• Title/Summary/Keyword: Semiconductor Devices

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Electrical Properties of Al3+ and Y3+ Co-doped SnO2 Transparent Conducting Films (Al3+와 Y3+ 동시치환 SnO2 투명전극 박막의 전기적 특성)

  • Kim, Geun-Woo;Seo, Yong-Jun;Sung, Chang-Hoon;Park, Keun-Young;Cho, Ho-Je;Heo, Si-Nae;Koo, Bon-Heun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.10
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    • pp.805-810
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    • 2012
  • Transparent conducting oxides (TCOs) have wide range of application areas in transparent electrode for display devices, Transparent coating for solar energy heat mirrors, and electromagnetic wave shield. $SnO_2$ is intrinsically an n-type semiconductor due to oxygen deficiencies and has a high energy-band gap more than 3.5 eV. It is known as a transparent conducting oxide because of its low resistivity of $10^{-3}{\Omega}{\cdot}cm$ and high transmittance over 90% in visible region. In this study, co-doping effects of Al and Y on the properties of $SnO_2$ were investigated. The addition of Y in $SnO_2$ was tried to create oxygen vacancies that increase the diffusivity of oxygen ions for the densification of $SnO_2$. The addition of Al was expected to increase the electron concentration. Once, we observed solubility limit of $SnO_2$ single-doped with Al and Y. $\{(x/2)Al_2O_3+(x/2)Y_2O_3\}-SnO_2$ was used for the source of Al and Y to prevent the evaporation of $Al_2O_3$ and for the charge compensation. And we observed the valence changes of aluminium oxide because generally reported of valence changes of aluminium oxide in Tin - Aluminium binary system. The electrical properties, solubility limit, densification and microstructure of $SnO_2$ co-doped with Al and Y will be discussed.

Pd/Si-based Emitter Ohmic Contacts for AlGaAs/GaAs HBTs (AlGaAs/GaAs HBT 에미터 전극용 Pd/Si계 오믹 접촉)

  • 김일호
    • Journal of the Korean Vacuum Society
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    • v.12 no.4
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    • pp.218-227
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    • 2003
  • Pd/Si/Ti/Pt and Pd/Si/Pd/Ti/Au ohmic contacts to n-type InCaAs were investigated for applications to AlGaAs/GaAs HBT emitter ohmic contacts. In the Pd/Si/Ti/Pt ohmic contact, as-deposited contact showed non-ohmic behavior, and high specific contact resistivity of $5\times10^{-3}\Omega\textrm{cm}^2$ was achieved by rapid thermal annealing at $375^{\circ}C$/10 sec. However, the specific contact resistivity decreased remarkably to $2\times10^{-6}\Omega\textrm{cm}^2$ by annealing at $425^{\circ}C$/10sec. In the Pd/Si/Pd/Ti/Au ohmic contact, minimum specific contact resistivity of $3.9\times10^{-7}\Omega\textrm{cm}^2$ was achieved by annealing at $400^{\circ}C$/20sec. In both ohmic contacts, low contact resistivity and non-spiking planar interface between ohmic materials and InGaAs were maintained. Therefore, these thermally stable ohmic contact systems are promising candidates for compound semiconductor devices. RF performance of the AlGaAs/GaAs HBT was also examined by employing the Pd/Si/Ti/Pt and Pd/Si/Pd/Ti/Au systems as emitter ohmic contacts. Cutoff frequencies were 63.9 ㎓ and 74.4 ㎓, respectively, and maximum oscillation frequencies were 50.1 ㎓ and 52.5 ㎓, respectively. It shows very successful high frequency operations.

