A Study on the double-layered dielectric films of tantalum oxide and silicon nitride formed by in situ process (연속 공정으로 형성된 탄탈륨 산화막 및 실리콘 질화막의 이중유전막에 관한 연구)
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- Journal of the Korean Institute of Telematics and Electronics A
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- v.30A no.1
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- pp.44-50
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- 1993