• 제목/요약/키워드: Ti-S-N

검색결과 680건 처리시간 0.029초

Correlation of Sintering Parameters with Density and Hardness of Nano-sized Titanium Nitride reinforced Titanium Alloys using Neural Networks

  • Maurya, A.K.;Narayana, P.L;Kim, Hong In;Reddy, N.S.
    • 한국분말재료학회지
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    • 제27권5호
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    • pp.365-372
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    • 2020
  • Predicting the quality of materials after they are subjected to plasma sintering is a challenging task because of the non-linear relationships between the process variables and mechanical properties. Furthermore, the variables governing the sintering process affect the microstructure and the mechanical properties of the final product. Therefore, an artificial neural network modeling was carried out to correlate the parameters of the spark plasma sintering process with the densification and hardness values of Ti-6Al-4V alloys dispersed with nano-sized TiN particles. The relative density (%), effective density (g/㎤), and hardness (HV) were estimated as functions of sintering temperature (℃), time (min), and composition (change in % TiN). A total of 20 datasets were collected from the open literature to develop the model. The high-level accuracy in model predictions (>80%) discloses the complex relationships among the sintering process variables, product quality, and mechanical performance. Further, the effect of sintering temperature, time, and TiN percentage on the density and hardness values were quantitatively estimated with the help of the developed model.

팔면체 [M(Ⅲ)$A_3B_3$] 형태 착물의 쌍극자모멘트에 대한 ${\pi}$ 결합의 영향 [M(Ⅲ) = Ti(Ⅲ), V(Ⅲ), Cr(Ⅲ), Fe(Ⅲ) 및 Ni(Ⅱ) ; A = O 또는 N ; B = N, S 또는 Cl] (The Effect of ${\pi}$ Bonds on the Dipole Moments for Octahedral [M(Ⅲ)$A_3B_3$] Type Complexes [M(Ⅲ) = Ti(Ⅲ), V(Ⅲ), Cr(Ⅲ), Co(Ⅲ) and Ni(Ⅱ) ; A = O or N; B = N, Cl or S])

  • 안상운;박의서;이기학
    • 대한화학회지
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    • 제25권2호
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    • pp.61-66
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    • 1981
  • 팔면체 [M(Ⅲ)$A_3B_3$]형태 착물의 쌍극자모멘트에 ${\pi}$결합 분자궤도함수의 기여분을 계산하는 방법을 발전시켰다. [M(Ⅲ) = Ti(Ⅲ), V(Ⅲ), Cr(Ⅲ), Fe(Ⅲ), 또는 Co(Ⅲ); A = O 또는 N; B = N, S 또는 Cl] 쌍극자모멘트에 대한 ${\pi}$결합 분자궤도함수의 기여분은 ${\sigma}$결합 분자궤도함수의 기여분보다 작지만 비 편재화 ${\pi}$전자를 가지고 있는 킬레이트 착물에 까지도 무시할 수 없음이 발견되었다. 계산한 쌍극자모멘트가 ${\sigma}$결합 형성 만을 가정했을 때 보다 실험치에 가까웠다.

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유도결합플라즈마의 전력이 TiCrN 코팅층에 미치는 영향 (Effects of ICP Power on the Properties of TiCrN Films)

  • 차병철;김준호;이병석;김선광;김대욱;김대일;유용주
    • 열처리공학회지
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    • 제22권5호
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    • pp.307-311
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    • 2009
  • In this study, TiCrN films were deposited on STS 316 Land Si (100) wafer by inductively coupled plasma (ICP) assisted D.C. magnetron sputtering. The effect R.F. power for ICP discharge on the mechanical properties of TiCrN films was investigated. XRD, XPS and FE-SEM were used for the structure analysis. Also the Micro-Knoop hardness tester and profilometer were used for measuring hardness of coatings and film stress respectively. As increasing the R.F. power for ICP discharge, thickness of coating was decreased from 1633 nm to 1288 nm but hardness was increased about $Hk_{5g}$ 4200 at 400 W. All of the XRD patterns showed (111), (200) and (220) peaks of TiCrN films. Surface morphology was studied using the profilometer. FE-SEM was used to know morphology and cross-section of the films. Structure of the films was changed dense as increased ICP power.

전자-빔 조사를 이용한 TiN 박막의 물성변화에 관한 연구 (A Study on the Properties of TiN Films by Using Electron Beam Irradiation)

  • 신창호;성영종;임성열;신기욱;정철우;김선광;김준호;유용주;김대일
    • 열처리공학회지
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    • 제23권1호
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    • pp.29-33
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    • 2010
  • Titanium nitride (TiN) films were deposited on the polycarbonate substrate by using radio frequency (RF) magnetron sputtering without intentional substrate heating. After deposition, the films were bombarded with intense electron beam for 20 minutes. The intense electron irradiation impacts on the crystalline, hardness and surface roughness of the TiN films. The films irradiated with an electron beam of 300 eV show the small grains on the surface, while as deposited TiN films did not showany grains on the surface. Also the surface harness evaluated with micro indenter was increased up to 18 Gpa at electron energy of 900 eV after electron beam irradiation. In addition, surface root mean square (RMS) roughness of the films irradiated with intense electron beam affected strongly. The films irradiated by electron beam with 900 eV have the lowest roughness of 1.2 nm in this study.

