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Study of Selective Etching of GaAs over AlGaAs and InGaP Semiconductors in High Density Planar Inductively Coupled BCl3/SF6 Plasmas (고밀도 평판형 유도결합 BCl3/SF6 플라즈마를 이용한 GaAs/AlGaAs와 InGaP 반도체의 선택적 식각에 관한 연구)

  • Yoo Seungryul;Ryu Hyunwoo;Lim Wantae;Lee Jewon;Cho Guan Sik;Jeon Minhyon;Song Hanjung;Lee BongJu;Ko Jong Soo;Go Jeung Sang;Pearton S. J.
    • Korean Journal of Materials Research
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    • v.15 no.3
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    • pp.161-165
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    • 2005
  • We investigated selective dry etching of GaAs over AlGaAs and InGaP in high density planar inductively coupled $BCl_3/SF_6$ plasmas. The process parameters were ICP source power (0-500 W), RE chuck power (0-30W) and gas composition $(60-100\%\;BCl_3\;in\;BCl_3/SF_6)$. The process results were characterized in terms of etch rate, selectivities of GaAs over AlGaAs and InGaP, surface morphology, surface roughness and residues after etching. $BCl_3/SF_6$ selective etching of GaAs showed quite good results in this study. Selectivities of GaAs $(GaAs:AlGaAs\~36:1,\;GaAs:InGaP\~45:1)$ were superior at $18BCl_3/2SF_6$, 20 W RF chuck power, 300 W ICP source power and 7.5 mTorr. Addition of $(5-15\%)SF_6\;to\;BCl_3$ produced relatively high selectivities of GaAs over AlGaAs and InGaP during etching due to decrease of etch rates of AlGaAs and InGaP (boiling points of etch products: $AlF_3\~1300^{\circ}C,\;InF_3>1200^{\circ}C$ at atmosphere) at the condition. SEM and AFM data showed slightly sloped sidewall and somewhat rough surface$(RMS\~9nm)$. XPS study on the surface of processed GaAs proved a very clean surface after dry etching. It shows that planar inductively coupled $BCl_3/SF_6$ plasmas could be a good candidate for selective dry etching of GaAs over AlGaAs and InGaP.

Application of CMP Process to Improving Thickness-Uniformity of Sputtering-deposited CdTe Thin Film for Improvement of Optical Properties (스퍼터링 증확 CdTe 박막의 두께 불균일 현상 개선을 위한 화학적기계적연마 공정 적용 및 광특성 향상)

  • Park, Ju-Sun;Lim, Chae-Hyun;Ryu, Seung-Han;Myung, Kuk-Do;Kim, Nam-Hoon;Lee, Woo-Sun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2010.06a
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    • pp.375-375
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    • 2010
  • CdTe as an absorber material is widely used in thin film solar cells with the heterostructure due to its almost ideal band gap energy of 1.45 eV, high photovoltaic conversion efficiency, low cost and stable performance. The deposition methods and preparation conditions for the fabrication of CdTe are very important for the achievement of high solar cell conversion efficiency. There are some rearranged reports about the deposition methods available for the preparation of CdTe thin films such as close spaced sublimation (CSS), physical vapor deposition (PVD), vacuum evaporation, vapor transport deposition (VTD), closed space vapor transport, electrodeposition, screen printing, spray pyrolysis, metalorganic chemical vapor deposition (MOCVD), and RF sputtering. The RF sputtering method for the preparation of CdTe thin films has important advantages in that the thin films can be prepared at low growth temperatures with large-area deposition suitable for mass-production. The authors reported that the optical and electrical properties of CdTe thin film were closely connected by the thickness-uniformity of the film in the previous study [1], which means that the better optical absorbance and the higher carrier concentration could be obtained in the better condition of thickness-uniformity for CdTe thin film. The thickness-uniformity could be controlled and improved by the some process parameters such as vacuum level and RF power in the sputtering process of CdTe thin films. However, there is a limitation to improve the thickness-uniformity only in the preparation process [1]. So it is necessary to introduce the external or additional method for improving the thickness-uniformity of CdTe thin film because the cell size of thin film solar cell will be enlarged. Therefore, the authors firstly applied the chemical mechanical polishing (CMP) process to improving the thickness-uniformity of CdTe thin films with a G&P POLI-450 CMP polisher [2]. CMP process is the most important process in semiconductor manufacturing processes in order to planarize the surface of the wafer even over 300 mm and to form the copper interconnects with damascene process. Some important CMP characteristics for CdTe were obtained including removal rate (RR), WIWNU%, RMS roughness, and peak-to-valley roughness [2]. With these important results, the CMP process for CdTe thin films was performed to improve the thickness-uniformity of the sputtering-deposited CdTe thin film which had the worst two thickness-uniformities of them. Some optical properties including optical transmittance and absorbance of the CdTe thin films were measured by using a UV-Visible spectrophotometer (Varian Techtron, Cary500scan) in the range of 400 - 800 nm. After CMP process, the thickness-uniformities became better than that of the best condition in the previous sputtering process of CdTe thin films. Consequently, the optical properties were directly affected by the thickness-uniformity of CdTe thin film. The absorbance of CdTe thin films was improved although the thickness of CdTe thin film was not changed.

