Transactions on Electrical and Electronic Materials

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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PECVD Chamber Cleaning End Point Detection (EPD) Using Optical Emission Spectroscopy Data

  • Lee, Ho Jae (Department of Electronic Engineering, Myongji University) ;
  • Seo, Dongsun (Department of Electronic Engineering, Myongji University) ;
  • Hong, Sang Jeen (Department of Electronic Engineering, Myongji University) ;
  • May, Gary S. (School of Electrical and Computer Engineering, Georgia Institute of Technology)
  • Received : 2012.11.29
  • Accepted : 2013.08.07
  • Published : 2013.10.25
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Abstract

In-situ optical emission spectroscopy (OES) is employed for PECVD chamber monitoring. OES is used as an addon sensor to monitoring and cleaning end point detection (EPD). On monitoring plasma chemistry using OES, the process gas and by-product gas are simultaneously monitored. Principal component analysis (PCA) enhances the capability of end point detection using OES data. Through chamber cleaning monitoring using OES, cleaning time is reduced by 53%, in general. Therefore, the gas usage of fluorine is also reduced, so satisfying Green Fab challenge in semiconductor manufacturing.

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