• 제목/요약/키워드: Si activation

검색결과 646건 처리시간 0.024초

DSC에 의한 $PbO-TiO_2-SiO_2-B_2O_3$계 유리의 결정화 속도 (Crystallization Kinetics of $PbO-TiO_2-SiO_2-B_2O_3$ Glasses by DSC)

  • 손명모;이승호;이헌수;박희찬
    • 한국세라믹학회지
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    • 제32권12호
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    • pp.1331-1336
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    • 1995
  • The glass-ceramics for ferro-electric were made from compositions of 70PbO.16TiO2.8SiO2.4B2O3.2AlPO4 (wt%) and 67.5PbO.20TiO2.8.5SiO2.2B2O3.2AlPO4 (wt%). The crystallization kinetics for PbTiO3 crystalline phase formation from glass was studied using non-isothermal DSC techniques. The values of activation energy, ΔE using variables of heating rate and temperature were calculated at various reaction fractions obtained from peak area over DSC. The results indicated that activation energy was lowest at 60% reaction fractions and the activation energy of glass containing 20.0 wt% TiO2 is higher than that of glass containing 16.0 wt% TiO2. The crystallization mechanism was three dimensional growth (n=4).

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Predictors of massive transfusion protocols activation in patients with trauma in Korea: a systematic review

  • Dongmin Seo;Inhae Heo;Juhong Park;Junsik Kwon;Hye-min Sohn;Kyoungwon Jung
    • Journal of Trauma and Injury
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    • 제37권2호
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    • pp.97-105
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    • 2024
  • Purpose: Massive transfusion protocols (MTPs) implementation improves clinical outcomes of the patient's resuscitation with hemorrhagic trauma. Various predictive scoring system have been used and studied worldwide to improve clinical decision. However, such research has not yet been studied in Korea. This systematic review aimed to assess the predictors of MTPs activation in patients with trauma in Korea. Methods: The PubMed, Embase, Cochrane Library, Research Information Sharing Service databases, KoreaMed, and KMbase were searched from November 2022. All studies conducted in Korea that utilized predictors of MTPs activation in adult patients with trauma were included. Results: Ten articles were eligible for analysis, and the predictors were assessed. Clinical assessments such as systolic and diastolic blood pressure, shock index (SI), prehospital modified SI, modified early warning system (MEWS) and reverse SI multiplied by the Glasgow Coma Scale (rSIG) were used. Laboratory values such as lactate level, fibrinogen degradation product/fibrinogen ratio, and rotational thromboelastometry (ROTEM) were used. Imaging examinations such as pelvic bleeding score were used as predictors of MTPs activation. Conclusions: Our systematic review identified predictors of MTPs activation in patients with trauma in Korea; predictions were performed using tools that requires clinical assessments, laboratory values or imaging examinations only. Among them, ROTEM, rSIG, MEWS, SI, and lactate level showed good effects for predictions of MTPs activation. The application of predictors for MTP's activation should be individualized based on hospital resource and skill set, also should be performed as a clinical decision supporting tools.

Dielectric Passivation and Geometry Effects on the Electromigration Characteristics in Al-1%Si Thin Film Interconnections

  • Kim, Jin-Young
    • Journal of Korean Vacuum Science & Technology
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    • 제5권1호
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    • pp.11-18
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    • 2001
  • Dielectric passivation effects on the EM(electromigration) have been a great interest with recent ULSI and multilevel structure tends in thin film interconnections of a microelectronic device. SiO$_2$, PSG(phosphosilicate glass), and Si$_3$N$_4$ passivation materials effects on the EM resistance were investigated by utilizing widely used Al-1%Si thin film interconnections. A standard photolithography process was applied for the fabrication of 0.7㎛ thick 3㎛ wide, and 200㎛ ~1600㎛ long Al-1%Si EM test patterns. SiO$_2$, PSG, and Si$_3$N$_4$ dielectric passivation with the thickness of 300 nm were singly deposited onto the Al-1%Si thin film interconnections by using an APCVD(atmospheric pressure chemical vapor deposition) and a PECVD(plasma enhanced chemical vapor deposition) in order to investigate the passivation materials effects on the EM characteristics. EM tests were performed at the direct current densities of 3.2 $\times$ 10$\^$6/∼4.5 $\times$ 10$\^$6/ A/cm$^2$ and at the temperatures of 180 $\^{C}$, 210$\^{C}$, 240$\^{C}$, and 270$\^{C}$ for measuring the activation energies(Q) and for accelerated test conditions. Activation energies were calculated from the measured MTF(mean-time-to-failure) values. The calculated activation energies for the electromigration were 0.44 eV, 0.45 eV, and 0.50 eV, and 0.66 eV for the case of nonpassivated-, Si$_3$N$_4$passivated-, PSG passivated-, and SiO$_2$ passivated Al-1%Si thin film interconnections, respectively. Thus SiO$_2$ passivation showed the best characteristics on the EM resistance followed by the order of PSG, Si$_3$N$_4$ and nonpassivation. It is believed that the passivation sequences as well as the passivation materials also influence on the EM characteristics in multilevel passivation structures.

