• 제목/요약/키워드: Semi-Insulating

검색결과 170건 처리시간 0.017초

Electrical Characteristics of SiC Lateral P-i-N Diodes Fabricated on SiC Semi-Insulating Substrate

  • Kim, Hyoung Woo;Seok, Ogyun;Moon, Jeong Hyun;Bahng, Wook;Jo, Jungyol
    • Journal of Electrical Engineering and Technology
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    • 제13권1호
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    • pp.387-392
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    • 2018
  • Static characteristics of SiC (silicon carbide) lateral p-i-n diodes implemented on semi-insulating substrate without an epitaxial layer are inVestigated. On-axis SiC HPSI (high purity semi-insulating) and VDSI (Vanadium doped semi-insulating) substrates are used to fabricate the lateral p-i-n diode. The space between anode and cathode ($L_{AC}$) is Varied from 5 to $20{\mu}m$ to inVestigate the effect of intrinsic-region length on static characteristics. Maximum breakdown Voltages of HPSI and VDSI are 1117 and 841 V at $L_{AC}=20{\mu}m$, respectiVely. Due to the doped Vanadium ions in VDSI substrate, diffusion length of carriers in the VDSI substrate is less than that of the HPSI substrate. A forward Voltage drop of the diode implemented on VDSI substrate is 12 V at the forward current of $1{\mu}A$, which is higher than 2.5 V of the diode implemented on HPSI substrate.

Photoreflectance에 의한 반절연성 GaAs의 띠간격 에너지(Eo)측정 (Band-gap energy (Eo) measurements of semi-insulating GaAs by photoreflectance)

  • 배인호;김말문;이정열;김인수;김기홍
    • E2M - 전기 전자와 첨단 소재
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    • 제7권6호
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    • pp.490-495
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    • 1994
  • We investigated photoreflectance of semi-insulating GaAs with respect to modulation sources, that is, modulation beam intensity, modulation frequency, temperature, and thickness of sample. PR spectra by each modulation source turned out to be signals of low electric field third differential, and band gap values of sample were fitted by least square root method for Aspnes' theoretical equation.

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Improvement of Interfacial Performances on Insulating and Semi-conducting Silicone Polymer Joint by Plasma-treatment

  • Lee, Ki-Taek;Huh, Chang-Su
    • Transactions on Electrical and Electronic Materials
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    • 제7권1호
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    • pp.16-20
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    • 2006
  • In this paper, we investigated the effects of short-term oxygen plasma treatment of semiconducting silicone layer to improve interfacial performances in joints prepared with a insulating silicone materials. Surface characterizations were assessed using contact angle measurement and x-ray photoelectron spectroscopy (XPS), and then adhesion level and electrical performance were evaluated through T-peel tests and electrical breakdown voltage tests of treated semi-conductive and insulating joints. Plasma exposure mainly increased the polar component of surface energy from $0.21\;dyne/cm^2$ to $47\;dyne/cm^2$ with increasing plasma treatment time and then leveled off. Based on XPS analysis, the surface modification can be mainly ascribed to the creation of chemically active functional groups such as C-O, C=O and COH on semi-conductive silicone surface. This oxidized rubber layer is inorganic silica-like structure of Si bound with three to four oxygen atoms ($SiO_x,\;x=3{\sim}4$). The oxygen plasma treatment produces an increase in joint strength that is maximum for 10 min treatment. However, due to brittle property of this oxidized layer, the highly oxidized layer from too much extended treatment could be act as a weak point, decreasing the adhesion strength. In addition, electrical breakdown level of joints with adequate plasma treatment was increased by about $10\;\%$ with model samples of joints prepared with a semi-conducting/ insulating silicone polymer after applied to interface.

