• 제목/요약/키워드: Uniformity factor

검색결과 195건 처리시간 0.029초

통계적 실험계획 및 분석: Gate Poly-Silicon의 Critical Dimension에 대한 계층적 분산 구성요소 및 웨이퍼 수준 균일성 (Statistical Design of Experiments and Analysis: Hierarchical Variance Components and Wafer-Level Uniformity on Gate Poly-Silicon Critical Dimension)

  • 박성민;김병윤;이정인
    • 대한산업공학회지
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    • 제29권2호
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    • pp.179-189
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    • 2003
  • Gate poly-silicon critical dimension is a prime characteristic of a metal-oxide-semiconductor field effect transistor. It is important to achieve the uniformity of gate poly-silicon critical dimension in order that a semiconductor device has acceptable electrical test characteristics as well as a semiconductor wafer fabrication process has a competitive net-die-per-wafer yield. However, on gate poly-silicon critical dimension, the complexity associated with a semiconductor wafer fabrication process entails hierarchical variance components according to run-to-run, wafer-to-wafer and even die-to-die production unit changes. Specifically, estimates of the hierarchical variance components are required not only for disclosing dominant sources of the variation but also for testing the wafer-level uniformity. In this paper, two experimental designs, a two-stage nested design and a randomized complete block design are considered in order to estimate the hierarchical variance components. Since gate poly-silicon critical dimensions are collected from fixed die positions within wafers, a factor representing die positions can be regarded as fixed in linear statistical models for the designs. In this context, the two-stage nested design also checks the wafer-level uniformity taking all sampled runs into account. In more detail, using variance estimates derived from randomized complete block designs, Duncan's multiple range test examines the wafer-level uniformity for each run. Consequently, a framework presented in this study could provide guidelines to practitioners on estimating the hierarchical variance components and testing the wafer-level uniformity in parallel for any characteristics concerned in semiconductor wafer fabrication processes. Statistical analysis is illustrated for an experimental dataset from a real pilot semiconductor wafer fabrication process.

적외선 가열로에서 가열되는 유리 패널의 온도분포 해석 (Analysis of Temperature Distribution of the Glass Panel in the Infrared Heating Chamber)

  • 이공훈;김욱중;하수석;강새별;이준식
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 추계학술대회
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    • pp.278-283
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    • 2003
  • Analysis has been carried out to investigate the temperature variation and the uniformity of the temperature distribution of the glass panel by infrared radiant heating. Halogen lamps are used to heat the panel and located near the top and bottom of the rectangular chamber. The thermal energy is transfered only by radiation and the radiation exchange occurs only on the solid surfaces and is considered by using the view factor. The results show that the uniformity of the temperature distribution of the panel is improved but the time for heating increases as the wall reflectivity is large. The temperature difference reaches a maximum in the early stage of the heating process and then decreases until it reaches the uniform steady-state value.

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배연탈황설비 덕트쿨러에서의 유동균일화에 관한 연구 (A study on a uniformity of flow field in a duct cooler of FGD system)

  • 배진효;김광추;박만흥;박경석;이종원
    • 설비공학논문집
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    • 제12권2호
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    • pp.120-130
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    • 2000
  • A flow uniformity in a duct cooler of duct system of FGD(Flue Gas Desulfurization) linking a reheater and a absorber has been investigated in the present study. For this purpose, the flow characteristics according to the geometry of a vertical and horizontal vane in a curved duct of the duct system has been examined with the aid of a numerical simulation. The results indicate that the vertical vane with a little deflection toward a recirculation region makes the flow distribution in the duct cooler more uniform than that without deflection, and horizontal vane does not effect the change of the flow distribution for an angle of inclination. The mean flow uniform factor shows its maximum for duct system without the vane(case NP) and its minimum for the vertical vane with a little deflection(case P-0.8-0) .

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Temperature Uniformity of the Glass Panel Heated in the Infrared Heating Chamber

  • Lee, Kong-Hoon;Kim, Ook-Joong
    • Journal of Mechanical Science and Technology
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    • 제19권10호
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    • pp.1950-1956
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    • 2005
  • An analysis has been carried out to investigate the effect of the reflectivity on the temperature distribution of a glass panel by infrared radiant heating. Halogen lamps are used to heat the panel, located near the top and bottom of the rectangular chamber. The thermal energy is transferred from the lamps to the panel only by radiation and it is considered by using view factor. The conductive transfer is limited inside the panel. The results show that the uniformity of the temperature distribution of the panel is improved and, at the same time, the time for heating increases as the wall reflectivity increases. The temperature difference between the center and the corner reaches a maximum in the early stage of the heating process and then decreases until it reaches a uniform steady-state value.

