• The Korean Journal of Pain
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• v.32 no.1
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• pp.47-50
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• 2019

Background: It is uncommon for patients who have received a permanent implant to remove the spinal cord stimulator (SCS) after discontinuation of medication in complex regional pain syndrome (CRPS) due to their completely painless state. This study evaluated CRPS patients who successfully removed their SCSs. Methods: This 10-year retrospective study was performed on patients who had received the permanent implantation of an SCS and had removed it 6 months after discontinuation of stimulation, while halting all medications for neuropathic pain. Age, sex, duration of implantation, site and type of CRPS, and their return to work were compared between the removal and non-removal groups. Results: Five (12.5%, M/F = 4/1) of 40 patients (M/F = 33/7) successfully removed the permanent implant. The mean age was younger in the removal group ($27.2{\pm}6.4$ vs. $43.5{\pm}10.7$ years, P < 0.01). The mean duration of implantation in the removal group was $34.4{\pm}18.2$ months. Two of 15 patients (13.3%) and 3 of 25 patients (12%) who had upper and lower extremity pain, respectively, had removed the implant. The implants could be removed in 5 of 27 patients (18.5%) with CRPS type 1 (P < 0.01). All 5 patients (100%) who removed their SCS returned to work, while only 5 of 35 (14.3%) in the non-removal group did (P < 0.01). Conclusions: Even though this study had limited data, younger patients with CRPS type 1 could remove their SCSs within a 5-year period and return to work with complete pain relief.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.288-288
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• 2012

The oxidation characteristics of tungsten line pattern during the carbon-based mask layer removal process using oxygen plasmas and the reduction characteristics of the WOx layer formed on the tungsten line surface using hydrogen plasmas have been investigated for sub-50 nm patterning processes. The surface oxidation of tungsten line during the mask layer removal process could be minimized by using a low temperature ($300^{\circ}K$) plasma processing instead of a high temperature plasma processing for the removal of the carbon-based material. Using this technique, the thickness of WOx on the tungsten line could be decreased to 25% of WOx formed by the high temperature processing. The WOx layer could be also completely removed at the low temperature of $300^{\circ}K$ using a hydrogen plasma by supplying bias power to the tungsten substrate to provide an activation energy for the reduction. When this oxidation and reduction technique was applied to actual 40 nm-CD device processing, the complete removal of WOx formed on the sidewall of tungsten line could be observed.

• KIEAE Journal
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• v.14 no.6
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• pp.81-86
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• 2014

In recent years, many researchers have considered the building energy consumption reduction accordingly to deal with abnormal climate changes and greenhouse gas reduction. However, the lighting energy use ratio has increased in spite of the development of the high efficiency lighting device. Therefore, the study aims to produce the LED lighting applications for the effective lighting heat removal by using the heat characteristics of LED lighting and analyzing the heat removal effect. In order to increase radiant heat efficiency, the heat pipe and heat sink was attached on PCB as LED lighting applications. Experiment was conducted to verify the temperature and air velocity of inside duct: thermocouples, anemometer. The heat removal effect of LED lighting applications was measured by observing the temperature of the lighting applications and the change of air velocity in duct. The experiment shows that the temperature change in the duct according to air velocity was $0.9{\sim}5.8^{\circ}C$. It is also concluded that heat removal was calculated from 33 to 81W.

• Journal of Environmental Impact Assessment
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• v.14 no.3
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• pp.109-115
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• 2005

This study was conducted to evaluate the efficiency of indoor air cleaners and to inform how to select them correctly to the users. The efficiencies of removing suspended bacteria per hour were $64.3{\pm}13.1%$ for filter, wet, and complex type, respectively, which showed the complex type was the most efficient. The removal efficiencies of formaldehyde (HCHO) after two hours operation of air cleaners showed 88.3% and 81.1% for filter and wet type, respectively. The efficiency of complex type, with removal rate of 55.5~58.4%, was decreased after 30 minutes operation. Therefore, it is recommended to perform over 60 minutes when doing air cleaner certification test for HCHO removal efficiency. Generally, air cleaners having low wind volume showed higher efficiency. All tested air cleaners had no potential for removing of volatile organic compounds (VOCs), which is toxic substances, and it is desirable to develop a device which can control these substances. The results also confirmed that there was no ozone production from all tested air cleaners. And it is recommended to ventilate for 20 minutes every four hours to maintain 50% ventilation status.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.12S
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• pp.1181-1186
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• 2003

