• Title/Summary/Keyword: Plasma Discharge

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Discharge model of gliding arc plasma for benzene decomposition process (벤젠 분해처리를 위한 글라이딩 아크 플라즈마의 방전 모델)

  • Ko, K.;Kim, C.J.;Shin, P.K.;Hwang, M.H.;Kim, J.S.;Nam, K.Y.;Lee, Y.H.
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.1383-1384
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    • 2007
  • 직류 고전압을 사용한 글라이딩 아크 플라즈마 반응기에서 휘발성 유기 화합물(Volatile Organic Compounds, VOCs)의 일종인 기상의 벤젠 분해 연구가 진행되었다. 실험에는 압축공기와 벤젠(500ppm)으로 이루어진 혼합가스와 그 농도를 조절하기위한 압축공기가 사용되었다. 기본 방전 특성을 오실로스코프를 이용하여 분석하였다. 벤젠가스의 분해율은 글라이딩 아크 플라즈마와의 반응 전후의 가스를 포집하여 GC(Gas Chromatography)를 통해 정량 분석하여 비교하였다.

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Discharge characteristics of gliding arc plasma according to power variation (전력 변화에 따른 글라이딩 아크 플라즈마의 방전 특성)

  • Lim, J.S.;Ko, K.;Shin, P.K.;You, D.H.;Park, J.K.;Yuk, J.H.;Lee, N.H.;Kang, D.H.
    • Proceedings of the KIEE Conference
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    • 2007.07a
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    • pp.1484-1485
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    • 2007
  • 글라이딩 아크 플라즈마의 화학적 반응성을 이용하여 대표적 휘발성 유기 화합물인 벤젠의 분해를 위한 연구를 수행하였다. 실험에는 벤젠과 공기의 mixture gas를 사용하였다. 글라이딩 아크 플라즈마에 공급되는 전력을 변화시키며 각 regime의 방전 특성을 아크주의 방전 특성을 나타낸 O. Mayr의 식에 따라 살펴보았으며 플라즈마와의 반응전.후의 mixture gas내 포함되어 있는 벤젠 peak area의 크기를 GC(Gas Chromatography)를 통해 분석하였다.

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Optical Properties of Sulfur and NaI by Microwave Discharge (마이크로파 방전에 의한 Sulfur와 NaI의 광학적 특성)

  • Lee, Jong-Chan;Hwang, Myung-Keun;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2002.11a
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    • pp.109-111
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    • 2002
  • The fundamental principles of the operation of microwave discharges that are used to convert microwave energy to broad spectrum visual light are known. In this paper, emission dependance of microwave discharges in mixture content of sulfur with noble gases was studied. It is shown that the excitation of this gaseous mixture is carried out in two phases; (1) ionization of noble gas atoms by a microwave field and (2) the consequent maintenance of slightly ionized nonequilibrium plasma by the field. These two processes have essentially various thresholds for the microwave pump. The purpose of this work is to investigate spectral properties of the high frequency discharges in a mixture sulfur vapors with noble gases.

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A Novel Pulse Density Modulated High Frequency Inverter for Streamer Reactor (스트리머 발생을 위한 새로운 PDM 고주파 인버터)

  • Kim, J.Y.;Mun, S.P.;Suh, K.Y.;Lee, H.W.;Jung, J.G.
    • Proceedings of the KIEE Conference
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    • 2005.10c
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    • pp.223-225
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    • 2005
  • This paper presents a novel prototype of a current source resonant inverter using insulated gate bipolar transistors for driving a streamer reactor, streamer generation technology has been recognized as one of the best methods for water treatment, disinfection, industrial wastes utilization, and so on. However, some technological difficulties related to efficient streamer production have been significant problems restricting streamer usage in the industrial plants. Introduced in this paper is a pulse density modulated high frequency inverter for a plasma generate, which is developed with the aim to improve power conversion and control characteristics of the streamer reactor by using advances in power electronic technology. The developed system implements the feedforward control-based pulse density modulation control scheme with pulse width modulation feedback control strategy to compensate temperature and other environmental influences on streamer discharge.

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Electrical Breakdown in Flames

  • Han, S.Uhm
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.187-187
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    • 2000
  • Properties of electrical discharge in flames are investigated by making use of the ionization cross section of air. Fames have three distictive features. They are hot, emit light and are weakly ionized. We investigate influence of these three characteristics of flames on the electrical breakdown. It is found that the breakdown electric field in flames is inversely proportional to the flame temperature, thereby easily generating plasmas in flames. A swarm of low-energy electrons in flames would allow significant population of electronically excited states of flame molecules to be formed. Therefore, the analysis shows that the electronic excitation of flame molecules may also considerably reduce the breakdown field. Plasma electrons generate atomic oxygens by the electron attachment of oxygen molecules in high-pressure flames. These oxygen atoms are the most reactive radicals in flames for material oxidation. How are you and your family in this new year\ulcorner Professor Choi! I plan to go back Korea on February 6. All my family members are fine and have good time because I am here. Once I am in Korea, I will call you. I am always grateful for your helpful hand. Thank you so much.

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Effect of Environment on the Tribological Behavior of Si-incorporated Diamond-like Carbon Films (실리콘이 첨가된 다이아몬드상 카본 필름의 트라이볼로지적 특성에 미치는 환경변화의 영향)

  • 양승호;공호성;이광렬;박세준;김대은
    • Tribology and Lubricants
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    • v.16 no.3
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    • pp.188-193
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    • 2000
  • An experimental study was performed to discover the effect of environment on the tribological behavior of Si-incorporated diamond-like carbon(Si-DLC) film slid on a steel ball. The films were deposited on Si(100) wafers by a radio-frequency glow discharge of mixtures of benzene and dilute silane gases. Experiments using a ball-on-disk test-rig was performed in vacuum, dry air and ambient air conditions. It was observed that coefficient of friction decreased as the environment changed from vacuum, to dry air. Chemical analyses of debris suggested that low and stable friction is closely related to the formation of silicon-rich oxide debris and the rolling action.

