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Selective Electrodeposition Using Laser Masking and DC Voltage

레이저 마스킹과 직류전원을 이용한 선택적 전해도금

  • Shin, Hong Shik (Department of Energy System Engineering, Korea National University of Transportation) ;
  • Kim, Sung Yong (Department of Energy System Engineering, Korea National University of Transportation)
  • Received : 2014.12.01
  • Accepted : 2015.01.05
  • Published : 2015.02.15

Abstract

This paper proposes a selective electrodeposition process that uses laser masking and a DC voltage. Selective electrodeposition using laser masking and a DC voltage is more efficient than that using laser masking and a pulse voltage. In other words, electrodeposition with a DC voltage allows for precise selective deposition without the limitation of the deposition region. Also, a selective electrodeposition method that uses laser masking and DC voltage can reduce the electrodeposition time. The characteristics of a copper layer deposited by laser masking and DC voltage were examined under various conditions. A selective copper layer with various micro patterns of $2{\mu}m$ thickness was successfully fabricated.

Keywords

References

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  1. 레이저 마스킹과 직류전원을 이용한 선택적 전해도금의 재현성 개선 vol.25, pp.1, 2015, https://doi.org/10.7735/ksmte.2016.25.1.36
  2. 레이저빔을 이용한 티타늄 표면에서의 선택적 구리 전해도금 vol.26, pp.1, 2015, https://doi.org/10.7735/ksmte.2017.26.1.44