Chemical Mechanical Polishing (CMP) is an essential dielectric planarization in multilayer microelectronic device fabrication. In the CMP process, it is necessary to minimize the extent of surface defect formation while maintaining good planarity and optimal material removal rates. The polishing mechanism of W-CMP process has been reported as the repeated process of passive layer formation by oxidizer and abrasion action by slurry abrasives. Thus, it is important to understand the effect of oxidizer on W passivation layer, in order to obtain higher removal rate (RR) and very low non-uniformity (NU %) during W-CMP process. In this paper, we compared the effects of oxidizer or W-CMP process with three different kind of oxidizers with 5 wt% hydrogen peroxide such as Fe(NO$_3$)$_3$, H$_2$O$_2$, and KIO$_3$. The difference in removal rate and roughness of W in stable and unstable slurries are believed to caused by modification in the mechanical behavior of Al$_2$O$_3$ particles in presence of surfactant stabilizing the slurry.

• Korean Journal of Ecology and Environment
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• v.49 no.4
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• pp.258-270
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• 2016

This study was conducted to test the green-tide mitigation technique in the lower part of the Sook Stream (Chusori) of Daecheong Reservoir from June 27 to August 24, 2014. And the effects were compared with weekly monitoring result of the watching station of the algae alert system (AAS) as well as test beds reach. The green-tide in a test bed was begun from the upstream, and it was gradually transferred and spread toward the downstream by the hydrological factors. The total amount of algae removed by algae removal device during the test period was 33,920 kg, and solids dewatered by natural gravity was 8,480 kg. Also chlorophyll-a content was 2.83 kg, the number of blue-green algae cells was equivalent to $78.6{\times}10^{14}$ cells. Compared with the results of the watching station of AAS, the pre-concentrate removal work in the outbreak waters was able to suggest the possibility of green-tide mitigation. In addition, an effective management of the green-tide was required spatial and temporal occurrence information and practical device technology. Particularly, the optimal timing of algae removal in the river-reservoir hybrid system was recommended at times before the monsoon rainy season and reached the lowest water level.

• Journal of Korean Society of Disaster and Security
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• v.11 no.2
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• pp.69-74
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• 2018

Fog to which environmental impacts are sensitive has a danger to the safety of citizens due to the difficulty in predicting the specific area/time zone. Therefore, we propose a white smoke fog reduction technique using a fog removal device that can remove fog particles directly through dry air and anionic condensation nucleus instead of conventional passive countermeasures. In this study, to verify the effect of reducing fog and the effect of temperature on the white smoke fog which is frequently occurred in the detention basin. As a result, the visible distance of 100m or more was secured within 30 seconds, and it was confirmed that the fog reduction effect is more effective. Also, the lower the temperature, the larger the amount of white smoke fog was. However, the effect of reducing the white smoke fog by temperature was insignificant. Through this experiment, it was possible to verify the reduction effect of the white smoke fog generated in the detention basin through fog removal device.

• Journal of the Korea Convergence Society
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• v.11 no.10
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• pp.213-217
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• 2020

An eco-friendly water purifier was developed using natural minerals, plants, and sludge from water purification plants. A wastewater complex treatment system using this water purification agent was developed. The wastewater complex treatment system goes through the process of inflow of contaminated water, input of water purification agent, operation of a pressurized flotation device, sludge flotation, sludge collection and treatment water discharge. This device was applied to the removal of green algae in livestock desorption liquid, broiler washing water, factory wastewater, sewage treatment plant and pond to obtain excellent removal rate. The use of natural water purification agents for organic waste purification has not been investigated.

• Journal of the Korean GEO-environmental Society
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• v.4 no.3
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• pp.61-67
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• 2003

A new precess which consists of pre-dewatering device, post composting for solid phase and post sequencing batch reactor(SBR) for liquid phase was designed. Nitrogen in supernatants of dewatering device was removed by sequencing batch reactor. Experiments were carried out to investigate the SBR operation modes such as fill ratio, SRT, and operation cycle. The optimum fill ratio, SRT and aeration/non-aeration time were 1/12, 15days, and 2hr aeration / 1hr non aeraion, respectively. Methanol as an external carbon source increased denitrification when step feeding method was applied, not single feeding method.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05c
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• pp.228-232
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• 2002

The rise throughput and the stability in the device fabrication can be obtained by applying chemical mechanical polishing(CMP) process in 0.18 ${\mu}m$ semiconductor device. However it does have various problems due to the CMP equipment. Especially, among the CMP components, process variables are very important parameters in determining removal rate and non-uniformity. In this paper, We studied the DOE(design of experiment) method for the optimized CMP process. Various process variations, such as table and head speed, slurry flow rate and down force, have investigated in the viewpoint of removal rate and non-uniformity. Through the above DOE results, we could set-up the optimal process parameters.