• Title/Summary/Keyword: Plasma x-ray

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LASER-PRODUED PLASMA AS AN X-RAY SOURCE

  • 김효근
    • Proceedings of the Optical Society of Korea Conference
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    • 1991.06a
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    • pp.64-64
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    • 1991
  • The interaction of high-intensity, focused, nanosecond laser light with matter results in the production of high-temperature plasma, which in turn emits an intense pulse of x rays. The x-ray spectrum consists of strong line components of several keV photon energy and broad continuum. Such an x-ray source provides many advantages over conventional ones for many applications. Pulse nature of the x-ray emission is well-suited for studying transient phenomena and for imaging living biological specimen. Recent experiments have also shown that the laser plasma x ray may be used for x ray lithography. These studies and other applications will be discussed in detail.

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STUDY OF FLARE-ASSOCIATED X-RAY PLASMA EJECTIONS : II. MORPHOLOGICAL CLASSIFICATION

  • KIM YEON-HAN;MOON Y.-J.;CHO K.-S.;BONG SU-CHAN;PARK Y.-D.
    • Journal of The Korean Astronomical Society
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    • v.37 no.4
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    • pp.171-177
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    • 2004
  • X-ray plasma ejections often occurred around the impulsive phases of solar flares and have been well observed by the SXT aboard Yohkoh. Though the X-ray plasma ejections show various morphological shapes, there has been no attempt at classifying the morphological groups for a large sample of the X-ray plasma ejections. In this study, we have classified 137 X-ray plasma ejections according to their shape for the first time. Our classification criteria are as follows: (1) a loop type shows ejecting plasma with the shape of loops, (2) a spray type has a continuous stream of plasma without showing any typical shape, (3) a jet type shows collimated motions of plasma, (4) a confined ejection shows limited motions of plasma near a flaring site. As a result, we classified the flare-associated X-ray plasma ejections into five groups as follows: loop-type (60 events), spray-type (40 events), jet-type (11 events), confined ejection (18 events), and others (8 events). As an illustration, we presented time sequence images of several typical events to discuss their morphological characteristics, speed, CME association, and magnetic field configuration. We found that the jet-type events tend to have higher speeds and better association with CMEs than those of the loop-type events. It is also found that the CME association (11/11) of the jet-type events is much higher than that (5/18) of the confined ejections. These facts imply that the physical characteristics of the X-ray plasma ejections are closely associated with magnetic field configurations near the reconnection regions.

The study on X-ray generation in the Coaxial Plasma focus Device (동축 플라즈마 집속장치에서의 x-선 방출에 관한 연구)

  • 엄영현
    • Proceedings of the Optical Society of Korea Conference
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    • 1989.02a
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    • pp.65-69
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    • 1989
  • Mather type dense plasma focus device was develooped for the feasibili쇼 study in its application to the x-ray lithography. To etermine the electrical characteristics,the temporal begavior of the discharge current and the voltage was measured by using the Rogowski coil and the high voltage probe respectively. The results are 9 $\mu\textrm{s}$ of the period, 18m$\Omega$ of resistance and 0.16$\mu$Η of inductance. The average current sheath velocity was measured by the light signal emitted at the moving plasma sheath. The light signal was detected through two fiber bundles. When the applied voltage was 13 kV and the initial jpressure of argon was 21.8 Pa, the best plasma focus was occurred. The x-ray emission characteristics from the plasma focus was determined by the x-ray pictures taken by pinhole camera. It is focus that the plasma was focused at 1.4 cm distant position above the center electrode and its diameter was about 1.0 m.

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Irradiation of Intense Characteristic X-rays from Weakly Ionized Linear Plasma

  • Sato, Eiichi;Hayasi, Yasuomi;Tanaka, Etsuro;Mori, Hidezo;Kawai, Toshiaki;Takayama, Kazuyoshi;Ido, Hideaki
    • Proceedings of the Korean Society of Medical Physics Conference
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    • 2002.09a
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    • pp.396-399
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    • 2002
  • Intense quasi-monochromatic x-ray irradiation from the linear plasma target is described. The plasma x-ray generator employs a high-voltage power supply, a low-impedance coaxial transmission line, a high-voltage condenser with a capacity of about 200 nF, a turbo-molecular pump, a thyristor pulse generator as a trigger device, and a flash x-ray tube. The high-voltage main condenser is charged up to 55 kV by the power supply, and the electric charges in the condenser are discharged to the tube after triggering the cathode electrode. The x-ray tube is of a demountable triode that is connected to the turbo molecular pump with a pressure of approximately 1 mPa. As electron flows from the cathode electrode are roughly converged to the molybdenum target by the electric field in the tube, the weakly ionized plasma, which consists of metal ions and electrons, forms by the target evaporating. In the present work, the peak tube voltage was almost equal to the initial charging voltage of the main condenser, and the peak current was about 20 kA with a charging voltage of 55 kV. When the charging voltage was increased, the linear plasma x-ray source grew, and the characteristic x-ray intensities of K-series lines increased. The quite sharp lines such as hard x-ray lasers were clearly observed. The quasi-monochromatic radiography was performed by a new film-less computed radiography system.

