• Title/Summary/Keyword: Semiconductor manufacturing

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Implementation of ATmega128 based Short Message Transmission Protocol IMCP (ATmega128 기반 단문 메시지 전송 프로토콜 IMCP 구현)

  • Kim, Jeom Go
    • Convergence Security Journal
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    • v.20 no.3
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    • pp.3-11
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    • 2020
  • The social networking service (SNS) is free, but the data usage fee paid to the telecommunications company and the member's information must be provided directly or indirectly. In addition, while SNS' specifications for transmitting and receiving devices such as smart-phones and PCs are increasing day by day, using universal transmission protocols in special environments such as contaminated areas or semiconductor manufacturing plants where work instructions are mainly made using short messages is not easy. It is not free and has a problem of weak security. This paper verified the practicality through the operation test by implementing IMCP, a low-power, low-cost message transmission protocol that aims to be wearable in special environments such as risk, pollution, and clean zone based on ATmega128.

Status of Quartz Glass Crucible (석영유리 도가니 국내외 현황)

  • Noh, Sunghun;Kang, NamHun;Yun, Heuikeun;Kim, Hyeong-Jun
    • Ceramist
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    • v.22 no.4
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    • pp.452-463
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    • 2019
  • A quartz glass crucible is the essential material for manufacturing silicon ingots such as semiconductors and solar cells. Quartz glass crucibles for semiconductors and solar cells are made similar, but differ in surface purity, structure and durability. Recently, ultra high purity synthetic glass crucibles for semiconductors have become more important due to foreign problems. In Korea, it has succeeded in producing 28-inch quartz glass crucibles through the past 10 years. However, 32-inch synthetic quartz glass for the production of silicon ingots for semiconductors is not up to the level of advanced technology, and the technology gap is expected to be 2 to 3 years. In order to overcome these technological gaps and localize synthetic quartz glass ware, close cooperation between production companies and demand companies and localization of synthetic quartz glass powder must also be made. In addition, if government support can be added, faster results can be expected.

Earthquakes occurred around the Yeongweol area (영월 및 인접 지역에서 발생한 지진에 대한 고찰)

  • 추교승
    • Proceedings of the Earthquake Engineering Society of Korea Conference
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    • 1997.04a
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    • pp.94-97
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    • 1997
  • The December 13, 1996 Yeongweol earthquake of magnitude 4.5 was felt almost everywhere in southern part of the Korean Peninsula and Cheju Island, even though not feld in Tsushima Island at other places in Japan near to Korea. Production lines of semiconductor disk in electronic engineering companies of Gumi manufacturing complex were seriously affected by the shake of this earthquake. Total 17 earthquakes of magnitude 4 or above occurred within the area of 50km radius from Yeongweol in the period from the year 1400 to 1996. This group of earthquakes includes 12 events of magnitude 5.0 or above and 3 events of magnitude 6.0 or above. Among these events, 13 earthquakes are historical events of years 1400-1904. Most of them occurred in 15-16 centuries. The February 21, 1596 Jungseon-Pyeongchang event of magnitude 6.5 is the largest one up to now in the area. There are four instrumental earthquakes (years 1905-1996) of magnitude 4.0 or above in this area. An earthquake of magnitude 4.4 occurred on 5th of November, 1919 at almost the same place as the December 13, 1996 earthquake of magnitude 4.5. Thus this event is preceded with the previous one by 77 years.

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Anti-Foaming Properties of Polypropylene Glycol Oleates (올레산 폴리프로필렌글리콜 에스테르류의 소포특성)

  • Li, Hai-Yan;Choi, Hyoung-Chul;Jeong, Noh-Hee
    • Journal of the Korean Applied Science and Technology
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    • v.28 no.2
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    • pp.146-151
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    • 2011
  • In this study, by using oleic acid and polypropylene glycol, good natured antifoaming agent for suitable electronics process under the alkaline conditions were synthesized. For the synthesized mono and diesters, acid value, hydroxyl value was measured, and identified by FT-IR and $^1H-NMR$ spectroscopy. Surface properties such as surface tension, critical micelle concentration(cmc) for diluted aqueous solution was measured, and tested the antifoaming properties according to the difference of alkyl chain length, various concentration, temperature and pH. The surface tension of synthesized antifoaming agent, PPMO(Polypropylene glycol monooleate) was 24.3 dyne/cm, PPDO(Polypropylene glycol dioleate) was 23.7 dyne/cm. By increasing of the alkyl chain length, surface tension was decreased slightly, and showed good antifoaming properties at 0.06 wt% concentration and $50^{\circ}C$, pH 11. These synthesized compounds are expected to apply as a suitable antifoaming agents in the semiconductor and the PCB(Printed Circuit Board) manufacturing process.

The Application of Electropolishing for Removing Burrs and Residual Stress of Stamping Leadframe (스탬핑 리드프레임의 버와 잔류응력 제거를 위한 전해연마의 적용)

  • 신영의;김헌희;김경섭;코조후지모토;김종민
    • Journal of the Microelectronics and Packaging Society
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    • v.8 no.3
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    • pp.19-24
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    • 2001
  • The lead frame, which is principal material used in semiconductor packaging, is required to be microscopic in leads and pitches to cope with miniaturization, thin film, large scale integrated. In addition, it is indispensable to eliminate residual stress and burrs occurring at manufacturing lead frames This thesis applied electrolytic abrasion in order to remove burrs and residual stress created during the stamp process. Electrolytic abrasion removed the burrs on the surface of lead frame. Removal of residual stress highly depends on the types of electrolyte solution. In case of perchloric system, electrolytic abrasion removed 23% of residual stress. Through removal of burrs and reducing residual stress, the reliability of lead frame was substantially improved.

