• Title/Summary/Keyword: Substrate system

Search Result 2,294, Processing Time 0.035 seconds

UV/Thermal Hybrid Nanoimprint System for Flexible Substrates (유연기판을 위한 UV/Thermal 하이브리드방식 나노임프린트 시스템)

  • Lim, Hyung-Jun;Lee, Jae-Jong;Choi, Kee-Bong;Kim, Gee-Hong;Ahn, Hyun-Jin;Ryu, Ji-Hyeong
    • Journal of the Korean Society of Manufacturing Technology Engineers
    • /
    • v.20 no.3
    • /
    • pp.245-250
    • /
    • 2011
  • An UV/thermal hybrid nanoimprint lithography system was designed and implemented for the pattern transfer to flexible substrates. This system can utilize a plate stamp, roll stamp, and film stamp. For all cases of using those stamps, this system is also switchable an UV or thermal nanoimprint lithography mode. This paper shows how to design the heating and UV curing plates and proposes how to change them easily. Because the pressure condition and the speed of the press roller varies by the characteristics of the stamp and substrate, all the parameters related to the nanoimprint lithography have to adjustable. Some transferred patterns are shown in this paper to verify the performance of the hybrid nanoimprint lithography system. The flexible substrates with nano-scale patterns on them will be key components for next generation technologies such as flexible displays, bendable semi-conductors, and solar cells.

Mathematical Models of Substrate Utilization within Bacterial Films (미생물막(微生物膜)을 이용(利用)한 폐수처리(廢水處理)의 수학적(數學的) 모델에 관한 연구(研究))

  • Chung, Tai Hak
    • KSCE Journal of Civil and Environmental Engineering Research
    • /
    • v.1 no.1
    • /
    • pp.43-51
    • /
    • 1981
  • A model of substrate utilization witbin bacterial films has been developed and simulated for a better understanding of fixed film treatment processes. The model consists of two parts, a deep biofilm and a thin biofilm, which are classified based on substrate penetration into the biofilm. Substrate concentration and flux within a biofilm can be computed from the model. Three dimensionless parameters, ${\phi}_1$, ${\phi}_2$ and $\bar{S}_b$ were obtained during model construction, and the substrate concentration and flux can be expressed in terms of these parameters. It has been found that an. increase of ${\phi}_1$ or a decrease of ${\phi}_2$ results in an increase of treatment efficiencies. It has also been found that systems maintaining high efficiencies belong to a deep biofilm. Among the constants involved, the mass transfer coefficient is the only controllable term and it depends Largely on fluid velocity near the biofilm surface. Substrate removal efficiency may be increased with an increase of fluid velocity for a biofilm of fixed depth. However, film depth is decreased due to sloughing with increasing velocity, and the system reaches a new steady state. Because changes in film depth are not well defined quantitatively yet, the efficiency can not be clearly described at a new steady state.

  • PDF

The geometry change of carbon nanofilaments by SF6 incorporation in a thermal chemical vapor deposition system

  • Kim, Sung-Hoon
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.21 no.3
    • /
    • pp.119-123
    • /
    • 2011
  • Carbon nanotilaments (CNFs) could be synthesized on nickel catalyst layer-deposited silicon oxide substrate using $C_2H_2$ and$H_2$ as source gases under thermal chemical vapor deposition system. By the incorporation of $SF_6$ as a cyclic modulation manner, the geometries of carbon coils-related materials, such as nano-sized coil and wave-like nano-sized coil could be observed on the substrate. The characteristics (formation density and morphology) of as-grown CNFs with or without $SF_6$ incorporation were investigated. Diameter size reduction for the individual CNFs-related shape and the enhancement of the formation density of CNFs-related material could be achieved by the incorporation of $SF_6$ as a cyclic modulation manner. The cause for these results was discussed in association with the slightly increased etching ability by $SF_6$ addition and the sulfur role in SF 6 for the geometry change.

Molecular Beam Epitaxy Grouth of $\textrm{LaAlO}_3$ Thin Film by a Pulsed laser Deposition Technique (펄스레이저증착법을 이용한 $\textrm{LaAlO}_3$ 박막의 Molecular Beam Epitaxy 성장)

  • Kim, In-Seon;Heo, Nam-Hoe;Park, Yong-Gi
    • Korean Journal of Materials Research
    • /
    • v.9 no.1
    • /
    • pp.25-29
    • /
    • 1999
  • We have developed a laser molecular beam epitaxy system for the layer-by-layer growth of oxide thin films. Using this system, we could grow and control oxide thin films of LaAlO$_3$in a molecular layer epitaxy mode on the atomically flat SrTiO$_3$ substrate with a LaAlO$_3$single crystal target. Very clear RHEED oscillations were observed during to growth of a LaAlO$_3$ film for a long period under the optimized conditions of substrate temperature at $650^{\circ}C$, oxygen pressure at 1$\times$10\ulcorner torr, and an incident laser fluence of 4.6J/$\textrm{cm}^2$. The height of mono-layer-LaAlO$_3$ film grown during one period of RHEED intensity oscillation was 3.8$\AA$.