An Energy-Balancing Technique using Spatial Autocorrelation for Wireless Sensor Networks (공간적 자기상관성을 이용한 무선 센서 네트워크 에너지 균등화 기법)

  • Jeong, Hyo-nam;Hwang, Jun
    • Journal of Internet Computing and Services
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    • v.17 no.6
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    • pp.33-39
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    • 2016
  • With recent advances in sensor technology, CMOS-based semiconductor devices and networking protocol, the areas for application of wireless sensor networks greatly expanded and diversified. Such diversification of uses for wireless sensor networks creates a multitude of beneficial possibilities for several industries. In the application of wireless sensor networks for monitoring systems' data transmission process from the sensor node to the sink node, transmission through multi-hop paths have been used. Also mobile sink techniques have been applied. However, high energy costs, unbalanced energy consumption of nodes and time gaps between the measured data values and the actual value have created a need for advancement. Therefore, this thesis proposes a new model which alleviates these problems. To reduce the communication costs due to frequent data exchange, a State Prediction Model has been developed to predict the situation of the peripheral node using a geographic autocorrelation of sensor nodes constituting the wireless sensor networks. Also, a Risk Analysis Model has developed to quickly alert the monitoring system of any fatal abnormalities when they occur. Simulation results have shown, in the case of applying the State Prediction Model, errors were smaller than otherwise. When the Risk Analysis Model is applied, the data transfer latency was reduced. The results of this study are expected to be utilized in any efficient communication method for wireless sensor network monitoring systems where all nodes are able to identify their geographic location.

Effect of Working Pressure on the Electrical and Optical Properties of ITZO Thin Films Deposited on PES Substrate with SiO2 Buffer Layer (공정압력이 SiO2 버퍼층을 갖는 PES 기판위에 증착한 ITZO 박막의 전기적 및 광학적 특성에 미치는 영향)

  • Joung, Yang-Hee;Choi, Byeong-Kyun;Kang, Seong-Jun
    • The Journal of the Korea institute of electronic communication sciences
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    • v.14 no.5
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    • pp.887-892
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    • 2019
  • In this study, after 20nm-thick $SiO_2$ thin film was deposited by PECVD method on the PES substrate, which is known to have the highest heat resistance among plastic substrates, as a buffer layer, ITZO thin films were deposited by RF magnetron sputtering method to investigate the electrical and optical properties according to the working pressure. The ITZO thin film deposited at the working pressure of 3mTorr showed the best electrical properties with a resistivity of $8.02{\times}10^{-4}{\Omega}-cm$ and a sheet resistance of $50.13{\Omega}/sq.$. The average transmittance in the visible region (400-800nm) of all ITZO films was over 80% regardless of working pressure. The Figure of merit showed the largest value of $23.90{\times}10^{-4}{\Omega}^{-1}$ in the ITZO thin film deposited at 3mTorr. This study found that ITZO thin films are very promising materials to replace ITO thin films in next-generation flexible display devices.

Thermoelectric Properties of the Reaction Sintered n-type β-SiC (반응소결법으로 제조한 n형 β-SiC의 열전특성)

  • Pai, Chul-Hoon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.20 no.3
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    • pp.29-34
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    • 2019
  • Silicon carbide is considered to be a potentially useful material for high-temperature electronic devices, as its large energy band gap and the p-type and/or n-type conduction can be controlled by impurity doping. Particularly, electric conductivity of porous n-type SiC semiconductors fabricated from ${\beta}-SiC$ powder at $2000^{\circ}C$ in $N_2$ atmosphere was comparable to or even larger than the reported values of SiC single crystals in the temperature region of $800^{\circ}C$ to $1000^{\circ}C$, while thermal conductivity was kept as low as 1/10 to 1/30 of that for a dense SiC ceramics. In this work, for the purpose of decreasing sintering temperature, it was attempted to fabricate porous reaction-sintered bodies at low temperatures ($1400-1600^{\circ}C$) by thermal decomposition of polycarbosilane (PCS) impregnated in n-type ${\beta}-SiC$ powder. The repetition of the impregnation and sintering process ($N_2$ atmosphere, $1600^{\circ}C$, 3h) resulted in only a slight increase in the relative density but in a great improvement in the Seebeck coefficient and electrical conductivity. However the power factor which reflects the thermoelectric conversion efficiency of the present work is 1 to 2 orders of magnitude lower than that of the porous SiC semiconductors fabricated by conventional sintering at high temperature, it can be stated that thermoelectric properties of SiC semiconductors fabricated by the present reaction-sintering process could be further improved by precise control of microstructure and carrier density.

