• 제목/요약/키워드: Quantum-dot

검색결과 429건 처리시간 0.02초

ITO-Ag NW기반 투명 양자점 발광 다이오드 (ITO-Ag NW based Transparent Quantum Dot Light Emitting Diode)

  • 강태욱;김효준;정용석;김종수
    • 한국재료학회지
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    • 제30권8호
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    • pp.421-425
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    • 2020
  • A transparent quantum dot (QD)-based light-emitting diode (LED) with silver nanowire (Ag NW) and indium-tin oxide (ITO) hybrid electrode is demonstrated. The device consists of an Ag NW-ITO hybrid cathode (-), zinc oxide, poly (9-vinylcarbazole) (PVK), CdSe/CdZnS QD, tungsten trioxide, and ITO anode (+). The device shows pure green-color emission peaking at 548 nm, with a narrow spectral half width of 43 nm. Devices with hybrid cathodes show better performances, including higher luminance with higher current density, and lower threshold voltage of 5 V, compared with the reference device with a pure Ag NW cathode. It is worth noting that our transparent device with hybrid cathode exhibits a lifetime 9,300 seconds longer than that of a device with Ag NW cathode. This is the reason that the ITO overlayer can protect against oxidization of Ag NW, and the Ag NW underlayer can reduce the junction resistance and spread the current efficiently. The hybrid cathode for our transparent QD LED can applicable to other quantum structure-based optical devices.

Effect of Ultrathin Al2O3 Layer on TiO2 Surface in CdS/CdSe Co-Sensitized Quantum Dot Solar Cells

  • Sung, Sang Do;Lim, Iseul;Kim, Myung Soo;Lee, Wan In
    • Bulletin of the Korean Chemical Society
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    • 제34권2호
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    • pp.411-414
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    • 2013
  • In order to enhance the photovoltaic property of the CdS/CdSe co-sensitized quantum dot sensitized solar cells (QDSSCs), the surface of nanoporous $TiO_2$ photoanode was modified by ultrathin $Al_2O_3$ layer before the deposition of quantum dots (QDs). The $Al_2O_3$ layer, dip-coated by 0.10 M Al precursor solution, exhibited the optimized performance in blocking the back-reaction of the photo-injected electrons from $TiO_2$ conduction band (CB) to polysulfide electrolyte. Transient photocurrent spectra revealed that the electron lifetime (${\tau}_e$) increased significantly by introducing the ultrathin $Al_2O_3$ layer on $TiO_2$ surface, whereas the electron diffusion coefficient ($D_e$) was not varied. As a result, the $V_{oc}$ increased from 0.487 to 0.545 V, without appreciable change in short circuit current ($J_{sc}$), thus inducing the enhancement of photovoltaic conversion efficiency (${\eta}$) from 3.01% to 3.38%.

고출력 응용을 위한 $1.3\;{\mu}m$ InAs/GaAs 양자점 레이저 다이오드의 특성 연구 (Characteristics of $1.3\;{\mu}m$ InAs/GaAs Quantum Dot Laser Diode for High-Power Applications)

  • 김경찬;유영채;이정일;한일기;김태근
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 하계학술대회 논문집 Vol.7
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    • pp.477-478
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    • 2006
  • Characteristics of InAs/GaAs quantum dot (QD) ridge laser diodes (LDs) are investigated for high-power $1.3\;{\mu}m$ applications. For QD ridge LDs with a $5-{\mu}m$-wide stripe and a 1-mm-long cavity, the emission wavelength of 1284.1 nm, the single-uncoated-facet CW output power as high as 90 mW, the external efficiency of 0.31 W/A and the threshold current density of $800\;mA/cm^2$ are obtained. The linewidth enhancement factor ($\alpha$-factor) is successfully measured to be between 0.4 and 0.6, which are about four times as small values with respect to conventional quantum well structure. It is possible that this result significantly reduce the filamentation of far-field profiles resulting in better beam quality for high power operation.

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ZnO 박막 전자수송층의 공기 노출에 의한 양자점 발광다이오드의 특성 변화 (Effect of Air Exposure on ZnO Thin Film for Electron Transport Layer of Quantum Dot Light-Emitting Diode )

  • 서은용;이경재;황정하;김동현;임재훈;이동구
    • 센서학회지
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    • 제32권6호
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    • pp.455-461
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    • 2023
  • We investigated the electrical characteristics of ZnO nanoparticles (NPs) with air exposure that is a widely used electron transport layer for quantum dot light-emitting diodes (QLEDs). Upon air exposure, we observed changes in the density of states (DOS) of the trap levels of ZnO NPs. In particular, with air exposure, the concentration of deep trap energy levels in ZnO NPs decreased and electron mobility significantly improved. Consequently, the air-exposed ZnO reduced leakage current by approximately one order of magnitude and enhanced the external quantum efficiency at the low driving voltage region of the QLED. In addition, based on the excellent conductivity properties, high-brightness QLEDs could be achieved.

