• Journal of the Korean Magnetics Society
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• v.17 no.3
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• pp.120-123
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• 2007

The typical double-barrier magnetic tunnel junction (DMTJ) structure examined in this paper consists of a Ta 45/Ru 9.5/IrMn 10/CoFe7/$AlO_x$/free layer/AlO/CoFe 7/IrMn 10/Ru 60 (nm). The free layer consists of an $Ni_{16}Fe_{62}Si_8B_{14}$ 7 nm, $Co_{90}Fe_{10}$ (fcc) 7 nm, or CoFe $t_1$/NiFeSiB $t_2$/CoFe $t_1$ layer in which the thicknesses $t_1$ and $t_2$ are varied. The DMTJ with an NiFeSiB-free layer had a tunneling magnetoresistance (TMR) of 28%, an area-resistance product (RA) of $86\;k{\Omega}{\mu}m^2$, a coercivity ($H_c$) of 11 Oe, and an interlayer coupling field ($H_i$) of 20 Oe. To improve the TMR ratio and RA, a DMTJ comprising an amorphous NiFeSiB layer that could partially substitute for the CoFe free layer was investigated. This hybrid DMTJ had a TMR of 30%, an RA of $68\;k{\Omega}{\mu}m^2$, and a of 11 Oe, but an increased of 37 Oe. We confirmed by atomic force microscopy and transmission electron microscopy that increased as the thickness of NiFeSiB decreased. When the amorphous NiFeSiB layer was thick, it was effective in retarding the columnar growth which usually induces a wavy interface. However, if the NiFeSiB layer was thin, the roughness was increased and became large because of the magnetostatic $N{\acute{e}}el$ coupling.

• Proceedings of the KIEE Conference
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• 2004.07c
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• pp.2064-2066
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• 2004

본 논문에서는 새로운 개념인 능동 고조파 결합을 이용한 4위상 전압제어 발진기를 설계, 제작하였다. 4위상 출력 특성을 얻기 위하여 각각의 차동 VCO의 가상 접지(Virtual Ground)면을 본 논문에 제시된 능동 고조파 결합 회로(Active super harmonic coupling)을 이용하여 결합시키는 방법을 적용하였다. 제안된 구조는 다음과 같은 장점을 가지고 있다. 결합구조를 갖는 트랜지스터에 부가적인 전류소비를 줄일 수 있으며, layout상에서 문제되었던 대칭구조를 개선할 수 있다. 또한 기존에 발표되었던 방법인 passive transformer를 이용한 고조파 결합 보다 회로 크기를 줄일 수 있다. 측정결과 출력 전력 -12dBm, -117dBc/Hz @1-MHz 이하의 위상잡음 특성, 2.66GHz${\sim}$2.91GHz의 250 MHz 주파수 가변, 25dB이하의 2차고조파 억압, 7 mA 의 전류 소모(buffer amp. 포함되지 않음)를 가졌다.

• Current Optics and Photonics
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• v.4 no.6
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• pp.551-557
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• 2020

A mirror-in-slab waveguide is fabricated on a slab waveguide by using the refractive-index contrast between two materials, with the reflection performance depending on the slab waveguide's design. In this research, a slab waveguide design consisting of silicon (Si) as the core and SiO2 as the substrate was designed and developed to determine the coupling, waveguide, and mirror losses. Based on experimental results, coupling loss is dominant and is affected by the design of the slab waveguide. Furthermore, the mirror loss is affected by the design of the mirror, such as the curvature radius and the size of the mirror. TE and TM polarizations of light are used in the measurements. The experimental results show that mirror losses due to reflection by mirrors are 0.011 dB/mirror and 0.007 dB/mirror for TE and TM polarizations respectively. A simulation was performed to confirm whether the size of mirror is sufficient to reflect the input light, and to check the quality of the surfaces of fabricated mirrors.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.112-112
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• 2009

In this study, the effect of a long post-deposition thermal annealing(600 and 1000 $^{\circ}C$) on the surface acoustic wave (SAW) properties of polycrystalline (poly) aluminum-nitride (AlN) thin films grown on a 3C-SiC buffer layer was investigates. The poly-AlN thin films with a (0002) preferred orientation were deposited on the substrates by using a pulsed reactive magnetron sputtering system. Experimental results show that the texture degree of AlN thin film was reduced along the increase in annealing temperature, which caused the decrease in the electromechanical coupling coefficient ($k^2$). The SAW velocity also was decreased slightly by the increase in root mean square (RMS) roughness over annealing temperature. However, the residual stress in films almost was not affect by thermal annealing process due to small lattice mismatch different and similar coefficient temperature expansion (CTE) between AlN and 3C-SiC. After the AlN film annealed at 1000 $^{\circ}C$, the insertion loss of an $IDT/AlN/3C-SiC/SiO_2/Si$ structure (-16.44 dB) was reduced by 8.79 dB in comparison with that of the as-deposited film (-25.23 dB). The improvement in the insertion loss of the film was fined according to the decrease in the grain size. The characteristics of AlN thin films were also evaluated using Fourier transform-infrared spectroscopy (FT-IR) spectra and X-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM) images.