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Polymerization of Tetraethoxysilane by Using Remote Argon/dinitrogen oxide Microwave Plasma

  • Chun, Tae-Il;Rossbach, Volker
    • Textile Coloration and Finishing
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    • v.21 no.3
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    • pp.19-25
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    • 2009
  • Polymerization of tetraethoxysilane on a glass substrate was investigated by remote microwave plasma using argon with portions of nitrous oxide as carrier gas. Transparent layer like a thickness of 0.5 ${\mu}m$ 3 ${\mu}m$ were obtained, differing in chemical composition, depending on plasma power and treatment time as well as on ageing time. In general the milder the treatment and the shorter the ageing was, the higher was the content of organic structural elements in the layer. We have identified that the chemical structure of our samples composed of mainly Si O and Si C groups containing aliphatics, carbonyl groups. These results were obtained by X ray photon spectroscopy, Fourier transformed infrared spectroscopy, and scanning electron microscope combined with Energy dispersive X ray spectroscopy.

Monitoring of semiconductor plasma process using wavelet and X-ray photoelectron spectroscopy (웨이브릿과 X-ray 광전자 분광법을 이용한 반도체 플라즈마 공정 감시 기법)

  • Park, Kyoung-Young;Kim, Byung-Whan
    • Proceedings of the KIEE Conference
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    • 2005.05a
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    • pp.281-283
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    • 2005
  • Processing Plasmas are very sensitive to a variation in process parameters, To maintain process quality and device field, plasma malfunction should be tightly monitored with high sensitivity. A new monitoring method is presented and this was accomplished by applying discrete wavelet transformation to X-ray photoelectron spectroscopy. XPS data were collected during a plasma etching of silicon carbide. Various effects of DWT factor on fault sensitivity were optimized experimentally. Compared to raw data, total percent sensitivity for DWT data demonstrated a significantly improved sensitivity to plasma faults induced by bias power.

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Recognition of Plasma- Induced X-Ray Photoelectron Spectroscopy Fault Pattern Using Wavelet and Neural Network (웨이블렛과 신경망을 이용한 플라즈마-유도 X-Ray Photoelectron Spectroscopy 고장 패턴의 인식)

  • Kim, Soo-Youn;Kim, Byung-Whan
    • Proceedings of the KIEE Conference
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    • 2006.04a
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    • pp.135-137
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    • 2006
  • To improve device yield and throughput, faults in plasma processing equipment should be quickly and accurately diagnosed. Despite many useful information of ex-situ sensor measurements, their applications to recognize plasma faultshave not been investigated. In this study, a new technique to identify fault causes by recognizing X-ray photoelectron spectroscopy (XPS) using neural network and continuous wavelet transformation (CWT). The presented technique was evaluated with the plasma etch data. A totalof 17 experiments were conducted for model construction. Model performance was investigated from the perspectives of training error, testing error, and recognition accuracy with respect to various thresholds. CWT-based BPNN models demonstrated a higher prediction accuracy of about 26%. Their advantages over pure XPS-based models were conspicuous in all three measures at small networks.

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양산에 적합한 구조의 X-ray 검출기 공정에 대한 연구