친환경 정밀농업을 위한 입제 변량살포기 개발 (II) -송풍식 붐형 분두 개발과 살포균등도 - (Development of a Variable Rate Granule Applicator for Environment-Friendly Precision Agriculture (II) - Development of Pneumatic Fertilizer Blow Head and Its Application Uniformity -)

  • 김영주;김학진;서민;이중용
    • Journal of Biosystems Engineering
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    • 제31권6호
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    • pp.474-481
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    • 2006
  • In this paper, a new type blow head was developed and pneumatic application system was evaluated. The blow head had one operating factor, inserting length of collecting plate, that was directly related to discharge rate and application pattern. To determine Proper blow head arrangement and application height, a blow head set was tested. Three-way ANOVA was conducted to investigate relationships between CV value, the discharge rate and inserting length of collecting plate. The discharge rate and inserting length of collecting plate were statistically significant at p=0.01, affecting uniformity of application pattern. The best CV value among the application tests was 23.3% when the application rate and application height was 23.5 g/sec and 80 cm respectively. The worst CV value was 63.3% in 111.4 g/sec. Therefore, it is necessary to increase number of blow head in a section of the boom in improve application uniformity.

혼합형 채광조절장치가 실내공간의 주광조도분포에 미치는 영향에 관한 Mockup 실험평가 (Light Factor Performance of a Room with Light Guide and Blind Systems by Mockup Experiments)

  • 신화영;김정태
    • KIEAE Journal
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    • 제7권1호
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    • pp.23-31
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    • 2007
  • This study aims to evaluate the illuminance performance of sloped light guide with automated venetian blind systems. For the purpose, a mock-up model was constructed as a prototype of Korean office building with $12.0m{\times}7.3m{\times}3.7m$ ($w{\times}d{\times}h$) and south facing side-window mounted between the clerestory window($2.0m^2$) and the view window($5.6m^2$). The light guide of 1.28m deepth and $29^{\circ}$ tilted angle, is covered with 0.6mm galvanized steel sheet and 97% reflective film. To protect the room from low solar angle, a blind systems, 0.15m deepth and $30^{\circ}$ automated slat angle was installed. To assess illuminance performance, the totally 37 measuring points for illuminance were monitored. For the detailed analysis, photometric sensors were installed at work-plane (8 points), wall (7 points), ceiling (3points), and exterior horizontal illuminance (1 point) respectively. The performance was measured under clear sky and is monitored by Agilent data logger, photometric sensor Li-cor and the Radiant Imaging ProMetric 1400. Comparisons of light factor and uniformity are discussed.

블록 클리닝 비용 분석에 기초한 MODA할당 정책 설계 및 구현 (Design and Implementation of MODA Allocation Scheme based on Analysis of Block Cleaning Cost)

  • 백승재;최종무
    • 한국정보과학회논문지:시스템및이론
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    • 제34권11호
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    • pp.599-609
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    • 2007
  • 플래시 메모리는 덮어 쓰기 제약이나, 쓰기와 삭제 연산의 단위가 다르다는 등의 특징을 가지고 있다. 따라서 플래시 메모리를 저장장치로 사용하는 파일 시스템은 블록 클리닝을 필요로 하며 이는 파일 시스템의 주된 병목으로 작용한다. 이에 따라 본 논문에서는 플래시 메모리 기반 파일 시스템의 병목 요소인 블록 클리닝에 따른 성능향상에 대해 연구한다. 우선 블록 클리닝에 영향을 끼치는 성능 인자로서 이용률, 무효율, 순수도를 정의하였다. 이 세 가지 인자를 통해 블록 클리닝 비용을 분석한 결과, 파일 시스템 수준에서 제어 가능한 인자인 순수도가 블록 클리닝 비용에 많은 영향을 끼침을 확인할 수 있었다. 따라서 순수도를 높게 유지하여 블록 클리닝 비용을 최소화함으로서 파일시스템의 성능을 향상 시킬 수 있는 MODA 할당 정책(modification-aware)을 설계하였고, 이를 내장형 보드와 YAFFS(Yet Another Flash File System)상에 구현하였다. 실험 결과 MODA는 YAFFS의 순차 할당 기법에 비해 블록 클리닝 시간을 평균 123% 단축 시켰다.