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Usefulness of Registration in the Evaluation of Parkinson′s Disease (영상 융합하여 분석한 파킨슨씨병 환자영상의 유용성)

  • 주라형;김재승;문대혁;최보영;서태석
    • Progress in Medical Physics
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    • v.14 no.4
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    • pp.268-278
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    • 2003
  • Purpose:The aim of this study was to evaluate the striatal binding ratio, the anterior/posterior ratio and reproducibility using a template based registration method using the standard MR template as a replacement for each patients MR image. Materials and Methods:This study analyzed the 123I IPT SPECT images of 30 patients with IPD, who were subdivided into 17 patients (56.6$\pm$10.8 yr, M/F : 8/9.) with mild IPD, and 13 patients (56.4$\pm$11.1 yr, M/F : 8/5) with severe IPD. In addition, 11 normal controls (57.8$\pm$14.4 yr, M/F : 4/7) were also analyzed. The ROIs were positioned manually in the same slice showing the highest striatal activity using the traditional manual method, whereas those were positioned automatically in a mid striatal slice of the SPECT image coregistered to the standard T1 weighted MR template. Results : The specific binding ratio (SBR) obtained using the template based registration method strongly correlated with those using the manual method in all groups : normal controls (r=0.85, P<0.001), mild IPD (r=0.84, P<0.001) and severe IPD (r=0.7, P=0.01). The SBRs obtained using both methods were significantly different among the three groups (P=0.05) and the SBRs obtained by the template based registration method were higher than those by the manual method (P=0.05) in all three groups. The APRs obtained by the template based registration correlated with those using manual method in only mild IPD (r=0.72, P=0.0). The APRs obtained by the template based registration method were significantly different from the normal controls and those with mild or severe IPD (P<0.05), whereas those obtained using the manual method were not significantly different among the three groups (P>0.1). The reproducibility (rmsCV) of the template based registration method was 7.2% (normal controls:5.2%, mild IPD:4.2%, severe IPD:10.8%), whereas the reproducibility of the manual method was 31% (normal controls:19.7%, mild IPD:21.7%, severe IPD:46.2%). Conclusion:These results show that the use of $^{123}$ I-IPT SPECT for assessing IPD is affected by the methods used to position the striatal ROI. The template based registration method using the standard MR template can be useful in diagnosing IPD and assessing the disease severity with a high reproducibility. Therefore, the template based registration method appears to be a good replacement for the manual method.

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Reproducibility of Gated Myocardial Perfusion SPECT for the Assessment of Myocardial Function: Comparison with Thallium-201 and Technetium-99m-MIBI (심근 기능 측정에 사용된 게이트 심근 관류 SPECT 방법의 재현성 평가: $^{201}Tl$$^{99m}Tc$-MIBI 게이트 SPECT의 비교)

  • Hyun, In-Young;Seo, Jeong-Kee;Hong, Eui-Soo;Kim, Dae-Hyuk;Kim, Sung-Eun;Kwan, Jun;Park, Keum-Soo;Choe, Won-Sick;Lee, Woo-Hyung
    • The Korean Journal of Nuclear Medicine
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    • v.34 no.5
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    • pp.381-392
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    • 2000
  • Purpose: We compared the reproducibility of $^{201}Tl\;and\;^{99m}Tc$-sestamibi (MIBI) gated SPECT measurement of myocardial function using the Germano algorithm Materials and Methods: Gated SPECT acquisition was repeated in the same position in 30 patients who received $^{201}Tl$ and in 26 who received $^{99m}Tc$-MIBI. The quantification of end-diastolic volume (EDV), end-systolic volume (ESV), and ejection fraction (EF) on $^{201}Tl\;and\;^{99m}Tc$-MIBI gated SPECT was processed independently using Cedars quantitative gated SPECT software. The reproducibility of the assessment of myocardial function on $^{201}Tl$ gated SPECT was compared with that of $^{99m}Tc$-MIBI gated SPECT Results: Correlation between the two measurements for volumes and EF was excellent by the repeated gated SPECT studies of $^{201}Tl$ (r=0.928 to 0.986; p<0.05) and $^{99m}Tc$-MIBI (r=0.979 to 0.997; p<0.05). However, Bland Altman analysis revealed the 95% limits of agreement (2 SD) for volumes and EF were tighter by repeated $^{99m}Tc$-MIBI gated SPECT (EDV: 14.1 ml, ESV: 9.4 ml and EF: 5.5%) than by repeated $^{201}Tl$ gated SPECT (EDV: 24.1 ml, ESV: 18.6 ml and EF: 10.3%). The root mean square (RMS) values of the coefficient of variation (CV) for volumes und EFs were smaller by repeated $^{99m}Tc$-MIBI gated SPECT (EDV: 2.1 ml, ESV 2.7 ml and EF: 2.3%) than by repeated $^{201}Tl$ gated SPECT (EDV: 3.2 ml, ESV: 3.5 ml and EF: 5.2%). Conclusion: $^{99m}Tc$-MIBI provides more reproducible volumes and EF than $^{201}Tl$ on repeated acquisition gated SPECT. $^{99m}Tc$-MIBI gated SPECT is the preferable method for the clinical monitoring of myocardial function.

