• Title/Summary/Keyword: Plating rate

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Effects of Nano-sized Diamond on Wettability and Interfacial Reaction for Immersion Sn Plating

  • Yu, A-Mi;Kang, Nam-Hyun;Lee, Kang;Lee, Jong-Hyun
    • 마이크로전자및패키징학회지
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    • 제17권3호
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    • pp.59-63
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    • 2010
  • Immersion Sn plating was produced on Cu foil by distributing nano-sized diamonds (ND). The ND distributed on the coating surface broke the continuity of Sn-oxide layer, therefore leading to penetrate the molten solder through the oxide and retarding the wettability degradation during a reflow process. Furthermore, the ND in the Sn coating played a role of diffusion barrier for Sn atoms and decreased the growth rate of intermetallic compound ($Cu_6Sn_5$) layer during the solid-state aging. The study confirmed the importance of ND to improve the wettability and reliability of the Sn plating. Complete dispersion of the ND within the immersion Sn plating needs to be further developed for the electronic packaging applications.

Effect of Plating Parameters on the Electrodeposition of Ni-alumina Nanocomposite

  • Gyawalia, Gobinda;Woo, Dong-Jin;Lee, Soo-Wohn
    • 한국표면공학회지
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    • 제43권4호
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    • pp.165-169
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    • 2010
  • $Ni-Al_2O_3$ nanocomposite coatings were fabricated by conventional electrodeposition technique using nickel sulfamate bath. Effect of plating parameters on electrodeposition of $Ni-Al_2O_3$ nanocomposite were studied. The properties of the nano composite were investigated by using SEM, XRD, and Vicker's microhardness test. The results demonstrated that $Al_2O_3$ incorporation in the composite coatings was found to be increased by increasing stir rate and $Al_2O_3$ content in plating bath. Microhardness of the composite coatings was also increased with increasing content of the nano particles in the plating bath. The surface morphologies of the nanocomposite coatings were found to be varied with varying pH, current densities as well as alumina content in the plating bath.

Pb계 Ceramics 기지상의 무전해 Ni 도금 (Electroless Ni Plating on Pb-base Ceramics)

  • 민봉기;유종수;최순돈;신현준
    • 한국표면공학회지
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    • 제32권4호
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    • pp.487-495
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    • 1999
  • In order to form metallic electrodes on PZT (Pb (Zr, Ti)O$_3$) ceramics, plating conditions for optimal electroless Ni deposition were investigated. Pb in PZT is the major component to inhibit the electroless deposition, because it plays a active role of catalytic poison in plating solution. Adhesion of the electroless Ni deposits is measured by push-pull scale test and peel test. Results such as deposition ability, deposition rate, and thickness of deposits showed in terms of concentration of etchant, composition of catalyzing solution, and composition and pH of electroless bath solution.

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Strip 형 반도체 부품상에 회전음극 방법에 의한 주석도금에 관한 고찰 (Rotary Cathode Tin Plating on Strip Type Semiconductors)

  • 이완구
    • 한국표면공학회지
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    • 제8권2호
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    • pp.1-6
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    • 1975
  • A novel electroplating process is described and effects of anode lay-out thickness distribution and on platiting rate are discussed. Microphotograhic analysis indicates are compact and less "POROUS " than of barrel and rack. With this process production cost reduction and capacity increase could be achieved by a rate of 60% and 97% respectively, as compared to our present barrel plating process. This process disclose a number of beneficial processes such as color coding system on TO-92 package and development of a new tin bath formula.

