• Title/Summary/Keyword: Piezoresistive

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Fabriaction of bump bounded piezoresistive silicon accelerometer (범프 본딩된 압저항 실리콘 가속도센서의 제조)

  • 심준환;이상호;이종현
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.34D no.7
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    • pp.30-36
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    • 1997
  • Bump bonded piezoesistive silicon accelerometer was fabricated by the porous silicon micromachining and th eprocess technique of integrated circuit. The output voltage of the accelerometer fabricated on (111)-oreiented Si substrates with n/n$^{+}$n triple layers showed good linear characteristic of less than 1%. The measured sensitivity and the resonant frequency was about 743 .mu.V/g and 2.04 kHz, respectively. And the transverse sensitivity of 5.2% was measured from the accelerometer. Also, to investigate an influence on the output characteristics of the sensor due to bump bonding, the values of the piezoresistors were measured through thermal-cycling test in the temperature variation form -50 to 120.deg. C. Then, there was 0.014% resistance changes about 3.61 k.ohm., so sthe output charcteristics of the sensor was less affected by bump bonding.g.

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Comparison of Temperature Characteristics Between Single and Poly-crystalline Silicon Pressure Sensor (단결정 및 다결정 실리콘 압력센서의 온도특성 비교)

  • Park, Sung-June;Park, Se-Kwang
    • Proceedings of the KIEE Conference
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    • 1995.11a
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    • pp.342-344
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    • 1995
  • Using piezoresistive effects of single-crystal and poly-crystalline silicon, pressure sensors of the same pattern were fabricated for comparison of temperature characteristics. Optimum size and aspect ratio of rectangular sensor diaphragm were calculated by FEM. For polsilicon pressure sensor, polysilicon resistors of Wheatstone bridge were deposited by LPCVD to be used in a wide' temperature range. Polysilicon pressure sensors showed more stable temperature characteristics than single-crysta1 silicon in the range of $-20\sim125[^{\circ}C]$. To get low TCO (Temperature Coefficient of Offset), below $\pm$3 [${\mu}V/V/^{\circ}C$], it is needed for each TCR of piezoresistors to have a deviation within $\pm25[ppm/^{\circ}C]$ less than $\pm500[ppm/^{\circ}C]$ of resistors for polysilicon pressure sensor can result in low TCS(Temperature Coefficient of Sensitivity) of -0.1[%FS/$^{\circ}C$].

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Flexible tactile sensor for minimally invasive surgery (최소 침습 수술을 위한 유연한 촉각 센서)

  • Lee, Junwoo;Yoo, Yong Kyoung;Han, Sung Il;Kim, Cheon Jing;Lee, Jeong Hoon
    • Proceedings of the KIEE Conference
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    • 2015.07a
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    • pp.1229-1230
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    • 2015
  • Monitoring of mechanical properties of tissues as well as direction/quantities of forces is considered as an essential way for disease diagnosis and haptic feedback systems. There are extensively increasing interests for measuring normal/shear force and touch feelings, especially for surgery systems. Highly sensitive and flexible tactile sensor is needed in palpation for detecting cancer cyst as well as real time pressure monitoring in minimally invasive surgery (MIS). Importantly, MEMS technique with miniaturized fabrication technique is essential for the on-chip integration with biopsy and biomedical grasper. Here, we propose the flexible tactile sensor with high sensitivity based on piezoresistive effect. We analyzed the sensitivity according to the pressure and directions and showed the ability of discrimination of the different materials surfaces, illustrating the feasibility of the flexible tactile sensor for biomedical grasper by mimicking human skin.

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Development of a Micro-pressure Sensor with high-resisting Pressure for Military Applications (군수용 고내압을 가지는 마이크로 압력센서의 개발)

  • Shim, Joon-Hwan;Seo, Chang-Taeg;Lee, Jong-Hyun
    • Proceedings of the Korean Society of Marine Engineers Conference
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    • 2005.06a
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    • pp.1016-1021
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    • 2005
  • A piezoresistive pressure sensor using a silicone rubber membrane has been fabricated on the selectively diffused (100)-oriented n/n+/n silicon substrates by a unique silicon micromachining technique using porous silicon ething. The width, length and thickness of the beam were 120${\mu}m$, 600${\mu}m$ and 7${\mu}m$, respectively and the thickness of the silicone rubber membrane was 40${\mu}m$. By the fusion of silicon beam and silicone rubber membrane, the mechanical strength of the pressure sensor could be highly improved due to smaller shear stress. The effectiveness of the sensor was confirmed through an experiment and FEM simulation in which the pressure sensor was characterized.

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Fabrication of a multi-functional one-chip sensor for detecting water depth, temperature, and conductivity (수위, 온도, 전도도 측정을 위한 다기능 One-Chip 센서의 제조)

  • Song, Nak-Chun;Cho, Yong-Soo;Choi, Sie-Young
    • Journal of Sensor Science and Technology
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    • v.15 no.1
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    • pp.7-12
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    • 2006
  • The multi-functional one-chip sensor has been fabricated to reduce output variation under various water environment. There were a temperature sensor, a piezoresistive type pressure sensor, and a electrode type conductivity sensor in the fabricated one-chip sensor. This sensor was measured water depth in the range of $0{\sim}180cm$, temperature in the range of $0{\sim}50^{\circ}C$, and salinity in the range of 0 $0wt%{\sim}5wt%$, respectively. Since the change of water depth in solution environment depends on various factors such as salinity, latitude, temperature, and atmospheric pressure, the water depth sensor is needed to be compensated. We tried to compensate the salinity and temperature dependence for the pressure in water by using lookup-table method.