ZnTe-InSb Heterojunction의 전기적 특성 (Electrical Properties of ZnTe-lnSb Heterojunctions)

  • 김화택
    • 대한전자공학회논문지
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    • 제12권4호
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    • pp.35-40
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    • 1975
  • ZnTe-lnSb Heterojunction을 계면합금법으로 제작했다. Insb의 In이 ZnTe결정에 확산되어 계면에 고저항 ZnTe충을 성장시켜 P-i-n구조를 갖고 있으며 전류수송기구는 p형 ZnTe 가전자대로부터 고저항 ZnTe충에 주입된 Hole의 SCLC기구에 의존된다. 순방향과 역방향 전압을 인가할때 실온에서 오런지색 전 장발장이 관측되었다. The Zn7e-lnSb heterojunctions was prepared by interface alloying technique. The structure of this beterojunction had p-i-n which semi-insulating ZnTe laver at interface of this heterojunction was formed by diffusing In of InSb into ZnTe crystal. The current transport mechanism of this heterojunction was Spacecharge-Limited-Current(SCLC) mechanism by hole at semi-insulating ZnTe layer. The hole wart injected from valence band of p- type SnTe crystal. Orange color electroluminescence was observed at this heterojunction when forward and reversed bias voltage applied.

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Dark Conductivity in Semi-Insulating Crystals of CdTe:Sn

  • Makhniy, V.P.;Sklyarchuk, V.M.;Vorobiev, Yu.V.;Horley, P.P.
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제15권2호
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    • pp.243-248
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    • 2015
  • We prepared semi-insulating CdTe for radiation detectors by isothermal annealing of single crystals grown by Bridgeman technique in a sealed quartz container filled with Sn vapor. The resistivity of CdTe:Sn samples thus obtained was of order of $10^{10}Ohm{\cdot}cm$ at room temperature with electrons lifetime of $2{\times}10^{-8}$ s, which is appropriate for the applications desired. Analysis of electric transport characteristics depending on temperature, sample thickness and voltage applied revealed the presence of traps with concentration of about $(4-5){\times}10^{12}cm^{-3}$ with the corresponding energy level at 0.8 - 0.9 eV counted from the bottom of conduction band. The conductivity was determined by electron injection from electrodes in space charge limited current mode.

Surface Photovoltage in Electron Beam Irradiation Semi-insulating GaAs

  • Yu, Jae-In;Lim, Jin-Hwan;Yu, Jae-Yong;Kim, Ki-Hong
    • Journal of Electrical Engineering and Technology
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    • 제1권4호
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    • pp.543-545
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    • 2006
  • Surface photovoltage (SPV) measurements were performed to investigate the optic-electrical properties in the electron beam irradiation semi-insulating GaAs (e-beam irradiation SI-GaAs) and semi-insulating GaAs (SI-GaAs). The signal intensity showed stronge. dependency on the frequency in the SI-GaAs than it did in the e-beam irradiation SI-GaAs. This result indicates that the number of the generated photo-carriers depends on the surface state. Also, the B region of the e-beam irradiation SI-GaAs found a weak signal. This result was explained by the surface and internal damage with e-beam irradiation.

K-Band용 SEmi-MMIC Hair-pin 공진발진기 (A Semi-MMIC Hair-pin Resonator Oscillator for K-Band Application)

  • 이현태
    • 한국통신학회논문지
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    • 제25권9B호
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    • pp.1635-1640
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    • 2000
  • 본 논문에서는 기본파를 억제시키고 2차 고조파가 주 발진신호로 동작되는 18GHz 대역의 push-push 발진기를 semi-MMIC 형태로 설계 및 제작하였다. 마이크로스트립 선로를 포함하는 passive component는 semi-insulating GaAs 기판위에 MMIC 공정을 이용하여 구현하고, Chip 형태의 P-HEMT, 저항, 캐패시터를 Au wire-bonding에의해 연결하였으며, via-hole 대신 접지면을 회로 주변에 구성하여, back-side와 wire-bonding하였다. 실험 결과 -10.5 dBm의 출력 전력 특성을 얻었으며, 기본 주파수 억압은 -17.3 dBc/Hz의 특성을 보였다. 위상 잡음은 100kHz offset에서 -97.7 dBc/Hz를 얻었다.