양자간섭소자를 위한 InGaAs/InGaAsP/InP 양자점 분자구조 연구 (Study on InGaAs/InGaAsP/InP Quantum-dot Molecules for Quantum Interference devices)

  • 김진석;김은규;정원국
    • 한국진공학회지
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    • 제15권2호
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    • pp.186-193
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    • 2006
  • 유기금속화학기상증착법으로 InGaAs/InGaAsP/InP 양자점 분자구조를 두 양자점 층간의 거리가 10 nm가 되도록 성장하여 성장된 구조에 대해 C-V, DLTS 및 PL 등의 전기 광학적 물성측정을 하였다. 그 결과 큰 양자점은 작은 양자점과 비교하여 장벽물질의 전도대역 가장자리로부터 먼 쪽에 에너지 준위가 형성되어 있음을 확인하였다. 큰 쪽 양자점에는 최소한 2개 이상의 에너지 준위에 운반자를 포획시킬 수 있음이 확인되었는데, -4 V의 역전압 하에서 측정된 양자점 분자구조의 에너지 준위는 장벽 가장자리로부터 0.35, 0.42, 0.45 eV 의 깊이에 각각 존재하였다. 인가된 전압의 변화에 대하여 약한 전기장 하에서는 양자점 분자구조의 에너지 준위들이 서로 결합되어 있다가 전기장이 증가하면서 이들 두 에너지 준위가 확연히 분리되는 모습을 확인할 수 있었다.

상압 분위기에서 QD 제작 및 이를 응용한 비휘발성 QD 메모리 특성 평가

  • 안강호;안진홍;정혁
    • 한국반도체및디스플레이장비학회:학술대회논문집
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    • 한국반도체및디스플레이장비학회 2005년도 추계 학술대회
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    • pp.137-141
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    • 2005
  • Quantum dot(QD) 메모리용 silicon nano-particle을 corona 방전방법에 의해 상온에서 대량 발생하는 방법을 개발하였다. Silicon QD는 SiH4 가스를 코로나 방전 영역을 통과시켜 발생시켰으며, 코로나 전압은 2.75kV를 사용하였다. SiH4 몰농도 $0.33{\times}10^{-7}\;mol/l$ 일 경우 발생된 QD입자 크기는 약 10nm이며 기하학적 표준편차(geometric standard deviation)는 1.31이었다. 이 조건에서 nonvolatile quantum dot semiconductor memory (NVQDM)를 제작하였으며, 이렇게 제작된 NVQDM flat band voltage는 1.5 volt였다.

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대기압 MOCVD 시스템을 이용하여 Si 기판 위에 자발적으로 형성된 InAs 양자점에 대한 연구 (Epitaxy of Self-assembled InAs Quantum Dots on Si Substrates by Atmospheric Pressure Metalorganic Chemical Vapor Deposition)

  • 유충현
    • 한국전기전자재료학회논문지
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    • 제18권6호
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    • pp.527-531
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    • 2005
  • Fully coherent self-assembled InAs quantum dots(QDs) grown on Si (100) substrates by atmospheric pressure metalorganic chemical vapor deposition(APMOCVD) were grown and the effect of growth conditions such as growth rate and growth time on quantum dots' morphology such as densities and sizes was investigated. InAs QDs of 30 - 80 nm in diameters with densities in the range of (0.6 - 1.7) x $10^{10}\;cm^{-2}$ were achieved on Si substrates and InAs layer was changed from 2 dimensional growth to 3 dimensional one at a nominal thickness less than 0.48 ML. This is attributed to the higher ambient pressure of APMOCVD suppressing of In segregation from the 2 dimensional InAs layer. This In segregation looked to disturb the dot formation especially when the growth rate was low so that the dots became less dense and bigger as the growth rate was lower.

파장대역폭이 넓은 고휘도 발광소자를 위한 Chirped 양자점 구조의 광/전기 특성 분석 (Optical and Electrical Characteristics of Chirped Quantum Dot Structures for the Superluminescent Diodes with Wide Spectrum Bandwidth)

  • 한일기
    • 한국진공학회지
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    • 제18권5호
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    • pp.365-371
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    • 2009
  • 크기가 다른 양자점 (chirped 양자점) 구조에 대하여 전기발광 (Electroluminescence, EL) 특성과 광발광 (Photoluminescence, PL) 특성을 측정하고 비교 분석하였다. PL 특성에서는 양자점의 기저준위에 의한 피이크가 우세하게 나타난 반면, EL 특성에서는 여기준위에 의한 특성이 우세하게 나타났다. 이와 같은 특성비교로부터 기저준위도 EL 특성에 영향을 미칠 수 있도록 chirped 양자점 구조를 설계하면 파장대역폭이 더욱 넓은 고휘도 발광소자 개발이 가능할 것임을 제안하였다.