A Study on Temperature Compensation of Silicon Piezoresistive Pressure Sensor (실리콘 저항형 압력센서의 온도 보상에 관한 연구)

  • 최시영;박상준;김우정;정광화;김국진
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.27 no.4
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    • pp.563-570
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    • 1990
  • A silicon pressure sensor made of a full bridge of diffused resistors was designed and fabricated using semiconductor integrated circuit process. Thin diaphragms with 30\ulcorner thickness were obtained using anisotropic wet chemical etching technique. Our device showed strong temperature dependence. Compensation networks are used to compensate for the temperature dependence of the pressure sensor. The bridge supply voltage having positive temperature coefficient by compensation networks was utilized against the negative temperature coefficient of bridge output voltage. The sensitivity fluctuation of pressure sensor before temperature compensation was -1700 ppm/\ulcorner, while it reduced to -710ppm\ulcorner with temperature compensation. Our result shows that the we could develop accurate and reliable pressure sensor over a wide temperature range(-20\ulcorner~50\ulcorner).

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Applications of Polycrystalline Silicon Layer to Sensors (다결정실리콘 박막의 센서에의 응용)

  • Park, Sung-June;Park, Se-Kwang
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1226-1228
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    • 1994
  • Applications of poly-Si layers which are important as sensing and structural material of various sensors were reviewed in this research. A piezoresistive pressure sensor with piezoresistors has sensitivity of $6.93{\mu}$ V/(VmmHg) within 300mmHg. Temperature sensor was studied with measurement range of $-40{\sim}140^{\circ}C$ and $400{\sim}800^{\circ}C$ using boron-doped and undoped poly-Si resistors, respectively. Poly-Si layer was used to transduce volume change of polyimide to stress of silicon diaphragm for humidity sensor.

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Application of Electrochemical Etch-stop in TMAH/IPA/pyrazine Solution to Pressure Sensors (TMAH/IPA/pyrazine용액에 있어서 전기화학적 식각정지법의 압력센서에의 응용)

  • 박진성;정귀상
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1998.06a
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    • pp.423-426
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    • 1998
  • Piezoresistive pressure sensors have fabricated using electrochemical etch-stop technique. Si diaphragm having thickness of n-epi. layer was fabricated and used to detect pressure range from 0 to 1 kg/$\textrm{cm}^2$. Piezoresistors were diffused 3${\times}$10$\^$18/ cm$\^$-3/ and placed at diaphragm edge for maximum pressure detection. The characteristics of electrochemical etch-stop in TMAH/lPA/pyrazine solution were also discussed. I-V curves of n and p-type Si in TMAH/lPA/pyrazine solution were obtained. Etching rate is highest at optimum etching condition, TMAH 25wt.%/IPA 17vo1.%/pyrazine 0.1/100m1, thus the elapsed time of etch-stop was reduced.

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Fabrication of Ceramic Thin Film Type Pressure Sensors for High-Temperature Applications and Their Characteristics (고온용 세라믹 박막형 압력센서의 제작과 그 특성)

  • 정귀상
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.9
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    • pp.790-794
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    • 2003
  • This paper describes the fabrication and characteristics of ceramic thin film type pressure sensors based on Ta-N strain gauges for high temperature applications. Ta-N thin-film strain gauges are deposited onto a thermally oxidized Si diaphragm by RF sputtering in an argon-nitrogen atmos[here($N_2$ gas ratio: 8%, annealing condition: 90$0^{\circ}C$, 1 hr.), patterned on a wheatstone bridge configuration, and used as pressure sensing elements with a high stability and a high gauge factor. The sensitivity is 1.097 ~ 1.21 mV/Vㆍkgf/$\textrm{cm}^2$ in the temperature range of 25 ~ 200 $^{\circ}C$ and the maximum non-linearity resistance), non-linearity than existing Si piezoresistive pressure sensors. The fabricated ceramic thin-film type pressure sensor is expected to be usefully applied as pressure and load sensors that os operable under high-temperature.

Silicon Strain Gauge Load Cell for Weighting Disdrometer

  • Lee, Seon-Gil;Moon, Young-Soon;Son, Won-Ho;Sohn, Young-Ho;Choi, Sie-Young
    • Journal of Sensor Science and Technology
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    • v.22 no.5
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    • pp.321-326
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    • 2013
  • In this paper, the usability of a compact silicon strain gauge load cell in a weighting disdrometer for measuring the impact load of a falling raindrop is introduced for application in a multi-meteorological sensor. The silicon strain gauge load cell is based on the piezoresistive effect, which has a high linearity output from the momentum of the raindrop and the simplicity of signal processing. The weighting disdrometer shows a high sensitivity of 7.8 mV/g in static load measurement when the diaphragm thickness of the load cell is $250{\mu}m$.