  • PDF

Analysis of Characteristics of DLC Coating Thin Film in Tungsten Carbide for Production of Medical Thermal-Infrared Lenses

  • Park, Yong-Pil;Kim, Tae-Gon;Cheon, Min-Woo
    • Transactions on Electrical and Electronic Materials
    • /
    • v.15 no.6
    • /
    • pp.344-347
    • /
    • 2014
  • This study was carried out on DLC thin film deposition technology used in infrared optical system production as a method of reducing the shape changes of the molding core and the consequent loss of life. Experiments on the deposition on silicon wafer and tungsten carbide used as a substrate for molding core were conducted at each processing condition using a filtered arc system, and it was found that the surface and mechanical properties were of the greatest quality when the substrate bias voltage of -150 V was used. In addition, it was confirmed that the PV and Ra characteristics were improved by the deposition of the DLC thin film.

The Characteristic and Formation of Ti(B,N) Films on Steel by EA Hot Filament CVD (EA hot filament CVD system을 이용하여 금형공구강에 증착한 Ti(B,N)박막의 합성과 특성에 관하여)

  • Yoon, Jung-H.;Choi, Yong;Choe, Jean-I.
    • The Transactions of The Korean Institute of Electrical Engineers
    • /
    • v.61 no.4
    • /
    • pp.585-589
    • /
    • 2012
  • The characteristics of interface layer and the effect of mole fraction of inlet gas mixture($B_2H_6/H_2/N_2/TiCl_4$) on the microstructure of Ti(B,N) films were studied by microwave plasma hot filament CVD process. Ti(B,N) films were deposited on a substrate(STD-61) to develop a high performance of resistance wear coating tool. Ti(B,N) films were obtained at a gas pressure of 1 torr, bias voltage of 300 V and substrate temperature of $480^{\circ}C$ in $B_2H_6/H_2/N_2/TiCl_4$gas system. It was found that TiN, $TiB_2$, TiB and hexagonal boron nitride(h-BN) phases exist in thin layer on the STD-61.

Deposition and Optimization of Al-doped ZnO Thin Films Fabricated by In-line Sputtering System (인라인 스퍼터를 이용한 알루미늄 도핑된 산화아연 박막의 증착 및 특성 최적화 연구)

  • Kang, Dong-Won
    • The Transactions of The Korean Institute of Electrical Engineers
    • /
    • v.66 no.8
    • /
    • pp.1236-1241
    • /
    • 2017
  • We deposited Al-doped ZnO (ZnO:Al) thin films on glass substrates ($200mm{\times}200mm$) by using in-line magnetron sputtering system. Effects of various deposition parameters such as working pressure, deposition power and substrate temperature on optoelectronic characteristics including surface-texture etching profiles were carefully investigated in this study. We found that relatively low working pressure and high deposition power offered to obtain enhanced conductivity and optical transmittance. Haze properties showed similar trend with the transmittance. Furthermore, surface-texture etching study exhibited good morphologies when the films were deposited at $200-300^{\circ}C$. On the basis of these optimizations, we could find the deposition region that produces highly transparent and conductive properties including efficient light scattering capability.

Characteristics of ITO electrode films grown on PET substrate by Roll-to-Roll Facing Target Sputtering system for flexible OLEDs

  • Cho, Sung-Woo;Choi, Kwang-Hyuk;Jeong, Jin-A;Kim, Bong-Seok;Jeong, Dae-Ju;Kim, Han-Ki
    • 한국정보디스플레이학회:학술대회논문집
    • /
    • 2008.10a
    • /
    • pp.613-616
    • /
    • 2008
  • We report on electrical and optical properties of flexible ITO electrode grown on PET substrate using a specially designed roll-to-roll facing target sputtering (R2R FTS) system at room temperature without conventional cooling drum. Due to effective confinement of high density plasma between ITO targets, we can grow a flexible ITO electrode without cooling drum at room temperature.

  • PDF

Development of an Inspection System of Contact Light Emitting Device for Quality Control

  • Lee, Jun-Ho;Kwon, Hyung-Kee;Ryu, Young-Kee
    • 제어로봇시스템학회:학술대회논문집
    • /
    • 2001.10a
    • /
    • pp.118.3-118
    • /
    • 2001
  • CLED (Contact Light Emitting Device) has three layers consisting of a transparent electrode, a light emitting layer and a substrate. When the substrate of the CLED comes in contact with a fingerprint under AC input voltage, it makes an electric field between the fingerprint and the device. Due to the electric field, the light is emitted along the ridgeline of the fingerprint. The intensity along the ridge on the surface of the CLED increase in proportion to the electric field. To achieve uniform performance of fingerprint verification devices, inspection system of CLED for quality control were required. In this research, we proposed the factors for quality controls such as dimensions of the CLED, uniformity ...

  • PDF