Fabrication and Electrical Property Analysis of [(Ni0.3Mn0.7)1-xCux]3O4 Thin Films for Microbolometer Applications (마이크로볼로미터용 [(Ni0.3Mn0.7)1-xCux]3O4 박막의 제작 및 전기적 특성 분석)

  • Choi, Yong Ho;Jeong, Young Hun;Yun, Ji Sun;Paik, Jong Hoo;Hong, Youn Woo;Cho, Jeong Ho
    • Journal of Sensor Science and Technology
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    • v.28 no.1
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    • pp.41-46
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    • 2019
  • In order to develop novel thermal imaging materials for microbolometer applications, $[(Ni_{0.3}Mn_{0.7})_{1-x}Cu_x]_3O_4$ ($0.18{\leq}x{\leq}0.26$) thin films were fabricated using metal-organic decomposition. Effects of Cu content on the electrical properties of the annealed films were investigated. Spinel thin films with a thickness of approximately 100 nm were obtained from the $[(Ni_{0.3}Mn_{0.7})_{1-x}Cu_x]_3O_4$ films annealed at $380^{\circ}C$ for five hours. The resistivity (${\rho}$) of the annealed films was analyzed with respect to the small polaron hopping model. Based on the $Mn^{3+}/Mn^{4+}$ ratio values obtained through x-ray photoelectron spectroscopy analysis, the hopping mechanism between $Mn^{3+}$ and $Mn^{4+}$ cations discussed in the proposed study. The effects of $Cu^+$ and $Cu^{2+}$ cations on the hopping mechanism is also discussed. Obtained results indicate that $[(Ni_{0.3}Mn_{0.7})_{1-x}Cu_x]_3O_4$ thin films with low temperature annealing and superior electrical properties (${\rho}{\leq}54.83{\Omega}{\cdot}cm$, temperature coefficient of resistance > -2.62%/K) can be effectively employed in applications involving complementary metal-oxide semiconductor (CMOS) integrated microbolometer devices.

Effect of Die Attach Film Composition for 1 Step Cure Characteristics and Thermomechanical Properties (다이접착필름의 조성물이 1단계 경화특성과 열기계적 물성에 미치는 영향에 관한 연구)

  • Sung, Choonghyun
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.21 no.12
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    • pp.261-267
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    • 2020
  • The demand for faster, lighter, and thinner portable electronic devices has brought about a change in semiconductor packaging technology. In response, a stacked chip-scale package(SCSP) is used widely in the assembly industry. One of the key materials for SCSP is a die-attach film (DAF). Excellent flowability is needed for DAF for successful die attachment without voids. For DAF with high flowability, two-step curing is often required to reduce a cure crack, but one-step curing is needed to reduce the processing time. In this study, DAF composition was categorized into three groups: cure (epoxy resins), soft (rubbers), hard (phenoxy resin, silica) component. The effect of the composition on a cure crack was examined when one-step curing was applied. The die-attach void and flowability were also assessed. The cure crack decreased as the amount of hard components decreased. Die-attach voids also decreased as the amount of hard components decreased. Moreover, the decrease in cure component became important when the amount of hard component was small. The flowability was evaluated using high-temperature storage modulus and bleed-out. A decrease in the amount of hard components was critical for the low storage modulus at 100℃. An increase in cure component and a decrease in hard component were important for the high bleed-out at 120℃(BL-120).

