Acknowledgement
Supported by : 산업자원부
References
- Photopolymerization of Surface Coatings C. G. Roffey
- 感光性高分子 永松元太郞;乾英夫
- PS版槪論 光澤輝彦;山本隆太郞
- Jeremy Robinson and Magaret Lamb Photoresist; materials and process W. S. DeForest
- Ind. Eng. Chem. v.38 J. D. Ianni;F. J. Naples;J. W. Marsh;J. L. Zarney
- Phot. Sci. Eng. v.16 R. K. Agnihotori;D. L. Falcon;F. P. Hood;L. G. Lesoine;C. D. needham;J. A. Offenbach
- U. S. Pat. 2,940,853 Kodak Co
- Photoreactive polymers: The Science and technology of resists Arnost Reiser
- U. S. Patent. 3,096,31 Kodak Co.
- J. Appl. Polymer Sci. v.7 S. H. Merrill;C. C. Unruh
- 特公昭 44-31837 Gavaert-Agfa
- Handbook of Adehesives(Third Edition) Irving Skeist(et al.);Irving Skeist(ed.)
- 高分子論文集 v.50 前田俗子
- Handbook of Polymer Synthesis Hans R. Krichedorf
- Fundamental Principles of Polymeric Materials(Second Edition) S. L. Rosen;Technical Volumes Committee