  • Gwon, Jun-Hwan;O, Gyeong-Min;Song, Yong-Geun;Kim, Ji-Na;No, Seong-Jin;Nam, Sang-Hui
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.265-266
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    • 2012
  • 의료용 X-ray의 발전에 따라, 영상의 Digital화가 필요하게 되었다. Digital 영상 구현을 위해 다양한 형태의 영상 검출기가 개발되었다. 진단 영상의 조건으로는 구현 시간이 빠르고 해상도가 높아야 한다. 조건에 부합하는 Flat panel 형태의 직접방식과 간접방식 검출기의 개발이 주로 이루어졌으며, X-ray 검출 효율이 높고 공간 분해능이 높은 직접 방식의 검출기에 대한 연구가 활발히 진행되고 있다. 기존 직접방식의 X-ray 검출물질로는 A-Se이 이용되었다. 하지만 A-Se의 경우 낮은 원자번호로 인해 X-ray에 대한효율이 낮으며, 제조 공정과 수율의 문제로 인해 대체 물질의 개발과 공정의 개선이 필요하다. 선행 연구를 통해 X-ray 검출물질의 전기적 특성을 파악을 통해 대체 물질로서 가능성을 알아보았다. 본 연구에서는 기존에 제작된 X-ray 검출물질의 상부전극 증착 물질과 증착법 선정에 대한 연구이다. 선행 연구를 통해 선정된 X-ray 검출물질은 HgI2이다. 상, 하부 전극 선택에 있어 HgI2의 일함수 값(4.15eV)을 고려하여 그와 비슷한 일함수 값을 가진 물질로 전기적 장벽을 제거하여야 한다. 따라서, ITO (일함수 4.45eV)와 Au (일함수 5.1eV)을 선택하였다. ITO의 증착으로 이용된 방법으로는 on-axis 형태의 magnetron plasma sputtering을 이용하였으며, Au의 증착으로 이용된 방법은 Thermal evaporation deposition을 이용하였다. plasma sputtering에 이용된 타겟은 In2O3;SnO2 (조성비:90:10wt%)를 사용하였으며, Chamber의 크기는 넓이 456 ${\phi}cm^2$ 높이 25 cm이며, 로 target과 기판과의 거리는 15cm이다. plasma발생에 필요한 가스로는 Ar과 O2를 이용하였다. 고 진공 환경 조성에 이용된 장비로는 Rotary pump와 Turbo molecular pump이다. plasma 발생 전 진공도는 $3.2{\times}10^{-5}$ Torr, 발생 후 진공도는 $5.1{\times}10^{-5}$ Torr이다. plasma 환경이 조성된 후 증착 시간은 1분 30초이다. Au는 순도 99.999%를 이용하였으며, 이용된 금은 1회 증착에 0.3 g을 이용하였다. Chamber의 넓이 1,444 ${\phi}cm^2$이며, 높이 40 cm, boat와 기판과의 거리는 25 cm이다. 고 진공 환경 조성에 이용된 장비로는 Rotary pump와 diffusion pump를 이용하였다. Au의 승화 전 진공도는 $2.4{\times}10^{-5}$ Torr 증착 시 진공도는 $4.2{\times}10^{-5}$ Torr이며, Boat에 가해준 전압, 전류는 0.97 V, 47 A이며, 증착 시간은 1분 30초이다. 광도전체 층에 각각 증착된 전극의 저항을 통해 증착상태를 판단하였다. DMM (Digital Multimeter)로 1 cm 간격으로 측정된 표면의 저항은 ITO 약 $8{\Omega}$, Au 약 $3{\Omega}$으로 전극으로서 이용이 가능한 상태이다. Au와 ITO가 증착된 HgI2 시편의 전기적 특성은 기존에 이용된 X-ray 변환물질의 성능보다 우수하였다. 하지만 Au와 ITO가 각각 증착된 시편의 전기적 특성은 큰 차이를 보이지 않았다. ITO의 경우 진공 상태에서 이용되는 Gas가 이용되며, Plasma 환경 조성 유지가 어려운 점이 있다. Au전극은 증착 환경 조성이 쉽지만, 전극 물질 이용효율이 떨어지는 단점이 있다. 본 연구를 통해 X-ray 변환물질인 HgI2의 전극물질로 Au와 ITO의 이용가능성을 알아보았다. 두 전극으로 제작된 검출기의 성능은 큰 차이 없이 우수하였고, 전기적 장벽 상태가 낮아 높은 검출 효율을 보였다. 상대적으로 Au 전극의 공정이 간단하고 수율이 높다. 하지만 Au Source의 이용 효율이 떨어지는 단점이 있다. 본 연구의 결과를 통해 공정상의 유리함과 Source의 이용효율을 고려한 분석에 대한 연구가 필요할 것으로 사료된다.

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Fabrication of ITO-less Sustain Electrodes for High Resolution Plasma Display Panel by X-Ray Lithographic Process

  • Ryu, Seung-Min;Yang, Dong-Yol;So, Jae-Yong;Park, Lee-Soon;Cheong, Hee-Woon;Whang, Ki-Woong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.370-373
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    • 2009
  • X-ray lithography was employed to fabricate ITO-less high resolution sustain electrodes for plasma display panel (PDP). A polyimide film based X-ray mask and Xray sensitive Ag electrode paste were fabricated to check their effect on the patterning of Ag electrodes with less than 30 ${\mu}m$ in width. The X-ray lithographic method was found to be useful for the high resolution sustain electrode patterns due to the high penetration power and low scattering property of X-ray source.

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Efficient keV X-ray Generation from Irradiation of in-situ Produced Silver Clusters by Ti:sapphire Laser Pulses

  • Chakravarty, U.;Naik, P.A.;Kumbhare, S.R.;Gupta, P.D.
    • Journal of the Optical Society of Korea
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    • v.13 no.1
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    • pp.80-85
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    • 2009
  • An experimental study of energy absorption and x-ray emission from ultrashort laser pulse irradiation of in-situ produced solid clusters has been performed. Silver clusters produced by a 30 mJ, 300 ps laser pulse were irradiated up to an intensity of $3{\times}10^{17}\;W/cm^2$ by a 70 mJ, 45 fs compressed laser pulse from the same Ti:sapphire laser. Absorption of the laser light exceeding 70% was observed, resulting in an x-ray yield (>1 keV) of ${\sim}60{\mu}J$ pulse. This may constitute a much simpler means of intense x-ray generation using ultrashort laser pulses as compared to the irradiation of structured / pre-deposited cluster targets, and it offers higher x-ray conversion efficiency than that from gas clusters and planar solid targets.