• Title/Summary/Keyword: Plasma Sensor

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Width Control in the Photo patterning of PDP Barrier Ribs

  • Kim, Dong-Ju;Kim, Soon-Hak;Hur, Young-June;Kim, Duck-Gon;Lee, Sam-Jong;Jung, Sang-Kwon;Kim, Myeug-Chan;Park, Lee-Soon
    • 한국정보디스플레이학회:학술대회논문집
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    • 2006.08a
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    • pp.910-912
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    • 2006
  • Barrier ribs in plasma display panels (PDPs) function to maintain the discharge space between the glass plates as well as to prevent optical cross-talking. The barrier ribs currently employed are typically $300{\mu}m$ pitch, $110{\sim}120{\mu}m$ in height, with upper and lower widths of $50{\mu}m$ and $80{\mu}m$, respectively. It has been reported that barrier ribs can be fabricated by screen-printing, sand blasting, etching and photolithographic processes. In this study, photosensitive barrier rib pastes were formulated and systematically evaluated in terms of photolithographic process variables such as printing, drying, UV exposure, development and sintering. It was found that the use of UV absorbent, polymerization inhibitor and surfactant were very effective in controlling the width uniformity of barrier ribs in the photolithographic method of barrier rib patterning.

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Abridged Region from Escherichia coli Periplasmic Stress Sensor DegS Acts as Plasminogen Activator In Vitro

  • Junpeng, Yan;Ko, Juho;Qi, Yipeng
    • Journal of Microbiology and Biotechnology
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    • v.17 no.4
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    • pp.594-599
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    • 2007
  • It is well known that the Escherichia coli inner membrane-bound protease DegS is a periplasmic stress sensor for unfolded outer membrane proteins (OMPs). Previous studies have also shown that the outer membrane protease OmpT activates plasminogen in vitro and this may be exploited by bacteria in the course of pathogenesis. However, there has been no research on the plasminogen activation ability of the important periplasmic protein DegS. Accordingly, in this study, the whole-length and truncated degS genes were separately overexpressed in Escherichia coli, the recombinant proteins purified by affinity chromatography, and their plasminogen activator role tested in vitro. The results suggested that the whole-length DegS was able to activate plasminogen on a plasma plate. The truncated form of DegS (residues 80-345), designated ${\Delta}DegS$, also acted as a plasminogen activator, as confirmed by different assays. The serine protease property of ${\Delta}DegS$ was verified based on the complete inhibition of its enzyme activity by PMSF (phenylmethanesulfonyl fluoride). Therefore, the present results indicate that DegS is a plasminogen activator in vitro.

A Study on Monitoring Technology to Improve the Reliability of Etching Processes (식각공정의 신뢰성 향상을 위한 모니터링 기술에 관한 연구)

  • Kyongnam Kim
    • Journal of the Korean institute of surface engineering
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    • v.57 no.3
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    • pp.208-213
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    • 2024
  • With the development of industry, miniaturization and densification of semiconductor components are rapidly progressing. Particularly, as demand surges across various sectors, efficiency in productivity has emerged as a crucial issue in semiconductor component manufacturing. Maximizing semiconductor productivity requires real-time monitoring of semiconductor processes and continuous reflection of the results to stabilize processes. However, various unexpected variables and errors in judgment that occur during the process can cause significant losses in semiconductor productivity. Therefore, while the development of a reliable manufacturing system is important, the importance of developing sensor technology that can complement this and accurately monitor the process is also growing. In this study, conducted a basic research on the concept of diagnostic sensors for thickness based on the physical changes of thin films due to etching. It observed changes in resistance corresponding to variations in thin film thickness as etching processes progressed, and conducted research on the correlation between these physical changes and thickness variations. Furthermore, to assess the reliability of thin film thickness measurement sensors, it conducted multiple measurements and comparative analyses of physical changes in thin films according to various thicknesses.

과학기술위성 2호 시스템

  • Lee, Seung-Hun;Park, Jong-Oh;Sim, Eun-Sup
    • Aerospace Engineering and Technology
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    • v.4 no.2
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    • pp.60-64
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    • 2005
  • STSAT-2 will demonstrate the scientific mission(acquisition of brightness temperature of the earth at 23.8 GHz and 37 GHz) and spacecraft technologies(laser ranging, frame-type satellite structure, Dual-head star tracker, CCD sun sensor, pulsed plasma thruster, etc.). In this paper STSAT-2 satellite system is described. It includes the definition of the system and the overview of payloads and BUS.

