• 제목/요약/키워드: Reaction-diffusion systems

검색결과 50건 처리시간 0.022초

Quantitative Evaluation on Photocatalytic Activity of Anatase TiO2 Nanocrystals in Aqueous Solution

  • Jeon, Byungwook;Kim, Yu Kwon
    • Applied Science and Convergence Technology
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    • 제24권4호
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    • pp.96-101
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    • 2015
  • Quantitative evaluation of photocatalytic activity of oxide nanoparticles in aqueous solution is quite challenging in that the kinetic reaction rate is determined by a complicated interplay among various limiting factors such as light scattering and absorption, diffusion and adsorption of reactants in condensed liquid phase, photoexcited charge separation and recombination rate, and the exact nature of active sites determined by detailed morphology and crystallinity of nanocrystals. Here, we present our simple experimental results showing that the kinetic regime of a typical photocatalytic degradation experiment over UV-irradiated $TiO_2$ nanoparticles in aqueous solution is in that dominated by the photoactivity of $TiO_2$ and its concentration. This result lays a firm ground of using the measured kinetic reaction rate in evaluating photocatalytic efficiency of oxide nanocrystals under evaluation.

SOME TYPES OF REACTION-DIFFUSION SYSTEMS WITH NONLOCAL BOUNDARY CONDITIONS

  • Han, Yuzhu;Gao, Wenjie
    • 대한수학회보
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    • 제50권6호
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    • pp.1765-1780
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    • 2013
  • This paper deals with some types of semilinear parabolic systems with localized or nonlocal sources and nonlocal boundary conditions. The authors first derive some global existence and blow-up criteria. And then, for blow-up solutions, they study the global blow-up property as well as the precise blow-up rate estimates, which has been seldom studied until now.

전하전이착체형 잠재성 촉매를 사용한 반도체 성형용 자소성 에폭시 수지 시스템의 경화 반응속도 연구 (Cure Kinetics of Self-Extinguishing Epoxy Resin Systems with Charge Transfer Complex Type Latent Catalyst for Semiconductor Encapsulation)

  • 김환건
    • 반도체디스플레이기술학회지
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    • 제13권4호
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    • pp.27-32
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    • 2014
  • The cure properties of self-extinguishing epoxy resin systems with different charge transfer type latent catalysts were investigated, which are composed of YX4000H as a biphenyl epoxy resin, MEH-7800SS as a hardener, and charge transfer type latent catalysts. We designed and used five kinds of charge transfer type latent catalyst and compared to epoxy resin systems with Triphenylphosphine-Benzoquinone(TPP-BQ) as reference system. The cure kinetics of these systems were analyzed by differential scanning calorimetry with an isothermal approach, the kinetic parameters of all systems were reported in generalized kinetic equations with diffusion effects. The epoxy resin systems with Triphenylphosphine-Quinhydrone(TPP-QH), Triphenylphosphine-Benzanthrone(TPP-BT) and Triphenylphosphine-Anthrone(TPP-AT) as a charge transfer type latent catalyst showed a cure conversion rate of equal or higher rate than those with TPP-BQ. These systems with TPP-QH and Triphenylphosphine-Tetracyanoethylene(TPP-TCE) showed a critical cure reaction conversion of equal or higher conversion than those with TPP-BQ. The increases of cure conversion rates could be explained by the decrease of the activation energy of these epoxy resin systems. It can be considered that the increases of critical cure reaction conversion would be dependent on the crystallinity of the biphenyl epoxy resin systems.

Plasma Assisted ALD 장비 계발과 PAALD법으로 증착 된 TaN 박막의 전기적 특성 (Development of Plasma Assisted ALD equipment and Electrical Characteristic of TaN thin film deposited PAALD method)

  • 도관우;김경민;양충모;박성근;나경일;이정희;이종현
    • 반도체디스플레이기술학회지
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    • 제4권2호
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    • pp.39-43
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    • 2005
  • In the study, in order to deposit TaN thin film for diffusion barrier and bottom electrode we made the Plasma Assisted ALD equipment and confirmed the electrical characteristics of TaN thin films grown PAALD method. Plasma Assisted ALD equipment depositing TaN thin film using PEMAT(pentakis(ethylmethlyamino) tantalum) precursor and NH3 reaction gas is shown that TaN thin film deposited high density and amorphous phase with XRD measurement. The degree of diffusion and reaction taking place in Cu/TaN (deposited using 150W PAALD)/$SiO_{2}$/Si systems with increasing annealing temperature was estimated for MOS capacitor property and the $SiO_{2}$, (600${\AA}$)/Si system surface analysis by C-V measurement and secondary ion material spectrometer (SIMS) after Cu/TaN/$SiO_{2}$ (400 ${\AA}$) layer etching. TaN thin film deposited PAALD method diffusion barrier have a good diffusion barrier property up to 500$^{\circ}C$.