두상관수장치의 부채꼴분사노즐 설치위치가 살수균일성에 미치는 영향 (Effect of a Suspended Overhead Sprayer with Sector Formed Injection Nozzles on Spraying Uniformity)

  • 김명규;정태상;민영봉
    • 생물환경조절학회지
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    • 제8권4호
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    • pp.223-231
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    • 1999
  • 육묘장의 두상관수장치는 균일하게 관수되어야 모종도 균일하게 성장한다. 본 연구에서는 부채꼴 분사노즐을 이용한 두상관수장치의 노즐 설치위치에 따른 관수상태를 조사하여 균일관수방법을 구명하였다. 살수량은 주행속도에 반비례하였고, 관수균일도는 노즐과 관수면과의 거리에 큰 영향을 받으며 주행속도의 영향은 없었다. 단일노즐에 의한 두상관수인 경우 노즐 끝에서 관수면이 60cm 이상 멀어질수록 관수균일도가 향상되며, 연속노즐에 의한 두상관수인 경우 관수면이 노즐분사 각도의 2차 교차점에 위치할 때 관수균일도가 가장 좋은 것으로 나타났다. 두상관수장치의 균일관수를 위해서는 작물의 머리높이가 분사노즐의 2차교차점에 일치하도록 노즐의 위치를 정해야 하며 작물의 자람에 따른 노즐대 놀이를 조절해 주는 것이 바람직한 것으로 판단된다.

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Urea 수용액의 배기가스 유동장내 분무 특성과 분무 균일도에 관한 연구 (A Study on the Characteristic and Droplet Uniformity of Spray Injection to Exhaust Gas Flow from Urea Solution Injector)

  • 오정모;차원심;김기범;이진하;이기형
    • 한국자동차공학회논문집
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    • 제19권3호
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    • pp.83-89
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    • 2011
  • Diesel engines can produce higher fuel efficiency and lower $CO_2$ emission, they are subject to ever more stringent emission regulation. However, there are two major emission concerns fo diesel engines like such as particulate matter (PM) and nitrogen oxides (NOx). Moreover, it is not easy to satisfy the regulations on the emission of NOx and PM, which are getting more strengthened. One of the solutions is to apply the new combustion concept using multistage injection such as HCCI and PCCI. The other solution is to apply after-treatment systems. For example, lean NOx trap catalyst, Urea-SCR and others have various advantages and disadvantages Especially, Urea-SCR system have advantages such as a high conversion efficiency and a wide operation conditions. Hence the key factor to implementation of Urea-SCR technology, good mixing of urea(Ammonia) and gas, reducing Ammonia slip. Urea mixer components are required to facilitate evaporation and mixing because the liquid state of urea poses significant barriers for evaporation, and the distance to mixer is the most critical that affect mixer performance. In this study, to find out the distance from injector to mixer and simulation factor, a laser diagnostics and high speed camera are used to analyze urea injector spray characteristics and to present a distribution of urea solution in transparent manifold In addition, Droplet Uniformity Index is calculated from the acquired images by using image processing method to clarify the distribution of spray.

터널용 고효율 조명기구 반사판의 개발 (The Development of a High Efficiency Luminaires Reflector for Tunnel Lighting)

  • 김기훈;황재산;윤미림;김훈
    • 조명전기설비학회논문지
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    • 제15권2호
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    • pp.1-6
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    • 2001
  • 우리 나라의 터널 조명은 운전자의 시야상태를 저해하는 불균일한 조도 균제도, 터널 내의 플리커 현상, 심한 눈부심 등과 함께 낮은 기구효율, 낮은 조명률, 높은 에너지 소비 등의 문제점을 갖고 있다. 이러한 것들을 개선 하기 위해서 터널용 고효율 조명기구의 반사판을 개발하였고, 개발된 조명기구는 기구 자체 효율이 10%이상 상승함으로써 에너지의 절감과 조명효과의 상승을 가져왔으며, 기구 대수의 저감으로 시설비를 절감할 수 있다. 또한 이것을 이용한 터널조명에서는 평균조도 200[lx]이상, 전반 균제도 0.4이상, 차선축 균제도 0.7이상, 단위 면적당 소비전력 3.7 [W/m$^2$]이하의 효과를 얻었다.

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