• 제목/요약/키워드: RF discharge

검색결과 224건 처리시간 0.022초

기체레이저의 여기를 위한 용량결합고주파(ccrf) 방전시스템 (Capacitively Coupled Radio Frequency Discharge System for Excitation of Gas Laser)

  • 최상태
    • 조명전기설비학회논문지
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    • 제20권1호
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    • pp.19-26
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    • 2006
  • 용량결합고주파(ccrf)방전은 홀로우음극방전이나, 직류방전에 비해서 방전관의 구조가 간단하고 균질한 플라즈마를 발생시키는 장점을 가지고 있다. 본 논문에서는 ccrf-방전을 기체레이저의 여기에 적용하기 위한 목표를 가지고 방전시스템을 선계, 제작하여 연속운전의 균질한 방전을 실현하였다. 13.56[MHz]의 rf-전력을 방전 내부로 효율적으로 결합하기 위해서 내부직경 5[mm]의 레이저방전관에 특수하게 제작된 rf-전극을 사용하였다. 또한 방전관의 임피던스가 rf-발생기의 풀력저항 50[$\Omega$]에 정합을 이루는 임피던스 정합회로를 개발하였다.

Multi-hole RF CCP 방전에서 방전 주파수가 미치는 영향

  • 이헌수;이윤성;서상훈;장홍영
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.145-145
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    • 2011
  • Recently, multi-hole electrode RF capacitively coupled plasma discharge is being used in the deposition of microcrystalline silicon for thin film solar cell to increase the speed of deposition. To make efficient multi-hole electrode RF capacitively coupled plasma discharge, the hole diameter is to be designed concerning the plasma parameters. In past studies, the relationship between plasma parameters such as pressures and gas species, and hole diameter for efficient plasma density enhancement is experimentally shown. In the presentation, the relationship between plasma deriving frequency and hole diameter for efficient multi-hole electrode RF capacitively coupled plasma discharge is shown. In usual capacitively coupled plasma discharge, plasma parameter, such as plasma density, plasma impedence and plasma temperature, change as frequency increases. Because of the change, the optimum hole diameter of the multi-hole electrode RF capacitively coupled plasma for high density plasma is thought to be modified when the plasma deriving frequency changes. To see the frequency effect on the multi-hole RF capacitively coupled plasma is discharged and one of its electrode is changed from a plane electrode to a variety of multi-hole electrodes with different hole diameters. The discharge is derived by RF power source with various frequency and the plasma parameter is measured with RF compensated single Langmuir probe. The shrinkage of the hole diameter for efficient discharge is observed as the plasma deriving frequency increases.

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Investigation of the Driving Frequency Effect on the RF-Driven Atmospheric Pressure Micro Dielectric Barrier Discharges

  • Bae, Hyowon;Lee, Jung Yeol;Lee, Hae June
    • Applied Science and Convergence Technology
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    • 제26권4호
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    • pp.74-78
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    • 2017
  • The discharge characteristics of the radio frequency (RF) surface dielectric barrier discharge have been simulated for the investigation of the ratio of the ion transit time to the RF period. From one-dimensional particle-in-cell (PIC) simulation for a planar dielectric barrier discharge (DBD), it was observed that the high-frequency driving voltage confines the ions in the plasma because of a shorter RF period than the ion transit time. For two-dimensional surface dielectric barrier discharges, a fluid simulation is performed to investigate the characteristics of RF discharges from 1 MHz to 40 MHz. The ratio of the peak density to the average density decreases with the increasing frequency, and the spatiotemporal discharge patterns change abruptly with the change in the ratio of ion transit time to the RF period.

KSTAR 제1벽 세정을 위한 방전세정 시스템 설계 (Design of the discharge cleaning system for KSTAR vacuum vessel)

  • 정승호;인상렬
    • 한국진공학회지
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    • 제16권5호
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    • pp.383-387
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    • 2007
  • 본 논문에서는 KSTAR 토카막 진공용기의 세정을 위한 방전세정 시스템의 설계에 대해 기술하였다. 먼저 방전세정효율에 영향을 주는 매개변수들에 대해 논의하였으며. 실제 설계에서 직류방전 보다 낮은 압력에서 방전이 시작되고 유지되며 따라서 세정효율이 높은 RG 방전(RF-assisted DC glow discharge) 방법을 채택하였다. 그리고 방전세정의 균일성을 위해 두 개의 방전 전극을 진공용기의 진단포트(A,I-port)에 설치하였다. 설계된 방전세정 시스템은 KSTAR 진공용기 내벽 세정뿐만 아니라 제1벽의 연료재순환(fuel recycling)이나 보론화 처리(boronization)등의 연구에도 응용될 수 있다.

