• Title/Summary/Keyword: Pressure material

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Analysis of Body Pressure Distribution Characteristics According to the Design Factors of the Air-Cell Mattress for Preventing Decubitus Ulcer (욕창방지방석용 공기셀의 설계요소에 따른 체압 분포 특성 분석)

  • Cho, Hyeon-Seok;Ryu, Jei-Cheong;Kim, Gyoo-Suk;Mun, Mu-Sung;Lee, In-Hyuk
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.5
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    • pp.118-126
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    • 2007
  • A finite element simulation model was developed for the performance optimization of a closed type air-cell mattress used for the ulcer prevention. An H-model with material properties of human flesh and kinematic joints were used for the calculation of the body contact pressure. The material property of rubber air-cell was evaluated by tensile test of standard specimen. We evaluated the body contact pressure distribution after laying human model on the inflated air-cell mattress. It was found that the body contact pressure was dependent on cell height. but hardly affected by the thickness of the rubber in a cell.

The Fabrication of Ceramic Thin-Film Type Pressure Sensors for High-Temperature applications (고온용 세라믹 박막형 압력센서의 제작)

  • Kim, Jae-Min;Choi, Sung-Kyu;Chung, Gwiy-Sang
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.11a
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    • pp.456-459
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    • 2002
  • This paper describes fabrication and characteristics of ceramic pressure sensor for working at high temperature. The proposed pressure sensor consists of a Ta-N thin-film, patterned on a Wheatstone bridge configuration, sputter deposited onto thermally oxidized Si membranes with an aluminium interconnection layer. The fabricated pressure sensor presents a low temperature coefficient of resistance, high sensitivity, low non-linearity and excellent temperature stability. The sensitivity is 1.097~1.21mV/$V{\cdot}kgf/cm^2$ in the temperature range of $25{\sim}200^{\circ}C$ and the maximum non-linearity is 0.43 %FS.

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Microstructure Electrical Prperties of (Ba, Sr)TiO$_3$[BST] Thin Films with Sputtering Pressure (Sputtering 압력에 따른 (Ba,Sr)TiO$_3$[BST] 박막의 구조 및 전기적 특성)

  • 신승창;이문기;류기원;배선기;이영희
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.06a
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    • pp.379-382
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    • 1998
  • (Ba, Sr)TiO$_3$[BST] thin films were fabricated on Pt/SiO$_2$/Si substrate by RF sputtering technique. The Mic개structure, dielectric and electrical properties of BST thin films were investigated with sputtering pressure. Dielectric constant and dielectric loss of the deposited thin film at sputtering pressure of 5 mTorr were about 91 and 1.9(%), respectively. Increasing sputtering pressure, leakage current was increased. It was found that leakage current of BST thin films was depended on the sputtering pressure.

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The effect of non-homogeneity on the stability of laminated orthotropic conical shells subjected to hydrostatic pressure

  • Zerin, Zihni
    • Structural Engineering and Mechanics
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    • v.43 no.1
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    • pp.89-103
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    • 2012
  • In this study, the stability of laminated homogeneous and non-homogeneous orthotropic truncated conical shells with freely supported edges under a uniform hydrostatic pressure is investigated. It is assumed that the composite material is orthotropic and the material properties depend only on the thickness coordinate. The basic relations, the modified Donnell type stability and compatibility equations have been obtained for laminated non-homogeneous orthotropic truncated conical shells. Applying Galerkin method to the foregoing equations, the expression for the critical hydrostatic pressure is obtained. The appropriate formulas for the single-layer and laminated, cylindrical and complete conical shells made of homogeneous and non-homogeneous, orthotropic and isotropic materials are found as a special case. Finally, effects of non-homogeneity, number and ordering of layers and variations of shell characteristics on the critical hydrostatic pressure are investigated.

A Cu-Ni Thin Film Pressure Sensor (Cu-Ni 박막 압력 센서)

  • 민남기;전재형;이성래;김정완
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.11a
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    • pp.9-12
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    • 1997
  • The fabrication and performance of a thin film pressure sensor are described. Cu-Ni thin film strain gauges have been fabricated by RF magnetron sputtering. For all the gauges, the relative chance in resistance ΔR/R with pressure is of the order 10$^{-3}$ for the maximum pressure. The output characteristic is found to be linear over the entire Pressure range (0-30kgf/cm$^2$) and the output sensitivity is 1.6 mV/V. The maximum nonlinearity observed in output characteristics is 0.34%FS for 5V excitation and the hysteresis is less than 0.1%FS.