• Journal of the Korean Institute of Telematics and Electronics
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• v.25 no.11
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• pp.1294-1303
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• 1988

Electron and hole traps in semi-insulating GaAs with activation energies ({\Delta}E_r) ranging from 0.16 $\pm$ 0.01 to 0.98 $\pm$ 0.01 eV, have been detected and characterized by photo-induced current transient measurements. SI undoped GaAs has fewer deep levels than SI GaAs: Cr. The thermal capture cross section and density of the traps have been estimated and some of the centers have been related to native defects. In particular, the activation energy of the compensating Cr, and "0" levels in semi-insulating GaAs were accurately measured. The transient measurements were complemented by Hall measurements at T > 300K and photocurrent spectra measurements. The transition energies for the deep compensating levels obtained by the analyses of data from these measurements, when compared with those from the transient measurements, indicate negligible lattice-coupling of these centers. Analysis of the transport data also indicates that neutral impurity scattering plays a significant role in semi-insulating materials at high temperatures.

• Korean Chemical Engineering Research
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• v.49 no.2
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• pp.181-186
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• 2011

In this study, we used 3-(trimethoxysilyl)propylmethacrylate(MPS) silane coupling agent for surface modification of silica nanoparticles. We studied effects of reaction conditions such as solvent pH, MPS hydrolysis time, reaction time, and molar ratio of MPS to Si-OH groups on silica nanoparticle surfaces, on the surface modification reactions of silica nanoparticles. Fourier Transform Infrared Spectroscopy(FTIR), Elemental Analysis(EA) and solid state crosspolarization magic angle spinning(CP/MAS) Nuclear Magnetic Resonance Spectroscopy(NMR) techniques were used to determine the type and the degree of surface modification. We found MPS reacts preferentially with Si-OH groups of the silica nanoparticles as monomeric form at solvent pH = 4.5. But increasing hydrolysis time of MPS from 30 mins to 90 mins, and molar ratio of MPS to Si-OH groups on silica nanoparticle surfaces, we found that MPS reacts preferentially with Si-OH groups of the silica nanoparticles as oligomeric form.

• Journal of the Korean Vacuum Society
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• v.6 no.3
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• pp.220-226
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• 1997

An optical intensity-type pressure sensor has been fabricated by coupling multimode optical fiber with 100 nm-Au/30 nm-NiCr/150 nm-$Si_3N_4/300 nm-SiO_2/150 nm-Si_3N_4$ optical reflection layer supported by micromachined frame-shape silicon substrate, and its characteristics was investigated. For the application of $Si_3N_4/SiO_2/Si_3N_4$ diaphragm to the optical reflection layer of the sensor, NiCr and Au films were deposited on the backside of the diaphragm by thermal evaporation , respectively, and thus optical low caused by transmission in the reflection layer could be decreased to a few percents. Dielectric diaphragms with uniform thickness were able to be also reproduced because top- and bottom-$Si_3N_4$ layer of the diaphragm could automatically stop silicon anisotropic etching. The respective pressure ranges in which the sensor showed linear optical output power-pressure characteristics were 0~126.64 kPa, 0~79. 98 kPa, and 0~46.66 kPa, and the respective pressure sensitivities of the sensor were about 20.69 nW/kPa, 26.70 nW/kPa, and 39.33 nW/kPa, for the diaphragm sizes of 3$\times$3 $\textrm{mm}^2$, 4$\times$4 $\textrm{mm}^2$, and 5$\times$5 $\textrm{mm}^2$, indicating that the sensitivity increases as diaphragm size increases.

• Proceedings of the IEEK Conference
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• 2005.11a
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• pp.747-750
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• 2005

In this paper, we propose a new level shifter circuit for reducing power consumption. The concept of the proposed level shifter is to use capacitive coupling effect to reduce short circuit current. The power consumption of the proposed level shifter is reduced up to 50%, compared to the conventional level shifter. Especially the proposed level shifter circuit works well with low temperature poly-Si (LTPS) TFTs. It can operate on low input voltage even with low-mobility, high and widely-varying threshold voltage of LTPS TFT.

• Proceedings of the Korean Magnestics Society Conference
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• 2009.12a
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• pp.168-169
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• 2009

• Polymer(Korea)
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• v.35 no.5
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• pp.409-418
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• 2011

A novel silicone (Si) containing vinylic monomer, N-(3-(triethoxysilyl)propyl) methacrylamide (TESPMA), based on 3-aminopropyltriethoxysilane (APTES) and methacryloyl chloride (MCl) has been synthesized for formulation of waterborne polyurethane (WPU). Two types of vinyl group containing Si, methacryloxypropyltriethoxysilane (MPTES) and triethoxyvinylsilane (TEVS), have been used as coupling reagents for comparison of the effects of Si kinds with TESPMA on the WPU. A series of new siliconized WPU, vinyl acetate/vinyl ester of versatic acid (VAc-Veova), TESPMA, MPTES and TEVS hybrid latexes have been successfully prepared by emulsion polymerization in the presence of WPU dispersion.