Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2001.05a
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- Pages.35-37
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- 2001
Employing of Metal Negative Ion in Halogen Plasmas
염소저온플라스마에서 금속음이온의 이용
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Choi, Young-Il
(Dept. of Electronics & Information, Chosun College of Science & Technology) ;
- Lee, Bong-Ju (Division of Physics and Chemistry, College of Nature Science, Chosun University) ;
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Lee, Kyung-Sub
(Division of Electrical and Electronics Engineering, College of Engineering, Dong-Shin University)
- Published : 2001.05.11
Abstract
The Al etching was studied employing negative ions generated in the downstream