320\;nm$ wavelength with a broad band from $200{\sim}500\;nm$ wavelength. The decay time of $SrAl_2O_4:Eu^{2+},Dy^{3+}$ increased as the annealing temperature increased.

Characterization of ZnO:Al layer with post-annealing and HCl etching (후열처리에 따른 ZnO:Al 투명전도막 특성 변화 및 HCl 식각 특성 분석)

  • Kim, Han-Ung;Kim, Young-Jin;Cho, Jun-Sik;Park, Sang-Hyun;Yoon, Kyung-Hoon;Song, Jin-Soo;O, Byung-Sung;Lee, Jeong-Chul
    • 한국신재생에너지학회:학술대회논문집
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    • 2009.06a
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    • pp.159-159
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    • 2009
  • RF 스퍼터링법을 이용하여 유리기판위에 ZnO:Al 박막을 증착하고 다양한 조건 하에서 후 열처리를 실시하여 이에 따른 박막의 구조적, 전기적 및 광학적 특성과 HCl 습식 식각 후의 표면형상 변화를 조사하였다. ZnO:Al 투명전도막은 우수한 전기적, 광학적 특성, 수소 플라즈마 안정성 및 저 비용 등으로 실리콘 박막 태양전지 전면 전극용으로 많은 관심을 받고 있다. 기존의 비정질 실리콘 박막 태양전지용으로 많이 사용되고 있는 상용 Asahi-U형 ($SnO_2:F$) 투명전도막의 경우는 수소 플라즈마에 대한 안정성이 낮고 입사광의 장파장 대역에서의 낮은 산란특성으로 인하여 실리콘 박막 태양전지의 고효율화를 위한 적용에 한계를 나타내고 있다. 이를 개선하기 위하여 스퍼터링법으로 우수한 전기적 특성을 갖는 ZnO:Al 박막을 제조한 후 습식 식각을 통한 표면형상 변화를 통하여 입사광의 산란특성을 향상시키는 방법이 개발되어 많은 연구가 이루어지고 있다. 본 연구에서는 2.5 wt%의 $Al_2O_3$가 함유된 ZnO 타겟을 이용하여 ZnO:Al 박막을 RF 스퍼터링으로 증착한 후 $N_2$ 분위기와 진공 분위기 하에서 다양한 시간과 온도에 따라 후열처리를 하여 열처리 전 박막과의 물질 특성을 상호 비교하고 1%로 희석된 HCl로 습식 식각하여 열처리 전 박막의 구조적 특성이 습식 식각 후의 박막 표면형상 변화에 미치는 영향을 조사하였다. 이로부터 후열처리를 통한 ZnO:Al 투명전도막의 특성을 최적화하고 Asahi-U형 투명전도막과의 특성 비교를 통하여 실리콘 박막 태양전지용 전면전극으로의 적용 가능성을 조사하였다.

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ZnO thin films with Cu, Ga and Ag dopants prepared by ZnS oxidation in different ambient

  • Herrera, Roberto Benjamin Cortes;Kryshtab, Tetyana;Andraca Adame, Jose Alberto;Kryvko, Andriy
    • Advances in nano research
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    • v.5 no.3
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    • pp.193-201
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    • 2017
  • ZnO, ZnO: Cu, Ga, and ZnO: Cu, Ga, Ag thin films were obtained by oxidization of ZnS and ZnS: Cu, Ga films deposited onto glass substrates by electron-beam evaporation from ZnS and ZnS: Cu, Ga targets and from ZnS: Cu, Ga film additionally doped with Ag by the closed space sublimation technique at atmospheric pressure. The film thickness was about $1{\mu}m$. The oxidation was carried out at $600-650^{\circ}C$ in air or in an atmosphere containing water vapor. Structural characteristics were investigated by X-ray diffraction (XRD) and atomic force microscopy (AFM). Photoluminescence (PL) spectra of the films were measured at 30-300 K using the excitation wavelengths of 337, 405 and 457.9 nm. As-deposited ZnS and ZnS: Cu, Ga films had cubic structure. The oxidation of the doped films in air or in water vapors led to complete ZnO phase transition. XRD and AFM studies showed that the grain sizes of oxidized films at wet annealing were larger than of the films after dry annealing. As-deposited doped and undoped ZnS thin films did not emit PL. Shape and intensity of the PL emission depended on doping and oxidation conditions. Emission intensity of the films annealed in water vapors was higher than of the films annealed in the air. PL of ZnO: Cu, Ga films excited by 337 nm wavelength exhibits UV (380 nm) and green emission (500 nm). PL spectra at 300 and 30 K excited by 457.9 and 405 nm wavelengths consisted of two bands - the green band at 500 nm and the red band at 650 nm. Location and intensities ratio depended on the preparation conditions.

Interfacial Adhesion and Reliability between Epoxy Resin and Polyimide for Flexible Printed Circuit Board (연성인쇄회로기판의 에폭시수지와 폴리이미드 사이의 계면접착력 및 신뢰성 평가)

  • Kim, Jeong-Kyu;Son, Kirak;Park, Young-Bae
    • Journal of the Microelectronics and Packaging Society
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    • v.24 no.1
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    • pp.75-81
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    • 2017
  • The effects of KOH pretreatment and annealing conditions on the interfacial adhesion and the reliability between epoxy resin and polyimide substrate in the flexible printed circuit board were quantitatively evaluated using $180^{\circ}$ peel test. The initial peel strength of the polyimide without the KOH treatment was 29.4 g/mm and decreased to 10.5 g/mm after 100hrs at $85^{\circ}C/85%$ R.H. temperature/humidity treatment. In case of the polyimide with annealing after KOH treatment, initial peel strength was 29.6 g/mm and then maintained around 27.5 g/mm after $85^{\circ}C/85%$ R.H. temperature/humidity treatment. Systematic X-ray photoelectron spectroscopy analysis results showed that the peel strength after optimum annealing after KOH treatment was maintained high not only due to effective recovery of the polyimide damage by the polyimide surface treatment process, but also effective removal of metallic ions and impurities during various wet process.

