• Title/Summary/Keyword: Step doped

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A Five Mask CMOS LTPS Process With LDD and Only One Ion Implantation Step

  • Schalberger, Patrick;Persidis, Efstathios;Fruehauf, Norbert
    • Journal of Information Display
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    • v.8 no.1
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    • pp.1-5
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    • 2007
  • We have developed a CMOS LTPS process which requires only five photolithographic masks and only one ion doping step. Drain/Source areas of NMOS TFTs were formed by PECVD deposition of a highly doped precursor layer while PMOS contact areas were defined by ion implantation. Single TFTs, inverters, ring oscillators and shift registers were fabricated. N and p-channel devices reached field effect mobilities of $173cm^2$/Vs and $47cm^2$/Vs, respectively.

Annealing condition dependence of the superconducting property and the pseudo-gap in the protect-annealed electron-doped cuprates

  • Jung, Woobeen;Song, Dongjoon;Cho, Su Hyun;Kim, Changyoung;Park, Seung Ryong
    • Progress in Superconductivity and Cryogenics
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    • v.18 no.2
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    • pp.14-17
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    • 2016
  • Annealing as-grown electron-doped cuprates under a low oxygen-partial-pressure condition is a necessary step to achieve superconductivity. It has been recently found that the so-called protect annealing results in much better superconducting properties in terms of the superconducting transition temperature and volume fraction. In this article, we report on angle-resolved photoemission spectroscopy studies of a protect-annealed electron-doped cuprate $Pr_{0.9}La_{1.0}Ce_{0.1}CuO_4$ on annealing condition dependent superconducting and pseudo-gap properties. Remarkably, we found that the one showing a better superconducting property possesses almost no pseudo-gap while others have strong pseudo-gap feature due to an anti-ferromagnetic order.

Characterization of Yttrium Doped Zinc Oxide Thin Films Fabricated by Spin-coating Method (스핀코팅법에 의해 제조되어진 Yttrium이 도핑된 ZnO 막의 특성)

  • Kim Hyun-Ju;Lee Dong-Yun;Song Jae-Sung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.19 no.5
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    • pp.457-460
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    • 2006
  • Y doped zinc oxide (YZO) thin films were deposited on F doped $SnO_2$ (FTO) glass substrate by sol-gel method using the spin-coating system. A homogeneous and stable solution was prepared by dissolving acetate in the solution added diethanolamine as sol-gel stabilizer. YZO films were obtained after preheated on the hot-plate for 5minute before each coating; the number of coating was 3 times. After the coating of last step, annealing of YZO films performed at $450^{\circ}C$ for 30 minute. In order to confirming of a ultraviolet ray interruption and down-conversion effects, optical properties of YZO films, transmission spectrum and fluorescent spectrum were used. Also, for understanding the obtained results by experiment, the elestronic state of YZO was calculated using the density functional theory The results obtained by experiment were compared with calculated structure. The detail of electronic structure was obtained by the discrete variational Xa (DV-Xa) method, which is a sort of molecular orbital full potential method. The density of state and energy levels of dopant element were shown and discussed in association with optical properties.

A study on the electromagnetic properties of Mn-Zn Ferrite doped with $Ho_2O_3$ ($Ho_2O_3$가 첨가된 Mn-Zn ferrite의 전자기적인 특성연구)

  • 김성수;김태원;정승우;백승철;최우성
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1999.11a
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    • pp.265-268
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    • 1999
  • In this study, we investigated the electromagnetic Properties of M $n_{Y}$Z $n_{1-x}$ F $e_{x}$ $O_4$(X=0.67~0.69, Y=0.13~0.19) doped with and without H $o_2$ $O_3$(each of 0.05~ 0.2wt%, step 0.05wt%). The greatest initial permeability of composition is M $n_{0.17}$Z $n_{0.16}$F $e_{0.67}$ $O_4$. As X and Y components, increased. generally resistivity slightly change by the various X and Y components. The initial permeability of M $n_{0.17}$Z $n_{0.16}$F $e_{0.67}$ $O_4$ doped with H $o_2$ $O_3$ showed the about 2.5 times higher than that of M $n_{0.17}$Z $n_{0.16}$F $e_{0.67}$ $O_4$ doped without H $o_2$ $O_3$EX>EX>EX>X>>EX>EX>EX>X>

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The characteristics of tilted grating in depressed- and step- index fiber and its application (Depressed index type과 Step index type 광섬유에서의 경사진 브래그격자 특성과 응용)

  • 권서원;이상배;최상삼;박진우
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.12
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    • pp.83-91
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    • 1998
  • Fiber Bragg grating which has a blazed ang1e to the plane of incident wave generates a side-mode as well as main-mode. The side-mode has an identical characteristics with a long period grating that couples with a cladding mode, so rejects the special wavelength. We experimented on the side-mode characteristics with two fibers which Ge doped depressed index fiber and very high photosensitive H$_2$ loaded step index fiber according to the tilted angle. Also, using a phase mask equipped with rotation plate which has 0.02$^{\circ}$ resolution, we can control the bandwidth and the peak value of a total loss spectrum by aligned tilted grating in a fiber and using this, tried to compose the ASE band rejection filter of the Erbium doped fiber amplifier.

