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Visible-Light-Driven Catalytic Disinfection of Staphylococcus aureus Using Sandwich Structure g-C3N4/ZnO/Stellerite Hybrid Photocatalyst

  • Zhang, Wanzhong;Yu, Caihong;Sun, Zhiming;Zheng, Shuilin
    • Journal of Microbiology and Biotechnology
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    • v.28 no.6
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    • pp.957-967
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    • 2018
  • A novel $g-C_3N_4$/ZnO/stellerite (CNZOS) hybrid photocatalyst, which was synthesized by coupled hydro thermal-thermal polymerization processing, was applied as an efficient visible-light-driven photocatalyst against Staphylococcus aureus. The optimum synthesized hybrid photocatalyst showed a sandwich structure morphology with layered $g-C_3N_4$ (doping amount: 40 wt%) deposited onto micron-sized ZnO/stellerite particles (ZnO average diameter: ~18 nm). It had a narrowing band gap (2.48 eV) and enlarged specific surface area ($23.05m^2/g$). The semiconductor heterojunction effect from ZnO to $g-C_3N_4$ leads to intensive absorption of the visible region and rapid separation of the photogenerated electron-hole pairs. In this study, CNZOS showed better photocatalytic disinfection efficiency than $g-C_3N_4/ZnO$ powders. The disinfection mechanism was systematically investigated by scavenger-quenching methods, indicating the important role of $H_2O_2$ in both systems. Furthermore, $h^+$ was demonstrated as another important radical in oxidative inactivation of the CNZOS system. In respect of the great disinfection efficiency and practicability, the CNZOS heterojunction photocatalyst may offer many disinfection applications.

Synthesis of Nanocrystalline ZnFe2O4 by Polymerized Complex Method for its Visible Light Photocatalytic Application: An Efficient Photo-oxidant

  • Jang, Jum-Suk;Borse, Pramod H.;Lee, Jae-Sung;Jung, Ok-Sang;Cho, Chae-Ryong;Jeong, Euh-Duck;Ha, Myoung-Gyu;Won, Mi-Sook;Kim, Hyun-Gyu
    • Bulletin of the Korean Chemical Society
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    • v.30 no.8
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    • pp.1738-1742
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    • 2009
  • Nanocrystalline Zn$Fe_2O_4$ oxide-semiconductor with spinel structure was synthesized by the polymerized complex (PC) method and investigated for its photocatalytic and photoelectric properties. The observation of a highly pure phase and a lower crystallization temperature in Zn$Fe_2O_4$ made by PC method is in total contrast to that was observed in Zn$Fe_2O_4$ prepared by the conventional solid-state reaction (SSR) method. The band gap of the nanocrystalline Zn$Fe_2O_4$ determined by UV-DRS was 1.90 eV (653 nm). The photocatalytic activity of Zn$Fe_2O_4$ prepared by PC method as investigated by the photo-decomposition of isopropyl alcohol (IPA) under visible light (${\geq}$ 420 nm) was much higher than that of the Zn$Fe_2O_4$ prepared by SSR as well as Ti$O_{2-x}N_x$. High photocatalytic activity of Zn$Fe_2O_4$ prepared by PC method was mainly due to its surface area, crystallinity and the dispersity of platinum metal over Zn$Fe_2O_4$.

Characteristics of $In_xGa_{1-x}N/GaN$ single quantum well grown by MBE

  • Kang, T.W.;Kim, C.O.;Chung, G.S;Eom, K.S.;Kim, H.J.;Won, S.H.;Park, S.H.;Yoon, G.S.;Lee, C. M.;Park, C.S.;Chi, C.S.;Lee, H.Y.;Yoon, J.S.
    • Journal of the Korean Vacuum Society
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    • v.7 no.s1
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    • pp.15-19
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    • 1998
  • Structural and optical properties of $In_xGa_{1-X}N$ as well as $In_{0.1}Ga_{0.9}N$/GaN single quantum we11 (SQW) grown on sapphire (0001) substrate with an based GaN using rf-plasma assisted MBE have been investigated. The quality of the InXGal.,N fdm was improved as the growth temperature increased. In PL measurements at low temperatures, the band edge emission peaks of $In_xGa_{1-X}N$ was shifted to red region as an indium cell and substrate temperature increased. For $In_{0.1}Ga_{0.9}N$/GaN SQW, the optical emission energy has blue shift about 15meV in PL peak, due to the confined energy level in the well region. And, the FWHM of the $In_{0.1}Ga_{0.9}N$/GaN SQW was larger than that of the bulk Ino,la.9N films. The broadening of FWHM can be explained either as non-uniformity of Indium composition or the potential fluctuation in the well region. Photoconductivity (PC) decay measurement reveals that the optical transition lifetimes of the SQW measured gradually increased with temperatures.