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Effects of chemical reaction on the polishing rate and surface planarity in the copper CMP

  • Kim, Do-Hyun;Bae, Sun-Hyuk;Yang, Seung-Man
    • Korea-Australia Rheology Journal
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    • 제14권2호
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    • pp.63-70
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    • 2002
  • Chemical mechanical planarization (CMP) is the polishing process enabled by both chemical and mechanical actions. CMP is used in the fabrication process of the integrated circuits to achieve adequate planarity necessary for stringent photolithography depth of focus requirements. And recently copper is preferred in the metallization process because of its low resistivity. We have studied the effects of chemical reaction on the polishing rate and surface planarity in copper CMP by means of numerical simulation solving Navier-Stokes equation and copper diffusion equation. We have performed pore-scale simulation and integrated the results over all the pores underneath the wafer surface to calculate the macroscopic material removal rate. The mechanical abrasion effect was not included in our study and we concentrated our focus on the transport phenomena occurring in a single pore. We have observed the effects of several parameters such as concentration of chemical additives, relative velocity of the wafer, slurry film thickness or ash)tract ratio of the pore on the copper removal rate and the surface planarity. We observed that when the chemical reaction was rate-limiting step, the results of simulation matched well with the experimental data.

새로운 반도체 Packaging용 Ethoxysilyl Bisphenol A Type Epoxy Resin System의 경화특성 연구 (Cure Characteristics of Ethoxysilyl Bisphenol A Type Epoxy Resin Systems for Next Generation Semiconductor Packaging Materials)

  • 김환건
    • 반도체디스플레이기술학회지
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    • 제16권2호
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    • pp.19-26
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    • 2017
  • The cure properties of ethoxysilyl bisphenol A type epoxy resin (Ethoxysilyl-DGEBA) systems with different hardeners were investigated, comparing with DGEBA and Diallyl-DGEBA epoxy resin systems. The cure kinetics of these systems were analyzed by differential scanning calorimetry with an isothermal approach, and the kinetic parameters of all systems were reported in generalized kinetic equations with diffusion effects. The Ethoxysilyl-DGEBA epoxy resin system showed lower cure conversion rates than DGEBA and Diallyl-DGEBA epoxy resin systems. The conversion rates of these epoxy resin systems with DDM hardener are lower than those with HF-1M hardener. It can be considered that the optimum hardener for Ethoxysilyl-DGEBA epoxy resin system is Phenol Novolac type. These lower cure conversion rates in the Ethoxysilyl-DGEBA epoxy resin systems could be explained by the retardation of reaction molecule movements according to the formation of organic-inorganic hybrid network structure by epoxy and ethoxysilyl group in Ethoxysilyl- DGEBA epoxy resin system.

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WLP(Wafer Level Package)적용을 위한 SEMC(Sheet Epoxy Molding Compounds)용 Naphthalene Type Epoxy 수지의 경화특성연구 (Cure Characteristics of Naphthalene Type Epoxy Resins for SEMC (Sheet Epoxy Molding Compound) for WLP (Wafer Level Package) Application)