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Low temperature solid phase crystallization of amorphous silicon thin film by crystalline activation

  • Kim, Hyung-Taek;Kim, Young-Kwan
    • Journal of Korean Vacuum Science & Technology
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    • 제2권2호
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    • pp.97-100
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    • 1998
  • We have investigated the effects of crystalline activation on solid phase crystallization (SPC) of amorphous silicon (a-Si) thin films. Wet blasting and self ion implantation were employed as the activation treatments to induce macro or micro crystalline damages on deposited a-Si films. Low temperature and larger grain crystallization were obtained by the applied two-step activation. High degree of crystallinity was also observed on both furnace and rapid SPC. crystalline activations showed the promotion of nucleation on the activated regions and the retardation of growth in an amorphous matrix in SPC. The observed behavior of two-step SPC was strongly dependent on the applied activation and annealing processes. It was also found that the diversified effects by macro and micro activations on the SPC were virtually diminished as the annealing temperature increased.

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COMPARISON OF DIFFUSION COEFFICIENTS AND ACTIVATION ENERGIES FOR AG DIFFUSION IN SILICON CARBIDE

  • KIM, BONG GOO;YEO, SUNGHWAN;LEE, YOUNG WOO;CHO, MOON SUNG
    • Nuclear Engineering and Technology
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    • 제47권5호
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    • pp.608-616
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    • 2015
  • The migration of silver (Ag) in silicon carbide (SiC) and $^{110m}Ag$ through SiC of irradiated tristructural isotropic (TRISO) fuel has been studied for the past three to four decades. However, there is no satisfactory explanation for the transport mechanism of Ag in SiC. In this work, the diffusion coefficients of Ag measured and/or estimated in previous studies were reviewed, and then pre-exponential factors and activation energies from the previous experiments were evaluated using Arrhenius equation. The activation energy is $247.4kJ{\cdot}mol^{-1}$ from Ag paste experiments between two SiC layers produced using fluidized-bed chemical vapor deposition (FBCVD), $125.3kJ{\cdot}mol^{-1}$ from integral release experiments (annealing of irradiated TRISO fuel), $121.8kJ{\cdot}mol^{-1}$ from fractional Ag release during irradiation of TRISO fuel in high flux reactor (HFR), and $274.8kJ{\cdot}mol^{-1}$ from Ag ion implantation experiments, respectively. The activation energy from ion implantation experiments is greater than that from Ag paste, fractional release and integral release, and the activation energy from Ag paste experiments is approximately two times greater than that from integral release experiments and fractional Ag release during the irradiation of TRISO fuel in HFR. The pre-exponential factors are also very different depending on the experimental methods and estimation. From a comparison of the pre-exponential factors and activation energies, it can be analogized that the diffusion mechanism of Ag using ion implantation experiment is different from other experiments, such as a Ag paste experiment, integral release experiments, and heating experiments after irradiating TRISO fuel in HFR. However, the results of this work do not support the long held assumption that Ag release from FBCVD-SiC, used for the coating layer in TRISO fuel, is dominated by grain boundary diffusion. In order to understand in detail the transport mechanism of Ag through the coating layer, FBCVD-SiC in TRISO fuel, a microstructural change caused by neutron irradiation during operation has to be fully considered.

ANALYSIS OF THE LiF:Mg,Cu,Si TL AND THE LiF:Mg,Cu,P TL GLOW CURVES BY USING GENERAL APPROXIMATION PLUS MODEL

  • Chang, In-Su;Lee, Jung-Il;Kim, Jang-Lyul;Oh, Mi-Ae;Chung, Ki-Soo
    • Journal of Radiation Protection and Research
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    • 제34권4호
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    • pp.155-164
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    • 2009
  • In this paper, we used computerized glow curve deconvolution (CGCD) software with several models for the simulation of a TL glow curve which was used for analysis. By using the general approximation plus model, parameters values of the glow curve were analyzed and compared with the other models parameters (general approximation, mixed order kinetics, general order kinetics). The LiF:Mg,Cu,Si and the LiF:Mg,Cu,P material were used for the glow curve analysis. And we based on figure of merits (FOM) which was the goodness of the fitting that was monitored through the value between analysis model and TLD materials. The ideal value of FOM is 0 which represents a perfect fit. The main glow peak makes the most effect of radiation dose assessment of TLD materials. The main peak of the LiF:Mg,Cu,Si materials has a intensity rate 80.76% of the whole TL glow intensity, and that of LiF:Mg,Cu,P materials has a intensity rate 68.07% of the whole TL glow intensity. The activation energy of LiF:Mg,Cu,Si was analyzed as 2.39 eV by result of the general approximation plus(GAP) model. In the case of mixed order kinetics (MOK), the activation energy was analyzed as 2.29 eV. The activation energy was analyzed as 2.38 eV by the general order kinetics (GOK) model. In the case of LiF:Mg,Cu,P TLD, the activation energy was analyzed as 2.39 eV by result of the GAP model. In the case of MOK, the activation energy was analyzed as 2.55 eV. The activation energy was analyzed as 2.51 eV by the GOK model. The R value means different ratio of retrapping-recombination. The R value of LiF:Mg,Cu,Si TLD main peak analyzed as $1.12\times10^{-6}$ and $\alpha$ value analyzed as $1.0\times10^{-3}$. The R of LiF:Mg,Cu,P TLD analyzed as $7.91\times10^{-4}$, the $\alpha$ value means different ratio of initial thermally trapped electron density-initial trapped electron density (include thermally disconnected trap electrons density). The $\alpha$ value was analyzed as $9.17\times10^{-1}$ which was the difference from LiF:Mg,Cu,Si TLD. The deep trap electron density of LiF:Mg,Cu,Si was higher than the deep trap electron density of LiF:Mg,Cu,P.

