• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.365-366
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• 2007

High quality cathode with high deposition rate of thin films and long target life time is required for manufacturing TFT-LCD and semiconductor. We developed WV(wide view) sputtering cathode with wide erosion area and high deposition rate. Ti thin film thickness variation in WV cathode is below 5% for 380 kWh target life time. Al thin film thickness using normal cathode is decreased about 20%. By using WV cathode, target using efficiency was improved 40%. in comparison with normal cathode.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 하계학술대회 논문집
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• pp.731-734
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• 2000

The characterization of Zinc diffusion processes applied fur high-speed avalanche photodiodes has been examined. The different diffusion process conditions for InP test structures were explored. The Zinc diffusion profiles, such as the diffusion depth and the Zinc dopant concentration, were examined using secondary ion mass spectrometry with varying the process variables and material parameters. It is observed that the diffusion profiles are severely impacted on the process parameters, such as the amount of Zn$_3$P$_2$source and the diffusion time, as well as material parameters, such as doping concentration of diffusion layer. These results can be utilized for the high-speed avalanche photodiode fabrication.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 하계학술대회 논문집 A
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• pp.382-384
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• 1995

The advancement of power semiconductor devices has given great attribution to the performance and reliability or power conversion systems. But contemporary power devices have room for improvement. So much interest and endeavor are being applied to develop an improved power devices. The MOS-Controlled Thyristor(MCT)is a recently developed power device which combines four layers thyristor structure and MOS-gate. Owing to advantages compared to other devices in many respects, the MCT attracts much notice recently. Nowadays, in designing and manufacturing power conversion systems, the importance of circuit simulation for reducing cost and time is incensed. And to excute the simulation that resemble the real system as much as possible, to develop a model of power device that provides properly static and dynamic characteristics is important. So, this paper presents a PSPICE model of the MCT considering dynamic characteristics.

• 한국정밀공학회지
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• 제25권6호
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• pp.80-91
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• 2008

Electrostatic forces have an advantage of directly levitating not only non-ferromagnetic metals but also semiconductors, such as silicon wafers, and dielectric materials like glass. This paper describes the characteristics of electrostatic forces and electrostatic suspension system, followed by the basic principle of 1-DOF(degree of freedom) electrostatic suspension system, and the structures of electrodes-for-suspension and voltage supplying methods to the electrodes in 1-DOF model. This paper also discuss about the minimum number of electrodes needed to control n-DOF motion of the suspended object and represents some desirable electrode patterns to stabilize the 6-DOF motion of the object. In the near future, electrostatic suspension system is expected to be applied to industrial manufacturing processes, for example, to the manufacture of semiconductor devices and/or flat panel display devices.

• 한국재료학회지
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• 제9권6호
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• pp.604-608
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• 1999

Semiconductor industry requires the development of new technology such as 300 mm technology, suitable for manufacturing the next generation dervices. A promising process for realizing 300 mm technology can be achieved by using enlarged microwave plasma chemical vapor deposition (MWCVD) technology. In this work, we used radial line slot antenna for enlarging microwave plasma area, and carried ut the deposition of polysilicon films using enlarged MWCVD for the first time in Korea. The results was as follows. Deposited polysilicon films showed various degrees of crystallinity as well as epitaxy to silicon substrates even at low temperature of $300^{\circ}C$. Deposition rates also controled crystallization behavior and slo deposition rates showed very high crystallinity. It could be said that enlarged MWCVD system and technology was worth to get attraction as one os future technologies for 1 G DRAM era.

• International Journal of Precision Engineering and Manufacturing
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• 제6권4호
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• pp.14-20
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• 2005

In this paper, a new field of metrology called 'precision nanometrology' is presented. The 'precision nanometrology' is the result of evolutions of the traditional 'precision metrology' and the new 'nanometrology'. 'Precision nanometrology' is defined here as the science of dimensional measurement and motion measurement with 100 nm to 0.1 nm resolution/uncertainty within a range of micrometer to meter. The definition is based on the fact that nanometrology in nanoengineering and the precision industries, such as semiconductor industry, precision machine tool industry, precision instrument industry, is not only concerned with the measurement resolution and/or uncertainty but also the range of measurement. It should also be pointed out that most of the measurement objects in nanoengineering have dimensions larger than 1 micrometer. After explaining the definition of precision nanometrology, the paper provides several examples showing the critical roles of precision nanometrology in precision nanosystems, including nanometrology system, nanofabrication system, and nanomechatronics system.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.934-937
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• 2005

It is not efficient and scarcely out of the question to use commercial expensive electron beam lithography system widely used for semiconductor fabrication process for the manufacturing application field of various devices in the small business scope. Then scanning electron microscope based electron beam machining system is maybe regarded as a powerful model can be used for it simply. To get a complete suite of thus proper system, proper chamber with high vacuum condition is necessarily required more than anything else to modify scanning electron microscope. In this study, special chamber unit using rotary pump and diffusion pump to obtain high vacuum degree was designed and manufactured and various evaluation tests fur recognize the vacuum characteristic were accomplished.

• 한국정밀공학회지
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• 제17권1호
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• pp.21-26
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• 2000

This paper describes a positioning system for ultra-precision that will be utilized in semiconductor manufacturing field and precision machinery. This system is composed with laser scale unit with 10nm resolution, ball screw with LM guide, brushless DC servo motor, vibration isolator and is equipped in chamber for continuous measuring environment. The dynamic of table, the problem of servo control and the traceability for micro step motion are described. These data will be applied for getting more stable system with 50nm resolution.

• 한국소음진동공학회:학술대회논문집
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• 한국소음진동공학회 1996년도 추계학술대회논문집; 한국과학기술회관, 8 Nov. 1996
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• pp.377-385
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• 1996

In the case of a precision equipment, it requires a vibration free environment to provide its proper function. Especially, lithography and inspection devices, which have sub-nanometer class high accuracy and resolution, have come to necessity for producing more improved giga class semiconductor wafers. This high technology equipments require very strict environmental vibration standard in proportion to the accuracy of the manufacturing, inspecting devices. The vibration criteria are usually obtained either by the real vibration exciting test on the equipment or by the analytical calculation. the former is accurate but requires a great deal of time and efforts while the latter lacks reliability. this paper proposes a new method to solve this problem at a time. the permissible vibration level to a precision equipment can be easily obtained by analyzing a process of Frequency Response Function. This paper also demonstrates its effectiveness by applying the proposed method to finding the vibration criteria of a Computer Hard Disk Drive by impact Test.

• 소음진동
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• 제2권4호
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• pp.273-280
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• 1992

The prediction of vibration response of floor is necessary in order to check whether the floor vibration level will satisfy the allowable vibration standard of precise machinery such as electronic microscopes in semiconductor manufacturing plant before the installation of various neighboring equipment facility. In conventional vibration isolation, we were mainly interested in minimization of vibration transmissibility and stabilization of vibration isolation system. But in order to predict vibration response of floor, it is necessary to know exciting force of equipment installed on the floor and the mobility of the floor. We measured the exciting force of the dropped mass assumed as equipment and the mobility of some practical building floor using large impact hammer. And from this we predicted the vibration response of floor on which the mass dropped. This predicted vibration response of floor is compared with measured vibration response. Through upper procedure, we examined the possibility of predicting vibration response of floor from the information of exciting force of equipment and the mobility of floor.