Effects of Microalloying Elements on Microstructures and Toughness of Simulated HAZ in Quenched and Tempered Steels

  • Chang, W.S.;Yoon, B.H.
    • International Journal of Korean Welding Society
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    • 제3권2호
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    • pp.40-45
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    • 2003
  • A series of experiments has been carried out to investigate the effect of titanium, boron and nitrogen on the microstructure and toughness of simulated heat affected zone (HAZ) in quenched and tempered (QT) type 490MPa yield strength steels. For acquiring the same strength level, the carbon content and carbon equivalent could be lowered remarkably with a small titanium and boron addition due to the hardenability effect of boron during quenching process. Following the thermal cycle of large heat input, the coarsened grain HAZ (CGHAZ) of conventional quenched and tempered (QT) type 490MPa yield strength steels exhibited a coarse bainitic or ferrite side plate structure with large prior austenite grains. While, titanium and boron bearing QT type 490MPa yield strength steels were characterized by the microstructure in the CGHAZ, consisting mainly of the fine intragranular ferrite microstructure. Toughness of the simulated HAZ was mainly controlled by the proper Ceq level, and the ratio of Ti/N rather than titanium and nitrogen contents themselves. In the titanium­boron added QT steels, the optimum Ti/N ratio for excellent HAZ toughness was around 2.0, which was much lower than the known Ti/N stoichiometric ratio, 3.4. With reducing Ti/N ratio from the stoichiometric ratio, austenite grain size in the coarse grained HAZ became finer, indicating that the effective fine precipitates could be sufficiently obtained even with lower Ti/N level by adding boron simultaneously. Along with typical titanium carbo­nitrides, various forms of complex titanium­ and boron­based precipitates, like TiN­MnS­BN, were often observed in the simulated CGHAZ, which may act as stable nuclei for ferrite during cooling of weld thermal cycles

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R$_2$O-TiO$_2$-P$_2$O$_{5}$계 다공질 글라스 세라믹스의 제조 (Fabrication of porous glass ceramics in Li$_2$O-TiO$_2$-P$_2$O$_{5}$ system)

  • 권면주;윤영진;강원호
    • 한국산학기술학회:학술대회논문집
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    • 한국산학기술학회 2000년도 추계학술대회
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    • pp.173-177
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    • 2000
  • 인산염계 5Li₂O, 36CaO, 20TiO₂, 27P₂O/sub 5/의 조성을 선정하여 10K/min 승온속도로 1300℃에서 2시간동안 유지시켜 모유리를 제조하였고, 최적의 핵형성을 위해 610℃에서 20시간, 최고 결정성장을 위해 840℃에서 20시간 동안 열처리함으로써 LiTi₂(PO₄)₃상과 β-Ca₃(PO₄)₂결정상이 존재하는 Glass Ceramics를 제조하였고, 이를 1N-HCI용액에서 3일간 담지하여 β-Ca₃(PO₄)₂결정상을 용출시켜 LiTi₂(PO₄)₃상만이 존재하는 다공성 Glass Ceramics를 제조하였다.

ZrN 및 TiN 코팅된 치과교정 용 미니나사의 표면특성과 전기화학적 거동 (Surface Characteristics and Electrochemical Behaviors of TiN and ZrN Coated Orthodontic Mini-screw)

  • 김신영;문영필;박근형;조호형;김원기;손미경;최한철
    • 한국표면공학회지
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    • 제41권5호
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    • pp.232-239
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    • 2008
  • The dental orthodontic mini-screw requires good mechanical properties and high corrosion resistance for implantation in the bone. The purpose of this study was to investigate the electrochemical characteristics of TiN and ZrN coated orthodontic mini-screws, mini-screws were used for experiment. Ion plating was carried out for mini-screw using Ti and Zr coating materials with nitrogen gas. Ion plated surface of each specimen w as o bserved with f ield emission scanning e lectron microscopy ( FE-SEM), e nergy dispersive x-ray spectroscopy (EDX), and electrochemical tester. The surface of TiN and ZrN coated mini-screw were more smooth than that of other kinds of non-coated mini-screw due to dercrease of machined defects. The corrosion current density of the TiN and ZrN coated mini-screw decreased compared to non-coated sample. The corrosion potential of TiN and ZrN coated mini-screw were higher than that of non-coated mini-screw in 0.9% NaCl solution. The pitting corrosion resistance increased in the order of ZrN coated, TiN coated and non-coated wire. Pitting potential of ZrN coated mini-screw was the highest in the other specimens.

