• 한국표면공학회지
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• 제36권1호
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• pp.89-98
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• 2003

Corrosion characteristics of Ti, Ti/Cr coated and plasma-nitrided surface for stainless steel containing Ti have been studied. Stainless steels containing 0.09-0.92wt% Ti were fabricated by using vacuum furnace and solutionized for 1hr at $1050^{\circ}C$. Ti and Cr coatings were done on solutionized stainless steel surface by EB-PVD. The Ti coated specimen were coated by Cr and were nitrided by plasma at $450^{\circ}C$ for 5hr Microstructure and phase analysis were performed using SEM, OM and EDX. Corrosion behavior of the coated specimen was investigated by electrochemical test. The coated surface was of fine columnar structure. The Ti/Cr coated surface was denser than the Ti coated and the Ti coated-nitrided surfaces. The corrosion and pitting potential increased in proportion to the Ti content, coating temperature, coating thickness and formation of stable oxide film. The current density in active and passive region decreased in the case of Ti/Cr coated sample and Ti coated-nitrided samples. Especially the plasma nitrided specimen after Ti coating have a good corrosion resistance compared with the Ti coated specimen. The number and size of pits decreased as Ti content of matrix increased.

• 한국표면공학회지
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• 제52권6호
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• pp.342-349
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• 2019

Titanium nitride(TiN) thin films have been deposited on PEN(Polyethylene naphthalate) substrate by reactive RF(13.56 MHz) magnetron sputtering in a 25% N₂/Ar mixed gas atmosphere. The pulsed DC bias voltage of -50V on substrates was applied with a frequency of 350 kHz, and duty ratio of 40%(1.1 ㎲). The effects of pulsed DC substrate bias voltage on the crystallinity, color, electrical properties of TiN_x films have been investigated using XRD, SEM, XPS and measurement of the electrical properties such as electrical conductivity, carrier concentration, mobility. The deposition rates of TiN_x films was decreased with application of the pulsed DC substrate bias voltage. The TiN_x films deposited without and with pulsed bias of -50V to substrate exhibits gray and gold colors, respectively. XPS depth profiling revealed that the introduction of the substrate bias voltage resulted in decreasing oxygen concentration in TiN_x films, and increasing the electrical conductivities, carrier concentration, and mobility to about 10 times, 5 times, and 2 times degree, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.212-213
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• 2007

$TiO_2$ 박막은 좋은 내구성 전기적 특성과 함께 가시광선 영역에서의 높은 투과율, 높은 굴절률을 나타내어 태양전지의 반사 방지막, TFT 절연막, 광학적 필터에 쓰이는 다층 광학적 코팅 재료 등에 쓰이며 높은 이용가치로 인해 이에 대한 많은 연구가 이루어지고 있다. 본 논문에서는 APCVD(Atmospheric Pressure Chemical Vapor Deposition)법을 이용하여 $200^{\circ}C$에서 $350^{\circ}C$까지 증착 온도를 변화시키며 $TiO_2$ 박막을 제조할 때 나타나는 광학적 특징 변화에 대한 연구를 수행하였다. 온도가 증가할수록 굴절률은 커지고 $TiO_2$, 박막안의 기공과 결함의 비율은 감소하였다. 광투과율은 UV범위 이후에서 급격한 증가를 보였으며 온도가 증가함에 따라 흡수단이 긴 파장쪽으로 이동하였다. 흡수단의 증가는 광학적 밴드갭과 연관되며 온도가 증가할수록 광학적 밴드갭은 낮아지는 것을 확인할 수 있었다.

• 한국전기전자재료학회논문지
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• 제33권6호
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• pp.433-438
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• 2020

To enhance the tunneling electroresistance (TER) ratio of a ferroelectric tunnel junction (FTJ) device using Al-doped HfO₂ thin films, a thin insulating layer was prepared on a TiN bottom electrode, for which TiN was preliminarily treated at various temperatures in O₂ ambient. The composition and thickness of the inserted insulating layer were optimized at 600℃ and 50 Torr, and the FTJ showed a high TER ratio of 430. During the heat treatments, a titanium oxide layer formed on the surface of TiN, that suppressed oxygen vacancy generation in the ferroelectric thin film. It was found that the fabricated FTJ device exhibits two distinct resistance states with higher tunneling currents by properly heat-treating the TiN bottom electrode of the HfO₂-based FTJ devices in O₂ ambient.

• 한국전기전자재료학회논문지
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• 제15권1호
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• pp.61-66
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• 2002

A method for designing antireflection (AR) and antistatic (AS) coating layer by the use of conducting polymer as an electrically conductive transparent layer is proposed. The conducting AR coating is composed of four-layer with alternating high and low refractive index layer: silicon dioxide (n=1.44) and titanium dioxide (n=2.02) prepared at low temperature by sol-gel method are used as the low and high refractive index layer, respectively. The poly(3,4-ethylenedioxythiophene) which has the surface resistivity of 10$^4$Ω/$\square$ is used as a conductive layer. Optical constant of each ARAS coating layers such as refractive index and optical thickness were measured by 7he spectroscopic ellipsometer and from the measured optical constants the spectral properties such as reflectance and transmittance were simulated in the risible region. The reflectance of ARAS films on glass substrate was below 1 %R and the transmittance was higher than 95 % in the visible wavelength (400-700 nm). The measured AR spectral properties was very similar to its simulated results.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.345-345
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• 2010

Thin film of $TiO_2$ deposited on carbon paper was fabricated by atomic layer deposition (ALD) using titanium isopropoxide (TTIP) and $H_2O$ as precursors. In this work, the photocatalytic activities of $TiO_2$ films with and without e-beam treatment were compared. The samples were treated by e-beam using e-beam energy of 1MeV and exposure range between 5 and 15kGy. The photocatalytic activity was evaluated by the photocatalytic degradation of methyleneblue (MB) under UV irradiation (365nm) at room temperature using an UV-vis spectroscopy. The surface properties were characterized by scanning electron microscope (SEM) and X-ray photoelectron spectroscopy (XPS). The sample treated by the low radiation dose has more catalytic activity than other ones. SEM images show that the high radiation dose caused the $TiO_2$ to aggregation on carbon paper. Due to the aggregation of $TiO_2$, the partially exposed carbon paper was oxidized.

