• 제목/요약/키워드: Ti-TiC

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Ag-Ti계 합금을 사용한 SiC/SiC 및 SiC/연강 브레이징에 대한 연구 (A Study on SiC/SiC and SiC/Mild steel brazing by the Ag-Ti based alloys)

  • 이형근;이재영
    • Journal of Welding and Joining
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    • 제14권4호
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    • pp.99-108
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    • 1996
  • The microstructure and bond strength are examined on the SiC/SiC and SiC/mild steel joints brazed by the Ag-Ti based alloys with different Ti contents. In the SiC/SiC brazed joints, the thickness of the reaction layers at the bond interface and the Ti particles in the brazing alloy matrices increase with Ti contents. When Ti is added up to 9 at% in the brazing alloy. $Ti_3SiC_2$ phase in addition to TiC and $Ti_5Si_3$ phase is newly created at the bond interface and TiAg phase is produced from peritectic reaction in the brazing alloy matrix. In the SiC/mild steel joints brazed with different Ti contents, the microstructure at the bond interface and in the brazing alloy matrix near SiC varies similarly to the case of SiC/SiC brazed joints. But, in the brazing alloy matrix near the mild steel, Fe-Ti intermetallic compounds are produced and increased with Ti contents. The bond strengths of the SiC/SiC and SiC/mild steel brazed joints are independent on Ti contents in the brazing alloy. There are no large differences of the bond strength between SiC/SiC and SiC/mild steel brazed joints. In the SiC/mild steel brazed joints, Fe dissolved from the mild steel does not affect on the bond strength of the joints. Thermal contraction of the mild steel has nearly no effects on the bond strength due to the wide brazing gap of specimens used in the four-point bend test. The brazed joints has the average bond strength of about 200 MPa independently on Ti contents, Fe dissolution and joint type. Fracture in four-point bend test initiates at the interface between SiC and TiC reaction layer and propagates through SiC bulk. The adhesive strength between SiC and TiC reaction layer seems to mainly control the bond strength of the brazed joints.

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질소 분위기에서 순간역처리에 의해 형성시킨 $TiN/TiSi_2$ Contact Bsrrier Lauer의 특성 (Characteristics of $TiN/TiSi_2$ Contact Barrier Layer by Rapid Thermal Anneal in $N_2$ Ambient)

  • 이철진;허윤종;성영권
    • 대한전기학회논문지
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    • 제41권6호
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    • pp.633-639
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    • 1992
  • The physical and electrical properties of TiN/TiSiS12T contact barrier were studied. The TiN/TiSiS12T system was formed by rapid thermal anneal in NS12T ambient after the Ti film was deposited on silicon substrate. The Ti film reacts with NS12T gas to make a TiN layer at the surface and reacts with silicon to make a TiSiS12T layer at the interface respectively. It was found that the formation of TiN/TiSiS12T system depends on RTA temperature. In this experiment, competitive reaction for TiN/TiSiS12T system occured above $600^{\circ}C$. Ti-rich TiNS1xT layer and Ti-rich TiSiS1xT layer were formed at $600^{\circ}C$. stable structure TiN layer and TiSiS1xT layer which has CS149T phase and CS154T phase were formed at $700^{\circ}C$. Both stable TiN layer and CS154T phase TiSiS12T layer were formed at 80$0^{\circ}C$. The thickness of TiN/TiSiS12T system was increased as the thickness of deposited Ti film increased.

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Effect of C/Ti Atomic Ratio of TiCx Raw Powder on the Properties of Ti-Mo-W-TiC Sintered Hard Alloy

  • Nakahara, Kenji;Sakaguchi, Shigeya
    • 한국분말야금학회:학술대회논문집
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    • 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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    • pp.109-110
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    • 2006
  • We have studied the effect of C/Ti atomic ratio of TiCx (x=0.5, 0.75 and 1.0) raw powder on the properties of the Ti-Mo-WTiC sintered hard alloy. The decrease of C/Ti atomic ratio accelerated the densification in the sintering process. The hardness was remarkably improved up to 1350HV with decreasing the C/Ti atomic ratio because of increase of TiCx phase volume content and its fine dispersion. From the results of electro-chemical tests in acid and 3% NaCl solutions, it was obvious that every alloy had excellent corrosion resistance, which meant about 200 times better than that of WC-Co cemented carbide.