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Fabrication and Characteristics of Zinc Oxide- and Gallium doped Zinc Oxide thin film transistor using Radio Frequency Magnetron sputtering at Room Temperature (Zinc Oxide와 갈륨이 도핑 된 Zinc Oxide를 이용하여 Radio Frequency Magnetron Sputtering 방법에 의해 상온에서 제작된 박막 트랜지스터의 특성 평가)

  • Jeon, Hoon-Ha;Verma, Ved Prakash;Noh, Kyoung-Seok;Kim, Do-Hyun;Choi, Won-Bong;Jeon, Min-Hyon
    • Journal of the Korean Vacuum Society
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    • v.16 no.5
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    • pp.359-365
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    • 2007
  • In this paper we present a bottom-gate type of zinc oxide (ZnO) and Gallium (Ga) doped zinc oxide (GZO) based thin film transistors (TFTs) through applying a radio frequency (RF) magnetron sputtering method at room temperature. The gate leakage current can be reduced up to several ph by applying $SiO_2$ thermally grown instead of using new gate oxide materials. The root mean square (RMS) values of the ZnO and GZO film surface were measured as 1.07 nm and 1.65 nm, respectively. Also, the transmittances of the ZnO and GZO film were more than 80% and 75%, respectively, and they were changed as their film thickness. The ZnO and GZO film had a wurtzite structure that was arranged well as a (002) orientation. The ZnO TFT had a threshold voltage of 2.5 V, a field effect mobility of $0.027\;cm^2/(V{\cdot}s)$, a on/off ratio of $10^4$, a gate voltage swing of 17 V/decade and it operated in a enhancement mode. In case of the GZO TFT, it operated in a depletion mode with a threshold voltage of -3.4 V, a field effect mobility of $0.023\;cm^2/(V{\cdot}s)$, a on/off ratio of $2{\times}10^4$ and a gate voltage swing of 3.3 V/decade. We successfully demonstrated that the TFTs with the enhancement and depletion mode type can be fabricated by using pure ZnO and 1wt% Ga-doped ZnO.

Agroclimatology of North Korea for Paddy Rice Cultivation: Preliminary Results from a Simulation Experiment (생육모의에 의한 북한지방 시ㆍ군별 벼 재배기후 예비분석)

  • Yun Jin-Il;Lee Kwang-Hoe
    • Korean Journal of Agricultural and Forest Meteorology
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    • v.2 no.2
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    • pp.47-61
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    • 2000
  • Agroclimatic zoning was done for paddy rice culture in North Korea based on a simulation experiment. Daily weather data for the experiment were generated by 3 steps consisting of spatial interpolation based on topoclimatological relationships, zonal summarization of grid cell values, and conversion of monthly climate data to daily weather data. Regression models for monthly climatological temperature estimation were derived from a statistical procedure using monthly averages of 51 standard weather stations in South and North Korea (1981-1994) and their spatial variables such as latitude, altitude, distance from the coast, sloping angle, and aspect-dependent field of view (openness). Selected models (0.4 to 1.6$^{\circ}C$ RMSE) were applied to the generation of monthly temperature surface over the entire North Korean territory on 1 km$\times$l km grid spacing. Monthly precipitation data were prepared by a procedure described in Yun (2000). Solar radiation data for 27 North Korean stations were reproduced by applying a relationship found in South Korea ([Solar Radiation, MJ m$^{-2}$ day$^{-1}$ ] =0.344 + 0.4756 [Extraterrestrial Solar Irradiance) + 0.0299 [Openness toward south, 0 - 255) - 1.307 [Cloud amount, 0 - 10) - 0.01 [Relative humidity, %), $r^2$=0.92, RMSE = 0.95 ). Monthly solar irradiance data of 27 points calculated from the reproduced data set were converted to 1 km$\times$1 km grid data by inverse distance weighted interpolation. The grid cell values of monthly temperature, solar radiation, and precipitation were summed up to represent corresponding county, which will serve as a land unit for the growth simulation. Finally, we randomly generated daily maximum and minimum temperature, solar irradiance and precipitation data for 30 years from the monthly climatic data for each county based on a statistical method suggested by Pickering et a1. (1994). CERES-rice, a rice growth simulation model, was tuned to accommodate agronomic characteristics of major North Korean cultivars based on observed phenological and yield data at two sites in South Korea during 1995~1998. Daily weather data were fed into the model to simulate the crop status at 183 counties in North Korea for 30 years. Results were analyzed with respect to spatial and temporal variation in yield and maturity, and used to score the suitability of the county for paddy rice culture.