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SI GaAs : Cr과 Undoped GaAs의 깊은 준위 (Deep Levels in Semi-Insulating GaAs : Cr and Undoped GaAs)

  • 이진구
    • 대한전자공학회논문지
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    • 제25권11호
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    • pp.1294-1303
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    • 1988
  • 광 유도 전류 천이 (photo-induced current transient)방법으로 측정한 SI GaAs의 전자와 정공 trap이 갖을 수 있는 activation energy({\Delta}E_r)의 범위는 0.16$\pm$ 0.01eV에서 0.98$\pm$ 0.01eV까지 분포되어 있다. SI Undoped GaAs가 SI GaAs : Cr 보다 깊은 준위의 수가 적음을 확인 하였다. Trap의 열적인 capture cross section과 농도를 평가 하였고, 약간의 trap은 SI GaAs 성장시에 발생될 수 있는 결함과 관련되어 있음을 확인하였다. 특히 SI GaAs에서 보상 level로 작용하는 Cr과 “0” level를 좀 더 정확하게 측정하기 위하여 서로 다른 측정방법을 사용하여 측정한 결과를 각기 비교 검토 하였다. 즉, PICT측정, 상온 이상의 온도에서 측정한 Hall data 및 광전류 spectra data 등을 비교 검토 하였으며, 보상 level은 격자 결합이 매우 약함을 확인할 수 있었다. Hall data를 computer로 분석한 결과 중성 불순물 scattering이 측정 온도 범위에서 매우 중요한 역할을 하고 있음을 알 수 있었다.

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송엽분과 질석을 포함한 준불연 단열복합보드의 개발 (Development of Semi-Incombustible Composite Insulating Board Containing Pine Leaf Powder and Vermiculite)

  • 정창헌;유석형
    • 한국화재소방학회논문지
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    • 제32권3호
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    • pp.27-34
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    • 2018
  • 본 연구는 송엽분과 질석을 주 원료로 하여 건축용 및 선박용으로 적용될 수 있는 준불연 단열복합보드를 개발하고 불연성능, 준불연성능, 보드 전체의 열관류율을 평가하였다. 가연성 물질인 송엽분과 유연바인더의 비율에 따라 보드의 화재저항성능이 결정되었으며, 가연물질이 불포함된 보드의 경우 불연성능을 확보하였다. 송엽분 6%를 첨가한 보드는 준불연 성능을 확보할 수 있었으며, 그 이상의 송엽분이 포함되거나 가연성의 바인더가 첨가될 경우 준불연 성능을 확보할 수 없는 것으로 나타났다. 또한, 글래스울과 폴리우레탄 뿜칠을 단열층으로 하고 개발된 불연/준불연 보드를 이용하여 1차 마감한 복합벽체는 200 mm 두께에서 국내법규 상의 건축물 단열기준을 상회하여 만족하는 것으로 나타났다.

PICTS 방법에 의한 급속열처리시킨 반절연성 InP(100)에서 깊은준위에 관한 연구 (A Study on Deep Levels in Rapid Thermal Annealed PICTS Semi-Insulating InP(100) by PICTS)

  • 김종수;김인수;이철욱;이정열;배인호
    • E2M - 전기 전자와 첨단 소재
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    • 제10권8호
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    • pp.800-806
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    • 1997
  • The behavior of de levels in rapid thermal annealed Fe-doped semi-insulating InP(100) was studied by photoinduced current transient spectrocopy(PICTS). In bulk InP, T2(Ec-0.24 eV), T3(Ec-0.30 eV) and T5(Ec-0.62 eV) traps were observed. After annealing the T2 trap was annihilated at 20$0^{\circ}C$ and recreated at 35$0^{\circ}C$. T3 trap was not affected below 40$0^{\circ}C$. With increasing temperature the concentration of T5 trap reduced and it was annihilated at 30$0^{\circ}C$. However the T1(Ec-0.16 eV) and T4(Ec-0.42 eV) traps were began to appear at 40$0^{\circ}C$and these concentrations were increased with annealing temperature. The T1 and T4 traps seem to be related to the isolated phosphorus vacancy( $V_{p}$) and $V_{p}$-indium antisite( $V_{p}$- $P_{in}$ ) or $V_{p}$-indium interstitial( $V_{p}$-I $n_{I}$) respectiely.respectiely.

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