Investigation of the residue formed on the silicon exposed to $C_4$ F$_8$ helicon wave plasmas
(고선택비 산화막 식각공정시 $C_4$ F$_8$ 헬리콘 웨이브 플라즈마에 노출된 실리콘 표면의 잔류막 관찰)
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- Journal of Surface Science and Engineering
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- v.32 no.2
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- pp.93-99
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- 1999