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Electrical Properties of Plasma According to Gas Pressure and RF Power of Xe-Inductively Coupled Plasma (유도결합형 제논의 가스압력 및 RF전력에 따른 플라즈마의 전기적 특성)

  • Choi, Yong-Sung;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.12a
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    • pp.43-47
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    • 2006
  • In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma (ICP). As results at several dependences of 20~100mTorr Xenon pressure, the brightness of discharge tube was higher (4,900 $cd/m^2$) than other conditions when Xe pressure was 20mTorr and RF power was 200W. In that case, the electron temperature and density were 3.58eV and $3.56{\times}10^{12}cm^2$, respectively. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

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Design and Fabrication of Capacitive Pressure Sensor (용량형 압력센서의 설계 및 제작)

  • 이승준;김병태;권영수;정귀상
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.561-564
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    • 2000
  • Silicon capacitive pressure sensor has been fabricated by using electrochemical etching stop and silicon-to-glass electrostatic bonding technique. A diaphragm structure is designed to compensate the nonlinear response. A cavity is etched into the silicon to the depth of 2$\mu\textrm{m}$ by anisotropic etching in 20wt.% TMAH solution at 80$^{\circ}C$. A fabricated sensor showed 3.3 pF zero-pressure capacitance, 297 pp.m/mmHg sensitivity, and a 7.4 7%F.S. nonlinear response in a 0-1 kgf/cm$^2$pressure range.

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Effect of Gas Pressure Infiltration on Microstructure of Continuous Fiber Reinforced Al Matrix Composite Wire (연속섬유 강화 Al기 복합재료 선재의 미세조직에 미치는 가스압의 영향)

  • Kim, Jung-Hoon;Jung, Dong-Suk;Kim, Jin-Gon;Kim, Byung-Geol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.617-618
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    • 2005
  • The main purpose of this study is to investigate the effect of gas pressure infiltration on microstructure. Continuous fiber reinforced Al matrix composite wire is produced by gas pressure infiltration process. With the increase of gas pressure, porosity and wettabillity was improved. No chemical reaction product was detected at the interface of $Al_2O_3$ and Al.

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Effect of Working Pressure Conditions during Sputtering on the Electrical Performance in Te Thin-Film Transistors (RF Sputtering 공정 법을 이용해 증착한 Te 기반 박막 및 박막 트랜지스터의 공정 변수에 따른 전기적 특성 평가)

  • Lee, Kyu Ri;Kim, Hyun-Suk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.35 no.2
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    • pp.190-193
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    • 2022
  • In this work, the effect of sputtering working pressure for the tellurium film and its thin-film transistor was investigated. The transfer characteristics of tellurium thin-film transistors were improved by increasing the working pressure during sputtering process. As increasing working pressure, physical and optical properties of Te films such as crystallinity, transmittance, and surface roughness were improved. Therefore, the improved transfer characteristics of Te thin-film transistors may originate from both improved interface properties between the silicon oxide gate dielectric layer and the tellurium active layer with an improved quality of Te film. In conclusion, the control of working pressure during sputtering would be important for obtaining high-performance tellurium-based thin film transistor

Thermoelastic analysis of rotating FGM thick-walled cylindrical pressure vessels under bi-directional thermal loading using disk-form multilayer

  • Fatemeh Ramezani;Mohammad Zamani Nejad
    • Steel and Composite Structures
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    • v.51 no.2
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    • pp.139-151
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    • 2024
  • In this research, a semi-analytical solution is presented for computing mechanical displacements and thermal stresses in rotating thick cylindrical pressure vessels made of functionally graded material (FGM). The modulus of elasticity, linear thermal expansion coefficient, and density of the cylinder are assumed to change along the axial direction as a power-law function. It is also assumed that Poisson's ratio and thermal conductivity are constant. This cylinder was subjected to non-uniform internal pressure and thermal loading. Thermal loading varies in two directions. The governing equations are derived by the first-order shear deformation theory (FSDT). Using the multilayer method, a functionally graded (FG) cylinder with variable thickness is divided into n homogenous disks, and n sets of differential equations are obtained. Applying the boundary conditions and continuity conditions between the layers, the solution of this set of equations is obtained. To the best of the researchers' knowledge, in the literature, there is no study carried out bi-directional thermoelastic analysis of clamped-clamped rotating FGM thick-walled cylindrical pressure vessels under variable pressure in the longitudinal direction.