• Title/Summary/Keyword: Rinsing process

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Optimum process conditions for supercritical fluid and co-solvents process for the etching, rinsing and drying of MEMS-wafers (초임계 유체와 공용매를 이용한 미세전자기계시스템 웨이퍼의 식각, 세정을 위한 최적공정조건)

  • Noh, Seong Rae;You, Seong-sik
    • Journal of the Semiconductor & Display Technology
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    • v.16 no.3
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    • pp.41-46
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    • 2017
  • This study aims to select suitable co-solvents and to obtain optimal process conditions in order to improve process efficiency and productivity through experimental results obtained under various experimental conditions for the etching and rinsing process using liquid carbon dioxide and supercritical carbon dioxide. Acetone was confirmed to be effective through basic experiments and used as the etching solution for MEMS-wafer etching in this study. In the case of using liquid carbon dioxide as the solvent and acetone as the etching solution, these two components were not mixed well and showed a phase separation. Liquid carbon dioxide in the lower layer interfered with contact between acetone and Mems-wafer during etching, and the results after rinsing and drying were not good. Based on the results obtained under various experimental conditions, the optimum process for treating MEMS-wafer using supercritical CO2 as the solvent, acetone as the etching solution, and methanol as the rinsing solution was set up, and MEMS-wafer without stiction can be obtained by continuous etching, rinsing and drying process. In addition, the amount of the etching solution (acetone) and the cleaning liquid (methanol) compared to the initial experimental values can be greatly reduced through optimization of process conditions.

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A Study on the Adsorption of Anionic Surfactant by Various Textile Fibers and Rinsing Efficiency in Washing Process (세척시 섬유의 음이온계 계면활성제 흡착과 헹구기 효과에 관한 연구)

  • Park, Son Kyeong;Kim, Sung Reon
    • Journal of the Korean Society of Clothing and Textiles
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    • v.17 no.1
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    • pp.129-136
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    • 1993
  • Authors have studied the adsorption of anionic surfactant from detergent solutions on cotton fabric during washing process and have measured the concentration of the residual surfactant in rinsing solution. The relations with temperature and pre-soaking time to rinsing process have been studied. The adsorption of sodium dodecylbenzene sulfonate by various textile fibers has also been investigated. The results of this study are; 1. Three times rinsing is sufficient as, without pre-soaking, the concentration of the surfactant on fabric is stable from that time on. 2. The rinsing efficiency increases with temperature; at $25^{\circ}C$, $40^{\circ}C$, and $55^{\circ}C$, the concentrations of surfactant on the fabric after-rinsing are 68, 59, 51 mg/100 g of fiber respectively. 3. The longer the pre-soaking time, the lower the rinsing efficiency is; the 4hrs presoaked fabric shows increased surfactant concentration than the one without-soaking. And the increment is 35.8%. 4. The adsorption of sodium dodecylbenzene sulfonate on fabrics differs greatly with the chemical nature of the fiber; wool, silk and nylon which are thought to be ionic-adsorbants shows greater adsorption. 5. The adsorption of surfactant is more affected by the ionic character than the physical one, and the one with higher crystallinity such as cotton and polyester shows lower value than rayon or acetate.

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Synthesis and optical properties of ZnO thin films prepared by SILAR method with ethylene glycol

  • Lee, Pay-Yu;Chang, Sheng-Po;Chang, Shoou-Jinn
    • Advances in nano research
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    • v.1 no.2
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    • pp.93-103
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    • 2013
  • An ultrasonic-mediated assisted stepwise method has been developed for depositing transparent ZnO films from aqueous solution. Rinsing in low ethylene glycol temperature was easy to produce intermediate phase of $Zn(OH)_2$, rinsing in $120^{\circ}C$ ethylene glycol was observed the diffraction peak of intermediate $Zn(OH)_2$ in early report, the rinsing temperature plays an important role in the process of $Zn(OH)_2$ phase transformed to ZnO, high rinsing temperature actually improved the intermediate phase. However, the effect of rinsing on the intermediate phase is yet to be understood clearly. The effect of different rinsing procedures, involving either of or a combination of successive ionic layer adsorption and reaction (SILAR) and ultrasonic-assisted rinsing, prior to hydrolysis in ethylene glycol was found to improve the occurrence $Zn(OH)_2$ in ZnO thin films. In the zinc complex ($[Zn(NH_3)_4]^{2+}$) solution, excess ($[Zn(NH_3)_4]^{2+}$) absorbed in glass substrate transformed incompletely to ZnO and exist as $Zn(OH)_2$ phase in thin films. In films deposited at low temperature, rinsing procedure is applied to improve excess $Zn(OH)_2$ and obtain smoother transparent thin films.

