• 제어로봇시스템학회논문지
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• 제20권4호
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• pp.428-436
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• 2014

This paper proposes a statistical regression method for classifying pillars and vehicles in parking area using a single ultrasonic sensor. There are three types of information provided by the ultrasonic sensor: TOF, the peak and the width of a pulse, from which 67 different features are extracted through segmentation and data preprocessing. The classification using the multiple SVM and the multinomial logistic regression are applied to the set of extracted features, and has achieved the accuracy of 85% and 89.67%, respectively, over a set of real-world data. The experimental result proves that the proposed feature extraction and classification scheme is applicable to the object classification using an ultrasonic sensor.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.362-363
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• 2005

The objectives of this paper are to achieve good planarization of the deposited film and to improve deposition efficiency of multi-layer structures by using surface-micromaching process in MEMS technology. Planarization characteristic of poly-Si film deposited on thin oxide layer with MEMS structures is evaluated with different slurries. Patterns used for this research have shapes of square, density, line, hole, pillar, and micro engine part. Advantages and disadvantages of CMP for MEMS structures are observed respectively by using the test patterns with structures larger than 1 um line width. Preliminary tests for material selectivity of poly-Si and oxide are conducted with two types of slurries: ILD1300 and Nalco2371. And then, the experiments were conducted based on the pretest.

• Transactions on Electrical and Electronic Materials
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• 제7권4호
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• pp.157-162
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• 2006

Chemical-mechanical polishing (CMP), one of the dominant technology for ULSI planarization, is used to flatten the micro electro-mechanical systems (MEMS) structures. The objective of this paper is to achieve good planarization of the deposited film and to improve deposition efficiency of subsequent layer structures by using surface-micromachining process in MEMS technology. Planarization characteristic of poly-Si film deposited on thin oxide layer with MEMS structures is evaluated with different slurries. Patterns used for this research have shapes of square, density, line, hole, pillar, and micro engine part. Advantages of CMP process for MEMS structures are observed respectively by using the test patterns with structures larger than 1 urn line width. Preliminary tests for material selectivity of poly-Si and oxide are conducted with two types of silica slurries: $ILD1300^{TM}\;and\;Nalco2371^{TM}$. And then, the experiments were conducted based on the pretest. A selectivity and pH adjustment of slurry affected largely step heights of MEMS structures. These results would be anticipated as an important bridge stone to manufacture MEMS CMP slurry.

• Journal of Electrical Engineering and Technology
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• 제9권3호
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• pp.843-847
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• 2014

In Super Junction (SJ) MOSFETs, charge balance is the most important issue of the SJ fabrication process. In order to achieve the best electrical characteristics, such as breakdown voltage and on-resistance, the N-type and P-type drift regions must be fully depleted when the drain bias approaches the breakdown voltage, which is known as the charge balance condition. In conventional charge balance analysis, based on multi-epi process SJ MOSFETs, analytical model has only N, P pillar width and doping concentration parameter. But applying a conventional charge balance principle to trench filling process, easier than Multi-epi process, is impossible due to the missing of the trench angle parameter. To achieve much more superior characteristics of on-resistance in trench filling SJ MOFET, the appropriate trench angle is necessary. So in this paper, modulated charge balance analysis is proposed, in which a trench angle parameter is added. The proposed method is validated using the TCAD simulation tool.

• 한국컴퓨터정보학회논문지
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• 제24권3호
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• pp.135-141
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• 2019