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Effect of Substrata Surface Energy on Light Scattering of a Low Loss Mirror (기판의 표면에너지가 반사경의 산란에 미치는 영향)

  • Lee, Beom-Sik;Yu, Yeon-Serk;Lee, Jae-Cheul;Hur, Deog-Jae;Cho, Hyun-Ju
    • Korean Journal of Optics and Photonics
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    • v.18 no.6
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    • pp.452-460
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    • 2007
  • Ultra-low loss ZERODUR and fused silica mirrors were manufactured and their light scattering characteristics were investigated. For this purpose, ZERODUR and fused silica substrates were super-polished by the bowl feed method. The surface roughness were 0.292 ${\AA}$ and 0.326 ${\AA}$ in rms for ZERODUR and fused silica, respectively. To obtain the high reflectivity, 22 thin film layers of $SiO_2$ and $Ta_2O_5$ were deposited by Ion Beam Sputtering. The measured light scattering of ZERODUR and fused silica mirror were 30.9 ppm and 4.6 ppm, respectively. This shows that the substrate surface roughness is not the only parameter which determines the light scattering of the mirror. In order to investigate the mechanism for additional light scattering of the ZERODUR mirror, the surface roughness of the mirror was measured by AFM and was found to be 2.3 times higher than that of the fused silica mirror. It is believed that there is some mismatch at the interface between the substrate and the first thin film layer which leads to the increased mirror surface roughness. To clarify this, the contact angle measurements were performed by SEO 300A, based on the Giriflaco-Good-Fowkes-Young method. The fused silica substrates with 0.46 ${\AA}$ in its physical surface roughness shows lower contact angle than that of the ZERODUR substrate with 0.31 ${\AA}$. This indicates that the thin film surface roughness is determined by not only its surface roughness but also the surface energy of the substrate, which depends on the chemical composition or crystalline orientation of the materials. The surface energy of each substrate was calculated from a contact angle measurement, and it shows that the higher the surface energy of the substrate, the better the surface roughness of the thin film.

Change of Spherical Aberration with Aspheric Soft Contact Lens Wear (비구면 소프트콘택트렌즈 착용에 의한 눈의 구면수차 변화)

  • Kim, Jeong Mee;Mun, Mi-Young;Kim, Young Chul;Lee, Koon-Ja
    • Journal of Korean Ophthalmic Optics Society
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    • v.17 no.4
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    • pp.365-372
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    • 2012
  • Purpose: To investigate ocular higher order aberrations (HOA) and spherical aberration changes caused by an aspheric soft contact lens designed to reduce spherical aberration (SA) of the eye. Methods: Fifty subjects who have successfully experienced soft contact lenses were refitted with aspheric design (Soflens Daily Disposable: SDD, Bausch+Lomb) soft contact lens. Ocular higher order aberrations (HOA) and stand alone SA were measured and analyzed for a 4-mm pupil size using Wave-Scan Wavefront$^{TM}$ aberrometer (VISX, Santa Clara, CA, USA). High and low contrast log MAR visual acuity and contrast sensitivity function (CSF) were also measured under photopic and mesopic conditions (OPTEC 6500 Vision Tester$^{(R)}$). All measurements were conducted monocularly with an undilated pupil. Results: The RMS mean values for total HOA with SDD contact lenses were significantly lower than those at with unaided eyes (p<0.001) and a reduction for SA in the SDD was close to the baseline SA (zero ${\mu}m$) (p<0.001). For the SDD lens, there was a statistically significant correlation between the changes in the total HOA and the contact lens power (r=0.237, p=0.018) as well as between the changes in SA and the lens power (r=0.324, p=0.001). High contrast visual acuity (HCVA) and low contrast visual acuity (LCVA) with SDD lenses were $-0.063{\pm}0.062$ and $0.119{\pm}0.060$, respectively under photopic and $-0.003{\pm}0.063$ and $0.198{\pm}0.067$, respectively under mesopic condition. Contrast Sensitivity Function (CSF) with SDD lenses under both photopic and mesopic conditions was $3.095{\pm}0.068$ and $3.087{\pm}0.074$, respectively. Conclusions: The SDD contact lens designed to control SA reduced the total ocular HOA and SA of the eye, resulting in compensating for positive SA of the eyes. Thus, the optical benefits of the lens with SA control would be adopted for improving the quality of vision.