Effects of DI Rinse and Oxide HF Wet Etch Processes on Silicon Substrate During Photolithography (반도체 노광 공정의 DI 세정과 Oxide의 HF 식각 과정이 실리콘 표면에 미치는 영향)

  • Baik, Jeong-Heon;Choi, Sun-Gyu;Park, Hyung-Ho
    • Korean Journal of Materials Research
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    • v.20 no.8
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    • pp.423-428
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    • 2010
  • This study shows the effects of deionized (DI) rinse and oxide HF wet etch processes on silicon substrate during a photolithography process. We found a fail at the wafer center after DI rinse step, called Si pits, during the fabrication of a complementary metal-oxide-semiconductor (CMOS) device. We tried to find out the mechanism of the Si pits by using the silicon wafer on CMOS fabrication and analyzing the effects of the friction charge induced by the DI rinsing. The key parameters of this experiment were revolution per minute (rpm) and time. An incubation time of above 10 sec was observed for the formation of Si pits and the rinsing time was more effective than rpm on the formation of the Si pits. The formation mechanism of the Si pits and optimized rinsing process parameters were investigated by measuring the charging level using a plasma density monitor. The DI rinse could affect the oxide substrate by a friction charging phenomenon on the photolithography process. Si pits were found to be formed on the micro structural defective site on the Si substrate under acceleration by developed and accumulated charges during DI rinsing. The optimum process conditions of DI rinse time and rpm could be established through a systematic study of various rinsing conditions.

A Study on Rinsing Effects of Sn Sensitization and Pd Activation Processes for Uniform Electroless Plating (무전해 도금에서 Sn 민감화와 Pd 활성화 공정의 세척 효과에 대한 연구)

  • Seong-Jae, Jeong;Mi-Se, Chang;Jae-Won, Jeong;Sang-Sun, Yang;Young-Tae, Kwon
    • Journal of Powder Materials
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    • v.29 no.6
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    • pp.511-516
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    • 2022
  • Electroless plating is widely utilized in engineering for the metallization of insulator substrates, including polymers, glass, and ceramics, without the need for the application of external potential. Homogeneous nucleation of metals requires the presence of Sn-Pd catalysts, which significantly reduce the activation energy of deposition. Therefore, rinsing conducted during Sn sensitization and Pd activation is a key variable for the formation of a uniform seed layer without the lack or excess of catalysts. Herein, we report the optimized rinsing process for the functionalization of Sn-Pd catalysts, which enables the uniform FeCo metallization of the glass fibers. Rinsing enables good deposition of the FeCo alloy because of the removal of excess catalysts from the glass fiber. Concurrently, excessive rinsing results in a complete removal of the Sn-Pd nucleus. Collectively, the comprehensive study of the proposed nanomaterial preparation and surface science show that the metallization of insulators is a promising technology for electronics, solar cells, catalysts, and mechanical parts.

A Study on the Rinsing Control Method in the Gilding Process (도금공정에서의 세척수 제어기법에 관한 연구)

  • Kim Ki Joon
    • Journal of Korea Society of Industrial Information Systems
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    • v.9 no.4
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    • pp.8-15
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    • 2004
  • Gilding process make thin membrane with other metals to surface of metal and metalloid. It control the hydrogen ion and oxalic acid density with rinsing work since the process used to acid and alkali. Therefore, in this study, several control method applied the gilding process. It desired to the optimal controller and their results can be save on water resource by useful feed of rinsing. And there is quite a possibility of uniform production due to fixed control of acid and alkali. Also it can be contributed the competition power because of lower production unit cost. Especially, this control method to be developed can be applied to any process without mathematical model. And it can be changed their algorithm more easily, if control object is changed.

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A study of Improvement on Washing and Rinsing Efficiency - Effect of the dissolution of detergent on washing and rinsing efficiency - (세탁 및 헹굼성능 향상 방안 연구 - 세제의 용해가 세탁 및 헹굼 성능에 미치는 영향 -)

  • 이옥기;표상연
    • Journal of the Korean Society of Clothing and Textiles
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    • v.18 no.1
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    • pp.23-30
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    • 1994
  • The objective of this study was to analyze the effect of the dissolution of detergent on washing and rinsing efficiency, and the possibility of saving detergent in washing. Washing and rinsing efficiency were reviewed in three different ways : A method was to input dissolved detergent by the use of rapid detergent dissolution instrument, B method was to input dissolved detergent beforehand, and C method was to input undissolved detergent. The results were as follows 1. A method > B method > C method was shown in detergency with washing time and three method's gaps were reduced because detergent dissolution effect was reduced by mechanical action in proportion of washing time. Especially, according to detergency of A method of 0.07% and C method of 0.1% was appeared approximately, saving detergent was expected by rapid dissolution of detergent. 2. A method > B method > C method was shown in detergency with washing temperature. As the washing temperature rose, the detergent reached chemically more activated state and become easily soluble. It resulted for the detergent to penetrate and adhere to laundry easily. 3. A method > B method > C method was shown in detergency with detergent concentration and C method was more sensitive than A, B method against change of detergent cocentration. Rapid detergent dissolution made it possible not only to enhance the washing efficiency but also to save the detergent because detergency of A method in low concentration is higher than that of C method. 4. A method $\geq$ B method > C method was shown in rinsing ratio with detergent input method. It indicated input dissolved detergent was advantageous in rinsing. 5. The result of anion surfactant concentration test of each process with detergent input method was shown like that A method In B method > C method in washing and reverse result was shown in rinsing. The anion surfactant concentration of C method was low during washing but high during rinsing. This was identical with previous results which shown the washing and rinsing efficiency improved with dissolved detergent usasge. 6. C method > B method > A method was shown in the degree of remaining detergent after rinsing. There was no remaining detergent after second rinsing in A and B method, but in C method four rinsings were required for the same result. Consequently, in A and B methods, less water and electricity were used, and less abrasion of cloth.