고속도로 자율주행 시 보상을 최대화하기 위한 강화 학습 활성화 함수 비교 (Comparison of Reinforcement Learning Activation Functions to Maximize Rewards in Autonomous Highway Driving)

  • 이동철
    • 한국인터넷방송통신학회논문지
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    • 제22권5호
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    • pp.63-68
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    • 2022
  • 자율주행 기술은 최근 심층 강화학습의 도입으로 큰 발전을 이루고 있다. 심층 강화 학습을 효과적으로 사용하기 위해서는 적절한 활성화 함수를 선택하는 것이 중요하다. 그 동안 많은 활성화 함수가 제시되었으나 적용할 환경에 따라 다른 성능을 보여주었다. 본 논문은 고속도로에서 자율주행을 학습하기 위해 강화 학습을 사용할 때 어떤 활성화 함수를 사용하는 것이 효과적인지 12개의 활성화 함수 성능을 비교 평가한다. 이를 위한 성능 평가 방법을 제시하였고 각 활성화 함수의 평균 보상 값을 비교하였다. 그 결과 GELU를 사용할 경우 가장 높은 평균 보상을 얻을 수 있었으며 SiLU는 가장 낮은 성능을 보여주었다. 두 활성화 함수의 평균 보상 차이는 20%였다.

SHS 법에 의한 $Ti5_Si_3$의 합성시 온도 Profile 분석 (Temperature Profile Analysis of $Ti5_Si_3$ in Self-Propagating High Temperature Synthesis)

  • 김도경;이형직;김익진;이형복
    • 한국세라믹학회지
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    • 제32권3호
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    • pp.341-348
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    • 1995
  • An analysis of the use of temperature profiles in the determination of the kinetic parameters of combustion synthesis of Ti5Si3 were investigated. From profile analysis, an apparent activation energy of 12KJ/mol was calculated. The Maximum heating rate achieved during 10wt% Ti5Si3 reaction by the product dilution method was approximately $1.5\times$104 K/s. Coupling this value with the measured wave velocity of 7.02 cm/s yields a maximum thermal gradient of 2.14$\times$103 K/cm. The value of tr (=t*) was calculated to be 1.2$\times$10-1 s and the value of td (=tx) was calculated to be 32.89 s. Using the definition of t* and the measured wave velocity, the effective thermal diffusivity, $\alpha$, was calculated to be 0.59$\times$10 $\textrm{cm}^2$/s. From these analysis, the power function, G, was also calculated.

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기계적 합금법에 의한 Al-Ti-Si합금의 고온 크립 변형 (High Temperature Creep Deformation of Mechanically Alloyed Al-Ti-Si Alloy)

  • 최철진;박원욱
    • 연구논문집
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    • 통권25호
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    • pp.169-173
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    • 1995
  • The high temperature deformation of mechanically alloyed Al-Ti-Si alloy (Al-9.64wt% Ti-1.56wt% Si) was investigated by performing constant load compression creep tests over the temperature range of $673^\circC$K to $723^\circC$K. From the calculation based on the modified power law creep equation for dispersion strengthened alloy, the true creep activation energy, was 176kJ/mole, the true stress exponent was 4.9. Considering the value of activation energy, stress exponent, the shape of primary creep region, it could be concluded that creep deformation in the MA Al-Ti-Si alloy is controlled by dislocation climb.

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6H-SiC MOSFET과 디지털 IC 제작 (Fabrication of 6H-SiC MOSFET and Digital IC)

  • 김영석;오충완;최재승;송지헌;이장희;이형규;박근형
    • 한국전기전자재료학회논문지
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    • 제16권7호
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    • pp.584-592
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    • 2003
  • 6H-SiC MOSFETs and digital ICs have been fabricated and characterized. PMOS devices are fabricated on an n-type epilayer while the NMOS devices are fabricated on implanted p-wells. NMOS and PMOS devices use a thermally grown gate oxide. SiC MOSFETs are fabricated using different impurity activation methods such as high temperature and newly proposed laser annealing methods. Several digital circuits, such as resistive road NMOS inverters, CMOS inverters, resistive road NMOS NANDs and NORs are fabricated and characterized.