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무전해 동 도금용액 속에서 안정제의 역할 (Effects of Stabilizing Additives on Electroless Copper Deposition)

  • 최순돈;박범동
    • 한국표면공학회지
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    • 제25권4호
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    • pp.173-180
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    • 1992
  • The effects of the stabilizing additives such as NaCN, 2-MBT and Thiourea on bath decom-position, plating rate and surface morphology have been studied. Bath stability was increased in the order of an additive-free bath, and NaCN-, 2-MBT-, and Thiourea-stabilized baths. The sta-bilizing effects may be attributed to the stability of Cu(II) -complexes. The plating rate is the re-verse order of the bath stability. Accelerative effect of 2-MBT in proper quantity(0.3mg/$\ell$) may be explained by visualizing it absorbed through benzene ring or sulfur atom on portions of the sub-strates. The strong bond of the complexing part of the molecule to nearby chelated copper ions would tend to accelerate plating by making it easier for the Cu2+ -ligand bond to be broken. Sur-face morphologies of copper deposits depend on the bath additives. Electroless copper deposits from the 2-MBT stabilized baths are finer than the deposits from the NaCN- and Thiourea- stabi-lized baths due to the strong adsorption on the substrates.

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초음파 교반을 이용한 기억소자 Metallization용 무전해 Ni Plating (Electroless Ni Plating for Memory Device Metallization Using Ultrasonic Agitation)

  • 우찬희;우용하;박종완;이원해
    • 한국표면공학회지
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    • 제27권2호
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    • pp.109-117
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    • 1994
  • Effect of ultrasonic agitation on the contact properties was studied in Ni electroless plating and Pd activation. P-type Si bare wafers were used as substrate and DMAB was used as reducing agent due to its good electrical properties, solderability and compatibility to substrate. In activation, high density Pd nuclei of small size were formed during ultra-sonic agitation compared to that of no stirring. In electroless plating, the plating rate was enhanced by 30∼90% by using ultrasonic agitation. In elecrtoless plating, inhibitor is the most effective additives in ultrasonic agitation. In this experi-ment, thiourea was used as inhibitor. The less the amount of the inhibitor, the more ultrasonic agitation efficiency. It is confirmed by SEM that Ni-B films formed by ultrasonic were coarser, less porous, and denser than those of no stirring. In ultrasonic agitation, boron content of the films was more than those of no stirring. In this case, the more DMAB concentration, the higher the temperature, the less pH, the more boron content. Resistivity of the films formed by ultrasonic agitation was higher than that of no strirring. As the content of boron was increased, the resistivity of the films was increased exponentially.

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CBN분말상에 석출형상 제어를 위한 무전해 기능성 니켈합금도금에 관한 연구 (A Study on the Functional Electroless Ni Plating for Controled Morphology on the CBN Powder)

  • 추현식;김동규
    • 한국표면공학회지
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    • 제41권6호
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    • pp.312-324
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    • 2008
  • In this study, the functional property as a super abrasive material was secured for CBN powder by the electroless Ni-P plating on the surface of the particle. The plating solution has been prepared to control the surface morphology by regulating surfactants and process conditions. The effects of processing parameters on the surface morphology of CBN powder was discussed. The results are summarized as follows; A stable plating tendency was achieved from 1 hour after quantitatively dropping reducing agent. It was observed that more than 50% of the weight gain was obtained by Ni-P coating on the surface of CBN super abrasive powder. The morphology of the Ni-P coating layer is consisted of botryoidal and spiky type and it could be controlled by regulating processing parameters. Superior characteristic in terms of surface morphology was found in the nonionic surfactant XL-80N. It was found that XL-80N considerably decreased surface tension of CBN powder and Ni-P alloy surface then enhance wettability as well as plating rate. Metal coated CBN powder as a raw material of resin bond wheel has been developed through this investigation.