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Electrical, Structural and Optical Characteristic Analysis of Al-doped ZnO Film Deposited by Atomic Layer Deposition (Atomic Layer Deposition으로 증착된 Al-doped ZnO Film의 전기적, 구조적 및 광학적 특성 분석)

  • Lim, Jung-Soo;Jeong, Kwang-Seok;Shin, Hong-Sik;Yun, Ho-Jin;Yang, Seung-Dong;Kim, Yu-Mi;Lee, Hi-Deok;Lee, Ga-Won
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.6
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    • pp.491-496
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    • 2011
  • Al-doped ZnO film on glass substrate is deposited by ALD in low temperature, using 4-step process (DEZ-$H_2O$-TMA-$H_2O$). To find out the optimal film condition for TCO material, we fabricate Al-doped ZnO films by increasing Al doping concentration at $100^{\circ}C$, so that the Al-doped film of 5 at% shows the lowest resistivity ($1.057{\times}10^{-2}{\Omega}{\cdot}cm$) and the largest grain size (38.047 nm). Afterwards, the electrical and physical characteristics in Al-doped films of 5 at% are also compared in accordance with increasing deposition temperature. All the films show the optical transmittance over 80% and the film deposited at $250^{\circ}C$ demonstrates the superior resistivity ($1.237{\times}10^{-4}{\Omega}{\cdot}cm$).

Characteristics of Cu-Doped Ge8Sb2Te11 Thin Films for PRAM (PRAM용 Cu-도핑된 Ge8Sb2Te11 박막의 특성)

  • Kim, Yeong-Mi;Kong, Heon;Kim, Byung-Cheul;Lee, Hyun-Yong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.32 no.5
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    • pp.376-381
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    • 2019
  • In this work, we evaluated the structural, electrical and optical properties of $Ge_8Sb_2Te_{11}$ and Cu-doped $Ge_8Sb_2Te_{11}$ thin films prepared by rf-magnetron reactive sputtering. The 200-nm-thick deposited films were annealed in a range of $100{\sim}400^{\circ}C$ using a furnace in an $N_2$ atmosphere. The amorphous-to-crystalline phase changes of the thin films were investigated by X-ray diffraction (XRD), UV-Vis-IR spectrophotometry, a 4-point probe, and a source meter. A one-step phase transformation from amorphous to face-centered-cubic (fcc) and an increase of the crystallization temperature ($T_c$) was observed in the Cu-doped film, which indicates an enhanced thermal stability in the amorphous state. The difference in the optical energy band gap ($E_{op}$) between the amorphous and crystalline phases was relatively large, approximately 0.38~0.41 eV, which is beneficial for reducing the noise in the memory devices. The sheet resistance($R_s$) of the amorphous phase in the Cu-doped film was about 1.5 orders larger than that in undoped film. A large $R_s$ in the amorphous phase will reduce the programming current in the memory device. An increase of threshold voltage ($V_{th}$) was seen in the Cu-doped film, which implied a high thermal efficiency. This suggests that the Cu-doped $Ge_8Sb_2Te_{11}$ thin film is a good candidate for PRAM.

Rigorous Analysis on Ring-Doped-Core Fibers for Generating Cylindrical Vector Beams

  • Kim, Hyuntai;Kwon, Youngchul;Vazquez-Zuniga, Luis Alonso;Lee, Seung Jong;Park, Wonil;Ham, Youngsu;Song, Suhyung;Yang, Joong-Hwan;Jeong, Yoonchan
    • Journal of the Optical Society of Korea
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    • v.18 no.6
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    • pp.650-656
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    • 2014
  • We propose a novel active fiber design for selectively generating cylindrical vector beams (CVBs) or cylindrical vector modes (CVMs) which can be applied to conventional fiber lasers. A fiber is designed to have a ring-shaped core refractive index profile which can lead to the best overlap between the active dopant distribution profile and the lowest-order CVM (LCVM) field profile. Therefore, the overlap factor (OVF) of the LCVM becomes even higher than that of the fundamental mode. We emphasize that this condition cannot be satisfied by a conventional step-index core fiber (SICF) but by the ring-doped core fiber (RDCF). Because the lasing threshold is inversely proportional to the OVF, the LCVM can predominantly be stimulated even without going through special procedures to impose extra loss mechanisms to the fundamental mode. We numerically verify that the OVF of the LCVM with the doped ions can significantly exceed that of the fundamental mode if the proposed fiber design is applied. In addition, an RDCF of the proposed fiber design can also operate in a regime containing no higher-order modes besides the LCVM, so that it can selectively and efficiently generate the LCVM without being disrupted by the parasitic lasing of the higher-order modes. We highlight that an optimized RDCF can lead to a >30 % higher OVF ratio than a SICF having the same doped area. The proposed model is expected to be useful for enhancing the efficiency of generating CVBs in an all-fiber format.

Improvement of Leakage Current in Ferroelectric Thin Films Formed by 2-step Sputtering (2단계 스퍼터링으로 형성시킨 강유전 박막의 누설전류 개선)

  • Mah Jae-Pyung;Shin Yong-In
    • Journal of the Microelectronics and Packaging Society
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    • v.13 no.1 s.38
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    • pp.17-22
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    • 2006
  • Ferroelectric PZT thin films were formed by 2-step sputtering and their dielectric properties and conduction mechanisms were investigated. Also. donor impurity doping was tried to compensate the carriers in PZT thin films. The leakage current density was able to reduce to $10^{-7}A/cm^2$ order by 2-step sputtering with thickness control of room temp.-layer. The conduction mechanism was confirmed as bulk-limited, and optimum donor impurities on PZT thin film were taken. Especially, leakage current characteristics was improved to $10^{-8}A/cm^2$ order in donor-doped PZT thin films formed by 2-step sputtering.

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