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The study of direct ${\mu}c$-Si:H film growth using RPCVD system in low temperature (RPCVD system을 이용한 ${\mu}c$-Si:H의 저온 직접 성장 연구)

  • Ahn, Byeong-Jae;Kim, Do-Young;Lim, Dong-Gun;Yi, Jun-Sin
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1818-1820
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    • 1999
  • This paper presents direct ${\mu}c$-Si:H thin film growth on the glass substrates using RPCVD system (remote plasma chemical vapor deposition) in low temperature. Hydrogenated micro-crystalline silicon deposited by RPCVD system in low temperature is very useful material for photovoltaic devices, sensor applications, and TFTs (thin film transistors). Varying the deposition conditions such as substrate temperature, gas flow rate, reactive gas ratio $(SiH_4/H_2)$, total chamber pressure, and rf power, we deposited ${\mu}c$-Si:H thin films on the glass substrates (Corning glass 1737). And then we measured the structural and electrical properties of the films.

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Electrochemical Properties of a Si3N4 Dielectric Layer Deposited on Anodic Aluminum Oxide for Chemical Sensors

  • Jo, Ye-Won;Lee, Sung-Gap;Yeo, Jin-Ho;Lee, Dong-Jin
    • Transactions on Electrical and Electronic Materials
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    • v.17 no.3
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    • pp.159-162
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    • 2016
  • We studied an electrolyte-dielectric metal (EDM) device based on a Si3N4 layer-coated anodic aluminium oxide (AAO) template for chemical sensors. The AAO templates were fabricated using a two-step anodization procedure at 0℃ and 70 V in 0.3 M oxalic acid, after which the Si3N4 was deposited on them using plasma enhanced chemical vapor deposition (PECVD). The average pore size was approximately 106 nm and the depth of the AAO templates was 24.6 nm to 86.5 nm. The Si3N4 layer-coated AAO is more stable than a single AAO template.

Modeling of Are Light Intensity and Its Application to Weld Seam Tracking in GMAW (GMA용접의 아크빛 모델 및 용접선 추적에의 응용)

  • 유용상;최상균;유중돈;선우희권
    • Journal of Welding and Joining
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    • v.14 no.5
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    • pp.113-121
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    • 1996
  • The arc sensor has been most widely used for weld seam tracking through welding current or voltage variation. In this work, the relation between the arc light intensity and welding condition is investigated using heat balance in the Plasma for its possible application to seam tracking in the GMAW process. The arc light intensity is derived to be the function of the arc length and welding current Experiments are carried out to verify the proposed heat balance model. Performances of least square and integration methods to process the signals for seam tracking are compared experimentally. Predicted arc light intensity shows reasonably good agreement with experimental results. The weld seam is successfully tracked through the arc light intensity. The least square and integration methods demonstrate almost same performance of seam tracking with $CO_2$gas shielding.

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Novel Position Controller for PMSM Based on State Feedback and Load Torque Feed-Forward

  • Zheng, Zedong;Li, Yongdong;Fadel, Maurice
    • Journal of Power Electronics
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    • v.11 no.2
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    • pp.140-147
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    • 2011
  • In this paper, a novel position controller based on state feedback and feed-forward is proposed. Traditional position and speed controllers are replaced by a single controller with the position and speed as state feedbacks, and the position command and load torque as feed-forwards. The feedback and feed-forward gains are obtained by analytic modeling and design. The load torque, rotor speed and position are estimated by an observer based on a Kalman filter (KF) with a low resolution mechanical position sensor. Feed-forward compensation by an estimated load torque is used to improve the dynamic performance during load torque changes.

PECVD Chamber Cleaning End Point Detection (EPD) Using Optical Emission Spectroscopy Data

  • Lee, Ho Jae;Seo, Dongsun;Hong, Sang Jeen;May, Gary S.
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.5
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    • pp.254-257
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    • 2013
  • In-situ optical emission spectroscopy (OES) is employed for PECVD chamber monitoring. OES is used as an addon sensor to monitoring and cleaning end point detection (EPD). On monitoring plasma chemistry using OES, the process gas and by-product gas are simultaneously monitored. Principal component analysis (PCA) enhances the capability of end point detection using OES data. Through chamber cleaning monitoring using OES, cleaning time is reduced by 53%, in general. Therefore, the gas usage of fluorine is also reduced, so satisfying Green Fab challenge in semiconductor manufacturing.

Monotoring Secheme of Laser Welding Interior Defects Using Neural Network (신경회로망을 이용한 레이저 용접 내부결함 모니터링 방법)

  • 손중수;이경돈;박상봉
    • Laser Solutions
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    • v.2 no.3
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    • pp.19-31
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    • 1999
  • This paper introduces the monitoring scheme of laser welding quality using neural network. The developed monitoring scheme detects light signal emitting from plasma formed above the weld pool with optic sensor and DSP-based signal processor, and analyzes to give a guidance about the weld quality. It can automatically detect defects of laser weld and further give an information about what kind of defects it is, specially partial penetration and porosity among the interior defects. Those could be detected only by naked eyes or X-ray after welding, which needs more processes and costs in mass production. The monitoring scheme extracts four feature vectors from signal processing results of optical measuring data. In order to classify pattern for extracted feature vectors and to decide defects, it uses single-layer neural network with perceptron learning. The monitoring result using only the first feature vector shows confidence rate in recognition of 90%($\pm$5) and decides whether normal status or defects status in real time.

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