• 제목/요약/키워드: Selective electrodeposition

검색결과 17건 처리시간 0.023초

레이저 마스킹과 직류전원을 이용한 선택적 전해도금의 재현성 개선 (Improvement of Reproducibility in Selective Electrodeposition Using Laser Masking and DC Voltage)

  • 신홍식
    • 한국생산제조학회지
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    • 제25권1호
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    • pp.36-41
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    • 2016
  • A method is proposed for the improvement of deposition reproducibility in the selective electrodeposition process using laser masking and DC voltage. Selective electrodeposition using laser masking and DC voltage can achieve a deposited layer with micro patterns. However, selective electrodeposition using laser masking and DC voltage have a critical problem: the lack of reproducibility in selective deposition. The reproducibility of selective electrodeposition can be improved by a new process that consists of laser masking, two-step electro-deposition, laser scribing, and ultrasonic cleaning. The experiments in this study show that the reproducibility of selective deposition can be successfully improved by the combination of two-step electrodeposition and laser scribing.

레이저 마스킹과 직류전원을 이용한 선택적 전해도금 (Selective Electrodeposition Using Laser Masking and DC Voltage)

  • 신홍식;김성룡
    • 한국생산제조학회지
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    • 제24권1호
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    • pp.75-80
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    • 2015
  • This paper proposes a selective electrodeposition process that uses laser masking and a DC voltage. Selective electrodeposition using laser masking and a DC voltage is more efficient than that using laser masking and a pulse voltage. In other words, electrodeposition with a DC voltage allows for precise selective deposition without the limitation of the deposition region. Also, a selective electrodeposition method that uses laser masking and DC voltage can reduce the electrodeposition time. The characteristics of a copper layer deposited by laser masking and DC voltage were examined under various conditions. A selective copper layer with various micro patterns of $2{\mu}m$ thickness was successfully fabricated.

레이저빔을 이용한 티타늄 표면에서의 선택적 구리 전해도금 (Selective Electrodeposition on Titanium Surface Using Laser Beam)

  • 신홍식
    • 한국생산제조학회지
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    • 제26권1호
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    • pp.44-49
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    • 2017
  • Titanium has been used in various fields due to its good corrosion and erosion resistance, and superior mechanical properties. The process for selective electro-deposition on a titanium surface using laser beam is proposed in this paper. The process consists of laser irradiation, electro-deposition, and ultrasonic cleaning. Laser irradiation can change the surface morphology of titanium. Through laser irradiation, the surface cleaning effect and a rough surface can be achieved. The surface roughness of titanium was measured according to the laser beam conditions. The characteristics of selective electro-deposition on titanium surface according to surface roughness are investigated by various analytical methods such as SEM, and EDS.

Electrodeposition of Some Selective Metals Belonging to Light, Refractory and Noble Metals from Ionic Liquid Electrolytes

  • Dilasari, Bonita;Kwon, Kyung-Jung;Lee, Churl-Kyoung;Kim, Han-Su
    • 전기화학회지
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    • 제15권3호
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    • pp.135-148
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    • 2012
  • Ionic liquids are steadily attracting interests throughout a recent decade and their application is expanding into various fields including electrochemistry due to their unique properties such as non-volatility, inflammability, low toxicity, good ionic conductivity, wide electrochemical potential window and so on. These features make ionic liquids become an alternative solution for electrodeposition of metals that cannot be electroplated in aqueous electrolytes. In this review, we classify investigated metals into three categories, which are light (Li, Mg), refractory (Ti, Ta) and noble (Pd, Pt, Au) metals, rather than covering the exhaustive list of metals and try to update the recent development in this area. In electrodeposition of light metals, granular fine Li particles were successfully obtained while the passivation of electrodeposited Mg layers is an obstacle to reversible deposition-dissolution process of Mg. In the case of refractory metals, the quality of Ta and Ti deposit particles was effectively improved with addition of LiF and pyrrole, respectively. In noble metal category, EMIM TFSA ionic liquid as an electrolyte for Au electrodeposition was proven to be effective and BMP TFSA ionic liquid developed a smooth Pd deposit. Pt nanoparticle production from ionic liquid droplet in aqueous solution can be cost-effective and display an excellent electrocatalytic activity.

선택적 금속 전착에 대한 전해질 온도 및 전류밀도 영향분석 (The Characteristics of Electrolyte Temperature and Current Density on Selective Jet Electrodeposition)

  • 박찬규;김성빈;김영국;유봉영
    • 한국표면공학회지
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    • 제51권6호
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    • pp.400-404
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    • 2018
  • A metal 3D printer has been developed on its own to electrodeposit the localized area. Nozzles were used to selectively laminate the electrolytic plating method. To analyze the factors affecting the deposition, the stack height, thickness and surface roughness were experimentally analyzed according to the current density and the temperature of the electrolyte. Electrolytic temperature and current are electrodeposited when the deposition conditions are dominant over the etching conditions, but the thickness is kept constant. On the contrary, when the etching conditions are dominant, the electrodeposited shape is rather the etched. As a result, the uniformity of surface quality and electrodeposition rate could be improved by conducting experiments under constant conditions of electrolyte temperature and current density.

