• 제목/요약/키워드: UV light source

검색결과 170건 처리시간 0.03초

TiO2를 이용한 저농도 유기오염물질 제거에 관한 연구 (A Study on Low Concentrations of Organic Pollutants Removal using TiO2)

  • 이용훈;강선홍
    • 상하수도학회지
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    • 제27권1호
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    • pp.83-89
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    • 2013
  • Microbiological treatment, chlorination, and ozonation are usually used for water treatment. However, there is weakness that these methods can't decompose and eliminate recalcitrant organic pollutants perfectly. It is possible to eliminate recalcitrant organic pollutants when photocatalysis of $TiO_2$ is used. In this study, the removal efficiencies of organic pollutants by using photocatalyst of $TiO_2$ in the slightly polluted golf club water hazard and a river were investigated. The amount of $TiO_2$ was divided into three categories of 1 g/L, 2 g/L and 4 g/L in order to investigate the adequate amount of $TiO_2$ and the removal efficiency. UV light was used as a light source for the reaction of photocatalyst. As a conclusion in this study, the efficiency of turbidity removal was increased in proportion to the amount of $TiO_2$ until 4 hours. After then the turbidity was gradually decreased. Finally, the optimum concentration of $TiO_2$ was 4 g/L. The efficiency of COD removal was increased in proportion to the amount of $TiO_2$ regardless of time.

LCD와 가시광선 LED를 사용한 전사방식의 Scanbeam-SLA 개발 (Development of Projection Scanbeam-SLA using Liquid Crystal Display and Visible Light Emitting Diode)

  • 윤수현;박인백;김민섭;조광호;이석희
    • 한국정밀공학회지
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    • 제30권3호
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    • pp.340-348
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    • 2013
  • In Projection Stereolithography Apparatus (PSLA), Digital Micromirror Device (DMD) and Liquid Crystal Display (LCD) are used as a beam pattern generator. The DMD shows high resolution, but it is mostly applied in micro stereolithography due to high cost and fabricable area. In LCD, the size of pattern beam is freely controlled due to various panel sizes. The LCD, however, has some limitations such as short life time by the high power light source, non-uniform light intensity of pattern beam and low transmittance of UV-light. To solve these problems in LCD-based PSLA, a Scanbeam-SLA with LCD of 19 inches and visible LED-array is developed. In this system, the light module works like a scanner for uniform illumination. The system configuration, working principle and fabrication examples are addressed in this study.

50μm급 마이크로렌즈 적용 2인치 휴대폰 LCD-BLU 금형 개발 : 광학패턴의 세장비 영향 (A Study on the Fabrication Method of Mold for 2 inch LCD-BLU by 50μm Microlens : Effect of Different Aspect Ratio)

  • 김종선;고영배;민인기;유재원;허영무;윤경환;황철진
    • 소성∙가공
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    • 제16권1호
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    • pp.48-53
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    • 2007
  • LCD-BLU(Liquid Crystal Display - Back Light Unit) consists of several optical sheets: LGP(Light Guiding Plate), light source and mold frame. The LGP of LCD-BLU is usually manufactured by etching process and forming numerous dots with $50{\mu}m$ in diameter on the surface. But the surface roughness of LGP with etched dots is very high, so there is much loss of light. In order to overcome the limit of current etched dot patterned LGP, optical pattern design with microlens of $50{\mu}m$ diameter was applied in the present study. The microlens pattern fabricated by modified LiGA with thermal reflow process was applied to the optical design of LGP and optical simulation was carried out to know tendency of microlens patterned LGP simultaneously. The attention was paid to the effects of different aspect ratio(i.e. $0.2\sim0.5$) of optical pattern conditions to the brightness distribution of BLU with microlens patterned LGP. Finally, high aspect ratio microlens patterned LGP showed superior results to the one made by low aspect ratio in average luminance.

포토 마스크가 필요없는 스크린 제판 기술 개발 (A Development on the Non-Photomask Plate Making Technology for Screen Printing)

  • 구용환;안석출;김성빈;남수용
    • 한국인쇄학회지
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    • 제28권1호
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    • pp.65-75
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    • 2010
  • Environmentally friendly, stencil and screen printing for cost-effective for maskless. In this study, UV -LED light source for the dispersion characteristics and high competence photoresist coating was prepared. Wavelength of 365nm UV-LED exposure device using the maskless lithography, 1.7kgf/$cm^2$ $2600mmH_2O$ the injection pressure and the suction pressure by using a dry photoconductor symptoms were dry emulsion on the market as a result, curing properties and adhesion, hardness, solvent resistance and excellent reproduction of fine patterns and ecological stencil technology was available and could be confirmed as a possibility.

VOC물질중 에탄올 광분해반응을 위한 $TiO_2$촉매의 제초변수 고찰 (The Study on Preparation Parameters of $TiO_2$Catalyst for Photodecomposition of Ethanol as a VOC)

  • 이병용;김성욱;정석진
    • 한국대기환경학회지
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    • 제17권4호
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    • pp.363-370
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    • 2001
  • In this study, TiO$_2$, the popular photocatalyst, was used to decompose ethanol. TiO$_2$was prepared by the sol -gel method and coated on pyrex stick. A 15W, UV-A lamp was used as the UV light source and il gas chromatography (HP 5890) was used to confirm the concentrations of ethanol, $CO_2$and the intermediates. Variation of preparation parameters and calcination temperature for TiO$_2$photocatalysts in the sol -gel method caused changes of ethanol decomposition activity. The best ethanol photodecomposition activity was obtained on the sample when prepared with 0.14 mol of HCI, a mol of ethanol and 1.3 mol of TTIP ware mixed in sol-gel process and calcinated at 50$0^{\circ}C$ for 3 hours. Acetaldehyde was detected as an intermediate and decomposed to carbon dioxide and water at the end of the reaction.

