• 제목/요약/키워드: Remote Plasma System

검색결과 32건 처리시간 0.034초

리모트 프라즈마 전원용 하프 브리지 인버터의 운전 특성 (A Operation characteristics of the HB inverter for Remote Plasma Source)

  • 김수석;원충연;최대규;최상돈
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2003년도 춘계전력전자학술대회 논문집(2)
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    • pp.611-615
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    • 2003
  • In this paper, a operation characteristics and analysis of the HB(half bridge) inverter for remote plasma system are studied. the remote plasma system is cleaning system for the chemical vapor deposition (CVD) chamber in semiconductor processing. The remote plasma system is powered by the RF generator The main power stage of the RF generator is used for the HB PWM inverter with an low pass filter in the secondary circuit of the transformer. The detailed mode analysis of HB invertor was described. The operation characteristics of Remote Plasma Source are verified by simulation and experimental results.

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리모트 플라즈마용 전원 개발 (The development of RPS (Remote Plasma Source))

  • 김수석;원충연;최대규;최상돈
    • 전력전자학회:학술대회논문집
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    • 전력전자학회 2002년도 전력전자학술대회 논문집
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    • pp.245-248
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    • 2002
  • In this paper, the development of the RF power supply for Remote Plasma System is discussed. 7kW, 400kHz Remote Plasma Generator is designed and tested. The main power stage is used for the HB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of Remote Plasma Generator are verified by simulation and experimental results.

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Power Line Communication을 이용한 반도체 Plasma 장비 전력시스템 원격제어 (The Electric Power System Remote Control Of Semiconductor Plasma Manufacturing Equipment Using Power Line Communication)

  • 이내일;김진환
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 제38회 하계학술대회
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    • pp.1678-1679
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    • 2007
  • This paper is the electric power system remote control of semiconductor plasma manufacturing equipment using PLC(power line communication). PLC is useful for economical data link but various problems and limitations are caused in using power lines for communications channel Develop of Semiconductor plasma manufactur ing equipment and remote automation technologies of tool develops day after day and standards. Also, Remote electric power control and device module control by GUIRCS(Graphic User Interface Remote Control System) of tool are monitoring in real time.

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Remote 플라즈마에서 위치 및 반응기체에 따른 PMMA의 식각 특성 분석 (Influence of Loading Position and Reaction Gas on Etching Characteristics of PMMA in a Remote Plasma System)

  • 고천광;이원규
    • Korean Chemical Engineering Research
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    • 제44권5호
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    • pp.483-488
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    • 2006
  • 유기고분자에 대한 건식 식각공정으로 remote 플라즈마를 이용하여 유리 표면에 도포된 PMMA의 식각공정에 관한 연구로 플라즈마 출력, 반응가스, 플라즈마 발생원과의 거리에 대한 식각특성을 측정하였다. 플라즈마 발생원으로부터 멀어질수록 플라즈마에 의해 발생된 라디칼 밀도로 인해 PMMA 식각속도가 감소하였다. 플라즈마 내에서 발생된 라디칼에 의해 PMMA가 제거되며, 플라즈마 출력이 증가할수록 PMMA 표면과 반응하는 라디칼 증가로 식각속도는 선형적으로 증가하였다. 식각 기체에서 산소의 양이 증가함에 따라 식각속도 증가와 더불어 식각표면의 거칠기도 증가함을 알 수 있었다.

Quasi-optical design and analysis of a remote steering launcher for CFETR ECRH system

  • Zhang Chao;Xiaojie Wang;Dajun Wu;Yunying Tang;Hanlin Wang;Dingzhen Li;Fukun Liu;Muquan Wu;Peiguang Yan;Xiang Gao;Jiangang Li
    • Nuclear Engineering and Technology
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    • 제56권5호
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    • pp.1619-1626
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    • 2024
  • In order to optimize the operational safety and reliability of the upper launcher for the CFETR ECRH system, a design of the launcher for NTM control based on the remote steering concept is currently being carried out for comparison with the front steering equivalent. This paper presents the layout design and analysis of the quasi-optical system in the remote steering launcher. A 3D visual quasi-optical design tool has been developed for the quasi-optical system, which can parameterize modeling, perform general astigmatic beam calculation and show the accurate beam propagation path in the upper port. Three identical sets of quasi-optical modules are arranged in the launcher, and each one consists of two fixed double-curvature focusing mirrors, which focus and reflect the steering beams (- 12°-12°) from two square corrugated waveguides. The beam characteristics at the resonance layer are described, and the average beam radius is < 100 mm. The peak head loads on the surfaces of the two fixed mirrors are 1.63 MW/m2 and 1.52 MW/m2. The position and size of the beam channel in the blanket are obtained, and the opening apertures on the launcher-facing and plasma-facing sides of the blanket module are 0.54 m2 and 0.4 m2, respectively.

