• Title, Summary, Keyword: Quadrupole illumination

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Off-Axis Illumination (패턴 분해능 및 초점심도 향상에 대한 사입사 조명)

  • 박정보;이성묵
    • Korean Journal of Optics and Photonics
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    • v.10 no.6
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    • pp.453-461
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    • 1999
  • In this paper, we have studied on the effects of annular and quadrupole illuminations by changing their conditions for enhancing the pattern resolution and depth of focus (OaF) in the optical lithography system using KrF Eximer laser 0.248$\mu$m and 0.65 NA. As a result, it is revealed that each illumination condition to optimize the resolution and the OaF for the mask containing the assistance pattern is different under the annular illumination. And in case of quadrupole illumination, we could ascertain that the resolution and the OaF would be enhanced through changing the arrangement of each pole from the conventional X type (45 degrees) to some proper type according to the main pattern direction. ction.

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Modified Illumination by Binary Phase Diffractive Patterns on the Backside of a Photomask (마스크 뒷면에 2 위상 회절 격자를 구현한 변형 조명 방법)

  • 이재철;오용호;고춘수
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.7
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    • pp.697-700
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    • 2004
  • We propose a method that realizes the modified illumination by implementing a binary phase grating at the backside of a photomask. By modeling the relationship between the shape of a grating on the photomask and the light intensity at the pupil plane, we developed a program named MIDAS that finds the optimum grating pattern with a stochastic approach. After applying the program to several examples, we found that the program finds the grating pattern for the modified illumination that we want. By applying the grating at the backside of a photomask, the light efficiency of modified illumination may be improved.

Modified Illumination with a Concentric Circular Grating at the Backside of a Photomask (마스크 뒷면에 동심원 격자를 사용한 변형조명 방법)

  • Oh, Yong-Ho;Go, Chun-Soo;Lim, Sungwoo;Lee, Jai-Cheol
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.3
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    • pp.212-215
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    • 2005
  • Modified illumination techniques have been used to enhance the resolution of the sub-wavelength lithography. But, since they shield the central part of incident light, the light efficiency is seriously degraded, which in turn reduces the throughput of a lithography process. In this research, we introduced an annular illumination structure that enhances the light efficiency with a concentric circular grating at the backside of a photomask. The efficiency of the structure was theoretically analyzed.

Research on the optimization of off-axis illumination condition and sub-resolution pattern size for the $0.1{\mu}m$ rule dense pattern formation ($0.1{\mu}m$급 dense 패턴 형성을 위한 사입사 조명 조건과 OPC 보조 패턴 크기의 최적 조건에 관한 연구)

  • 박정보;이재봉;이성묵
    • Korean Journal of Optics and Photonics
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    • v.12 no.3
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    • pp.190-199
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    • 2001
  • In this paper, we have researched the depth of focus (DOF) and cutoff intensity of the $0.1{\mu}m$rule dense line'||'&'||'space pattern according to the various off-axis illumination (OAl) conditions in the optical system of 0.65 NA using ArF excimer laser (193 nm). We have also studied the variation of the DOF and cutoff intensity according to the sub-resolution pattern (hammer head type) size for optical proximity correction (OPC) applied to the capacitor pattern and the various OAl conditions in the same optical system. As a result, it is revealed that the cross type quadrupole or annular illumination is preferred to the conventional X type quadrupole for printing the $0.1{\mu}m$ rule dense pattern. Also, we can investigate the optimal illumination condition and the size of ope sub-resolution pattern to keep a consistent DGF and cutoff intensity trends.

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