A Study on the Surface of the Dry Etched TaN Thin Film by Adding The CH4 Gas in BCl3/Ar Inductively Coupled Plasma (BCl3/Ar 유도결합 플라즈마 안에 CH4 가스 첨가에 따른 건식 식각된 TaN 박막 표면의 연구)
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- Journal of the Korean Institute of Electrical and Electronic Material Engineers
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- v.26 no.5
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- pp.335-340
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- 2013