Effects of 1 keV $Ar^+$ ion irradiation on Au films on glass (1 keV $Ar^+$ 이온의 조사가 유리기판위의 금 박막의 미치는 영향)

  • Jang, H. G.;Kim, H. S.;Han, S.;Choi, W. K.;Koh, S. K.;Jung, H. J.
    • Journal of the Korean Vacuum Society
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    • v.5 no.4
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    • pp.371-376
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    • 1996
  • Au films with a thickness around 1600 $\AA$ were deposited onto glass at room temperature by ion beam sputtering with a 5 cm cold-hollow ion gun at pressure $1\times 10^{-6}-1\times 10^{-5}$ Torr. Irradiation of the Au deposited samples was carried out at pressure of $7\times 10^{-6}$ Torr. For the sputter depositions, $Ar^+$ ion energy was 1 keV, and the current density at the substrate surface was 15 $\mu$A/$\textrm{cm}^2$. Effects of 1 keV $Ar^+$ ion dose($I_d$) between $1\times 10^{16}\; and\;2\times 10^{17}\;Ar^+\textrm{cm}^{-2}$on properties such as crystallinity, surface roughness and adhesion, etc. of the films have been investigated. The Au films sputtered by $Ar^+$ ion beam had only (111) plane and the X-ray intensity of the films decreased with increase of $I_d$. The thickness of Au films reduced with Id. $R_{ms}$ surface roughness of the films increased from 16 $\AA$ at as-deposited to 1118 $\AA$ at ion dose= $2\times 10^{17}\;Ar^+\textrm{cm}^{-2}$. Adhesion of Au film on sputtered at $I_d$= $2\times 10^{17}\;Ar^+\textrm{cm}^{-2}$ was 9 times greater than that of Au film with untreated, as determined by a scratch test.

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Enhanced Device Performance of IZO-based oxide-TFTs with Co-sputtered $HfO_2-Al_2O_3$ Gate Dielectrics (Co-sputtered $HfO_2-Al_2O_3$을 게이트 절연막으로 적용한 IZO 기반 Oxide-TFT 소자의 성능 향상)

  • Son, Hee-Geon;Yang, Jung-Il;Cho, Dong-Kyu;Woo, Sang-Hyun;Lee, Dong-Hee;Yi, Moon-Suk
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.48 no.6
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    • pp.1-6
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    • 2011
  • A transparent oxide thin film transistors (Transparent Oxide-TFT) have been fabricated by RF magnetron sputtering at room temperature using amorphous indium zinc oxide (a-IZO) as both of active channel and source/drain, gate electrodes and co-sputtered $HfO_2-Al_2O_3$ (HfAIO) as gate dielectric. In spite of its high dielectric constant > 20), $HfO_2$ has some drawbacks including high leakage current and rough surface morphologies originated from small energy band gap (5.31eV) and microcrystalline structure. In this work, the incorporation of $Al_2O_3$ into $HfO_2$ was obtained by co-sputtering of $HfO_2$ and $Al_2O_3$ without any intentional substrate heating and its structural and electrical properties were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and spectroscopic ellipsometer (SE) analyses. The XRD studies confirmed that the microcrystalline structures of $HfO_2$ were transformed to amorphous structures of HfAIO. By AFM analysis, HfAIO films (0.490nm) were considerably smoother than $HfO_2$ films (2.979nm) due to their amorphous structure. The energy band gap ($E_g$) deduced by spectroscopic ellipsometer was increased from 5.17eV ($HfO_2$) to 5.42eV (HfAIO). The electrical performances of TFTs which are made of well-controlled active/electrode IZO materials and co-sputtered HfAIO dielectric material, exhibited a field effect mobility of more than $10cm^2/V{\cdot}s$, a threshold voltage of ~2 V, an $I_{on/off}$ ratio of > $10^5$, and a max on-current of > 2 mA.