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회전원판 광촉매 반응기(Rotating Disk Photocatalytic Reactor)를 이용한 Rhodamine B의 색 제거 (Decolorization of Rhodamine B using Rotating Disk Photocatalytic Reactor)

  • 박영식
    • 한국물환경학회지
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    • 제21권1호
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    • pp.46-51
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    • 2005
  • The photocatalytic oxidation of Rhodamine B (RhB) was studied using immobilized $TiO_2$ and rotating disk photocatalytic reactor. Immobilized $TiO_2$ onto the surface of the aluminum plate was employed as the photocatalyst and two 20 W germicidal lamps and two 20 W UV-BLB lamps were used as the light source and the reactor volume was 1.0 L. The effects of parameters such as the number of rotating disk, rpm of rotating disk, the number of coating, $H_2O_2$ and photo-fenton amounts, and the concentrations of anions and cations ($NO_3{^-}$, $SO_4{^{2-}}$, $Cl^-$, $Ca^{2+}$, $Zn^{2+}$, $Na^+$) were examined.

불투명 수지재료의 복사에너지에 의한 변색 측정 (Measurement of Color Change of Opaque Resin Materials by Radiation Energy)

  • 한종성;김홍범;김훈
    • 한국조명전기설비학회:학술대회논문집
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    • 한국조명전기설비학회 1998년도 학술발표회논문집
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    • pp.138-141
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    • 1998
  • To evaluate the color change of the opaque resin materials, a measuring system including PAS(photodegradation acceleration system) was constructed. Xenon lamp is used as a light source in the PAS, and the radiant energy from the lamp is irradiated to the samples through serveral high-pass filters with cut-off wavelength in UV and visible region. The color difference of the samples were measured by using the measuring system with a spectrophotometer(CM-2002) and a computer. The result showed that the opaque resin materials changed severely in their color in the wavelength of UV region and changed a little in the wavelength of visible region.

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양극산화법과 UV-LED를 이용한 다공성 3C-SiC 박막 형성 (Formation of porous 3C-SiC thin film by anodization with UV-LED)

  • 김강산;정귀상
    • 센서학회지
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    • 제18권4호
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    • pp.307-310
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    • 2009
  • This paper describes the formation of porous 3C-SiC by anodization. 3C-SiC thin films were deposited on p-type Si(100) substrates by APCVD using HMDS(Hexamethyildisilane: $Si_2(CH_3)_6$). UV-LED(380 nm) was used as a light source. The surface morphology was observed by SEM and the pore size was increased with increase of current density. Pore diameter of 70 $\sim$ 90 nm was achieved at 7.1 mA/cm$^2$ current density and 90 sec anodization time. FT-IR was conducted for chemical bonding of thin film and porous 3C-SiC. The Si-H bonding was observed in porous 3C-SiC around wavenumber 2100 cm$^{-1}$. PL shows the band gap enegry of thin film(2.5 eV) and porous 3C-SiC(2.7 eV).

UV 라이다용 주파수 가변 Ti:sapphire 레이저에 관한 연구 (A Study of frequency tunable Ti:sapphire laser for UV lidar)

  • Yi, Yong-Woo
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2002년도 추계종합학술대회
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    • pp.656-661
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    • 2002
  • 라이다 광원용 다중통과 Ti-sapphire 증폭기를 각도다중 방식으로 설계하여 출력에너지 및 스펙트럼 특성을 개선하였다. 2-단의 다중통과 증폭기에서 파장이 790nm 일 때, 42mJ의 출력에너지와 21dB의 증폭이득 및 26%의 출력효율을 얻었으며, 715~930nm이 파장가변 영역에서 스펙트럼 선폭은 0.05$cm^{-1}$ / 이하였다. 780nm의 파장에서 35%의 SHG 변환효율과 390nm의 파장에서 13%의 THG 변환효율을 각각 얻었다. 결과적으로 240~306nm의 자외영역과 360~460nm의 deep-blue 영역에서 연속적으로 파장을 가변시킬 수 있었다.

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PLD증착 변수에 따른 II-VI족 화합물 ZnO 반도체 박막의 발광 특성 연구 (Correlation Between Deposition Parameters and Photoluminescence of ZnO Semiconducting Thin Films by Pulsed laser Deposition)

  • 배상혁;윤일구;서대식;명재민;이상렬
    • 한국전기전자재료학회논문지
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    • 제14권3호
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    • pp.246-250
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    • 2001
  • ZnO thin films for light emission device have been deposited on sapphire and silicon substrates by pulsed laser deposition technique(PLD). A Nd:YAG laser was used with the wavelength of355 nm. In order to investigate the emission properties of ZnO thin films, Pl measurements with an Ar ion laser a light source using an excitation wavelength of 351 nm and a power of 100 mW are used. All spectra were taken at room temperature by using a grating spectrometer and a photomultiplier detector. ZnO exhibited Pl bands centers around 390, 510 and 640 nm, labeled near ultra-violet(UV), green and orange bands. Structural properties of ZnO thin films are analyzed with X-ray diffraction(XRD).

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