• Proceedings of the KIPE Conference
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• 2003.07b
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• pp.611-615
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• 2003

In this paper, a operation characteristics and analysis of the HB(half bridge) inverter for remote plasma system are studied. the remote plasma system is cleaning system for the chemical vapor deposition (CVD) chamber in semiconductor processing. The remote plasma system is powered by the RF generator The main power stage of the RF generator is used for the HB PWM inverter with an low pass filter in the secondary circuit of the transformer. The detailed mode analysis of HB invertor was described. The operation characteristics of Remote Plasma Source are verified by simulation and experimental results.

• Proceedings of the KIPE Conference
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• 2002.07a
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• pp.245-248
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• 2002

In this paper, the development of the RF power supply for Remote Plasma System is discussed. 7kW, 400kHz Remote Plasma Generator is designed and tested. The main power stage is used for the HB PWM inverter with an LC filter in the secondary circuit. The operation characteristics of Remote Plasma Generator are verified by simulation and experimental results.

• Proceedings of the KIEE Conference
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• 2007.07a
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• pp.1678-1679
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• 2007

This paper is the electric power system remote control of semiconductor plasma manufacturing equipment using PLC(power line communication). PLC is useful for economical data link but various problems and limitations are caused in using power lines for communications channel Develop of Semiconductor plasma manufactur ing equipment and remote automation technologies of tool develops day after day and standards. Also, Remote electric power control and device module control by GUIRCS(Graphic User Interface Remote Control System) of tool are monitoring in real time.

• Korean Chemical Engineering Research
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• v.44 no.5
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• pp.483-488
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• 2006

Etching process of PMMA (Polymethyl Methacrylate) on glass surface was investigated by dry etching technique using remote plasma. To determine the etching characteristics, the remote plasma etching was conducted for various process parameters such as plasma power, reaction gas and distance from plasma generation. As the distance from the plasma generation was increased, the etch rate of PMMA was linearly decreased by radical density in plasma. PMMA has removed by reactive radicals in the plasma. The etch rate increased with plasma power because of more reactive radicals. The etch rate and surface roughness of PMMA increased with $O_2$ concentration in the etchant.

• Nuclear Engineering and Technology
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• v.56 no.5
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• pp.1619-1626
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• 2024

In order to optimize the operational safety and reliability of the upper launcher for the CFETR ECRH system, a design of the launcher for NTM control based on the remote steering concept is currently being carried out for comparison with the front steering equivalent. This paper presents the layout design and analysis of the quasi-optical system in the remote steering launcher. A 3D visual quasi-optical design tool has been developed for the quasi-optical system, which can parameterize modeling, perform general astigmatic beam calculation and show the accurate beam propagation path in the upper port. Three identical sets of quasi-optical modules are arranged in the launcher, and each one consists of two fixed double-curvature focusing mirrors, which focus and reflect the steering beams (- 12°-12°) from two square corrugated waveguides. The beam characteristics at the resonance layer are described, and the average beam radius is < 100 mm. The peak head loads on the surfaces of the two fixed mirrors are 1.63 MW/m² and 1.52 MW/m². The position and size of the beam channel in the blanket are obtained, and the opening apertures on the launcher-facing and plasma-facing sides of the blanket module are 0.54 m² and 0.4 m², respectively.

• Nuclear Engineering and Technology
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• v.56 no.2
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• pp.451-462
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• 2024

In order to optimize the operational safety and reliability of the upper launcher for the CFETR ECRH system, a design of the launcher based on the remote steering concept is currently being carried out for comparison with the front steering equivalent. This paper presents the remote steering system's conceptual design and simulation analysis. A Square Corrugated Waveguide (SCW) of 65 × 65 mm has been designed with an optimized length of 9.35 m. By changing the relative length of the waveguide, the transmission efficiency of the SCW is optimized within the range of steering angles ±12°. Different error factors are investigated in detail, and corresponding acceptable error ranges are provided. Considering these error factors and ignoring ohmic losses and thermal effects, the relative transmission efficiency of the SCW is estimated to be >98 % within the steering angle range. A matching steering unit for the SCW is designed, which consists of an ellipsoidal focusing mirror and a steerable flat mirror. The detailed design of the steerable mirror motion trajectory is presented. Also, the influence of the possible beam incident errors caused by the steering unit on the transmission efficiency is analyzed in detail.

• Journal of Surface Science and Engineering
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• v.41 no.4
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• pp.134-141
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• 2008

We have developed a numerical model for a remote ICP(inductively coupled plasma) system in 2D and 3D with gas distribution configurations and confirmed it by plasma diagnostics. The ICP source has a Cu tube antenna wound along a quartz tube driven by a variable frequency rf power source($1.9{\sim}3.2$ MHz) for fast tuning without resort to motor driven variable capacitors. We investigated what conditions should be met to make the plasma remotely localized within the quartz tube region without charged particles' diffusing down to a substrate which is 300 mm below the source, using the numerical model. OES(optical emission spectroscopy), Langmuir probe measurements, and thermocouple measurement were used to verify it. To maintain ion current density at the substrate less than 0.1 $mA/cm^2$, two requirements were found to be necessary; higher gas pressure than 100 mTorr and smaller rf power than 1 kW for Ar.

• Nuclear Engineering and Technology
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• v.53 no.8
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• pp.2708-2715
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• 2021

The Multi-Purpose Overload Robot (CMOR) is a key subsystem of China Fusion Engineering Test Reactor (CFETR) remote handling system. Due to the long cantilever and large loads of the CMOR, it has a large rigid-flexible coupling deformation that results in a poor position accuracy of the end-effector. In this study, based on the Levenberg-Marquardt algorithm, the spatial grid, and the linearized variable load principle, a variable parameter compensation model was designed to identify the parameters of the CMOR's kinematics models under different loads and at different poses so as to improve the trajectory tracking accuracy. Finally, through Adams-MATLAB/Simulink, the trajectory tracking accuracy of the CMOR's rigid-flexible coupling model was analyzed, and the end position error exceeded 0.1 m. After the variable parameter compensation model, the average position error of the end-effector became less than 0.02 m, which provides a reference for CMOR error compensation.

• Applied Science and Convergence Technology
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• v.23 no.4
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• pp.169-178
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• 2014

Fluid model based numerical analysis is done to simulate a low damage etch back system for 20 nm scale semiconductor fabrication. Etch back should be done conformally with very high material selectivity. One possible mechanism is three steps: reactive radical generation, adsorption and thermal desorption. In this study, plasma generation and transport steps are analyzed by a commercial plasma modeling software package, CFD-ACE+. Ar + $CF_4$ ICP was used as a model and the effect of reactive gas inlet position was investigated in 2D and 3D. At 200~300 mTorr of gas pressure, separated gas inlet scheme is analyzed to work well and generated higher density of F and $F_2$ radicals in the lower chamber region while suppressing ions reach to the wafer by a double layer conducting barrier.

• Polymer(Korea)
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• v.35 no.2
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• pp.136-140
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• 2011

The plasma resistances of nitrile curable perfluoro elastomer (NT PFE) and peroxide curable PFE (PO PFE) after exposing to $NF_3$ and $O_2$ remote plasmas were investigated by analyzing weight loss and morphology of O-ring made of PFE. The compounds were designed following the typical formulations of O-ring/seal which were applied in semiconductor and LCD production site. They were blended by an open roll mill, and then, O-ring was finally made by hot press molding and oven curing. The weight loss was calculated and morphology was observed for each atmosphere and temperature by a digital weighing machine and SEM. As results, it was confirmed the weight loss and related morphology were meaningfully different according to the cure type of PFE, filler system, and the species of remote plasma.