Effect of VI/III ratio on properties of alpha-Ga2O3 epilayers grown by halide vapor phase epitaxy (HVPE 방법으로 성장된 alpha-Ga2O3의 특성에 대한 VI/III ratio 변화 효과)
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- Journal of the Korean Crystal Growth and Crystal Technology
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- v.28 no.3
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- pp.135-139
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- 2018