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TiN, Ti(C,N), TiAlSiN, TiZrAlN, TiAlCrSiN 박막의 고온산화 (High Temperature Oxidation of TiN, Ti(C,N), TiAlSiN, TiZrAlN, TiAlCrSiN Thin Films)

  • 김민정;박순용;이동복
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2014년도 추계학술대회 논문집
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    • pp.192-192
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    • 2014
  • TiN, Ti(C,N), TiAlSiN, TiZrAlN, TiAlCrSiN 박막을 제조한 후, 이 들의 고온산화 특성을 SEM, EPMA, TGA, TEM, AES 등을 이용하여 조사하고, 산화기구를 제안하였다. 산화속도, 생성되는 산화물의 종류와 분포는 박막의 조성, 산화온도, 산화시간에 따라 변하였다.

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SHS공정에 의한 TiC-Ni-Mo 분말 합성 및 소결체 제조 (A Study on Self-Propagating High-Temperature Synthesis of TiC-Ni-Mo Based Cermet)

  • 송인혁;전재호;한유동
    • 한국세라믹학회지
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    • 제35권7호
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    • pp.749-756
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    • 1998
  • TiC-Ni and TiC-Ni-Mo cermet powders were produced by Self-propagating High temperature Synthesis (SHS) process. The cooling rate of synthesized powders were controlled by using the V-shaped copper jig and the carbide size decreased with increasing the cooling rate I. e decreasing the width of copper jig Round shape carbide particles were produced after SHS reaction in TiC-Ni as well as TiC-Ni-Mo powders. Local segregation of Mo rich phases was observed in SHS powder of TiC-Ni-Mo and the uneven dis-triobution of Mo promoted the faster growth rate of carbide particles during sintering compared to the same composition specimen with commercial TiC powder. Howogeneous microstructure of TiC-Ni-Mo cermet was obtained when the elemental Mo powder was mixed with the SHS powder of TiC-Ni.

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Eco-friendly Fabrication Process of Al-Ti-C Grain Refiner

  • Cho, Hoon;Kim, Bong-Hwan
    • 한국주조공학회지
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    • 제30권4호
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    • pp.147-150
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    • 2010
  • 알루미늄 합금의 미세조직 개량을 위한 목적으로 사용되는 Al-Ti-B 합금계의 미세화제는 재활용 과정에서 붕소(B)의 농축(Agglomeration) 문제 및 Zr, Si, Cr 등을 함유하는 합금에서 미세화 효과가 급격히 감소하는 Poisoning effect 등이 지적되어 왔다. 최근에는 이를 대체할 수 있는 Al-Ti-C 합금계의 미세화제에 대한 연구가 활발한데 이는 TiC가 용탕 내에서 ${\alpha}$-Al의 핵생성처로 직접 작용하는 점에 착안한 것이다. 한편, 이들 Al-Ti-B, Al-Ti-C 계의 미세화제는 그 제조공정에서 $K_2TiF_6$를 이용함에 따라 불소함유 유해가스를 배출하여 환경 문제를 야기하고, 이를 포집/정화하기 위한 추가설비를 요구하게 된다. 따라서 대기 환경 오염 및 경제성 측면에서 유리한 미세화제의 친환경 제조기술에 대한 개발이 필요한 시점이다. 본 연구에서는 $K_2TiF_6$를 사용하지 않고 용탕 내의 자발적 반응을 이용하여 환경 및 경제적 측면에서 유리한 Al-Ti-C 미세화제를 개발하고자 하였다. A3003 합금을 대상소재로 하여 개발된 Al-Ti-C 미세화제와 상용 Al-Ti-B 미세화제의 미세화 도달시간 및 fading 발생 등을 비교하였다. 본 연구를 통하여 개발된 Al-8.6Ti-0.025C 미세화제는 상용 Al-Ti-B 미세화제 보다 적은 첨가량에도 유사한 미세화 성능을 나타내었으며 용탕 유지시간 100분까지도 fading이 발생하지 않는 것을 확인하였다.

D.C. Magnetron Sputter를 이용한 (Ti, Al)N 피막의 고온산화특성 (High Temperature Oxidation Characteristics of the (Ti, Al)N Coating on the STS 304 by D.C. Magnetron Sputtering)

  • 최장현;이상래
    • 한국표면공학회지
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    • 제25권5호
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    • pp.235-252
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    • 1992
  • (Ti, Al)N films were deposited on 304 stainless steel sheet by D.C. magnetron sputtering using Al target and Ti plate. The high temperature oxidation of (T, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films with the variation of composition has been investigated. The chemical composition of (Ti, Al)N films was similar to the sputter area ratio of titanium to aluminum target by means of EDS and AES survey. The high temperature oxidation test of (Ti, Al)N showed that (Ti, Al)N has better high temperature resistance than TiN and TiC films. TiC films were cracked at 40$0^{\circ}C$ in air TiN films quickly were oxidised at $600^{\circ}C$, were spalled more than $700^{\circ}C$. But (Ti, Al)N films are relatively stable to$ 900^{\circ}C$. The good resistance to high temperature oxida-tion of (Ti, Al)N films are due to the formation of dense Al2O3 and TiO2 oxide layer. Especially, Al2O3 oxide layer is more important. The results obtained from this study show, it is believe that the (Ti, Al)N film by D.C. magnetron sputtering is promising for the use of high temperature and wear resistance mate-rials.