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TOWARD A NEXT GENERATION SOLAR CORONAGRAPH: DEVELOPMENT OF A COMPACT DIAGNOSTIC CORONAGRAPH FOR THE ISS

  • Cho, K.S.;Bong, S.C.;Choi, S.;Yang, H.;Kim, J.;Baek, J.H.;Park, J.;Lim, E.K.;Kim, R.S.;Kim, S.;Kim, Y.H.;Park, Y.D.;Clarke, S.W.;Davila, J.M.;Gopalswamy, N.;Nakariakov, V.M.;Li, B.;Pinto, R.F.
    • Journal of The Korean Astronomical Society
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    • v.50 no.5
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    • pp.139-149
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    • 2017
  • The Korea Astronomy and Space Science Institute plans to develop a coronagraph in collaboration with National Aeronautics and Space Administration (NASA) and to install it on the International Space Station (ISS). The coronagraph is an externally occulted one-stage coronagraph with a field of view from 3 to 15 solar radii. The observation wavelength is approximately 400 nm, where strong Fraunhofer absorption lines from the photosphere experience thermal broadening and Doppler shift through scattering by coronal electrons. Photometric filter observations around this band enable the estimation of 2D electron temperature and electron velocity distribution in the corona. Together with a high time cadence (<12 min) of corona images used to determine the geometric and kinematic parameters of coronal mass ejections, the coronagraph will yield the spatial distribution of electron density by measuring the polarized brightness. For the purpose of technical demonstration, we intend to observe the total solar eclipse in August 2017 with the filter system and to perform a stratospheric balloon experiment in 2019 with the engineering model of the coronagraph. The coronagraph is planned to be installed on the ISS in 2021 for addressing a number of questions (e.g., coronal heating and solar wind acceleration) that are both fundamental and practically important in the physics of the solar corona and of the heliosphere.

A 0.13-㎛ Zero-IF CMOS RF Receiver for LTE-Advanced Systems

  • Seo, Youngho;Lai, Thanhson;Kim, Changwan
    • Journal of electromagnetic engineering and science
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    • v.14 no.2
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    • pp.61-67
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    • 2014
  • This paper presents a zero-IF CMOS RF receiver, which supports three channel bandwidths of 5/10/40MHz for LTE-Advanced systems. The receiver operates at IMT-band of 2,500 to 2,690MHz. The simulated noise figure of the overall receiver is 1.6 dB at 7MHz (7.5 dB at 7.5 kHz). The receiver is composed of two parts: an RF front-end and a baseband circuit. In the RF front-end, a RF input signal is amplified by a low noise amplifier and $G_m$ with configurable gain steps (41/35/29/23 dB) with optimized noise and linearity performances for a wide dynamic range. The proposed baseband circuit provides a -1 dB cutoff frequency of up to 40MHz using a proposed wideband OP-amp, which has a phase margin of $77^{\circ}$ and an unit-gain bandwidth of 2.04 GHz. The proposed zero-IF CMOS RF receiver has been implemented in $0.13-{\mu}m$ CMOS technology and consumes 116 (for high gain mode)/106 (for low gain mode) mA from a 1.2 V supply voltage. The measurement of a fabricated chip for a 10-MHz 3G LTE input signal with 16-QAM shows more than 8.3 dB of minimum signal-to-noise ratio, while receiving the input channel power from -88 to -12 dBm.

Characterization of AlN Thin Films Grown by Pulsed Laser Deposition on Sapphire Substrate (사파이어 기판에 펄스 레이저 증착법으로 성장된 AlN 박막의 특성)

  • Jeong, Eun-Hee;Chung, Jun-Ki;Jung, Rae-Young;Kim, Sung-Jin;Park, Sang-Yeup
    • Journal of the Korean Ceramic Society
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    • v.50 no.6
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    • pp.551-556
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    • 2013
  • AlN films with c-axis orientation and thermal conductivity characteristics were deposited by using Pulsed Laser Deposition and the films were characterized by changing the deposition conditions. In particular, we investigated the optimal conditions for the application of a heat sinking plane AlN thin film. Epitaxial AlN films were deposited on sapphire ($c-Al_2O_3$) single crystals by pulsed laser deposition (PLD) with an AlN target. AlN films were deposited at a fixed pressure of $2{\times}10^{-5}$ Torr, while the substrate temperature was varied from 500 to $700^{\circ}C$. According to the experimental results of the growth temperature of the thin film, AlN thin films were confirmed with a highly c-axis orientation, maximum grain size, and high thermal conductivity at $650^{\circ}C$. The thermal conductivity of the AlN thin film was found to increase compared to bulk AlN near the band gap value of 6.2 eV.