Spatial variation in quality of Ga2O3 single crystal grown by edge-defined film-fed growth method (EFG 방법으로 성장한 β-Ga2O3 단결정의 영역별 품질 분석)

  • Park, Su-Bin;Je, Tae-Wan;Jang, Hui-Yeon;Choi, Su-Min;Park, Mi-Seon;Jang, Yeon-Suk;Moon, Yoon-Gon;Kang, Jin-Ki;Lee, Won-Jae
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.32 no.4
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    • pp.121-127
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    • 2022
  • β-Gallium oxide (Ga2O3), an ultra-wide bandgap semiconductor, has attracted great attention due to its promising applications for high voltage power devices. The most stable phase among five different polytypes, β-Ga2O3 has the wider bandgap of 4.9 eV and higher breakdown electric field of 8 MV/cm. Furthermore, it can be grown from melt source, implying higher growth rate and lower fabrication cost than other wide bandgap semiconductors such as SiC, GaN and diamond for the power device applications. In this study, β-Ga2O3 bulk crystals were grown by the edge-defined film-fed growth (EFG) process. The growth direction and the principal surface were set to be the [010] direction and the (100) plane of the β-Ga2O3 crystal, respectively. The spectra measured by Raman an alysis could exhibit the crystal phase an d impurity dopin g in the β-Ga2O3 ingot, and the crystallinity quality and crystal direction were analyzed using high-resolution X-ray diffraction (HRXRD). The crystal quality and various properties of as-grown β-Ga2O3 ribbon was systematically analyzed in order to investigate the spatial variation in entire crystal grown by EFG method.

How Market Reacts on the Metaverse Initiatives? An Event Study (메타버스 투자 추진이 기업 가치에 미치는 영향 분석: 이벤트 연구 방법론)

  • Mina Baek;Jeongha Kim;Dongwon Lee
    • Information Systems Review
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    • v.25 no.4
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    • pp.183-204
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    • 2023
  • Due to the COVID-19 pandemic, lots of occasions need to be held in online environment. This is the reason why "Metaverse" gets lots of attention in 2021. A number of companies made announcements on Metaverse, and this situation also boomed stock market. This paper investigates the relationship between Metaverse initiatives and business value of the firm (i.e., stock prices). We examine this relationship by using event study method with Lexis-Nexis News data from 2019 to 2021. The results indicate that Metaverse initiatives significantly impact positive influence on firm's value. In the technological perspective, technical factors affect more positive market returns, including Metaverse enablers (e.g., NFT, VR devices, digital twin) and common infrastructure (e.g., semiconductor, AI, cloud), and especially virtual environment was emphasized. Additionally, in the strategical perspective, radical innovation (e.g., pivoting, acquisition) impact more positive market return rather than incremental innovation (e.g., partnership, investment). Also, firms from non-service industries can achieve benefits from Metaverse initiatives rather than service industry in some degree.

Optimization of 1.2 kV 4H-SiC MOSFETs with Vertical Variation Doping Structure (Vertical Variation Doping 구조를 도입한 1.2 kV 4H-SiC MOSFET 최적화)

  • Ye-Jin Kim;Seung-Hyun Park;Tae-Hee Lee;Ji-Soo Choi;Se-Rim Park;Geon-Hee Lee;Jong-Min Oh;Weon Ho Shin;Sang-Mo Koo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.37 no.3
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    • pp.332-336
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    • 2024
  • High-energy bandgap material silicon carbide (SiC) is gaining attention as a next-generation power semiconductor material, and in particular, SiC-based MOSFETs are developed as representative power semiconductors to increase the breakdown voltage (BV) of conventional planar structures. However, as the size of SJ (Super Junction) MOSFET devices decreases and the depth of pillars increases, it becomes challenging to uniformly form the doping concentration of pillars. Therefore, a structure with different doping concentrations segmented within the pillar is being researched. Using Silvaco TCAD simulation, a SJ VVD (vertical variation doping profile) MOSFET with three different doping concentrations in the pillar was studied. Simulations were conducted for the width of the pillar and the doping concentration of N-epi, revealing that as the width of the pillar increases, the depletion region widens, leading to an increase in on-specific resistance (Ron,sp) and breakdown voltage (BV). Additionally, as the doping concentration of N-epi increases, the number of carriers increases, and the depletion region narrows, resulting in a decrease in Ron,sp and BV. The optimized SJ VVD MOSFET exhibits a very high figure of merit (BFOM) of 13,400 KW/cm2, indicating excellent performance characteristics and suggesting its potential as a next-generation highperformance power device suitable for practical applications.