• 한국재료학회지
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• 제21권10호
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• pp.532-541
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• 2011

The Xe plasma flat lamp, considered to be a new eco-friendly LCD backlight, requires a further improvement of its luminance and luminous efficiency. To improve the performance of this type of lamp, it is necessary to understand the effects of the discharge variables on the luminous characteristics of the lamp. In this study, the luminous characteristics of a coplanartype Xe plasma flat lamp with a teeth-type electrode pattern were analyzed while varying the gas composition, gas pressure and input voltage. The effects of the phosphor layer on the discharge and the luminous characteristics of the lamp were also studied. The luminous efficiency of the coplanar-type Xe plasma flat lamp improved as the Xe input ratio and gas pressure increased. Higher luminous efficiency was also obtained when helium (He) was used as a buffer gas and when a phosphor layer was fabricated on the electrode region. In contrast, the luminous efficiency was reduced with increasing the input voltage. It was found that the infrared emissions from the lamp were affected by the Xe excitation rate in the plasma, the Xe gas density, the collisional quenching of excited Xe species by gas molecules, and the recombination rate between the Xe ions and electrons.

• Molecules and Cells
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• 제19권3호
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• pp.445-451
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• 2005

Activation-induced cytidine deaminase (AID) is needed for Ig class switch recombination (CSR). We explored the effect of LPS on the expression of AID during B cell differentiation, and the role of AID in IgA isotype expression. In normal spleen B cells, LPS increased AID transcription up to 48 h post-stimulation, i.e. around the time of Ig CSR. TGF-${\beta}1$ and AID were required for IgA expression, and LPS contributed to $TGF{\beta}1$-induced IgA production largely by inducing AID. Interestingly, LPS repressed AID transcription in $sIgA^+$ B cells but still stimulated IgA production mainly by increasing the rate of IgA secretion. Our data indicate that LPS contributes to $TGF{\beta}1$-induced IgA isotype expression in at least two ways: by stimulating AID transcription before CSR and by enhancing the IgA secretion rate after CSR.

• 한국환경과학회지
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• 제8권5호
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• pp.569-574
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• 1999

This study was carried out to determine the antimutagenic effects of genistein on the somatic mutagenicity induced by aflatoxin B1 (${AFB}_1$), using Drosophila wing spot test system. Mutagen alone or mutagen with genistein were administered to the heterozygous(mwh/+) third instar larvae by feeding, and somatic cell mutations were detected in adult fly wing hairs. Genistein did not show any mutagenicity with the feeding concentrations of 5~15% in the test system. As the feeding concentrations of genistein increased, genistein inhibited the mutagenicity induced by AFB1 (14.6%~62.2% inhibition rate), while as the concentrations of AFB1 increased, small much spots that arise mostly from chromosome deletion and nondisjunction were more strongly suppressed by genistein than the large mwh spots from chromosomal recombination. In each group of different AFB1 concentrations, the rate of inhibition for total mwh spots was dependent on the dose of genistein. These results indicate that genistein have inhibitory effect on the mutagenicity induced by a mtagen, ${AFB}_1$. It seems to suggest that genistein may exert inhibitory effects to mutagenic and/or carcinogenic properties of DNA damaging agents.

• Journal of Electrochemical Science and Technology
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• 제15권2호
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• pp.276-290
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• 2024

A study of the transition from transitory state to steady state in DSSCs based on natural dyes is presented; cochineal was used as dye and Li⁺, Na⁺, and K⁺ were the ions added to the electrolyte. The photocurrent profiles were obtained as a function of time. Several DSSCs were prepared with different cations and their role and the transitory-to-steady transition was determined. A novel hybrid charge carrier source model based on the Heaviside function H(t) and the Lambert-Beer law, was developed and applied to analysis of the transient response of the output photocurrent. Additionally, the maximum effective light absorption coefficient α and the electronic extraction rate κ for each ion were determined: ${\alpha}_{Li^+,Na^+,K^+}\,=\,(0.486,\,0.00085,\,0.1126)\,cm^{-1}$, and also the electronic extraction rate ${\kappa}^{Li^+,Na^+,K^+}_{ext.}\,=\,(1410,\,19.07,\,19.69)\,cm\,s^{-1}$. The impedance model using Fick's second law was developed for carrier recombination to characterize the photocurrent.