• 한국표면공학회지
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• 제25권5호
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• pp.235-252
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• 1992

(Ti, Al)N films were deposited on 304 stainless steel sheet by D.C. magnetron sputtering using Al target and Ti plate. The high temperature oxidation of (T, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films was similar to the sputter area ratio of titanium to aluminum target by means of EDS and AES survey. The high temperature oxidation test of (Ti, Al)N showed that (Ti, Al)N has better high temperature resistance than TiN and TiC films. TiC films were cracked at 40$0^{\circ}C$ in air TiN films quickly were oxidised at $600^{\circ}C$, were spalled more than $700^{\circ}C$. But (Ti, Al)N films are relatively stable to$ 900^{\circ}C$. The good resistance to high temperature oxida-tion of (Ti, Al)N films are due to the formation of dense Al2O3 and TiO2 oxide layer. Especially, Al2O3 oxide layer is more important. The results obtained from this study show, it is believe that the (Ti, Al)N film by D.C. magnetron sputtering is promising for the use of high temperature and wear resistance mate-rials.

• Journal of Ceramic Processing Research
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• 제22권5호
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• pp.590-596
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• 2021

The widespread use of TiC-based cermets as cutting tools, thin-film, ultracapacitors, nozzles, and bearings is primarily due to exhibit combination of excellent mechanical properties such as low density, high hardness, and stiffness. The TiC cermets were synthesized by high energy ball milling, which includes binder metal (Ni), carbides (WC and Mo2C), wherein the present study focus on the relationship between the core-rim structure, phase constitution, and mechanical properties. Here, using in situ TEM, we clearly observed the behavior of adjacent core-rim formation from the solid-phase reaction with grain refinement of the TiC phase control of both the milling time and lattice formation. Also, we proposed that mechanically alloyed core-rim structure can affect oxidation resistance of TiC-Mo2C-WC-Ni cermets strongly related to activation energy attributed to TiC particle size. The mechanical properties of TiC-Mo2C-WC-Ni cermets suggest the hardening effect is not considered only grain refinement, but rather is solid solution strengthening and particle-dispersion hardening. The present study paves the relation to the formation behavior of both TiC hard phase and core-rim structure due to the mechanical powder synthesis of novel TiC-based cermets.

• Archives of Metallurgy and Materials
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• 제65권4호
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• pp.1357-1360
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• 2020

The low adherence of diamond-like carbon (DLC) films on titanium (Ti) alloys can be improved by using interlayer coatings. In this study, DLC (a-C:H) films were deposited using radio-frequency plasma-enhanced chemical vapor deposition (rf-PECVD), and a TiCN interlayer was applied between the extra low interstitial (ELI) grade of Ti-6Al-4V alloy and a-C:H film. The characteristics of the a-C:H-coated Ti-6Al-4V ELI alloy were investigated using field emission scanning electron microscopy, Vickers hardness, and scratch and wear tests. The DLC (a-C:H) films deposited by rf-PECVD had a thickness of 1.7 ㎛, and the TiCN interlayer had a thickness of 1.1 ㎛. Vickers hardness of the DLC (a-C:H) films were increased as a result of the influence of the TiCN interlayer. The resulting friction coefficient of the a-C:H-coated Ti-6Al-4V with the TiCN interlayer had an extremely low value of 0.07.

• 대한치과보철학회지
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• 제48권2호
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• pp.122-127
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• 2010

연구목적: 본 연구는 machined 임플란트와 골유도능이 있는 calcium phosphate를 electron-beam deposition으로 coating처리한 임플란트의 골/임플란트 접촉률을 조직형태계측학적으로 비교하는 것이다. 연구 재료 및 방법:여섯 마리의 수컷 New Zealand white rabbit과직경3.3 mm, 길이 5 mm의 임플란트 24개를 준비하였다. Machined 임플란트 (대조군)와 calcium phosphate coated 임플란트(실험군)를 좌, 우 경골에 2개씩 총 4개를 식립하고 임플란트 주위에 부하가 가해지지 않도록 하여 3주, 6주의 치유기간을 두었다. 식립 3주와 6주후, 각각 3마리의 토끼를 희생하여 조직시편을 제작하였다. 제작된 시편을 광학현미경 하에서 골/임플란트 접촉률 (BIC ratio)을 계산하고 paired t-test로 두 군을 비교하였다. 결과:골/임플란트 접촉률은 임플란트 식립 3주후, 대조군에서 평균과 표준편차는$44.1{\pm}16.5%$ 이었고 실험군은 $70.8{\pm}18.9%$로 실험군이 통계적으로 유의하게 높았다 (P= 0.0264). 6주후의경우, machined 임플란트는 $78.6{\pm}15.1%$, calcium phosphate coated 임플란트는 $79.0{\pm}26.0%$로 두 군 간 통계적으로 유의한 차이는 없었다. 결론: Calcium phosphate coated 임플란트는 machined 티타늄 임플란트에 비해 빠른 초기 골반응을 나타냈다. 그러므로, 임상적으로 calcium phosphate coated 임플란트를 사용했을 때, 수술 후 치유 기간을 단축하여 조기 부하가 가능할 것으로 사료된다.