Conceptual design and analysis of remote steering system for CFETR ECRH system

  • Chao Zhang;Xiaojie Wang;Dajun Wu;Yunying Tang;Hanlin Wang;Dingzhen Li;Fukun Liu;Muquan Wu;Peiguang Yan;Xiang Gao;Jiangang Li
    • Nuclear Engineering and Technology
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    • 제56권2호
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    • pp.451-462
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    • 2024
  • In order to optimize the operational safety and reliability of the upper launcher for the CFETR ECRH system, a design of the launcher based on the remote steering concept is currently being carried out for comparison with the front steering equivalent. This paper presents the remote steering system's conceptual design and simulation analysis. A Square Corrugated Waveguide (SCW) of 65 × 65 mm has been designed with an optimized length of 9.35 m. By changing the relative length of the waveguide, the transmission efficiency of the SCW is optimized within the range of steering angles ±12°. Different error factors are investigated in detail, and corresponding acceptable error ranges are provided. Considering these error factors and ignoring ohmic losses and thermal effects, the relative transmission efficiency of the SCW is estimated to be >98 % within the steering angle range. A matching steering unit for the SCW is designed, which consists of an ellipsoidal focusing mirror and a steerable flat mirror. The detailed design of the steerable mirror motion trajectory is presented. Also, the influence of the possible beam incident errors caused by the steering unit on the transmission efficiency is analyzed in detail.

원격 유도결합 플라즈마 시스템의 특성 해석 (Characterization of a Remote Inductively Coupled Plasma System)

  • 김영욱;양원균;주정훈
    • 한국표면공학회지
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    • 제41권4호
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    • pp.134-141
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    • 2008
  • We have developed a numerical model for a remote ICP(inductively coupled plasma) system in 2D and 3D with gas distribution configurations and confirmed it by plasma diagnostics. The ICP source has a Cu tube antenna wound along a quartz tube driven by a variable frequency rf power source($1.9{\sim}3.2$ MHz) for fast tuning without resort to motor driven variable capacitors. We investigated what conditions should be met to make the plasma remotely localized within the quartz tube region without charged particles' diffusing down to a substrate which is 300 mm below the source, using the numerical model. OES(optical emission spectroscopy), Langmuir probe measurements, and thermocouple measurement were used to verify it. To maintain ion current density at the substrate less than 0.1 $mA/cm^2$, two requirements were found to be necessary; higher gas pressure than 100 mTorr and smaller rf power than 1 kW for Ar.

Position error compensation of the multi-purpose overload robot in nuclear power plants

  • Qin, Guodong;Ji, Aihong;Cheng, Yong;Zhao, Wenlong;Pan, Hongtao;Shi, Shanshuang;Song, Yuntao
    • Nuclear Engineering and Technology
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    • 제53권8호
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    • pp.2708-2715
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    • 2021
  • The Multi-Purpose Overload Robot (CMOR) is a key subsystem of China Fusion Engineering Test Reactor (CFETR) remote handling system. Due to the long cantilever and large loads of the CMOR, it has a large rigid-flexible coupling deformation that results in a poor position accuracy of the end-effector. In this study, based on the Levenberg-Marquardt algorithm, the spatial grid, and the linearized variable load principle, a variable parameter compensation model was designed to identify the parameters of the CMOR's kinematics models under different loads and at different poses so as to improve the trajectory tracking accuracy. Finally, through Adams-MATLAB/Simulink, the trajectory tracking accuracy of the CMOR's rigid-flexible coupling model was analyzed, and the end position error exceeded 0.1 m. After the variable parameter compensation model, the average position error of the end-effector became less than 0.02 m, which provides a reference for CMOR error compensation.

Numerical Modeling of an Inductively Coupled Plasma Based Remote Source for a Low Damage Etch Back System

  • Joo, Junghoon
    • Applied Science and Convergence Technology
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    • 제23권4호
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    • pp.169-178
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    • 2014
  • Fluid model based numerical analysis is done to simulate a low damage etch back system for 20 nm scale semiconductor fabrication. Etch back should be done conformally with very high material selectivity. One possible mechanism is three steps: reactive radical generation, adsorption and thermal desorption. In this study, plasma generation and transport steps are analyzed by a commercial plasma modeling software package, CFD-ACE+. Ar + $CF_4$ ICP was used as a model and the effect of reactive gas inlet position was investigated in 2D and 3D. At 200~300 mTorr of gas pressure, separated gas inlet scheme is analyzed to work well and generated higher density of F and $F_2$ radicals in the lower chamber region while suppressing ions reach to the wafer by a double layer conducting barrier.

$NF_3$-와 $O_2$ 리모트 플라즈마 노출에 따른 니트릴 가교 과불소고무와 과산화물 가교 과불소고무의 무게 손실과 모폴로지 특성 (Weight Loss and Morphology of Nitrile Curable PFE and Peroxide Curable PFE after Exposing to $NF_3$ and $O_2$ Remote Plasmas)

  • 이경원;김태호
    • 폴리머
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    • 제35권2호
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    • pp.136-140
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    • 2011
  • 니트릴 가교 과불소고무와 과산화물 가교 과불소고무의 내플라즈마 특성을 평가하기 위해 고온상태에서 $NF_3$, $O_2$ 리모트 플라즈마에 노출된 과불소 고무 재질의 오링(O-ring)에 대해 각각의 무게 손실 및 표면 특성을 확인하였다. 이를 위해 컴파운드는 반도체 및 LCD 생산라인에서 적용되고 있는 오링/씰 제조를 위한 전형적인 처방에 맞춰 설계하고 오픈 롤을 사용하여 혼련작업을 실시하였으며, 이후 열프레스로 작업한 후 오븐을 이용한 후가교 공정을 거쳐 최종 오링 형태로 제조하였다. 가교된 과불소고무 오링을 고온 플라즈마 환경에 노출시킨 후 무게 감량 및 표면 특성 변화를 전자 저울 및 주사전자현미경을 사용해 관찰하였다. 그 결과, 과불소고무의 가교타입, 필러 시스템, 플라즈마의 종류에 따라 무게 손실과 표면 상태의 변화가 상당한 수준으로 발생되는 것을 확인하였다.