수소 생산을 위한 가시광선 감응 질소 도핑 $TiO_2$$Nb_2O_5$ 광촉매의 개발 (Development of Visible Light Responsive Nitrogen Doped Photocatalysts ($TiO_2$, $Nb_2O_5$) for hydrogen Evolution)

  • 최미진;채규정;유혜원;김경열;장암;김인수
    • 대한환경공학회지
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    • 제33권12호
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    • pp.907-912
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    • 2011
  • 물의 광분해에 의한 수소생산을 위하여 이산화티타늄($TiO_2$)과 산화니오븀($Nb_2O_5$)을 이용하여 가시광선 감응 광촉매 개발을 본 연구의 목적으로 하고 있다. 이를 위하여 요소를 이용한 질소 도핑한 $TiO_2$, $Nb_2O_5$, $HNb_3O_8$ ($TiO_2-N$, $Nb_2O_5-N$$HNb_3O_8-N$)을 제조하였다. 그 결과 질소 도핑이 광촉매의 띠간격 에너지를 감소시킴으로써 excitation파장이 자외선 영역에서 가시광선 영역으로 이동한 것을 reflectance 관찰을 통해 알 수 있었다. 특히 $TiO_2-N$의 경우 띠 간격 에너지가 3.3 eV ($TiO_2$)에서 2.72 eV로 가장 큰 감소를 보였다. 또한, 가시광선 영역에서 로다민 B 광분해 반응을 통하여 광촉매의 활성도를 평가하였을 때, 질소 도핑한 경우($Nb_2O_5-N$$HNb_3O_8-N$)는 모두 80% 이상의 분해 효율을 나타내었으며 특히 $TiO_2-N$이 약 99.8%의 높은 분해율을 보여주었다. 그러나 질소 도핑을 하지 않은 $TiO_2$$Nb_2O_5$의 경우, 약 10% 의 로다민 B가 분해된 것으로 관찰되었다. 또한 가시광선 영역에서 각 촉매의 광전류 생성을 비교해보았을 때, $HNb_3O_8-N$ ($63.7mA/cm^2$)이 가장 높은 전류 반응을 나타내었으며 물의 광분해에 의한 수소생산량을 비교해보면 $Nb_2O_5-N$$19.4{\mu}mol/h$의 가장 많은 양을 생산한 것으로 나타났다.

시스틴으로 화학흡착된 금 코팅 니티놀 표면에 앙쪽성 이온 폴리에틸렌글리콜의 그래프트 및 특성 평가 (Grafting and Characterization of Zwitter Ionic Poly(ethylene glycol) on Gold-Coated Nitinol Surface Chemisorbed with L-Cysteine)

  • 신홍섭;박귀덕;김재진;김지흥;한동근
    • 폴리머
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    • 제33권1호
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    • pp.84-90
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    • 2009
  • 니티놀(Nitinol) 합금(TiNi)은 혈관 스텐트로서 널리 사용되고 있다. 본 연구에서는 니티놀 합금의 혈액적 합성을 개선시키기 위해서 화학적인 표면개질을 행하였다. 먼저 니티놀의 표면을 금으로 코팅한 다음 시스턴(L-cysteine, C/N)을 화학흡착한 후 신규 합성한 양쪽성 이온 폴리에틸렌글리콜(PEG) (PEG-$N^+-SO_3{^-}$)을 그래프트 시켜서 TiNi-C/N-PEG-N-S를 제조하였다. 양쪽성 이온 PEG가 그래프트된 니티놀의 표면은 ATR-FTIR, ESCA 및 SEM을 통해서 확인하였고 친수성 표면은 물 접촉각의 감소를 통해서 입증하였다. 또한, 단백질 흡착 및 혈소판 점착과 혈액응고시간 측정과 같은 혈액적합성 평가 결과로부터 미처리 니티놀 합금에 비해서 표면개질된 니티놀 합금이 상대적으로 훨씬 우수한 혈액적합성을 나타내었다. 이는 그래프트된 친수성 PEG와 항응혈성 양쪽성 이온의 상승효과에 의해서 혈액적합성을 대폭 개선시킨 것으로 사료된다.

Influence of processing parameters for adhesion strength of TiN films prepared by AIP technique

  • ;주윤곤;조동율;윤재홍;송기오
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2007년도 추계학술대회 논문집
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    • pp.140-141
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    • 2007
  • The arc ion plating (AIP) technique has been used widely for thin coating in the area of surface engineering. The TiN coating is important in the field of dies, cutting tools and other mechanical parts. When forming the TiN films by AIP technique, the processing parameters such as arc power, bias voltage, working pressure, temperature of substrate and pre-treatment affected the adhesion respectively. The results of scratch test revealed that the adhesion strength was influenced by arc power most strongly. And a sequence of the importance of each parameters has been obtained. The crystal structure and cross-section of TiN films are also be investigated.

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