• Title/Summary/Keyword: Ti-S-N

Search Result 676, Processing Time 0.028 seconds

DC-Pulse Plasma와 Thermal MOCVD방법으로 증착된 TiN 박막의 특성에 관한 연구

  • 박용균;이영섭;정수종;신희수;조동율;천희곤
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2000.11a
    • /
    • pp.27-27
    • /
    • 2000
  • TDEAT precursor를 이용하여 DC-Pulse Plasma MOCVD 방법과 Thermal MOCVD 방법으로 각각 TiN 박막을 증착하였다. 본 논문에서는 DC-Pulse Plasma MOCVD 방 법으로 증착된 TiN 박막과 Therrnal MOCVD 방법으로 증착된 TiN 박막의 전기적 특성에 관하여 비교 분석하였다. 동일한 조건 하에서 각각의 방법으로 증착된 박막은 4-point probe를 이용하여 면저항을 측정하였고, XRD를 이용하여 박막의 성장방향을 관찰하였으며, FE-SEM을 이용하여 박막의 두께와 단면 사진, 표면형상을 관찰하였으며, AES depth profile을 통해 두께에 따른 Ti, N, 잔류 C와 0의 함량을 분석하였으며, XPS를 통해 C의 결합형태를 파악하고자 하였다. 분석결과 DC-Pulse Plasma MOCVD 방법으로 증착된 TiN 박막이 Thermal MOCVD 방법으로 증착된 TiN 박막에 비해 전기적 특성은 매우 우수하였으며, 치밀한 구조의 박막을 가지는 것으로 나타났다. 또한, 잔류 C, O의 함량이 낮은 것으로 나타났다.

  • PDF

The effect of metal composition on the structure and properties of Ti-Cu-N superhard nanocomposite coatings

  • Myung, Hyun S.;Lee, Hyuk M.;Han, Jeon G.
    • Journal of the Korean institute of surface engineering
    • /
    • v.34 no.5
    • /
    • pp.429-434
    • /
    • 2001
  • Ti-Cu-N nanocomposite films deposited by arc ion plating and magnetron sputter hybrid system with various copper contents. The microstructure and mechanical properties of Ti-Cu-N superhard nanocomposite films depend on the Cu concentration. In X-ray diffraction (XRD) analysis, intensity of TiN (111) and TiN (220) peak decreased and peak broadness increased with increasing the copper contents and Cu peak was not detected. The grain size of films decreased with increasing at%Cu and Transmission Electron Microscopy (TEM) analysis also showed that Ti-Cu-N film containing 1.5at%Cu was composed of very fine (<10nm) nanocrystalline grains. The maximum hardness of Ti-Cu-N (1.5at%Cu) film reached to 45GPa and friction coefficient was measured 0.3.

  • PDF

The Effect of TiAlN coated Ball End Mill and MQL Cutting Condition on Cutting characteristic of High Hardness Steels (고경도 강재의 MQL 가공시 초경 볼 엔드밀의 TiAlN 코팅 조건이 절삭 특성에 미치는 영향)

  • Park D. S.;Won S. T.;Lee Y. J.;Hur J. H.
    • Proceedings of the Korean Society for Technology of Plasticity Conference
    • /
    • 2004.10a
    • /
    • pp.245-251
    • /
    • 2004
  • This paper is studied on the effect of TiAlN coated Ball End Mill and MQL(Minimum Quantity Lubrication) cutting condition on cutting characteristic of high hardness steels. KP4 steels[HRC32] and STD11[HRC60] heat treated steels were used as the workpiece and WC-Co ball end mill and single and multi layer TiAlN coated ball end mill were utilized in the cutting tests. MQL device was used to spray botanical oil coolant. Result showed that TiAlN coated ball end mill were increased the cutting length than WC-Co ball end mill in the cutting speed[$245{\sim}320m/min$] about $2.3{\sim}5.7$ times for KP4 steels and about $2.5{\sim}4.3$ times far STD11 heat treated steels. The multi layer TiAlN coated ball end mill is good for KP4 steels than single layer coated.