Morphology of Lead Titanate Prepared by Wet Chemical Methods (습식화학법으로 제조된 티탄산 납의 형상)

  • 최병철;이문호
    • Korean Journal of Crystallography
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    • v.3 no.1
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    • pp.1-8
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    • 1992
  • The morphology of lead titanate powders prepared by sol-gel and coprecipitation techniques was investigated as a function of firing temperature and soaking time. PbTiO3 precursor powders were derived from a mixed solution of lead nitrate and titanium tetrachloride at 40℃ to 43℃ and pH of 9.0 to 9.7, and fired at temperatures 350-1000℃ for 1-10h in air. An increase of particle size and agglomeration with increasing calcination temperature and duration could be observed. By annealing sol-gel derived powder at 700℃, the tially-formed acicular(and/or prismatic) primary particles transformed to polyhedral shape with soaking time, and further soaking caused coarsening the polyhedral particles with rounded edges. However, the morphology of the coprecipitated powders was not varied during crystallization.

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Effect of Surface Treatments of Polycrystalline 3C-SiC Thin Films on Ohmic Contact for Extreme Environment MEMS Applications (극한 환경 MEMS용 옴익 접촉을 위한 다결정 3C-SiC 박막의 표면 처리 효과)

  • Chung, Gwiy-Sang;Ohn, Chang-Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.3
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    • pp.234-239
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    • 2007
  • This paper describes the TiW ohmic contact characteristics under the surface treatment of the polycrystalline 3C-SiC thin film grown on $SiO_2/Si(100)$ wafers by APCVD. The poly 3C-SiC surface was polished by using CMP(chemical mechanical polishing) process and then oxidized by wet-oxidation process, and finally removed SiC oxide layers. A TiW thin film as a metalization process was deposited on the surface treated poly 3C-SiC layer and was annealed through a RTA(rapid thermal annealing) process. TiW/poly 3C-SiC was investigated to get mechanical, physical, and electrical characteristics using SEM, XRD, XPS, AFM, optical microscope, I-V characteristic, and four-point probe, respectively. Contact resistivity of the surface treated 3C-SiC was measured as the lowest $1.2{\times}10^{-5}{\Omega}cm^2$ at $900^{\circ}C$ for 45 sec. Therefore, the surface treatments of poly 3C-SiC are necessary to get better contact resistance for extreme environment MEMS applications.

Fabrication, Structure and Gas Sensing Properties of Pt-functionalized ZnS Nanowires

  • Kim, Soohyun;Park, Sunghoon;Jung, Jihwan;Lee, Chongmu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.315.2-315.2
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    • 2014
  • Pt-functionalized ZnS nanowires were synthesized on Au-deposited c-plane sapphire substrates by thermal evaporation of ZnS powders followed by wet Pt coating and annealing. The $NO_2$ gas sensing properties of multiple-networked Pt-functionalized ZnS nanowire sensors were examined. Scanning electron microscopy showed the nanowires with diameters of 20-80 nm. Transmission electron microscopy and X-ray diffraction showed that the nanowires were wurtzite-structured ZnS single crystals. The Pt-functionalized ZnS nanowire sensors showed enhanced sensing performance to $NO_2$ gas at $150^{\circ}C$ compared to pristine ZnS nanowire sensors. Pristine and Pt-functionalized ZnS nanowire sensors showed responses of 140-211% and 207-488%, respectively, to 1-5 ppm $NO_2$, which are better than or comparable to those of many oxide semiconductor sensors. In addition, the underlying mechanism of the enhancement of the sensing properties of ZnS nanowires by Pt functionalization is discussed.

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Fabrication of YBCO films in MOD processing via chemically modified precursor solution (화학적으로 변형된 전구용액을 이용한 YBCO 박막 제조)

  • Kim, Y.K.;Yoo, J.M.;Chung, K.C.;Ko, J.W.;Kim, Y.J.;Han, B.S.
    • Progress in Superconductivity
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    • v.7 no.2
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    • pp.158-161
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    • 2006
  • Superconducting YBCO films were successfully fabricated by MOD process using chemically modified precursor solution. In this study, a chemically modified precursor solution for MOD processing was synthesized using metal-organic salts and organic additives. It was shown that crack-free and uniform precursor films were formed after calcination in humidified Oxygen atmosphere. Less than 3 hours are required to finish the calcination process. XRD measurement shows that $BaF_2,\;CuO,\;Y_2O_3$ are major constituent of precursor films. Furthermore, YBCO films without any secondary phases were successfully fabricated after annealing in wet $Ar/O_2$ atmosphere. The YBCO film prepared on a $LaAlO_3$ single crystal substrate ($10mm{\times}10mm$) gives transport $I_c$ of 10A at 77K. This chemical modification approach is a possible candidate for improving MOD-processing of YBCO coated conductor.

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