• KNOM Review
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• 제23권1호
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• pp.51-62
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• 2020

통신 인프라를 공유하고 클라우드 자원을 유연하게 제공하는 개방형 IoT 플랫폼을 활용함으로써 스마트 서비스 개발 시간과 비용이 절약될 수 있다. 본 논문에서는 물리 IoT 디바이스를 가상의 IoT 디바이스로 구현하고 서비스 개발자가 가상 디바이스와 연동하도록 하는 엣지 컴퓨팅 기반 가상 IoT 시스템을 개방형 IoT 플랫폼으로 제안한다. 물리 IoT 디바이스 인근 엣지 클라우드 내 관리 서버는 물리 IoT 디바이스에 대응되는 가상 IoT 디바이스의 생성, 이동, 제거를 관리한다. 논문에서는 가상 IoT 시스템의 주요 구성 요소인 관리 서버와 물리 IoT 디바이스 그리고 가상 IoT 디바이스의 동작을 정의하고 동작을 수행하기 위해 필요한 통신 프로토콜을 설계한다. 마지막으로 모의실험을 통해 각 구성 요소가 정의된 상태와 동작을 설계된 것과 같이 수행함을 확인함으로써 엣지 클라우드 기반 가상 IoT 시스템 성능을 검증한다.

• 대한기계학회논문집A
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• 제29권9호
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• pp.1276-1281
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• 2005

Compound semiconductors are the semiconductors composed of more than two chemical elements. Lithium Tantalate$K_I$ wafer is used for several optical devices, especially surface acoustic wave(SAW) device. Because of the lithography in SAW device process, $LiTaO_3$ polishing is needed. In this paper, the commercial slurries $(NALC02371^{TM},\; ILD1300^{TM},\;ceria slurry)$ used for chemical mechanical polishing(CMP) were tested, and the most suitable slurry was selected by measuring material removal rate and average centerline roughness$(R_a)$. From these result, it was proven that $ILD1300^{TM}$ was the most suitable slurry for $LiTaO_3$ wafer CMP due to the chemical reaction between solution in slurry and material.

• 연구논문집
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• 통권24호
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• pp.5-11
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• 1994

EGR is an efficient method for reduction of NOx from diesel exhaust emission since it is simple to install with low cost and effective in its performance however it has demerits such as incresing wear on the moving parts of engines. stainning intake system and deteriorate lubricating oil. In order to reduce the soot contents in the recirculating gas to intake system of the engine, a proper filtering device was desined and manufactered for experiment system. It is aimed to grasp the characteristics of pollutant emissions including SFC on EGR system equipped with soot removal device.

• 한국정밀공학회지
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• 제21권7호
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• pp.22-29
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• 2004

As a result of high integration of semiconductor device, the global planarization of multi-layer structures is necessary. So the chemical mechanical polishing(CMP) is widely applied to manufacturing the dielectric layer and metal line in the semiconductor device. CMP process is under influence of polisher, pad, slurry, and process itself, etc. In comparison with the general CMP which uses the slurry including abrasives, fixed abrasive pad takes advantage of planarity, resulting from decreasing pattern selectivity and defects such as dishing & erosion due to the reduction of abrasive concentration especially. This paper introduces the manufacturing technique of fixed abrasive pad using hydrophilic polymers with swelling characteristic in water and explains the self-conditioning phenomenon. And the tungsten CMP using fixed abrasive pad achieved the good conclusion in terms of the removal rate, non-uniformity, surface roughness, material selectivity, micro-scratch free contemporary with the pad life-time.

• 한국대기환경학회:학술대회논문집
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• 한국대기환경학회 2009년도 추계학술대회 논문집
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• pp.604-605
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• 2009

• 해양환경안전학회지
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• 제3권2호
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• pp.69-76
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• 1997

Each factor for the most effective electrolytic reaction in treating shipboard sewage was enhanced by means of batch electrolyitc reactor using DSA electrode. The effective clearance was 6mm and pH was 5-6. In such case, more than 20% of sea water concentration was needed to attain 90% of COD removal rate. The suspended solids was effectively removed by electro-floatation in proportion as charged current density. The nitrogen and posporous were effectively removed in the electrolytic device when mixed seawater.

• Smart Structures and Systems
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• 제20권5호
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• pp.637-640
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• 2017

The adoption of cladding panels as dissipation device is a sort of passive control "ante litteram" for residential and commercial buildings. This paper gives details on the current technology outlining the difference between buffer panels and cladding panels. The discussion of robustness and resilience of the resulting system is afforded. It is shown that the strength of such solution, originally related to economy and light weight, is mainly associated with the respect of the main robustness requisites, as well as the short time it requires for removal and replacement (resilience).

• 마이크로전자및패키징학회지
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• 제10권4호
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• pp.53-60
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• 2003

CCD(Charge-Coupled Device) wafer와 같이 표면이 polymer 성분의 micro lens로 구성되어있는 경우 passivation 막을 도포하지 않는 것이 보통인데, 이때 particle이 lens 표면에 쉽게 달라붙는 현상이 나타나게 된다. 특히 sawing 하면서 발생하는 particle은 치명적인 불량을 유발한다. 본 연구에서는 sawing에서 발생한 particle을 효과적으로 flushing하기위한 방안으로 측면노즐과 중심노즐의 분사위치, 분사각도, 퍼짐각도를 최적화 하고, 아울러 flushing 노즐을 추가한 새로운 형태의 wafer saw를 도입하였다. 개선된 saw를 적용하여 실험한 결과 particle로 인한 CCD chip의 불량률이 9.l%로부터 0.63%로 현격하게 개선되었음을 확인할 수 있었다.

• 센서학회지
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• 제17권2호
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• pp.100-105
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• 2008

The objectives of this study are to measure and to remove Cerenkov lights generated in a fiber-optic radiation sensor by a charge-coupled device. we have fabricated a fiber-optic radiation sensor which comprises an organic scintillator, a plastic optical fiber and a charge-coupled device. Charge-coupled device as a light measuring tool has many advantages which are easy in multi-dimensional measurements, high spatial resolution and relatively low cost.

• 대한방사선치료학회지
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• 제9권1호
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• pp.40-45
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• 1997

When therapeutic irradiation is indicated for the orbital tumors, the greatest concern is the risk of radiation-induced cataract. Conjunctival lymphoma is one of the good examples. We would like to report the procedure of the lens shielding device(L.S.D) and the result of irradiated dose to the lens. L.S.D. consistes of two parts : load alloy to attenuate electron beam, and dental acryl which completely covers the lead alloy to avoid discomfort of cornea from contacting directly with cerrobend and side scattering by cerrobend. And for easy location and removal, side bars were made on each side. Radiation doses were meaured with TLD(TLD 3500 Hawshaw). Markus chamber in a polystyrene phantom. The phantom was irradiated with 9MeV electron beams from Clinac 2100C with $6{\times}6cm$ electron cone. The relative dose at 6mm depth where the lens is located was $4.2\%$ with TLD and $5.1\%$ with Markus chamber clinically when 2600 cGy are irradiated to the eyeball, the mapinary dose to the lens will be 109 cGy or 132 cGy, which will significently reduce the cataract.