중소기업 도금공정에서의 6가 크롬 폭로에 관한 연구 (A Study on Worker Exposure to Hexavalent Chromium in Plating 0peration)

  • 정희경;백남원
    • 한국산업보건학회지
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    • 제3권2호
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    • pp.152-165
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    • 1993
  • This study was performed at eleven small-sized plating factories located in Seoul, Incheon, Ansan, and Taejeon from July 21 to October 6, 1992. The major objectives of this study were to evaluate worker exposure to hexavalent chromium and local exhaust ventilation (L.E.V.) systems at the chromium plating operations. The most suitable L.E.V. systems for chromium plating tanks were designed as examples for recommendation to the industry. The results are summarized as follows. The range of chromium plating operations investigated included decorative, hard, and black chromium plating on several kinds of parts. Most of plating tanks were not equipped with proper control methods against emission of hexavalent chromium mists and workers were not wearing appropriate personal protectives. The ariborne hexavalent chromium concentrations showed an approximate lognormal distribution. The geometric means of both personal and area samples were within the Korean and ACGIH standards, $50{\mu}g/m^3$. However, in comparison with the NIOSH criterion, $1{\mu}g/m^3$, the geometric means of personal samples at two factories and the geometric means of area samples at two factories exceeded it. The geometric means of personal and area samples of high exposure groups (above the NIOSH criterion) were 7 and 27 times higher than those of low exposure groups (below the NIOSH criterion), respectively. The L.E.V. systems of high exposure groups were improperly designed, and the factory with the highest exposure level had no L.E.V. systems at all on chemical etching process. Whereas at factories of low exposure groups, mist control methods such as mist suppressants, tank cover, and/or auxillary L.E.V. systems were added to L.E.V systems. The evaluation of L.E.V. systems showed that there was no chromium plating operation satisfying the ACGIH criteria for capture velocity, slot velocity, and exhaust rate simultaneously. To increase performance of L.E.V. systems, it must be designed to minimize the impact of boundary layer separation. Push-pull ventilation hood and downward plenum ventilation hood were suggested for the Korean industry.

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광유도도금을 이용한 스크린 프린팅 결정질 실리콘 태양전지의 효율 향상 (Efficiency Improvement in Screen-printed Crystalline Silicon Solar Cell with Light Induced Plating)

  • 정명상;강민구;장효식;송희은
    • 한국전기전자재료학회논문지
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    • 제26권3호
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    • pp.246-251
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    • 2013
  • Screen printing is commonly used to form the front/back electrodes in silicon solar cell. But it has caused high resistance and low aspect ratio, resulting in decreased conversion efficiency in solar cell. Recently the plating method has been combined with screen-printed c-Si solar cell to reduce the resistance and improve the aspect ratio. In this paper, we investigated the effect of light induced silver plating with screen-printed c-Si solar cells and compared their electrical properties. All wafers were textured, doped, and coated with anti-reflection layer. The metallization process was carried out with screen-printing, followed by co-fired. Then we performed light induced Ag plating by changing the plating time in the range of 20 sec~5min with/without external light. For comparison, we measured the light I-V characteristics and electrode width by optical microscope. During plating, silver ions fill the porous structure established in rapid silver particle sintering during co-firing step, which results in resistance decrease and efficiency improvement. The plating rate was increased in presence of light lamp, resulting in widening the electrode with and reducing the short-circuit current by shadowing loss. With the optimized plating condition, the conversion efficiency of solar cells was increased by 0.4% due to decreased series resistance. Finally we obtained the short-circuit current of 8.66 A, open-circuit voltage of 0.632 V, fill factor of 78.2%, and efficiency of 17.8% on a silicon solar cell.

pH Effects of Electroless Ni Plating on ABS Plastics

  • Song, T.H.;Lee, J.K.;Ryoo, K.K.;Lee, Y.B.
    • Corrosion Science and Technology
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    • 제3권1호
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    • pp.26-29
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    • 2004
  • Metal plated plastics are becoming more prevalent in materials of communication parts. A new technique MmSH is a process of injecting plastics to produce innovated physical properties compared to the conventional injection process. This study involves two ways of coating plastics Ni by electroless plating and varying bath and plasma treatment for improved adhesion strength between plating layer and surface. MmSH injection processed ASS with plasma treated after neutralization showed a superior adhesion force and a gloss and rate of deposition when it was in pH 7.5. On the other hand, conventional injection processed ASS was in pH 6.5.