부분방전 모니터링 시스템을 위한 광대역 RF 소자설계 연구 (Design of Broad Band RF Components for Partial Discharge Monitoring System)

  • 이제광;고재형;김군태;김형석
    • 전기학회논문지
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    • 제60권12호
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    • pp.2286-2292
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    • 2011
  • In this paper we present the design of Low Noise Amplifier(LNA), mixer and filter for RF front-end part of partial discharge monitoring system. The monitoring system of partial discharge in high voltage power machinery is used to prevent many kinds of industrial accidents, and is usually composed of three parts - sensor, RF front-end and digital microcontroller unit. In our study, LNA, mixer and filter are key components of the RF front-end. The LNA consists of common gate and common source-cascaded structure and uses the resistive feedback for broad band matching. A coupled line structure is utilized to implement the filter, of which size is reduced by the meander structure. The mixer is designed using dual gate structure for high isolation between RF and local oscillator signal.

RF/DC 방전을 이용한 고 진공용SUS 용기세정에 관한 연구 (A study on the RE/DC discharge cleaning for high vacuum SUS chamber)

  • 김정형;임종연;서인용;정광화
    • 한국진공학회지
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    • 제10권3호
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    • pp.298-302
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    • 2001
  • 초청정을 요구하는 진공용기의 내벽세정을 위한 RF 및 DC 방전세정장치를 제작하여 여러 가지 방전조건에 따라 세정효과를 조사하였다. Baking없이 방전세정만을 수행하였을 때는 baking만 진행했을 때와 비슷한 세정효과를 나타내었으며 세정후의 탈기체율은 반으로 줄어들었다. Baking과 방전세정을 동시에 진행하면 세정효과가 매우 증대되어 세정후의 탈기체율이 1/20으로 감소하였다. Baking과 방전세정을 동시에 수행 시 여러 방전조건에 따른 세정효과를 조사하였는데 이온이 진공용기 내벽에 부딪히며 세정을 할 때 이온에너지와 이온밀도가 중요한 역할을 하는 것으로 보였다. 진공용기를 세정함에 있어 RF방전세정이 DC 방전세정보다 효과적이라는 결과를 얻었다.

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1,2차 모델링을 이용한 Ar RF 플라즈마의 응답 특성 (The Properties of Ar RF Plasma Using 1- and 2-dimensional Model)

  • 박용섭;정해덕
    • 한국전기전자재료학회논문지
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    • 제14권8호
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    • pp.622-628
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    • 2001
  • We developed 1- and 2-dimensional fluid model for the analysis of a capacitively coupled Ar RF(Radio Frequency) glow discharge. This discharge is in pure Ar gas at the pressure 100[mTorr], frequency 13.56[MHz] and voltage amplitude 120[V}. This model is based on the equations of continuity and electron energy conservation coupled with Poison equation. 2-dimensional model is simulated on the condition of GEC(Gaseous Electronic Conference cell). The geometry of the discharge chamber and the electrodes used in the model is cylindrically simmetric; tow cylinders for the electrodes are surrounded by the grounded chamber. It is shown that 1-dimensional model is very useful on the understanding of RF glow discharge property and of the movement of charged particles. 2-dimensional model predicts off-axis maximum structure as in the experiments and has the results in qualitatively and quantitatively good agreement with the experiments. Effects of dc self-bias voltage, guard ring and reactor geometry is discussed.

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저기압하의 아르곤 가스의 RF 글로우 방전특성 (RF Glow Discharge Characteristics of Argon at Low Gas Pressure)

  • 곽동주;김두환;박정후
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 C
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    • pp.1382-1384
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    • 1995
  • In order to study the structure of RF glow discharge driven at 13.56MHz in argon, the discharge voltage, current and phase shift between them will be measured over a wide range of discharge parameters(gas pressure between 1mTorr and 50mTorr with discharge power between 20mW and 200W). In this paper, the dc glow discharge characteristics and plasma parameters of both FTS and CPMS systems are studied experimentally. It is found that for CPMS system discharge is stablized under wider ranges of magnetic field and pressure than for FTS system. The plasma density and electron temperature of the plasma for these two systems are in the range of $10^{10}{\sim}7{\times}10^{11}[cm^{-3}]$ and $3.5{\sim}6.5$[eV], respectively.

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RF 마그네트론 스퍼터법에 의한 ZnO:Al 투명전도막 특성에 미치는 방전전력의 영향 (Effect of discharge power on the electrical properties of ZnO:Al transparent conducting films by RF magnetron sputtering)

  • 이성욱;김병섭;이수호;임동건;박민우;이세종;곽동주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.939-942
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    • 2004
  • Al doped Zinc Oxide(ZnO:Al) films, which is widely used as a transparent conductor in optoelectronic devices such as solar cell, liquid crystal display, plasma display panel, thermal heater, and other sensors were Prepared by using the capacitively coupled RF magnetron sputtering method. In this paper the effect of RF discharge power on the electrical, optical and structural properties were investigated experimentally. The results show that the structural and electrical properties of the film are highly affected by the variation of RF discharge power. The optimum growth conditions were obtained for films doped with 2 wt% of $Al_2O_3$ and 200 W in RF discharge power, which exhibit a resistivity of $10.4{\times}10^{-4}{\Omega}-cm$ associated with a transmittance of 89.66 % for 1000nm in films thickness in the wavelength range of the visible spectrum.

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