  • PDF

Studies on Structure and Optical Characteristics of TiO-N Thin Film Manufactured by DC Reactive Magnetron Sputtering Method (DC 마그네트론 반응성 스퍼터링법에 의해서 제작된 TiO-N 박막의 구조 및 광학적특성에 관한 연구)

  • Park Jang Sick;Park Sang Won;Kim Tae Woo;Kim Sung Kuk;Ahn Won Sool
    • Journal of the Korean institute of surface engineering
    • /
    • v.37 no.6
    • /
    • pp.307-312
    • /
    • 2004
  • Extensive efforts have been made in an attempt to utilize photocatalytic properties of $TiO_2$ in visible range. $TiO_2$ and TiO-N thin films were made by the DC reactive magnetron sputtering method at $300^{\circ}C$. Various gases (Ar, $O_2$ and $N_2$) were used and Ti target was impressed by 0.6 kW-5.8 kW power range. The hysteresis phenomenon of the $TiO_2$ thin film as a function of the discharge voltage characteristic was observed to be higher as applied power increases. That of TiO-N thin film was occurred at the 5.8 kW power. The cross section and surface roughness of thin films were observed by FE-SEM and AFM. Average surface roughness of TiO-N thin film was observed as $15.9\AA$ and that of $TiO_2$ as $13.2\AA$. The crystal phases of both $TiO_2$ and TiO-N thin films were found to be anatase structure. The atomic $\beta$-N (396 eV peak in N 1s XPS) was shown in the rutile crystal of TiO-N and was considered acting as the origin of wavelength shift to the visible light.

Parameters Affecting the TiN Coated Machining Tool's Life (질화 티타늄이 코팅된 절삭공구의 수명에 영향을 미치는 인자)

  • 최병대;김동수
    • Journal of the Korean institute of surface engineering
    • /
    • v.28 no.2
    • /
    • pp.77-82
    • /
    • 1995
  • In this study, we examined the relationships between the coating film's properties, such as microhardness, adhesion of coating fil $m_strate, and machining tool's life time. Samples were prepared by coating TiN on the 5.5 diameter twist drills using reactive ion plating technology, For measuring microhardness and adhesion of fil $m_strate, HSS plate was used for substrate. TiN coated drill's life time was dependent on the adhesion of fil $m_strate and averagely increased by several ten times more than uncoated drill's. The major parameter affecting TiN coated drill's life time was the strong adhesion between coating film and substrate.ate.

  • PDF

Studies on Photocatalytic Thin Films($TiO_2$, TiO-N) Manufactured by DC Magnetron Sputtering Method and it's Characteristics for Removal of Pollutants (DC 마그네트론 스퍼터링법을 이용한 광촉매박막($TiO_2$, TiO-N)제조 및 오염물질 제거에 관한 연구)

  • Jeong, Weon-Sang;Park, Sang-Weon
    • Journal of Korean Society of Environmental Engineers
    • /
    • v.27 no.1
    • /
    • pp.59-66
    • /
    • 2005
  • [ $TiO_2$ ] was deposited by DC magnetron sputtering on glass surface under various sputtering parameters such as discharge power($0.6{\sim}5.2\;kW$, substrate temperature($R.T{\sim}350^{\circ}C$), Ar and $O_2$ flow ratio with $0{\sim}50\;sccm$($Ar+O_2$ 90 sccm) and about 1 mtorr of pressure. TiO-N thin film was prepared under same sputtering conditions for $TiO_2$ thin film except flow ratio($Ar+O_2+N_2$ 90 sccm). The sheet resistance of thin films deposited under these parameters was measured to analyze electronic characteristic and thin film's thickness(${\alpha}$-step), surface roughness(AFM) and formation construction(FE-SEM, XRD) were also measured to draw optimal sputtering parameters. In order to evaluate photo-activity of thin film($TiO_2$, TiO-N) made in optimal parameters for removal of pollutants, toluene among VOCs and Suncion Yellow among reactive dyes were chosen to probe organic compounds for photo-degradation. It was shown that the photo-catalytic thin films had a significant photo-activation for the chosen contaminants and especially TiO-N thin film showed maximum efficiency of 33% for toluene(5 ppm) removal in visible-light range.