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치밀화된 Ti(C,N)과 TiC-TiN-Ni 써멧에서의 Ti(C,N) 고용상의 특성평가 (Characterization of Ti(C,N) Solid Solutions in Densified Ti(C,N) and TiC-TiN-Ni Cermet)

  • 김성원;채정민;강신후;류성수;김형태
    • 한국분말재료학회지
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    • 제15권6호
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    • pp.503-508
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    • 2008
  • Ti(C,N) solid solutions in hot-pressed Ti($C_{x}N_{1-x}$) (x=0.0, 0.3, 0.5, 0.7, 1.0) and 40TiC-40TiN-20Ni (in wt.%) cermet were characterized in this study. For hot-pressed Ti(C,N)s, the lattice parameters and hardness values of Ti(C,N) were determined by using XRD (X-Ray Diffraction) and nanoindentation. The properties of hot-pressed Ti(C,N) samples changed linearly with their carbon or nitrogen contents. For the TiC-TiN-Ni cermet, the hardness of the hard phase and binder phase were determined by nanoindentation in conjunction with microstructural observation. The measured hardness values were ${\sim}8.7$ GPa for the binder phase and ${\sim}28.7$ GPa for the hard phase, which was close to the hardness of hot-pressed Ti($C_{0.7}N_{0.3}$).

PECVD 로 합성된 Ti-Si-C-N 코팅막의 미세구조 및 기계적 성질 (Microstructure and Mechanical Properties of Ti-Si-C-N Coatings Synthesized by Plasma-Enhanced Chemical Vapor Deposition)

  • 홍영수;김광호
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2008년도 추계학술대회 초록집
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    • pp.83-85
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    • 2008
  • 4성분계 Ti-Si-C-N 코팅막은 $TiCl_4$, $SiH_4$, $CH_4$, Ar, 그리고 $N_2$ 가스 혼합체를 이용하여 RF-PECVD 기법에 의해 Si 와 AISI 304 기판위에 합성하였다. Ti-C-(0.6)-N(0.4) 조성의 코팅막에 Si를 첨가함으로 Ti(C,N) 결정질은 줄어들고, Si3N4 및 SiC 비정질상이 나타났다. Ti-Si(9.2 at.%)-C-N의 조성에서 나노 크기의 nc-Ti(C,N) 결정질을 비정질 a-Si3N4/SiC가 둘러싸고 있는 형태의 나노 복합체를 나타내었다. 경도 24 Gpa의 Ti-C-N 코팅막은 Si를 첨가함으로 Ti-Si(9.2 at.%)-C-N 조성에서 46 Gpa의 최고 경도를 나타내었으며, 마찰계수의 경우에도 Ti-C-N 코팅막에 Si를 첨가함으로 크게 낮아졌다.

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동시증착에 의한 Si(111)-7$\times$7 기판 위에 $TiSi_2$ 에피택셜 성장 (In situ Epitaxial Growth of the $TiSi_2$ on si(111)-7$\times$7 Substrate by Codeposition)

  • 최치규;류재연;오상식;염병렬;박형호;조경익;이정용;김건호
    • 한국진공학회지
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    • 제3권4호
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    • pp.405-413
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    • 1994
  • 초고진공에서 기판 Si(111)-7$\times$7 위에 Ti:Si 또는 1:2의 조성비로 Ti와 Si을 동시증착한 후 in situ 열처리하여 TiSi2 박막을 에피택셜 성장시켰다 XRD와 XPS 분석결과 동시증착된 혼합 층에서 C49-TiSi2 박막의 성장은 핵형성에 의함을 확인하였으며 양질의 C49-TiSi2 박막은 Ti를 증착한후 Ti와 Si를 동시 증착한 (Ti+2Si)/(Ti)/Si(111)-7$\times$7구조의 시료를 초고진공에서 50$0^{\circ}C$에서 열처리하여 얻을수 있었다. 형성된 C49-TiSi2/Si(111)의 계면은 깨끗하였고 HRTEM 분석 결과 C49-TiSi2\ulcornerSi(111)의 계면은 약 10。 의 편의를 가지면서 TiSi2[211]∥Si[110] TiSi2(031)/Si(111) 의 정합성을 가졌으며 시료의 전 영 역에 에피택셜 성장되었다.

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