• 한국산학기술학회논문지
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• 제19권6호
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• pp.709-714
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• 2018

반도체소자의 접합특성에 따라서 분극의 특성이 달라지는 원인을 조사하였다. 반도체소자의 접합특성은 최종적인 반도체소자의 효율과 관련되기 때문에 중요한 요소이며, 효율을 높이기 위해서는 반도체접합 특성을 이해하는 것은 매우 중요하다. 다양한 성질의 접합을 얻기위하여 n형의 실리콘 위에 절연물질인 carbon doped silicon oxide (SiOC) 박막을 증착하였으며, 아르곤 (Ar) 유량에 따라서 반도체기판의 특성이 달라지는 것을 확인하였다. 전도체인 tin doped zinc oxide (ZTO) 박막을 절연체인 SiOC 위에 증착하여 소자의 전도성을 살펴보았다. SiOC 박막의 특성은 플라즈마에 의하여 이온화현상이 일어날 때 Ar 유량에 따라서 이온화되는 경향이 달라지면서 반도체 계면에서의 공핍현상이 달라졌으며, 공핍층 형성이 많이 일어나는 곳에서 쇼키접합 특성이 잘 형성되는 것을 확인하였다. 아르곤 가스의 유량이 많은 경우 이온화 반응이 많이 일어나고 따라서 접합면에서 전자 홀쌍의 재결합반응에 의하여 전하들이 없어지게 되면 절연특성이 좋아지고 공핍층의 전위장벽이 증가되며, 쇼키접합의 형성이 유리해졌다. 쇼키접합이 잘 이루어지는 SiOC 박막에서 ZTO를 증착하였을 때 SiOC와 ZTO 사이의 계면에서 전하들이 재결합되면서 전기적으로 안정된 ZTO 박막을 형성하고, ZTO의 전도성이 증가되었다. 두께가 얇은 반도체소자에서 흐르는 낮은 전류를 감지하기 위해서는 쇼키접합이 이루어져야 하며, 낮은 전류만으로도 전기신호의 품질이 우수해지고 또한 채널층인 ZTO 박막에서의 전류의 발생도 많아지는 것을 확인하였다.

• 한국분말재료학회지
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• 제23권2호
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• pp.91-94
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• 2016

High-quality colloidal CdSe/ZnS (core/shell) is synthesized using a continuous microreactor. The particle size of the synthesized quantum dots (QDs) is a function of the precursor flow rate; as the precursor flow rate increases, the size of the QDs decreases and the band gap energy increases. The photoluminescence properties are found to depend strongly on the flow rate of the CdSe precursor owing to the change in the core size. In addition, a gradual shift in the maximum luminescent wave (${\lambda}_{max}$) to shorter wavelengths (blue shift) is found owing to the decrease in the QD size in accordance with the quantum confinement effect. The ZnS shell decreases the surface defect concentration of CdSe. It also lowers the thermal energy dissipation by increasing the concentration of recombination. Thus, a relatively high emission and quantum yield occur because of an increase in the optical energy emitted at equal concentration. In addition, the maximum quantum yield is derived for process conditions of 0.35 ml/min and is related to the optimum thickness of the shell material.

• 신재생에너지
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• 제18권1호
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• pp.29-34
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• 2022

The most prevalent cause of solar cell efficiency loss is reduced recombination at the metal electrode and silicon junction. To boost efficiency, a a SiO_X/poly-Si passivating interface is being developed. Poly-Si for passivating contact is formed by various deposition methods (sputtering, PECVD, LPCVD, HWCVD) where the ploy-Si characterization depends on the deposition method. The sputtering process forms a dense Si film at a low deposition rate of 2.6 nm/min and develops a low passivation characteristic of 690 mV. The PECVD process offers a deposition rate of 28 nm/min with satisfactory passivation characteristics. The LPCVD process is the slowest with a deposition rate of 1.4 nm/min, and can prevent blistering if deposited at high temperatures. The HWCVD process has the fastest deposition rate at 150 nm/min with excellent passivation characteristics. However, the uniformity of the deposited film decreases as the area increases. Also, the best passivation characteristics are obtained at high doping. Thus, it is necessary to optimize the doping process depending on the deposition method.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2016년도 추계학술대회 논문집
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• pp.181-181
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• 2016