SIMULTANEOUS OBSERVATIONS OF H2O AND SIO MASERS TOWARD KNOWN EXTRAGALACTIC WATER MASER SOURCES

  • CHO, SE-HYUNG;YOON, DONG-HWAN;KIM, JAEHEON;BYUN, DO-YOUNG;WAGNER, JAN
    • Journal of The Korean Astronomical Society
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    • v.48 no.6
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    • pp.357-364
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    • 2015
  • We observe ten known 22GHz H2O maser galaxies during February 19-22, 2011 using the 21 m Tamna telescope of the Korean VLBI Network and a new wide-band digital spectrometer. Simultaneously we searched for 43GHz SiO v = 1, 2, J = 1-0 maser emission. We detect H2O maser emission towards five sources (M 33, NGC 1052, NGC 1068, NGC 4258, M 82), with non-detections towards the remaining sources (UGC 3193, UGC 3789, Antennae H2O-West, M 51, NGC 6323) likely due to sensitivity. Our 22GHz spectra are consistent with earlier findings. Our simultaneous 43GHz SiO maser search produced non-detections, yielding - for the first time - upper limits on the 43GHz SiO maser emission in these sources at a 3 σ sensitivity level of 0.018K-0.033K (0.24 Jy-0.44 Jy) in a 1.75 km s−1 velocity resolution. Our findings suggest that any 43GHz SiO masers in these sources (some having starburst-associated H2O kilomasers) must be faint compared to the 22GHz H2O maser emission.

Improved Electrical Characteristics of Symmetrical Tunneling Dielectrics Stacked with SiO2 and Si3N4 Layers by Annealing Processes for Non-volatile Memory Applications (비휘발성 메모리를 위한 SiO2와 Si3N4가 대칭적으로 적층된 터널링 절연막의 전기적 특성과 열처리를 통한 특성 개선효과)

  • Kim, Min-Soo;Jung, Myung-Ho;Kim, Kwan-Su;Park, Goon-Ho;Jung, Jong-Wan;Chung, Hong-Bay;Lee, Young-Hie;Cho, Won-Ju
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.386-389
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    • 2009
  • The electrical characteristics and annealing effects of tunneling dielectrics stacked with $SiO_2$ and $Si_{3}N_{4}$ were investigated. I-V characteristics of band gap engineered tunneling gate stacks consisted of $Si_{3}N_{4}/SiO_2/Si_{3}N_{4}$ (NON), $SiO_2/Si_{3}N_{4}/SiO_2$ (ONO) dielectrics were evaluated and compared with $SiO_2$ single layer using the MOS (metal-oxide-semiconductor) capacitor structure. The leakage currents of engineered tunneling barriers (ONO, NON stacks) are lower than that of the conventional $SiO_2$ single layer at low electrical field. Meanwhile, the engineered tunneling barriers have larger tunneling current at high electrical field. Furthermore, the increased tunneling current through engineered tunneling barriers related to high speed operation can be achieved by annealing processes.

Simulation study of ion-implanted 4H-SiC p-n diodes (이온주입 공정을 이용한 4H-SiC p-n diode에 관한 시뮬레이션 연구)

  • Lee, Jae-Sang;Bahng, Wook;Kim, Sang-Cheol;Kim, Nam-Kyun;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.131-131
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    • 2008
  • Silicon carbide (SiC) has attracted significant attention for high frequency, high temperature and high power devices due to its superior properties such as the large band gap, high breakdown electric field, high saturation velocity and high thermal conductivity. We performed Al ion implantation processes on n-type 4H-SiC substrate using a SILVACO ATHENA numerical simulator. The ion implantation model used a Monte-Carlo method. We studied the effect of channeling by Al implantation simulation in both 0 off-axis and 8 off-axis n-type 4H-SiC substrate. We have investigated the Al distribution in 4H-SiC through the variation of the implantation energies and the corresponding ratio of the doses. The implantation energies controlled 40, 60, 80, 100 and 120 keV and the implantation doses varied from $2\times10^{14}$ to $1\times10^{15}cm^{-2}$. In the simulation results, the Al ion distribution was deeper as increasing implantation energy and the doping level increased as increasing implantation doses. After the post-implantation annealing, the electrical properties of Al-implanted p-n junction diode were investigated by SILV ACO ATLAS numerical simulator.

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Improved Harmonic-CELP Speech Coder with Dual Bit-Rates(2.4/4.0 kbps) (이중 전송률(2.4/4.0 kbps)을 갖는 개선된 하모닉-CELP 음성부호화기)

  • 김경민;윤성완;최용수;박영철;윤대희;강태익
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.28 no.3C
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    • pp.239-247
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    • 2003
  • This paper presents a dual-rate (2.4/4.0 kbps) Improved Harmonic-CELP(IHC) speech coder based on the EHC(Efficient Harmonic-CELP) which was presented by the authors. The proposed IHC employs the harmonic coding for voiced and the CELP for unvoiced segments. In the IHC, an initial voiced/unvoiced estimate is obtained by the pitch gain and energy. Then, the final V/UV mode is decided by using the frame energy contour. A new harmonic estimation combining peak picking and delta adjustment provides a more reliable harmonic estimation than that in the EHC. In addition, a noise mixing scheme in conjunction with an improved band voicing measurement provides the naturalness of the synthesized speech. To demonstrate the performance of the proposed IHC coder, the coder has been implemented and compared with the 2.0/4.0 kbps HVXC(Harmonic excitation Vector Coding) standardized by MPEG-4. Results of subjective evaluation showed that the proposed IHC coder and produce better speech quality than the HVXC, with only 40% complexity of the HVXC.