고효율 수직형 발광다이오드용 TiN/Al/질소극성 n형 질화갈륨 오믹 전극 연구

  • Jeon, Jun-U;Hong, Hyeon-Gi;Jeong, Sang-Yong;Kim, Hyeon-Su;Kim, Gyeong-Guk;Seong, Tae-Yeon
    • Proceedings of the Korean Institute of Surface Engineering Conference
    • /
    • 2008.11a
    • /
    • pp.50-50
    • /
    • 2008
  • 고성능 수직형 발광다이오드를 위해 저저항을 가지는 TiN/Al 오믹 전극을 개발하였다. 열처리 전에는 ${\sim}10^{-4}{\Omega}cm^2$의 컨택저항을 보였지만, 열처리후에는 TiN/Al 전극과 Ti/Al 전극은 모두 전기적 특성 감소를 보였다. 이 전극들을 시간이 지남에 따라 측정하였을 시에 TiN/Al 전극이 Ti/Al 전극보다 안정함을 보였다. XPS와 SIMS를 이용하여 오믹 형성과 전기적 특성 감소 메커니즘을 분석하였다.

  • PDF

Enhancement in the light extraction efficiency of 405 nm light-emitting diodes by adoption of a Ti-Al reflection layer (Ti-Al 반사막을 이용한 405 nm LED의 광추출 효율 향상)

  • Kim, C.Y.;Kwon, S.R.;Lee, D.H.;Noh, S.J.
    • Journal of the Korean Vacuum Society
    • /
    • v.17 no.3
    • /
    • pp.211-214
    • /
    • 2008
  • GaN-based light-emitting diodes (LEDs) of a 405 nm wavelength have been fabricated on a sapphire substrate by metal organic chemical vapor deposition (MOCVD). In order to reflect the photons, which are generated in the InGaN active region and emitted to the backside, to the front surface, a reflection layer was deposited onto the back of the substrate. Aluminum was used as the reflection layer and Al was deposited on the sample followed by Ti evaporation for firm adhesion of the reflection layer to the substrate. The light extraction efficiency was enhanced 52 % by adoption of the Ti-Al reflection layer.

Limitation of Nitrogen ion Implantation and Ionplating Techniques Applied for Improvement of Wear Resistance of Metallic Implant Materials (금속 임플란트 소재의 내마모성 향상을 위하여 적용되는 질소 이온주입 및 이온도금법의 한계)

  • 김철생
    • Journal of Biomedical Engineering Research
    • /
    • v.25 no.2
    • /
    • pp.157-163
    • /
    • 2004
  • Nitrogen ion implantation and ion plating techniques were applied for improvement of the wear resistance of metallic implant materials. In this work, the wear dissolution behaviour of a nitrogen ion implanted super stainless steel (S.S.S, 22Cr-20Ni-6Mo-0.25N) was compared with those of S.S.S, 316L SS and TiN coated 316L SS. The amounts of Cr and Ni ions worn-out from the specimens were Investigated using an electrothermal atomic absorption spectrometry. Furthermore, the Ti(Grade 2) disks were coated with TiN, ZrN and TiCN by use of low temperature arc vapor deposition and the wear resistance of the coating layers was compared with that of titanium. The chemical compositions of the nitrogen ion implanted and nitride coated layers were examined with a scanting auger electron spectroscopy. It wat observed that the metal ions released from the nitrogen ion implanted S.S.S surface were significantly reduced. From the results obtained, it was shown that the nitrogen ion implanted zone obtained with 100 KeV ion energy was easily removed within 200,000 revolutions from a wear dissolution testing under a similar load condition when applied to artificial hip joint. The remarkable improvement in wear resistance weir confirmed by the nitrides coated Ti materials and the wear properties differ greatly according to the chemical composition of the coating layers. for specimens with the same coating thickness of about 3$\mu\textrm{m}$, TiCN coated Ti showed the highest wear resistance. However, after removing the coating layers, the wear rates of all nitrides coated Ti reverted to their normal rates of below 10,000 revolutions from Ti-disk-on-disk wear testing under the same load condition. From the results obtained, it is suggested that the insufficient depth of the 100 Kel N$\^$+/ ion implanted zone and of the nitrides coated layers of 3$\mu\textrm{m}$ are subject to restriction when used as frictional parts of load bearing implants.