• Journal of the Korean Vacuum Society
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• v.6 no.4
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• pp.293-297
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• 1997

Using trace etching method in this study, we measure the energy of argon ions generated in VEBA System which is composed of Marx Generater and Pulse Forming Line. In this system the electron beam of 240 kV, 30 kA, 60 ns is generated. Argon ions are formed through the electron beam ionization of a gas cloud injected by a fast puff valve. Thus argon ions are accelerated into vacuum drift tube by a virtual cathode and seperated with electron beam, consequently, they heat the trace etching plates made of aluminum thin films. The energy of argon ions are determined by the number of aluminum thin films penetrated by the ions. This experimental value corresponds with the theoretical value.

• Journal of the Korean Vacuum Society
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• v.6 no.4
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• pp.298-307
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• 1997

TDS(Thermal Desorption Spectroscopy)system, for diagnosis of CRT manufacturing process, was designed and constructed. Outgassings and thermal desorptions from the part or materials of CRT can be measured and analysed with this system at various temperatures. The system is consisted of 3 parts, vacuum chamber and pumping system with variable conductance, sample heating stages & their controller, and outgassing measurement devices, like as ion gauge or quadrupole mass spectrometer. The ultimate pressure of the system was under $1{\times}10^{-7}$ Pa. With the variable conductance system, the effective pumping speed of the chamber could be controlled from sub l/s to 100 l/s. The effective pumping speed values were determined by dynamic flow measurement principle. The temperatures and ramp rate of sample were controlled by tungsten heater and PID controller up to 600℃ within ±1℃ difference to setting value. Ion gauge & QMS were calibrated for quantitative measurements. Some examples of TDS measurement data and application on the CRT process analysis were shown.

• Journal of the Korean Vacuum Society
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• v.12 no.3
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• pp.151-156
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• 2003

Two capacitance diaphragm gauges(CDG) and two resonance silicon gauges(RSG) were calibrated using an ultrasonic interferometer as a national low vacuum standard in KRISS. The CDG has superior pressure resolution and is rugged as well as resistant to over-pressure because of all-metal inner components. Meanwhile, the RSG is a new type of MEMS sensor that has excellent calibration stability and is resistant to mechanical shocks. The calibration uncertainties were analyzed according to the ISO procedures. Results showed that the maximum difference of the expanded uncertainties was $9\times10^{-3}$Pa at the generated pressure of 100 Pa for the two different types. It is remarkable that the RSG can be used as a transfer standard at low vacuum since their accuracies were found to be within 0.5 %.

• Journal of the Korean Vacuum Society
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• v.12 no.4
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• pp.207-213
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• 2003

We have developed the hardware and software for automation of the national medium vacuum standard. The automation is necessary to control and monitor the complex system consists of several vacuum chambers, pumping systems, vacuum gauges, thermometers, and valves. By using the automation program, we have measured volume ratios of the system and performed calibration of a capacitance diaphragm gauge in order to evaluate the system.

• Journal of the Korean Vacuum Society
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• v.3 no.4
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• pp.395-400
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• 1994

본 연구에서는 LRDC 트랜스듀서를 장착한 변형된 회전 진자를 제작하여 1$\times$10-2 Torr에서 1-10-5 Torr 사이의 Ar 압력을 측정하였다. 비구동 회전 진자의 진폭은 기체 분자와의 충돌에 의한 감 쇄가 일어난다. 회전 진자의 감쇄에 의한 특성 함수를 측정하여 본 연구팀은 일반적인 진공 측정 장비 로는 측정이 어려운 1-10-5 Torr에서 1-10-5 Torr 사이의 Ar 압력을 정확하게 측정할 수 있었다.

• Proceedings of the Korean Society of Propulsion Engineers Conference
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• 2006.11a
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• pp.67-70
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• 2006

In this study micro-thrust measurement method in high vacuum chamber is introduced. This is important for the development of micro-thruster for micro-satellite applications. At Chungnam national University, high-vacuum experimental facility has been constructed to simulate space environment. And strain gauge besed micro-thrust measurement in vacuum chamber has been studied and discussed.

• Journal of the Korean Vacuum Society
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• v.14 no.3
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• pp.103-109
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• 2005

A new medium vacuum primary standard using the static expansion method was developed in KRISS. In order to evaluate the performance of the equipment, we compared the medium vacuum standard with an ultrasonic interferometer manometer using two capacitance diaphragm gauges, the measuring ranges of which were 133 Pa and 1,333 Pa respectively. The result, Error normalized values, showed that the two standards are coincident each other within the range of combined uncertainty at calibrated pressure of $3pa\;\sim\;100pa$.

• Journal of the Korean Vacuum Society
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• v.13 no.2
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• pp.54-58
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• 2004

Three hot cathode ionization gauges (HCIG) were used to study their responses of pressure measurements at the stainless steel high vacuum (HV) chamber around room temperatures. The pressure variations of HV measured by the three HCIGs between $20 ^{\circ}C$ and $26 ^{\circ}C$ were 5.0 %, 5.3 %, and 10.3 %, respectively. However, pressure differences between $21.5 ^{\circ}C$ and $22.5^{\circ}C$ were lower than the gauges uncertainty limits. The pressure variations of the HCIGs at the HV chamber was not directly affected by gauge characteristics, but pressure changes due to room temperatures.

• Journal of the Korean Vacuum Society
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• v.7 no.1
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• pp.1-4
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• 1998

We have developed an extreme high vacuum (XHV) system using a new combination pump cpmposed of a suitably shaped NEG(Non-Evaporable Getters) in the body of a sputter-ion pump (SIP). The stainless-steel test chamber was used which had been well oxidized at $450^{\circ}C$ and already yielded XHV with a turbomolecular pumping system. The pressure was measured by a Leybold extractor gauge (EXG,limit:1~$2{\times}10^{-12}$torr, but in the ultimate pressure regionthe EXG shows an unusual sign as $-0.{\times}10^{-12}$ torr which indicates much lower pressure range than its available lower limit. These results are mainly due to the high pumping speed of NEG for hydrogen. Furthermore, use of the SIP combined with the NEG as a XHV pumping system implies the potential for actualization of the surface analysis under XHV environment, and allows one to have a chance tp meet a new world in nanometer science and technology.

• Journal of the Korean Vacuum Society
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• v.9 no.1
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• pp.7-15
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• 2000

An ECR-PECVD system with the characteristics of high ionization rat다 ability of plasma processing in a wide pressure range and deposition at low temperature was manufactured and characterized for the deposition of thin films. The system consists of a vacuum chamber, sample stage, vacuum gauge, vacuum pump, gas injection part, vacuum sealing valve, ECR source and a control part. The control of system is carried out by the microprocessor and the ROM program. We have investigated the vacuum characteristics of ECR-PECVD system, and also have diagnosed the characteristics of ECR microwave plasma by using the Langmuir probe. From the data of system and plasma characterization, we could confirmed the stability of pressure in the vacuum chamber according to the variation of gas flow rate and the effect of ion bombardment by the negative DC self bias voltage. The plasma density was increased with the increase of gas flow rate and ECR power. On the other hand, it was decreased with the increase of horizontal radius and distance between ECR source and probe. The calculated plasma densities were in the range of 49.7\times10^{11}\sim3.7\times10^{12}\textrm{cm}^{-3}$. It is also expected that we can estimate the thickness uniformity of film fabricated by the ECR-PECVD system from the distribution of the plasma density.