The purpose of this study was to analyze the direct measurement data of 20-25 years male university students of 7th Size Korea data and to characterize and to type the body shape of lower body. It was to provide basic data for male university students' pants pattern production. The lower body part consisted of the 'horizontal factor' of the lower body composed of circumference, thickness, width, and 'vertical factor' of the lower body composed of the length and height. This was consistent with the analysis of the body shape factor of the lower half of male adolescents. The lower body shape was classified into four types. Type 1 was thick and relatively long in the lower body and was named 'thick long leg'. Type 2 was named 'short bird legs' because the lower body was thin and relatively short. Type 3 was relatively thin and long, so the lower body was named 'long crane leg'. In Type 4, the lower body was relatively thick and short, which means 'short pillar leg'. In the case of 20-25 year-old male university students, they have different body shapes depending on the girth and length of the lower half of their body as they have reached adulthood. Therefore, it would be necessary to provide a sales system that allows the repair of the length of the pants to be facilitated, and the length of the pants to be repaired when the pants are selected according to the circumference. Future studies will need to classify the body shape according to angle and flatness.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.241-241
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• 2008

Macrofore formation in silicon and other semiconductors using electrochemical etching processes has been, in the last years, a subject of great attention of both theory and practice. Its first reason of concern is new areas of macropore silicone applications arising from microelectromechanical systems processing (MEMS), membrane techniques, solar cells, sensors, photonic crystals, and new technologies like a silicon-on-nothing (SON) technology. Its formation mechanism with a rich variety of controllable microstructures and their many potential applications have been studied extensively recently. Porous silicon is formed by anodic etching of crystalline silicon in hydrofluoric acid. During the etching process holes are required to enable the dissolution of the silicon anode. For p-type silicon, holes are the majority charge carriers, therefore porous silicon can be formed under the action of a positive bias on the silicon anode. For n-type silicon, holes to dissolve silicon is supplied by illuminating n-type silicon with above-band-gap light which allows sufficient generation of holes. To make a desired three-dimensional nano- or micro-structures, pre-structuring the masked surface in KOH solution to form a periodic array of etch pits before electrochemical etching. Due to enhanced electric field, the holes are efficiently collected at the pore tips for etching. The depletion of holes in the space charge region prevents silicon dissolution at the sidewalls, enabling anisotropic etching for the trenches. This is correct theoretical explanation for n-type Si etching. However, there are a few experimental repors in p-type silicon, while a number of theoretical models have been worked out to explain experimental dependence observed. To perform ordered macrofore formaion for p-type silicon, various kinds of mask patterns to make initial KOH etch pits were used. In order to understand the roles played by the kinds of etching solution in the formation of pillar arrays, we have undertaken a systematic study of the solvent effects in mixtures of HF, N-dimethylformamide (DMF), iso-propanol, and mixtures of HF with water on the macrofore structure formation on monocrystalline p-type silicon with a resistivity varying between 10 ~ 0.01 $\Omega$ cm. The etching solution including the iso-propanol produced a best three dimensional pillar structures. The experimental results are discussed on the base of Lehmann's comprehensive model based on SCR width.

• International journal of advanced smart convergence
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• 제4권1호
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• pp.137-144
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• 2015

Development of the yarn sorting equipment (khonhook) by slide way due to the principle of engineering that cause of workers on the long of motion time. The data was collected from the weaving group Ban Nongkok village, Nakornratchasima Province, THAILAND. According to the study, the step of yarn sorting (konhook) was one of the steps that affect long of motion time. The problem was the inadequate capacity equipment. The objective of research was to study and develop the yarn sorting equipment (konhook). The fabric used in the study was 64 meters in length and 1 meter in width. Researchers studied the processes the yarn sorting (konhook) which it consists of seven sub steps, 1) the thread tube setting, 2) yarn bunching, 3) tying a knot at the end of yarn, 4) looping the yarn into a pillar, 5) sorting the yarn (konhook), 6) crossing pillars and 7) taking out the yarn. Researchers focused on studying yarn sorting process (konhook) by designing and creating a device for yarn sorting (konhook) for reducing yarn sorting (konhook) time by the original method performance indicators. The results found that the developed yarn sorting equipment (konhook) ) by slide way could reduce working time from 7.24 minutes to 6.08 minutes of the original equipment yarn sorting (konhook). This means it could make the process 16.02 % faster. This also helps reducing the distance of workers' movement from 2,234 meters to 8 meters. This is 99.64 % shorter.

