• Macromolecular Research
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• v.14 no.3
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• pp.300-305
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• 2006

The chemical structure of a semi-aromatic polyimide-I, which was prepared by the chemical imidization of cyclopentanetetracarboxylic dianhydride and 2,2-bis(4-aminophenyl)hexafluoropropane, was characterized by $^{13}C-NMR$ spectroscopy. The chemically imidized polyimide-I was used for the preparation of a photosensitive polyimide (PSPI) through the addition of benzophenone and benzophenone oxime hexamethylene diurethane (BOHD), a photobase generator containing oxime-urethane groups. The polyimide-I film containing benzophenone and BOHD was not soluble in 2.38 wt% tetrabutylammonium hydroxide solution in $H_2O$. However, it became soluble following irradiation with 310 nm UV light. A positive tone image with a resolution of $5{\mu}m$ was obtained with this PSPI, having sensitivity($D_c$) of $1.2J/cm^2$ and contrast(${\gamma}_p$) of 1.08. Thus, a polyimide, which is not intrinsically photosensitive, can become photosensitive through the addition of a photobase generator containing oxime-urethane groups as a photosensitive compound.

• Bulletin of the Korean Chemical Society
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• v.29 no.10
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• pp.2054-2056
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• 2008

• Bulletin of the Korean Chemical Society
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• v.29 no.9
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• pp.1689-1694
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• 2008

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.381-384
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• 2003

Photosensitive electordes(Ag and Black) are widely used in the patterning of both address and bus electrodes on the rear and front panel of plasma display panel (PDP). As the need for high resolution(>XGA) and large area(>60 inches) PDP is increased, basic understanding of each component of formulation on the photolithographic process of patterning electrodes are required in order to increase the yield in the production of PDP. In this work, the materials and amount of necessary components of photosensitive electrode paste and their effect on the photolithographic process of patterning electrodes were studied.

• 한국정보디스플레이학회:학술대회논문집
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• 2000.01a
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• pp.177-179
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• 2000

Barrier rib for the plasma display panel (PDP) was made by photolithographic process utilizing photosensitive barrier rib paste. The barrier rib paste was prepared by first dissolving poly(MMA-co-MAA) binder polymer in butyl carbitol(BC) solvent at 15 wt% concentration. To this solution were added a mixture of functional monomers , Irgacure 651 photoinitiator, and barrier rib power and then the whole mixture was dispersed in the three roll mill for 2 hour. The effect of component and concentration of photosensitive barrier rib paste was studied. After optimization of the paste formulation and photolithographic process, barrier rib could be obtained with good resolution up to 110-120 ${\mu}m$ height and 80-90 ${\mu}m$ width.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.369-372
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• 2008

Black matrix and Ag electrode with uniform line pitches were successfully fabricated through the photolithographic process by using the photosensitive black pastes and Ag pastes with optimized photosensitive properties for high resolution PDPs. The photosensitivity of the black and Ag pastes in the photolithographic process was investigated with the variation of photosensitive BM and Ag pastes and the photolithography process conditions. The important components and formulation of the photosensitive BM and Ag paste we discussed.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1625-1628
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• 2006

Two different negative-type photosensitive polyimides were synthesized and characterized for an application as an interdielectric layer in TFTLCD array. In the case of photocurable polyimides, the photosensitive moiety, 2-HHSP, was synthesized through 3 step reaction, and then was incorporated into side chains of polyimide precursor by post reaction. Optimum compositions of negative-type photocurable polyimde were also formulated. For photopolymerizable polyimides, two novel UV monomers containing imide linkages were prepared. An aqueous alkaline developable polymer matrix was synthesized by free radical copolymerization. A negative photoresist formulation was developed utilizing synthesized UV monomers containing imide linkage, photoinitiator, UV oligomer, and alkali developable polymer matrix. It was found that viaholes with good resolution, high transmittance and thermal resistance could be obtained by photolithographic process utilizing the negative-type photoresist formulations.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1360-1363
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• 2007

The bus electrode is composed of two layers. One is the black matrix(BM) and silver layer is formed on top of black layer. The BM paste is made by mixing $Co_3O_4$ black powder with photosensitive vehicle and rheological additives. In this work we studied the effect of $Co_3O_4$ black powder and glass frit on the rheological property of photosensitive BM paste. We also examined how the size and content of black powder and glass frit affect the transmittance and reflectance of the BM layer after sintering.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.639-642
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• 2002

A new PDP barrier rib formation technique was investigated utilizing transparent soft maid made of silicon resin. Transparent soft mold was fabricated by pouring a silicone resin into the base mold made with photosensitive glass. The photosensitive barrier rib paste was coated on the glass substrate and dried in a 90 $^{\circ}C$ convection oven for 20min. The transparent soft mold was pressed on top of the semi-dry barrier rib layer and then irradiated with a UV lamp to a total dose of $900{\sim}1000mJ/cm^2$ The soft maid was then removed from the pressed barrier rib by winding up and fine pattern of barrier rib was obtained. The photosensitive barrier rib paste makes the demolding easy due to reduced interfacial forces and shrinking of paste materials.

• Applied Chemistry for Engineering
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• v.9 no.7
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• pp.1053-1058
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• 1998

Poly(vinyl butyral)s (PVB) with different butyral content were synthesized from poly(vinyl alcohol)(PVA) and n-butylaldehyde with acid catalyst. Bound butyral unit in PVB was determined by elemental analysis. Synthesized PVBs were reacted with p-azidobenzaldehyde to give photosensitive polymer with azidobenzene group(PVB-AZ). Bound photosensitive azidobenzene group in PVB-AZ was determined by UV spectrophotometry. The photosensitivity of PVB-AZ was compared with that of PVB/2,6-bis(p-azidobenzylidene)cyclohexanone(BAC) photosensitizer mixture system by gray scale method. Photosensitivity of PVB-AZ was higher than that of PVB/BAC mixture system. The photosensitivity of PVB-AZ was dependent on the developer used due to the solubility of PVB-AZ in a developer solvent.