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Rinsing Water Reduction in the Food (Kimchi) Industry (식품(김치)산업에서 세척수 사용량 절감에 관한 연구)

  • Yi, Hosang;Hyoung, Hoon;Choo, Kwang-Ho;Lee, Chung-Hak
    • Clean Technology
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    • v.5 no.1
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    • pp.78-85
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    • 1999
  • In the Kimchi manufacturing industry that has recently been on its greatest growth, the rinsing process for salt-pickled Chinese cabbage in a brining step generates a vast amount of rinsing wastewater containing salts, colloids, and organics released from the raw material. In this study, the experimental method was developed to optimize the rinsing water consumption and thus to minimize the rinsing wastewater generation. The continuous counter-current rinsing basin in the actual plant was simulated through the lab-scale three batch-wise rinsing tanks. Rinsing efficiencies for the brined cabbage from the same brining tank were almost in the same level, whereas those varied substantially from source to source in the raw Chinese cabbage provided. When rinsing water used were decreased from 3.3 L/head to 2.7 L/head, no significant change was observed with respect to COD, turbidity, conductivity, $Na^+$, and $Cl^-$ concentrations in the extracted solution of the rinsed cabbage. However, the quality of the extracted solution was badly deteriorated as the amount of rinsing water used dropped down to below 2.7 L/head. The reduction of rinsing water up to 18% was proved to be possible without any negative effect on the quality of the product, Kimchi.

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Antibacterial and Rinsing Activities Against Potentially Harmful Bacteria in Rice during Rice Flour Production (쌀가루 제분용 백미 내 잠재적 위해 세균에 대한 살균 및 세척 효과)

  • Han, Jae-Kwang;Cha, Min-Hee;Kim, Min-Ju;Kim, Keun-Sung
    • Journal of Food Hygiene and Safety
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    • v.29 no.2
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    • pp.117-122
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    • 2014
  • Rice can be the contaminating with soil-borne bacteria. Furthermore, the contaminated bacteria can be grown during immersion process for produce wet-milled rice flour. Therefore, disinfectants can be added during the immersion process. Antibacterial activities of the natural disinfectant, fermented rice spent water (FRSW), and the chemical disinfectants, chlorine dioxide (CD) and sodium benzoate (SB), were respectively determined when added in pure cultures of target bacteria such as Salmonella typhimurium, Escherichia coli, and Bacillus cereus or when added to immersion water in the immersion process. In addition, rinsing effects for removing bacteria were determined when rice was rinsed with water before and after the immersion process. Antibacterial activities were rapidly increased as increasing amounts of the disinfectants are added to the pure cultures of the target bacteria. Antibacterial activity of CD was the most effective among the three tested disinfectants when added to the pure cultures of the target bacteria, respectively. Those of the same disinfectants were increased when they were increasingly added to the immersion water. However those of the disinfectants were less effective when added to the immersion water. On the other hand, rinsing effects for removing bacteria were the most effective when rice was rinsed only with water without the immersion process. Collectively, rinsing rice with water only was more effective than using disinfectants in the immersion water during rice flour production.

Effect of Organic wax residues and particles removal by DIO3 (ozonated DI water) after Silicon Wafer batch Polishing Process (오존수를 이용한 실리콘 웨이퍼 연마 후 지용성 왁스 및 오염입자 제거의 영향)

  • Yi, Jae-Hwan;Lee, Seung-Ho;Kim, Tae-Gon;Park, Jin-Goo;Lee, Gun-Ho;Bae, So-Ik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.558-559
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    • 2007
  • A commercially de-waxer which kinds of solvent after was used to remove a thick organic wax film after polishing process and several steps of SC-1 cleanings were followed for the removal of organic wax residues and particles which requires long process time and high cost of ownership (COO). DIO3 was used to remove organic wax residues too achieve low COO. In this study, 0103 rinsing could use instead of 01 water rinsing. The process time and chemical consumption were reduced by using DIO3.

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