• Title/Summary/Keyword: Thin film silicon

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Growth of Polycrystalline 3C-SiC Thin Films using HMDS Single Precursor (HMDS 단일 전구체를 이용한 다결정 3C-SiC 박막 성장)

  • Chug, Gwiy-Sang;Kim, Kang-San;Han, Ki-Bong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.2
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    • pp.156-161
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    • 2007
  • This paper describes the characteristics of polycrystalline ${\beta}$ or 3C (cubic)-SiC (silicon carbide) thin films heteroepitaxailly grown on Si wafers with thermal oxide. In this work, the poly 3C-SiC film was deposited by APCVD (atmospheric pressure chemical vapor deposition) method using HMDS (hexamethyildisilane: $Si_{2}(CH_{3}_{6})$ single precursor. The deposition was performed under various conditions to determine the optimized growth conditions. The crystallinity of the 3C-SiC thin film was analyzed by XPS (X-ray photoelectron spectroscopy), XRD (X-ray diffraction) and FT-IR (fourier transform-infrared spectometers), respectively. The surface morphology was also observed by AFM (atomic force microscopy) and voids or dislocations between SiC and $SiO_{2}$ were measured by SEM (scanning electron microscope). Finally, depth profiling was invesigated by GDS (glow discharge spectrometer) for component ratios analysis of Si and C according to the grown 3C-SiC film thickness. From these results, the grown poly 3C-SiC thin film is very good crystalline quality, surface like mirror and low defect. Therfore, the poly 3C-SiC thin film is suitable for extreme environment, Bio and RF MEMS applications in conjunction with Si micromaching.

Highly sensitive gas sensor using hierarchically self-assembled thin films of graphene oxide and gold nanoparticles

  • Ly, Tan Nhiem;Park, Sangkwon
    • Journal of Industrial and Engineering Chemistry
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    • v.67
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    • pp.417-428
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    • 2018
  • In this study, we fabricated hierarchically self-assembled thin films composed of graphene oxide (GO) sheets and gold nanoparticles (Au NPs) using the Langmuir-Blodgett (LB) and Langmuir-Schaefer (LS) techniques and investigated their gas-sensing performance. First, a thermally oxidized silicon wafer ($Si/SiO_2$) was hydrophobized by depositing the LB films of cadmium arachidate. Thin films of ligand-capped Au NPs and GO sheets of the appropriate size were then sequentially transferred onto the hydrophobic silicon wafer using the LB and the LS techniques, respectively. Several different films were prepared by varying the ligand type, film composition, and surface pressure of the spread monolayer at the air/water interface. Their structures were observed by scanning electron microscopy (SEM) and atomic force microscopy (AFM), and their gas-sensing performance for $NH_3$ and $CO_2$ was assessed. The thin films of dodecanethiol-capped Au NPs and medium-sized GO sheets had a better hierarchical structure with higher uniformity and exhibited better gas-sensing performance.

Growth of polycrystalline 3C-SiC thin films for M/NEMS applications by CVD (CVD에 의한 M/NEMS용 다결정 3C-SiC 박막 성장)

  • Chung, Gwiy-Sang;Kim, Kang-San;Jeong, Jun-Ho
    • Journal of Sensor Science and Technology
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    • v.16 no.2
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    • pp.85-90
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    • 2007
  • This paper presents the growth conditions and characteristics of polycrystalline 3C-SiC (silicon carbide) thin films for M/NEMS applications related to harsh environments. The growth of the 3C-SiC thin film on the oxided Si wafers was carried out by APCVD using HMDS (hexamethyildisilane: $Si_{2}(CH_{3})_{6})$ precursor. Each samples were analyzed by XRD (X-ray diffraction), FT-IR (fourier transformation infrared spectroscopy), RHEED (reflection high energy electron diffraction), GDS (glow discharge spectrometer), XPS (X-ray photoelectron spectroscopy), SEM (scanning electron microscope) and TEM (tunneling electro microscope). Moreover, the electrical properties of the grown 3C-SiC thin film were evaluated by Hall effect. From these results, the grown 3C-SiC thin film is very good crystalline quality, surface like mirror and low defect. Therefore, the 3C-SiC thin film is suitable for extreme environment, Bio and RF M/NEMS applications in conjunction with Si fabrication technology.

Nanotribological characteristics of plasma treated hydrophobic thin films on silicon surfaces using SPM (SPM을 이용한 Si 표면위에 플라즈마 처리된 소수성 박막의 나노 트라이볼로지적 특성 연구)

  • Yoon, Eui-Sung;Park, Ji-Hyun;Yang, Seung-Ho;Han, Hung-Gu;Kong, Ho-Sung;Koh, Seok-Keun
    • Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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    • 2001.11a
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    • pp.35-42
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    • 2001
  • Nanotribological characteristics between a Si$_3$N$_4$ AFM tip and hydrophobic thin films were experimentally studied. Tests were performed to measure the nano adhesion and friction in both AFM(atomic force microscope) and LFM(lateral force microscope) modes in various ranges of normal load. Plasma-modified thin polymeric films were deposited on Si-wafer (100). Results showed that wetting angle of plasma-modified thin polymeric film increased with the treating time, which resulted in the hydrophobic surface and the decrease of adhesion and friction. Nanotribological characteristics of these surfaces were compared with those of other hydrophobic surfaces, such as DLC, OTS and IBAD-Ag coated surfaces. Those of OTS coated surface was superior to those of others, though wetting angle of plasma-modified thin polymeric film is higher.