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A Study on Industrial Development Direction at Transitional Periods of Industrial Structure in Chungcheongbuk-do Region (산업구조 전환기 충북지역 산업의 발전방향)

  • 한주성
    • Journal of the Economic Geographical Society of Korea
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    • v.6 no.2
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    • pp.293-306
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    • 2003
  • This paper aims to clarify the change in industrial structure and industry itself, and makes suggestions for the industrial development direction at transitional periods in the Chungcheongbuk-do(province) region. Because profits of regional gross production in Chungcheongbuk-do region flow out of the region, basic industries must be brought up. For this phenomenon, main manufacturing must be developed for the industrial power of the next generation of high added values that combined with digital industry; the petrochemistry, semiconductor industry as major type of industry, and automobile industry as minor type of industry. Also for supporting industry, education service, health and welfare, research and development services that are knowledge-based service industries in Chungcheongbuk-do region, must be formated the network among corporations and constructed regional innovation system linked with educational institutions, precision chemistry industry and biology technology as major type of industry, and precision machinery and tools industry as minor type of industry.

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A Study on Improvement of the Performance of Pulsed AC Ion Bar (1) (바 형태 정전기제거장치의 정전기제거성능 향상을 위한 연구 (1))

  • Lee, Dong Hoon;Choi, Dong Soo;Jung, Yong Chul;Kim, Sang Min
    • Journal of the Korean Society of Safety
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    • v.29 no.3
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    • pp.34-38
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    • 2014
  • In Display such as LCD, LED, and AMOLED or semiconductor related industries are required to have static ionizer in order to produce reliable goods since the ionizer can create balanced ion that is delivered to producing goods to minimize electrical damages when manufacturing. However, the most general type of ionization is called, "Corona Discharge" that has a slight chances to generate unequal and unstable amount of each +/- ion to the target object. Then, the ionization performance will drastically decrease and end up with quality deterioration problem. In this research, our objective to resolve the current issue via applying "Coupling Condenser" on each counter electrodes of Corona discharging type ionizer. The result is that the ion balance was maintained the satisfied range that is within +/-100V when we changed the duty ratio of the High Voltage of Pulse AC about 40 ~ 70%. In addition, when levelling the High Voltage of Pulse AC, the ion balance holds the range within +20 ~ 0V. Even though we have tested the same experiment for a year, we have seen the range changes roughly ${\pm}50V$.

A Study of Data correction method when in-situ end point detection in Chemical-Mechanical Polishing of Copper Overlay (구리 박막 CMP의 실시간 end point detection을 위한 데이터 정밀도 개선 방법에 관한 연구)

  • Kim, Nam-Woo;Hur, Chang-Wu
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.18 no.6
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    • pp.1401-1406
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    • 2014
  • Knowledge of the manufacturing process of semiconductor devices in order to obtain a copper pattern using chemical mechanical polishing (CMP) planarization using a Wafer polishing process is applied with a thickness of the copper measured in real time, which need to be precisely controlled by, where the acquisition the actual thickness of the sensor value with the calculated value in terms of error can occur in the process. Approximated the actual measurement values so as to obtain a method using a simple average, moving average, compared to the results using filters onggo Strom real-time measurements of the thickness of the units of the control system to reduce the variation in the implementation of the method described for the.

High density line patterns fabricated by thermal imprint (Thermal imprint를 이용한 고밀도 line패턴 형성방법)

  • Lee, Sang-Moon;Kwak, Jung-Bok;Lee, Hwan-Soo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.270-270
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    • 2008
  • We present details of experimental results in the fabrication of high density line patterns, using imprint technique that can provide a simple and comparatively cost-effective manufacturing means. Barrier array structures for display or interconnects for semiconductor applications were the aims of this study. For pattern fabrication, a polymer layer (Ajinomoto GX-13 dielectric film) with a thickness of 38um that can act as either an insulating or a dielectric layer was laminated on a substrate. Fine tracks were then formed using a patterned stamp under isostatic pressure. The line width was ranged between 10 to 60 mm. A self-assembled monolayer (SAM) of fluorinated alkylchlorosilane [$CF_3(CF_2)5(CH_2)2SiCl_3$] as an anti-sticking layer was coated on the surface of the stamp prior to thermal imprint to improve the de-molding characteristic.

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Recursive Least Squares Run-to-Run Control with Time-Varying Metrology Delays

  • Fan, Shu-Kai;Chang, Yuan-Jung
    • Industrial Engineering and Management Systems
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    • v.9 no.3
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    • pp.262-274
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    • 2010
  • This article investigates how to adaptively predict the time-varying metrology delay that could realistically occur in the semiconductor manufacturing practice. Metrology delays pose a great challenge for the existing run-to-run (R2R) controllers, driving the process output significantly away from target if not adequately predicted. First, the expected asymptotic double exponentially weighted moving average (DEWMA) control output, by using the EWMA and recursive least squares (RLS) prediction methods, is derived. It has been found that the relationships between the expected control output and target in both estimation methods are parallel, and six cases are addressed. Within the context of time-varying metrology delay, this paper presents a modified recursive least squares-linear trend (RLS-LT) controller, in combination with runs test. Simulated single input-single output (SISO) R2R processes subject to various time-varying metrology delay scenarios are used as a testbed to evaluate the proposed algorithms. The simulation results indicate that the modified RLS-LT controller can yield the process output more accurately on target with smaller mean squared error (MSE) than the original RLSLT controller that only deals with constant metrology delays.