Nanoscale Fluoropolymer Pattern Fabrication by Capillary Force Lithography for Selective Deposition of Copper

  • 백장미;이린;성명모
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.369-369
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    • 2012
  • The present work deals with selective deposition of copper on fluoropolymers patterned silicon (111) surfaces. The pattern of fluoropolymer was fabricated by nanoimprint lithography (NIL) and plasma reactive ion etching (RIE) was used to remove the residuals layers. Copper was electrochemically deposited in bare Si regions which were not covered with fluoropolymers. The patterns of fluoropolymers and copper have been investigated by scanning electron microscopy (SEM). In this work, we used two deposition methods. One is galvanic displacement method and another is electrodeposition. Selective deposition works in both cases and it shows applicability to other materials. By optimization of the deposition conditions can be achieved therefore this process represents a simple approach for a direct high resolution patterning of silicon surfaces.

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흑크롬 태양광 선택흡수막 제조용 도금액의 개발 및 전기화학적 고찰 (An Electrochemical Study on the New Black Chrome Bath Solution for the Electrodeposited Solar Selective Surface)

  • 이태규;조서현;최영희;오정무
    • 태양에너지
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    • 제10권1호
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    • pp.92-97
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    • 1990
  • 태양에너지 이용시스템 개발에 있어서 태양열을 효율적으로 이용하기 위한 태양광의 선택흡수막의 제조시 가장 중요한 것이 선택흡수막의 파장별 광학적 특성이다. 이러한 광학적 특성은 전기도금액의 조성에 따라 달라지고 전기도금 방법의 선택 및 도금조건에 따라 영향을 받게 된다. 본 연구에서는 미국에서 개발되고 가장 널리 사용되는 ChromOnyx 도금액을 근거로 새로이 Chromic acid-Propionic acid 흑크름 도금액을 제조하였으며 액을 구성하고 있는 성분별 전기화학적 역할을 고찰하였다. 실제 전기도금법에 의해 제작된 흑크름 선택 흡수막의 광학적특성에 관한 연구는 다시 상세히 다루어 발표할 예정이다.

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전기화학적 방법에 의한 산화아연 나노튜브의 합성과 형성 기구 (Synthesis and Formation Mechanism of ZnO Nanotubes via an Electrochemical Method)

  • 문진영;김형훈;이호성
    • 대한금속재료학회지
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    • 제49권5호
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    • pp.400-405
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    • 2011
  • ZnO nanotube arrays were synthesized by a two-step process: electrodeposition and selective dissolution. In the first step, ZnO nanorod arrays were grown on an Au/Si substrate by using a homemade electrodeposition system. ZnO nanorod arrays were then selectively dissolved in an etching solution composed of 0.125 M NaOH, resulting in hollow ZnO nanotube arrays. It is suggested that the formation mechanism of the ZnO nanotube arrays might be attributed to the preferred surface adsorption of hydroxide ion ($OH^{-1}$) on a positive polar surface followed by selective dissolution of the metastable Zn-terminated ZnO (0001) polar surface caused by the difference in the surface energy per unit area between the ZnO nanorod and nanotube.

구리 전해 도금을 이용한 실리콘 관통 비아 채움 공정 (Through-Silicon-Via Filling Process Using Cu Electrodeposition)

  • 김회철;김재정
    • Korean Chemical Engineering Research
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    • 제54권6호
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    • pp.723-733
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    • 2016
  • 반도체 배선 미세화에 의한 한계를 극복하기 위해 실리콘 관통 비아(through silicon via, TSV)를 사용한 소자의 3차원 적층에 대한 연구가 진행되고 있다. TSV 내부는 전해도금을 통해 구리로 채우며, 소자의 신뢰성을 확보하기 위해 결함 없는 TSV의 채움이 요구된다. TSV 입구와 벽면에서는 구리 전착을 억제하고, TSV 바닥에서 선택적으로 구리 전착을 유도하는 바닥 차오름을 통해 무결함 채움이 가능하다. 전해 도금액에 포함되는 유기 첨가제는 TSV 위치에 따라 국부적으로 구리 전착 속도를 결정하여 무결함 채움을 가능하게 한다. TSV의 채움 메커니즘은 첨가제의 거동에 기반하여 규명되므로 첨가제의 특성을 이해하는 연구가 선행되어야 한다. 본 총설에서는 첨가제의 작용기작을 바탕으로 하는 다양한 채움 메커니즘, TSV 채움 효율을 개선하기 위한 평탄제의 개발과 3-첨가제 시스템에서의 연구, 첨가제 작용기와 도금 방법의 수정을 통한 채움 특성의 향상에 관한 연구를 소개한다.

전기선 폭발법으로 제조된 Al-Cu 합금 나노분말을 이용한 다공성 나노 입자 제조 (Fabrication of Porous Nano Particles from Al-Cu Alloy Nano Powders Prepared by Electrical Wire Explosion)

  • 박제신;김원백;서창열;안종관;김병규
    • 한국분말재료학회지
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    • 제15권3호
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    • pp.234-238
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    • 2008
  • Al-Cu alloy nano powders have been produced by the electrical explosion of Cu-plated Al wire. The porous nano particles were prepared by leaching for Al-Cu alloy nano powders in 40wt% NaOH aqueous solution. The surface area of leached powder for 5 hours was 4 times larger than that of original alloy nano powder. It is demonstrated that porous nano particles could be obtained by selective leaching of alloy nano powder. It is expected that porous Cu nano powders can be applied for catalyst of SRM (steam reforming methanol).