Stoichiometry dependency of the firing and sustain voltage properties of MgO thin films for AC plasma display panels (교류형 플라즈마 디스플레이용 MgO 박막의 조성변화에 따른 방전전압특성의 영향)

  • 손충용;조진희;김락환;김정열;박종완
    • Journal of the Korean Vacuum Society
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    • v.9 no.1
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    • pp.24-29
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    • 2000
  • MgO thin films were deposited on soda lime glass substrates by rf magnetron sputtering using a MgO target at various oxygen flow ratios in order to probe the relationship between MgO film properties and discharge characteristics. MgO films have a tendency to form microstructures with a preferred growth orientation of (200) with increasing oxygen flo ration up to 0.1 $O_2$/(Ar+$O_2$). MgO film obtained at 0.1[$O_2$/(Ar+$O_2$)] was found to be fully stoichiometric. The stoichiometric MgO film was observed to have relatively very clean surface and grains of large size and contain almost no hydroxyl group. The AC PDP with fully stoichiometric MgO film showed lower firing and sustain voltages than those with magnesium-rich or oxygen-rich MgO films, being largely attributed to the larger grain size and the minimized hydroxyl group.

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Multiple Hole Electrode를 이용한 RF CCP에서의 홀 디자인에 관한 연구

  • Lee, Heon-Su;Lee, Yun-Seong;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.437-437
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    • 2010
  • DC Hollow cathode 방전은 약 100여 년 전, Paschen에 의해 실험된 이후로 광원, 스퍼터링 공정, 이온빔 소스 등 다양한 분야에 이용되어 왔다. 최근 태양전지용 마이크로 결정질 실리콘 증착 시, RF CCP의 전극에 복수의 홀 혹은 트렌치 구조를 두어 Hollow cathode 방전 효과를 이용하여 향상된 공정 속도로 공정을 진행한다. 그러나 RF-MHCD (Multi hole cathode discharge) 공정을 위한 최적 규격의 홀 기에 관한 연구는 그 중요성과 응용성에도 불구하고 깊게 이루어지지 못한 바 있다. 그러므로 저자는 Capacitively Coupled Plasma (전극 간격 : 4cm, 전극 직경 : 14cm) 장비에서 평면 전극과 10mm 깊이와 각각 3.5mm, 5mm, 7mm, 10mm 직경의 홀이 있는 4개의 전극을 이용하여 Argon RF-MHCD 방전을 관찰하여 조건 별 최적의 홀 전극 디자인을 도출하였다. 실험 조건은 64.5mTorr ~ 645mTorr압력 범위/ 1A~9A이며, 플라즈마는 전극 사이 중앙에 설치한 RF-compensated Langmuir Probe와, 전극과 전기적으로 접촉하는 1000:1 Probe 와 Voltage-Current Probe를 이용하여 측정되었다. 실험 결과 압력 조건 별로, 최적의 전자 밀도를 유도하는 전극 상 홀의 직경이 달라짐을 확인하였다.

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DIAMOND-LIKE CARBON FILMS FOR ANTIREFLECTION COATINGS OF GERMANIUM INFRATED OPTICAL LENSES

  • Kim, Seong-Young;Lee, Sang-Hyun;Lee, Jai-Sung
    • Journal of Surface Science and Engineering
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    • v.32 no.3
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    • pp.461-466
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    • 1999
  • Diamond-like carbon(DLC) films were directly deposited onto germanium(Ge) witness pieces and lenses by a capacitively coupled 13.56 MHz RF glow discharge plasma with $CH_4$ gas. The characterizations of DLC films were measured using a Raman and FTIR spectrometer. The configuration of Raman and FTIR spectra had a traditional shape. The IR transmittance was measured using an IR spectrophotometer. The maximum values of the IR transmission of Ge with the DLC/Ge/DLC, DLC/Ge/BBAR (broad band antireflection), DLC/Ge, and BBAR/Ge structures are 98%, 93%, 64%, and 63.5%, respectively, which come up to the theoretical values. The uniform DLC films were obtained by a rotation of the cathode at certain conditions.

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Study of silicon deep via etching mechanism using in-situ temperature monitoring of silicon exposed to $SF_6/O_2$ plasma discharge

  • Im, Yeong-Dae;Lee, Seung-Hwan;Yu, Won-Jong;Jeong, Oh-Jin;Lee, Han-Chun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.10a
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    • pp.116-117
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    • 2009
  • 식각 공정변화 즉 상부 ICP 파워, 반응기 압력, 실리콘 기판 온도변화에 따른 실리콘 딥 비어 (deep via) 의 형상 변화 메커니즘을 연구하였다. 메커니즘을 연구하기 위해 $SF_6/O_2$ 플라즈마에 노출된 실리콘 기판의 공정변화에 따른 표면 온도변화를 실시간으로 측정하여 플라즈마 내 positive ions의 거동을 분석하였다. 실리콘 기판의 표면온도를 상승시키는 주된 요인은 positive ions임을 확인할 수 있었으며 이는 기판에 적용된 negative voltage로 인하여 나타난 이온포격이 그 원인임을 알 수 있었다. 상대적으로 radical은 실리콘 표면온도 상승에 큰 역할을 하지 못하였다. 기판 표면온도가 상승 할수록 실리콘 딥 비어 구조에 undercut, local bowing과 같은 측벽 식각이 활성화됨을 확인할 수 있었으며 이는 기판에 들어오는 positive ions가 측벽식각을 유도하는 것으로 해석할 수 있었다.

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