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Electrostatic Suspension System of Silicon Wafer using Relay Feedback Control (릴레이 제어법을 이용한 실리콘 웨이퍼의 정전부상에 관한 연구)

  • 전종업;이상욱;정일진;박규열
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.969-974
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    • 2003
  • A simple and cost-effective method for the electrostatic suspension of thin plates like silicon wafers is proposed which is based on a switched voltage control scheme. It operates according to a relay feedback control and deploys only a single high-voltage power supply that can deliver a dc voltage of positive and/or negative polarity. This method possesses the unique feature that no high-voltage amplifiers are needed which leads to a remarkable system simplification relative to conventional methods. It is shown that despite the inherent limit cycle property of the relay feedback based control, an excellent performance in vibration suppression is attained due to the presence of a relatively large squeeze film damping origination from the air between the electrodes and levitated object. Using this scheme, a 4-inch silicon wafer was levitated stably with airgap variation decreasing down to 1 $\mu\textrm{m}$ at an airgap of 100 $\mu\textrm{m}$

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Electrostatic Suspension System of Silicon Wafer using Relay Feedback Control (릴레이 제어법을 이용한 실리콘 웨이퍼의 정전부상에 관한 연구)

  • Lee, Sang-Uk;Jeon, Jong-Up
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.10 s.175
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    • pp.56-64
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    • 2005
  • A simple and cost-effective method for the electrostatic suspension of thin plates like silicon wafers is proposed which is based on a switched voltage control scheme. It operates according to a relay feedback control and deploys only a single high-voltage power supply that can deliver a DC voltage of positive and/or negative polarity. This method possesses the unique feature that no high-voltage amplifiers are needed which leads to a remarkable system simplification relative to conventional methods. It is shown that despite the inherent limit cycle property of the relay feedback based control, an excellent performance in vibration suppression is attained due to the presence of a relatively large squeeze film damping origination from the air between the electrodes and levitated object. Using this scheme, a 4-inch silicon wafer was levitated stably with airgap variation decreasing down to $1 {\mu}m$ at an airgap of $100{\mu}m$.

Measurement and Verification of Thermal Conductivity of Multilayer Thin Dielectric Film via Differential $3\omega$ Method (차등 $3\omega$ 기법을 이용한 다층 유전체 박막의 열전도도 측정 및 검증)

  • Shin, Sang-Woo;Cho, Han-Na;Cho, Hyung-Hee
    • Transactions of the Society of Information Storage Systems
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    • v.2 no.1
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    • pp.85-90
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    • 2006
  • In this study, measurement of thermal conductivity of multilayer thin dielectric film has been conducted via differential $3\omega$ method. Also, verification of differential $3\omega$ method has been accomplished with various proposed criteria. The target film for the measurement is 300 nm thick silicon dioxide which is covered with upper protective layer of various thicknesses. The upper protective layer is inserted between the target film and the heater line for purpose of electrical insulator or anti-oxidation barrier since the target film may be a good electrical conductor or a well-oxidizing material. Since the verification of differential $3\omega$ method has not been conducted yet, we have shown that the measurement of thermal conductivity of thin films with upper protective layer via differential $3\omega$ method is verified to be reliable as long as the proposed preconditions of the samples are satisfied. Experimental results show that the experimental errors tend to increase with aspect ratio between thickness of the upper protective layer and width of the heater line due to heat spreading effect.

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Circuit Modeling of Amorphous Silicon Thin Film Transistor (비정질 실리콘 박막 트랜지스터의 회로 해석 모델링)

  • Choi, Hong-Seok;Park, Jin-Seok;Choi, Yeon-Ik;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 1990.11a
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    • pp.106-109
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    • 1990
  • We develop the analytical model of the static and dynamic characteristics of hydrogenated amorphous silicon thin film transistors. It is found out that, compared with the conventional MOS model, our a-Si model has been in better agreement with experimental static and dynamic results. It may be also suggested that our a-Si model is suitable for incorporation into a widely used curcuit simulation.

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Numerical Analysis of Inverted Staggered-Type Hydrogenated Amorphous Silicon Thin Film Transistor (Inverted Staggered-Type 비정질 실리콘 박막트랜지스터의 수치적 분석)

  • Oh, Chang-Ho;Park, Jin-Seok;Han, Min-Koo
    • Proceedings of the KIEE Conference
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    • 1990.11a
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    • pp.93-96
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    • 1990
  • The characteristics of an inverted staggered-type hydrogenated amorphous silicon thin film transistor has been analyzed by employing numerical simulation. The field effect mobility and threshold voltage are characterized as a function of density of deep and tail states and lattice temperature. It has been found that the density of deep states plays an important role of determining the threshold voltage, while the field effect mobility are very sensitive to the slope of band tail states. Also, the numerically temperature dependence of field effect mobility and threshold voltage has been in good agreements with the experimental results.

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A Study on the Effect of Plasma Deuterium Treatment on Reliability of Poly-Silicon Thin Film Transistors (중수소 프라즈마 처리가 다결정 실리콘 TFT의 안정성에 미치는 영향에 관한 연구)

  • Sohn Song Ho;Bae S. C.;Kim Donghwan
    • Korean Journal of Materials Research
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    • v.14 no.7
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    • pp.516-521
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    • 2004
  • We applied a deuterium plasma treatment to the surface of polycrystalline silicon films using PECVD and observed the change with AFM, XRD, ET-IR, and SIMS measurement. A bias temperature stressing (BTS) test was carried out to evaluate the reliability of the thin-film transistors (TFT). TFTs with channel lengths as small as 2 ${\mu}m$ were electrically stressed fer up to 1000 sec at room temperature. From the parameter variation such as s-factor, leakage current and on/off ratio, we suggest that the deuterium plasma treatment suppress the hot carrier effect and improve the stability of TFTs.