• 터널과지하공간
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• 제18권1호
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• pp.58-68
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• 2008

임하댐 비상여수로 터널 공사가 단층파쇄대가 포함된 화강암지역에 굴착되고 있는데 본 터널이 3련 터널임을 감안하여 터널이격거리, 터널막장간 이격거리를 검토하였으며 단층파쇄대가 여수로 터널의 안정성에 미치는 영향을 검토하였다. 이를 위해 여러 가지 지구물리학적 조사와 암반공학적 현장 실험을 실시하였다. 터널 막장간 이격거리는 최소 25 m 이상을 유지하면서 2터널의 선행 굴착이 적합하리라 판단되며 단층대의 영향을 받는 터널 만곡부의 3차원 수치해석결과 2터널의 천단변위 및 내공변위는 미미하며 숏크리트 최대 휨압 축응력, 숏크리트 최대전단응력, 록볼트 최대축력 등을 살펴보면 만곡부 굴착에 따른 응력집중은 미미하여 여수로 터널의 안정성에는 문제가 없는 것으로 판단되었다.

• 터널과지하공간
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• 제17권1호
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• pp.56-65
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• 2007

기존의 단열 시스템, 지하동굴 건설기술과 새로운 동결링 방벽기술을 결합하여 암반동굴식 지하 LNG 저장시스템이 개발되었다. 이 저장시스템의 기술적 적합성은 파일럿 동굴 실증시설의 건설과 운영을 통해 검증된 바 있으며, 조만간 실규모 프로젝트가 시작될 예정이다. LNG 저장시스템에서 중요한 사항 중의 하나는 극저온 열전달을 통해 장기간의 운영 기간동안 열손실을 최소화하는 것이다. 이 논문은 지하 LNG 저장 시스템의 설계를 위한 몇 가지 중요한 열전달 해석 결과를 제시하며, 기화율, 단열재 두께와 같은 설계 변수를 결정하기 위해 일련의 실규모 동굴에 대한 열전달 및 열-수리 해석을 실시하였다. 열-수리 연계해석결과 LNG 저장시설의 기화율은 초기 단계에서 0.04 %/day로 떨어져 유지되는 것으로 나타났다. 이 값은 암반내 존재하는 불연속면을 고려할 때 더욱 낮아질 수 있을 것으로 판단된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2009년도 제38회 동계학술대회 초록집
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• pp.365-365
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• 2010

Similar to the superhydrophobic surfaces of lotus leaf, water strider leg is attributed to hierarchical structure of micro pillar and nano-hair coated with low surface energy materials, by which water strider can run and even jump on the water surface. In order to mimick its leg, many effort, especially, on the fabrication of nanohairs has been made using several methods such as a capillarity-driven molding and lithography using poly(urethane acrylate)(PUA). However most of those effort was not so effective to create the similar structure due to its difficulty in the fabrication of nanoscale hairy structures with hydrophobic surface. In this study, we have selected a low surface energy polymeric material of polytetrafluoroethylene (PTFE, or Teflon) assisted with surface modification of CF4 plasma treatment followed by hydrophobic surface coating with pre-cursor of hexamethyldisiloxane (HMDSO) using a plasma enhanced chemical vapor deposition (PE-CVD). It was found that the plasma energy and duration of CF4 treatment on PTFE polymer could control the aspect ratio of nano-hairy structure, which varying with high aspect ratio of more than 20 to 1, or height of over 1000nm but width of 50nm in average. The water contact angle on pristine PTFE surface was measured as approximately $115^{\circ}$. With nanostructures by CF4 plasma treatment and hydrophobic coating of HMDSO film, we made a superhydrophobic nano-hair structure with the wetting angle of over $160^{\circ}C$. This novel fabrication method of nanohairy structures has been applied not only on 2-D flat substrate but also on 3-D substrates like wire and cylinder, which is similarly mimicked the water strider's leg.