  • 김환건
    • 반도체디스플레이기술학회지
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    • 제19권1호
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    • pp.29-35
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    • 2020
  • The cure characteristics of three kinds of naphthalene type epoxy resins(NET-OH, NET-MA, NET-Epoxy) with a 2-methyl imidazole(2MI) catalyst were investigated for preparing sheet epoxy molding compound(SEMC) for wafer level package(WLP) applications, comparing with diglycidyl ether of bisphenol-A(DGEBA) and 1,6-naphthalenediol diglycidyl ether(NE-16) epoxy resin. The cure kinetics of these systems were analyzed by differential scanning calorimetry with an isothermal approach, and the kinetic parameters of all systems were reported in generalized kinetic equations with diffusion effects. The NET-OH epoxy resin represented an n-th order cure mechanism as like NE-16 and DGEBA epoxy resins, however, the NET-MA and NET-Epoxy resins showed an autocatalytic cure mechanism. The NET-OH and NET-Epoxy resins showed higher cure conversion rates than DGEBA and NE-16 epoxy resins, however, the lowest cure conversion rates can be seen in the NET-MA epoxy resin. Although the NETEpoxy and NET-MA epoxy resins represented higher cure reaction conversions comparing with DGEBA and NE-16 resins, the NET-OH showed the lowest cure reaction conversions. It can be figured out by kinetic parameter analysis that the lowest cure conversion rates of the NET-MA epoxy resin are caused by lower collision frequency factor, and the lowest cure reaction conversions of the NET-OH are due to the earlier network structures formation according to lowest critical cure conversion.

SiO$_2$-CaO-Al$_2$O$_3$계 유리 솔더에 의한 알루미나의 접합 현상에 관한 연구 (A Study for Joining of Alumina Soldered by SiO$_2$-CaO-A1$_2$O$_3$ Glasses)

  • 안병국
    • Journal of Welding and Joining
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    • 제21권2호
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    • pp.35-41
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    • 2003
  • Sintered alumina ceramics were joined by 2 kinds of SiO$_2$-CaO-A1$_2$O$_3$ glass solders having a similar expansivity as alumina. Wetting of glass/alumina was examined by sessile drop method. The observation of interface and bending strength related to alumina/glass/alumina systems were investigated by means of SEM/EDX and 4-point bending test. the result are summarized as follow: (1) Wetting of glass solders on alumina was good at temperatures higher than 145$0^{\circ}C$. (2) When the joining temperature wan high, diffusion and/or reactions between solder md alumina took place at the interface. These diffusions and reactions occurring at the interface greatly affected the bending strength of joining body. (3) Highest strength corresponding to 80% that of alumina was obtained by the solder of 35SiO$_2$-35CaO-30A1$_2$O$_3$(wt%) glass.

막미생물과 부유미생물의 kinetics 비교 연구 (A Comparative Study on the Bio-kinetics of Suspended Sludge and Attached Sludge)

  • 이정수;이태규
    • 상하수도학회지
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    • 제12권4호
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    • pp.59-69
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    • 1998
  • Biological treatment systems generally can be divided into two main classes of a suspended sludge process and attached one like a fluidized bed reactor. These process are considered to bring remarkable change in species composition of microorganisms, due to difference of a state of biofilm, a concentration and diffusion velocity of dissolved oxygen, a concentration and diffusion velocity of substance or poisonous matter. The change of species composition bring different treatment result for influence factors like F/M ratio, DO concentration, pH or poisonous matter. This study is to investigate the reaction characteristics of both microorganisms, namely, a suspended sludge and attached sludge, through the changes of pH, temperature and substance concentration.

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고온공기를 이용한 제트확산화염의 연소특성에 관한 실험 (Experiment on the Characteristics of Jet Diffusion Flames with High Temperature Air Combustion)

  • 조은성;대야건;소림수소;정석호
    • 대한기계학회논문집B
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    • 제28권3호
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    • pp.359-364
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    • 2004
  • For the development of high efficiency and low emission combustion systems, high temperature air combustion technology has been tested by utilizing preheated air over 1100 K and exhaust gas recirculation. In this system, combustion air is diluted with large amount of recirculated exhaust gases, such that the oxygen concentration is relatively low in the reaction zone, leading to low flame temperature. Since, the temperature fluctuations and sound emissions from the flame are small and flame luminosity is low, the combustion mode is expected to be flameless or mild combustion. Experiment was performed to investigate the turbulent flame structure and NO$_x$ emission characteristics in the high temperature air combustion focused on coflowing jet diffusion flames which has a fundamental structure of many practical combustion systems. The effect of turbulence has also been evaluated by installing perforated plate in the oxidizer inlet nozzle. LPG was used as a fuel. Results showed that even though NO$_x$ emission is sensitive to the combustion air temperature, the present high temperature air combustion system produce low NO$_x$ emission because it is operated in low oxygen concentration condition by the high exhaust gas recirculation.