Hydrogenated microcrystalline silicon (${\mu}c-Si:H$) films have attracted much attention as materials of the bottom-cells in Si thin film tandem photovoltaics due to their low bandgap and excellent stability against light soaking. However, in PECVD, the source gas $SiH_4$ must be highly diluted by $H_2$, which eventually results in low deposition rate. Moreover, it is known that high-rate ${\mu}c-Si:H$ growth is usually accompanied by a large number of dangling-bond (DB) defects in the resulting films, which act as recombination centers for photoexcited carriers, leading to a deterioration in the device performance. During film deposition, Si nanoparticles generated in $SiH_4$ discharges can be incorporated into films, and such incorporation may have effects on film properties depending on the size, structure, and volume fraction of nanoparticles incorporated into films. Here we report experimental results on the effects of nonoparticles incorporation at the different substrate temperature studied using a multi-hollow discharge plasma CVD method in which such incorporation can be significantly suppressed in upstream region by setting the gas flow velocity high enough to drive nanoparticles toward the downstream region. All experiments were performed with the multi-hollow discharge plasma CVD reactor at RT, 100, and $250^{\circ}C$, respectively. The gas flow rate ratio of $SiH_4$ to $H_2$ was 0.997. The total gas pressure P was kept at 2 Torr. The discharge frequency and power were 60 MHz, 180 W, respectively. Crystallinity Xc of resulting films was evaluated using Raman spectra. The defect densities of the films were measured with electron spin resonance (ESR). The defect density of fims deposited in the downstream region (with nonoparticles) is higher defect density than that in the upstream region (without nanoparticles) at low substrate temperature of RT and $100^{\circ}C$. This result indicates that nanoparticle incorporation can change considerably their film properties depending on the substrate temperature.

• 한국태양에너지학회 논문집
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• 제33권2호
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• pp.11-17
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• 2013

Silicon nitride($SiN_x:H$) deposited by radio frequency plasma enhanced chemical vapor deposition(RF-PECVD) is commonly used for anti-reflection coating and passivation in crystalline silicon solar cell fabrication. In this paper, characteristics of the deposited silicon nitride was studied with change of working pressure, deposition temperature, gas ratio of $NH_3$ and $SiH_4$, and RF power during deposition. The deposition rate, refractive index and effective lifetime were analyzed. The (100) p-type silicon wafers with one-side polished, $660-690{\mu}m$, and resistivity $1-10{\Omega}{\cdot}cm$ were used. As a result, when the working pressure increased, the deposition rate of SiNx was increased while the effective life time for the $SiN_x$-deposited wafer was decreased. The result regarding deposition temperature, gas ratio and RF power changes would be explained in detail below. In this paper, the optimized condition in silicon nitride deposition for silicon solar cell was obtained as 1.0 Torr for the working pressure, $400^{\circ}C$ for deposition temperature, 500 W for RF power and 0.88 for $NH_3/SiH_4$ gas ratio. The silicon nitride layer deposited in this condition showed the effective life time of > $1400{\mu}s$ and the surface recombination rate of 25 cm/s. The crystalline silicon solar cell fabricated with this SiNx coating showed 18.1% conversion efficiency.

• 한국정보통신학회:학술대회논문집
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• 한국정보통신학회 2012년도 춘계학술대회
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• pp.686-689
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• 2012

본 논문에서는 ISE-TCAD를 이용하여 GaN 기반의 LED특성을 분석하였다. LED는 GaN 버퍼층을 기반으로 GaN 장벽과 InGaN 양자우물로 구성된 활성 영역, AlGaN EBL(Electron Blocking Layer)과 AlGaN HBL(Hole Blocking Layer)로 이루어져 있다. Auger 재결합률, 양자 우물의 폭과 수, EBL의 Al 몰분율의 변화에 따른 LED의 출력 전력 특성을 분석하고 효율 개선을 위한 몇 가지 기준을 제시하였다.